Center for Quantum Devices - Journal Articles and Conference Proceedings

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776.	Intermixing of GaInP/GaAs Multiple Quantum Wells C. Francis, M.A. Bradley, P. Boucaud, F.H. Julien and M. Razeghi Applied Physics Letters 62 (2)-- January 11, 1993 The intermixing of GaInP‐GaAs superlattices induced by a heat treatment is investigated as a function of the annealing temperature and duration. Photoluminescence experiments reveal a large red shift of the effective band gap of the annealed quantum wells thus indicating a dominant self‐diffusion of the group III atoms which is confirmed by secondary ion mass spectroscopic measurements. For long enough annealing durations, the red shift saturates and even decreases due to the competing slower self‐diffusion of the group V atoms. Experiments are well understood based on a simple diffusion model. reprint
777.	Finite-Size Scaling in the Dissipative Transport Regime Between Quantum Hall Plateaus Razeghi M., S. Koch, R.J. Hang, K.V. Klitzing, K. Ploog Koch, S., Haug, R.J., v. Klitzing, K., Ploog, K., Razeghi, M. (1992). Finite-Size Scaling in the Dissipative Transport Regime Between Quantum Hall Plateaus. In: Bauer, G., Kuchar, F., Heinrich, H. (eds) Low-Dimensional Electronic Systems. Springer Series in Solid-State Sciences, vol 111. Springer, Berlin, Heidelberg.-- January 1, 1993 The magnetoresistance of a two-dimensional electron gas shows a novel scaling behaviour in the dissipative transport regime between adjacent integer quantum Hall plateaus when studied in samples of different size. At low temperatures (≥ 25mK) the phase coherence length L in may exceed the size W of small samples (W ≥ 8µm). Under these conditions the width ΔB of the magnetic field region where dissipative transport is observed becomes independent of temperature. Then ΔB only depends on the size of the sample and increases with decreasing size. Thus the critical exponent v of the localization length ξ ∝ (ΔB)−v can be determined directly. The resulting exponent v = 2.3±0.1 does not depend on the specific sample and, furthermore, is independent of the (spin-resolved) Landau level. This experimental result agrees with the predictions of several theoretical approaches to the metal-insulator transition in the quantum Hall regime. The effect described occurs both in Hall bars and in Corbino geometries, with essentially identical results. On the other hand, in a Landau level where spin-splitting is not resolved, a considerably larger value of v = 6.5 ± 0.6 is observed for the localization length exponent. reprint
778.	Splitting of the Landau Level Coincidence: A Novel Phase Transition in Tilted Magnetic Fields Razeghi M., S. Koch, R.J. Hang, K.V. Klitzing Phys Rev B 47 (7), 4048 (1993)-- January 1, 1993 Magnetotransport studies of GaxIn1-xAs/InP heterostructures in strong parallel magnetic fields at mK temperatures reveal a suppression of the coincidence of two Landau levels with opposite spin at filling factor 2. This phenomenon is explained by the occurrence of a phase transition from a spin-unpolarized state (at small tilt angles) to a spin-polarized state (at large tilt angles). reprint
779.	Growth of InSb/GaAs layers on YIG-coated GGG substrate C. Jelen, S. Charriere, M. Razeghi, and V.J. Leppert Mat. Res. Soc. Symp. Proc., Vol. 281-- January 1, 1993
780.	High Power 0.98 μm GaInAs/GaAs/GaInP Multiple Quantum Well Laser K. Mobarhan, M. Razeghi, G. Marquebielle and E. Vassilaki Journal of Applied Physics 72 (9)-- November 1, 1992 We report the fabrication of high quality Ga_0.8In_0.2As/GaAs/Ga_0.51In_0.49P multiple quantum well laser emitting at 0.98 μm grown by low pressure metalorganic chemical vapor deposition. Continuous wave operation with output power of 500 mW per facet was achieved at room temperature for a broad area laser with 130 μm width and 300 μm cavity length. This is an unusually high value of output power for this wavelength laser in this material system. The differential quantum efficiency exceeded 75% with excellent homogeneity and uniformity. The characteristic temperature, T₀ was in the range of 120–130 K. reprint
781.	High Quality InSb Epitaxial Film Grown by Low Pressure Metalorganic Chemical Vapor Deposition Y.H. Choi, R. Sudharsanan, C. Besikci, E. Bigan, and M. Razeghi Proceeding of Materials Research Society Conference Proceedings, Vol. 281-- November 1, 1992
782.	Optical Investigations of GaAs-GaInP Quantum Wells Grown on the GaAs, InP, and Si Substrates H. Xiaoguang, M. Razeghi Applied Physics Letters 61 (14)-- October 5, 1992 We report the first photoluminescence investigation of GaAs‐Ga_0.51In_0.49P lattice matched multiquantum wells grown by the low pressure metalorganic chemical vapor deposition simultaneously in the same run on GaAs, Si, and InP substrates. The sharp photoluminescence peaks indicate the high quality of the samples on three different substrates. The temperature dependence of the photoluminescence indicates that the intrinsic excitonic transitions dominate at low temperature and free‐carrier recombinations at room temperature. The photoluminescence peaks of the samples grown on Si and InP substrates shift about 15 meV from the corresponding peaks of the sample grown on the GaAs substrate. Two possible interpretations are provided for the observed energy shift. One is the diffusion of In along the dislocation threads from GaInP to GaAs and another is the localized strain induced by defects and In segregations. reprint
783.	Frontiers of Monolithic Integration of Semiconductor III-V Optoelectronic Devices with Si Technology M. Razeghi, R. Sudharsanan, and J.C.C. Fan Proceedings of International Conference on Solid State Devices and Materials, Tsukuba, Japan-- August 1, 1992
784.	GaInAs/GaAs/GaInP Buried Ridge Structure Single Quantum Well Laser Emitting at 0.98 μm K. Mobarhan, M. Razeghi and R. Blondeau IEEE Electronics Letters 28 (16)-- July 30, 1992
785.	Evaluation of the Band Offsets of GaAs-GaInP Multilayers by Electroreflectance Razeghi M., D. Yang, J.W. Garland, Z. Zhang, D. Xue SPIE Proceedings, Vol. 1676, pp. 130-- January 1, 1992 We report the first band offset measurement of GaAs/Ga_0.51In_0.49P multiquantum wells and superlattices by electrolyte electroreflectance spectroscopy. The conduction and valence band discontinuities (Delta) Ec equals 159 ± 4 meV and (Delta) Ev equals 388 ± 6 meV have been measured. The values found for the conduction band, heavy-hole and light-hole masses in the GaInP barriers and GaAs wells and for the split-off well mass are in excellent agreement with the literature. The intraband, intersubband transition energies, which are important for III - V infrared detection devices, also were directly measured. reprint
786.	Caracterisation optique des semiconducteurs III-V par ellipsometrie et reflectance differentielle spectroscopique Acher O., Omnes F., Razeghi M., Drevillion B. Thomson-CSF Revue Technique, Vol. 23, No. 3,-- September 1, 1991
787.	Incorporation of Impurities in GaAs Grown by MOCVD Razeghi M., and M.A. di Forte-Poisson Thomson-CSF Revue Technique, Vol. 23, No. 3-- September 1, 1991
788.	Etude du dopage de type n et p des materiaux GaAs et GaInP Omnes F., Defour M., Razeghi M. Thomson-CSF Revue Technique, Vol. 23, No. 3-- September 1, 1991
789.	GaAs-GaInP Multipayers for High Performance Electronic Devices Omnes F., and Razeghi M. Thomson-CSF Revue Technique, Vol. 23, No. 3-- September 1, 1991
790.	A Review of the Band Offsets Measurements in the GaAs/Ga0.49In0.51P System Omnes F., and Razeghi M. Thomson-CSF Revue Technique, Vol. 23, No. 3-- September 1, 1991
791.	Optical Investigations of GaAs-GaInP Quantum Wells and Superlattices Grown by Metalorganic Chemical Vapor Deposition Omnes F., and Razeghi M. Applied Physics Letters 59 (9), p. 1034-- May 28, 1991 Recent experimental results on the photoluminescence and photoluminescence excitation of GaAs‐Ga_0.51In_0.49P lattice‐matched quantum wells and superlattices are discussed. The full width at half maximum of a 10‐period GaAs‐GaInP superlattice with Lz=90 Å and LB=100 Å is 4 meV at 4 K. The photoluminescence excitation exhibits very sharp peaks attributed to the electron to light‐hole and electron to heavy‐hole transitions. The GaInP‐GaAs interface suffers from memory effect of In, rather than P or As elements. reprint
792.	Defects in Organometallic Vapor-Phase Epitaxy-Grown GaInP Layers Feng S.L., Bourgoin J.C., Omnes F., and Razeghi M. Applied Physics Letters 59 (8), p. 941-- May 28, 1991 Non-intentionally doped metalorganic vapor‐phase epitaxy Ga_1−x InxP layers, having an alloy composition (x = 0.49) corresponding to a lattice matched to GaAs, grown by metalorganic chemical vapor deposition, have been studied by capacitance‐voltage and deep-level transient spectroscopy techniques. They are found to exhibit a free‐carrier concentration at room temperature of the order of 10¹⁵ cm⁻³. Two electron traps have been detected. The first one, at 75 meV below the conduction band, is in small concentration (∼10¹³ cm⁻³) while the other, at about 0.9 eV and emitting electrons above room temperature, has a concentration in the range 10¹⁴–10¹⁵ cm⁻³. reprint
793.	In-situ investigation of the low-pressure MOCVD growth of III-V compounds using reflectance anisotropy measurements Bernard Drevillon, Manijeh Razeghi Proceedings Volume 1361, Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization; (1991) -- March 1, 1991 Recent in situ applications of reflectance anisotropy (RA) to the study of the growth of 111-V materials by low pressure MOCVD are reviewed. These results illustrate the extreme sensitivity of the RA technique. During heterojunction growth the first 1-2 seconds are dominated by the change of group V species. Over the time scale of several minutes the signal exhibits damped oscillations correlated to the growth rate. An optical model is proposed to account for this behaviour. A difference in the optical anisotropy between growing and non-growing AsH3 stabilized InAs surface is observed. Large reflectance anisotropies during the growth of lattice-mismatched semiconductors are also presented. It is shown that these anisotropies are related to 3-dimensional growth. The beginning of the lattice-mismatched growth is quantitatively described by an optical model based on effective medium theories. More generally RA technique appears a very promising new method for in situ monitoring of epitaxial processes.
794.	InGaAs(P)/InP MQW Mixing by Zn Diffusion Ge and S Implantation for Optoelectronic Applications, Julien F.H., Bradley M., Rao E.V.K., Razeghi M., Goldstein L. Optical and Quantum Electronics, 23-- November 30, 1990
795.	Defects in High Purity GaAs Grown by Low Pressure Metalorganic Chemical Vapor Deposition Feng S.L., Bourgoin J.C., and Razeghi M. Semiconductor Science and Technology 6, pp. 229-230-- November 30, 1990
796.	Recent Advances in MOCVD Growth of GaAs/GaInP System for OEICs Applications Razeghi M. Proceeding of the 7th International Conference on Vapor Growth and Epitaxy, Nagoya, Japan-- November 30, 1990
797.	Ga/sub 0.51/In/sub 0.49/P/GaAs HEMT's exhibiting good electrical performance at cryogenic temperatures Y.-J. Chan; D. Pavlidis; M. Razeghi; F. Omnes IEEE TRANS. ELEC.DEVICES. 77. IO. 1990-- October 1, 1990 The DC and microwave characteristics of Ga/sub 0.51/In/sub 0.49/P/GaAs HEMTs grown by metalorganic chemical vapor deposition (MOCVD) are presented. Devices with 1- mu m-long gates show transconductances of 163 and 213 mS/mm at 300 and 77 K, respectively. Their maximum cutoff frequency is 17.8 GHz. Deep traps in the doped layer are evaluated at low temperature by the threshold voltage shift and current collapse phenomena. GaInP/GaAs HEMTs show no current collapse and have almost zero threshold voltage shift compared to AlGaAs/GaAs and InAlAs/InGaAs where the corresponding values are 0.5 and 0.25 V, respectively. reprint
798.	Conduction‐ and valence‐band offsets in GaAs/Ga0.51In0.49P single quantum wells grown by metalorganic chemical vapor deposition D. Biswas; N. Debbar; P. Bhattacharya; M. Razeghi; M. Defour; F. Omnes Appl. Phys. Lett. 56, 833–835 (1990)-- February 26, 1990 We have independently estimated the conduction- and valence-band offsets D.Ec and D.Ev in GaAs/Gao . 51 Ino49 P quantum wells by measuring the capacitance transient resulting from thermal emission of carriers from the respective wens. The heterostructure samples were grown by low-pressure metalorganic chemical vapor deposition. The band offsets are extrapolated from the emission activation energies with appropriate corrections. The estimated values of AEc and AEv are 0.198 and 0.285 eV, respectively. reprint
799.	The first fabrication of n- and p-type Ga0.49In0.51P/Ga(In)As lattice matched and strained HIGFET structures grown by MOCVD M Razeghi, F Omnes, M Defour, P Maurel, P Bove, Y J Chan and D Pavlidis M Razeghi et al 1990 Semicond. Sci. Technol. 5 274-- December 11, 1989 The authors report the first fabrication of Ga0.49In0.51P/GaxIn1-xAs n- and p-type lattice matched (x=1) and strained (x-0.85) heterostructure insulated gate field effect transistor (HIGFET) grown by low-pressure metal-organic chemical vapour deposition (LP MOCVD). The growth conditions of Ga0.49In0.51P have been optimised to produce a high-purity insulator material. The n-type devices show good pinch-off characteristics, with a small variation of threshold voltage with temperature consecutive to the low trap density in that system. High transconductance values have been obtained on p-type devices, due to the large valence band discontinuity between GaAs and Ga0.49In0.51P. reprint
800.	High performance GaAs/GaInP heterostructure bipolar transistors grown by low-pressure metal-organic chemical vapour deposition M Razeghi, F Omnes, M Defour, P Maurel, J Hu, E Wolk and D Pavlidis M Razeghi et al 1990 Semicond. Sci. Technol. 5 278-- December 11, 1989 The authors report the fabrication of high-quality GaAs/GaInP n-p-n heterojunction bipolar transistors grown by low-pressure metal-organic chemical vapour deposition on semi-insulating substrates. Various structures with homogeneous and graded bases have been fabricated. Doping profiles together with X-ray double diffraction patterns demonstrate the excellent control of growth parameters such as thicknesses, doping levels and interface quality. The static characteristics of the devices show current gains as high as 400, which is the highest value reported in that system reprint

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