Center for Quantum Devices - Journal Articles and Conference Proceedings

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26.	Graphene versus oxides for transparent electrode applications Sandana, V. E.; Rogers, D. J.; Teherani, F. Hosseini; Bove, P.; Razeghi, M. Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862603 (March 18, 2013)-- March 18, 2013 Due to their combination of good electrical conductivity and optical transparency, Transparent Conducting Oxides (TCOs) are the most common choice as transparent electrodes for optoelectronics applications. In particular, devices, such as LEDs, LCDs, touch screens and solar cells typically employ indium tin oxide. However, indium has some significant drawbacks, including toxicity issues (which are hampering manufacturing), an increasing rarefication (due to a combination of relative scarcity and increasing demand [1]) and resulting price increases. Moreover, there is no satisfactory option at the moment for use as a p-type transparent contact. Thus alternative materials solutions are actively being sought. This review will compare the performance and perspectives of graphene with respect to TCOs for use in transparent conductor applications. reprint
27.	Investigation of MgZnO/ZnO heterostructures grown on c-sapphire substrates by pulsed laser deposition D. J. Rogers ; F. Hosseini Teherani ; P. Bove ; A. Lusson ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 86261X (March 18, 2013)-- March 18, 2013 MgZnO thin films were grown on c-sapphire and ZnO-coated c-sapphire substrates by pulsed laser deposition from a ZnMgO target with 4 at% Mg. The MgZnO grown on the ZnO underlayer showed significantly better crystal quality than that grown directly on sapphire. AFM studies revealed a significant deterioration in surface morphology for the MgZnO layers compared with the ZnO underlayer. Optical transmission studies indicated a MgZnO bandgap of 3.61eV (compared with 3.34eV for the ZnO), which corresponds to a Mg content of about 16.1 at%. The MgZnO/ZnO heterojunction showed an anomalously low resistivity, which was more than two orders of magnitude less than the MgZnO layer and an order of magnitude lower than that for the ZnO layer. It was suggested that this may be attributable to the presence of a 2D electron gas at the ZnMgO/ZnO heterointerface. reprint
28.	Comparison of chemical and laser lift-off for the transfer of InGaN-based p-i-n junctions from sapphire to glass substrates D. J. Rogers ; P. Bove ; F. Hosseini Teherani ; K. Pantzas ; T. Moudakir ; G. Orsal ; G. Patriarche ; S. Gautier ; A. Ougazzaden ; V. E. Sandana ; R. McClintock ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862611 (March 18, 2013)-- March 18, 2013 InGaN-based p-i-n structures were transferred from sapphire to soda-lime glass substrates using two approaches: (1) laser-lift-off (LLO) and thermo-metallic bonding and (2) chemical lift-off (LLO) by means sacrificial ZnO templates and direct wafer bonding. Both processes were found to function at RT and allow reclaim of the expensive single crystal substrate. Both approaches have also already been demonstrated to work for the wafer-scale transfer of III/V semiconductors. Compared with the industry-standard LLO, the CLO offers the added advantages of a lattice match to InGaN with higher indium contents, no need for an interfacial adhesive layer (which facilitates electrical, optical and thermal coupling), no damaged/contaminated GaN surface layer, simplified sapphire reclaim (GaN residue after LLO may complicate reclaim) and cost savings linked to elimination of the expensive LLO process. reprint
29.	Energy harvesting from millimetric ZnO single wire piezo-generators Rogers, D. J.; Carroll, C.; Bove, P.; Sandana, V. E.; Goubert, L.; Largeteau, A.; Teherani, F. Hosseini; Demazeau, G.; McClintock, R.; Drouhin, H.-J.; Razeghi, M. Oxide-based Materials and Devices III. Edited by Teherani, Ferechteh H.; Look, David C.; Rogers, David J. Proceedings of the SPIE, Volume 8263, article id. 82631X, 7 pp. (2012).-- February 9, 2013 This work reports on investigations into the possibility of harvesting energy from the piezoelectric response of millimetric ZnO rods to movement. SEM & PL studies of hydrothermally grown ZnO rods revealed sizes ranging from 1 - 3 mm x 100 - 400 microns and suggested that each was a wurtzite monocrystal. Studies of current & voltage responses as a function of time during bending with a probe arm gave responses coherent with those reported elsewhere in the literature for ZnO nanowires or micro-rod single wire generators. The larger scale of these rods provided some advantages over such nano- and microstructures in terms of contacting ease, signal level & robustness. reprint
30.	Novel process for direct bonding of GaN onto glass substrates using sacrificial ZnO template layers to chemically lift-off GaN from c-sapphire Rogers, D. J.; Ougazzaden, A.; Sandana, V. E.; Moudakir, T.; Ahaitouf, A.; Teherani, F. Hosseini; Gautier, S.; Goubert, L.; Davidson, I. A.; Prior, K. A.; McClintock, R. P.; Bove, P.; Drouhin, H.-J.; Razeghi, M. Proc. SPIE 8263, Oxide-based Materials and Devices III, 82630R (February 9, 2012)-- February 9, 2012 GaN was grown on ZnO-buffered c-sapphire (c-Al₂O₃) substrates by Metal Organic Vapor Phase Epitaxy. The ZnO then served as a sacrificial release layer, allowing chemical lift-off of the GaN from the c-Al₂O₃ substrate via selective wet etching of the ZnO. The GaN was subsequently direct-wafer-bonded onto a glass substrate. X-Ray Diffraction, Scanning Electron Microscopy, Energy Dispersive X-ray microanalysis, Room Temperature Photoluminescence & optical microscopy confirmed bonding of several mm2 of crack-free wurtzite GaN films onto a soda lime glass microscope slide with no obvious deterioration of the GaN morphology. Using such an approach, InGaN based devices can be lifted-off expensive single crystal substrates and bonded onto supports with a better cost-performance profile. Moreover, the approach offers the possibility of reclaiming and reusing the substrate. reprint
31.	ZnO nanorod electrodes for hydrogen evolution and storage Harinipriya, S.; Usmani, B.; Rogers, D. J.; Sandana, V. E.; Teherani, F. Hosseini; Lusson, A.; Bove, P.; Drouhin, H.-J.; Razeghi, M. Proc. SPIE 8263, Oxide-based Materials and Devices III, 82631Y (February 9, 2012)-- February 9, 2012 Due to the attractive combination of a relatively high specific heat of combustion with a large specific energy capacity, molecular hydrogen (H2) is being investigated for use as an alternative to fossil fuels. Energy-efficient H₂ production and safe storage remain key technical obstacles to implementation of an H₂ based economy, however. ZnO has been investigated for use as an alternative photocatalytic electrode to TiO₂ for solarpowered photo-electro-chemical (PEC) electrolysis, in which H₂ is generated by direct water splitting in a cell with a metal cathode and a semiconducting anode. In this investigation, ZnO NR grown on Si (100) substrates by pulsed laser deposition were investigated for use as electrodes in the Hydrogen Evolution Reaction (HER). The electrochemical potential and Fermi energy of the ZnO NR were estimated from the electrochemical current density in acid and alkaline solutions via phenomenological thermodynamic analysis. As well as acting as an effective electrocalytic cathode, the ZnO NR appear to operate as a hydrogen reservoir. These results indicate that the ZnO NR have excellent potential for the storage of evolved H₂. reprint
32.	Molecular Beam Epitaxial Growth of High Quality InSb for p-i-n Photodetectors G. Singh, E. Michel, C. Jelen, S. Slivken, J. Xu, P. Bove, I. Ferguson, and M. Razeghi Journal of Vacuum Science and Technology B, 13 (2)-- March 1, 1995 The InSb infrared photodetectors grown heteroepitaxially on Si substrates by molecular beam epitaxy (MBE) are reported. Excellent InSb material quality is obtained on 3-inch Si substrates (with a GaAs predeposition) as confirmed by structural, optical, and electrical analysis. InSb infrared photodetectors on Si substrates that can operate from 77 K to room temperature have been demonstrated. The peak voltage-responsitivity at 4 μm is about 1.0×10³ V/W and the corresponding Johnson-noise-limited detectivity is calculated to be 2.8×10¹⁰ cm·Hz^½/W. This is the first important stage in developing InSb detector arrays or monolithic focal plane arrays (FPAs) on silicon. The development of this technology could provide a challenge to traditional hybrid FPA's in the future. reprint
33.	Molecular beam epitaxial growth of InSb p-i-n photodetectors on GaAs and Si E. Michel, R. Peters, S. Slivken, C. Jelen, P. Bove, J. Xu, I. Ferguson, and M. Razeghi Optoelectronic Integrated Circuit Materials, Physics and Devices, SPIE Conference, San Jose, CA; Proceedings, Vol. 2397-- February 6, 1995 High quality InSb has been grown by Molecular Beam Epitaxy and optimized using Reflection High Energy Electron Diffraction. A 4.8 micrometers InSb layer grown on GaAs at a growth temperature of 395 degree(s)C and a III/V incorporation ratio of 1:1.2 had an X-ray rocking curve FWHM of 158 arcsec and a Hall mobility of 92300 cm2V-1s-1 at 77 K, the best reported to date for InSb nucleated directly onto GaAs. InSb p-i-n structures of 5.8 micrometers grown under the same conditions demonstrated a X-ray Full Width at Half Maximum of 101 arcsec and 131 arcsec for GaAs and Si substrates, respectively, and exhibited excellent uniformity of +/- 3 arcsec over a 3' substrate. Prototype InSb p-i-n detectors on Si have been fabricated and have demonstrated photovoltaic response at 6.5 micrometers up to 200 K. These p-i-n detectors have also exhibited the highest D* for a device grown onto Si. reprint
34.	Molecular Beam Epitaxial Growth of High Quality InSb E. Michel, G. Singh, S. Slivken, C. Besikci, P. Bove, I. Ferguson, and M. Razeghi Applied Physics Letters 65 (26)-- December 26, 1994 In this letter we report on the growth of high quality InSb by molecular beam epitaxy that has been optimized using reflection high energy electron diffraction. A 4.8 µm InSb layer grown on GaAs at a growth temperature of 395 °C and a III/V incorporation ratio of 1:1.2 had an x-ray rocking curve of 158 arcsec and a Hall mobility of 92,300 cm²·V⁻¹ at 77 K. This is the best material quality obtained for InSb nucleated directly onto GaAs reported to date. reprint

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