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Page 17 of 19: Prev << 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 >> Next (475 Items)
| 401. | Growth of AlxGa1-xN:Ge on sapphire and silicon substrates
X. Zhang, P. Kung, A. Saxler, D. Walker, T.C. Wang, and M. Razeghi
Applied Physics Letters 67 (12)-- September 18, 1995
AlxGa1–xN were grown on (00.1) sapphire and (111) silicon substrates in the whole composition range (0 <= x <= 1). The high optical quality of the epilayers was assessed by room-temperature optical absorption and photoluminescence measurements. Layers with higher Al composition are more resistive. Resistive AlxGa1 – xN epilayers were successfully doped with Ge and free-electron concentration as high as 3 × 10^19 cm^–3 was achieved. ...[Visit Journal]
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| 402. | Epitaxial Growth of Aluminum Nitride on Sapphire and Silicon
K. Dovidenko, S. Oktyabrsky, J. Narayan, and M. Razeghi
Proceedings of Symposium F, Materials Research Society (MRS), Boston, MA-- September 1, 1995
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| 403. | InGaAsP-based High Power Laser Diodes
M. Razeghi
Optics and Photonics News-- August 1, 1995
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| 404. | p-doped GaAs/Ga0.51In0.49P quantum well intersub-band photodetectors
J. Hoff, X. He, M. Erdtmann, E. Bigan, M. Razeghi, and G.J. Brown
Journal of Applied Physics 78 (3)-- August 1, 1995
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| 405. | Background Limited Performance in p-doped GaAs/Ga[0.71]In[0.29]As[0.39]P[0.61] Quantum Well Infrared Photodetectors
J. Hoff, S. Kim, M. Erdtmann, R. Williams, J. Piotrowski, E. Bigan, M. Razeghi and G. Brown
Applied Physics Letters 67 (1)-- July 3, 1995
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| 406. | Optimized structure for InGaAsP/GaAs 808nm high power lasers
H. Yi, J. Diaz, L.J. Wang, I. Eliashevich, S. Kim, R. Williams, M. Erdtmann, X. He, E. Kolev and M. Razeghi
Applied Physics Letters 66 (24)-- June 12, 1995
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| 407. | Reliability of Aluminum-Free 808 nm High-Power Laser Diodes with Uncoated Mirrors
I. Eliashevich, J. Diaz, H. Yi, L. Wang, and M. Razeghi
Applied Physics Letters 66 (23)-- June 5, 1995
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| 408. | High quality AlN and GaN epilayers grown on (00*1) sapphire, (100) and (111) silicon substrates
P. Kung, A. Saxler, X. Zhang, D. Walker, T.C. Wang, I. Ferguson, and M. Razeghi
Applied Physics Letters 66 (22)-- May 29, 1995
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| 409. | Photoluminescence study of GaN
X. Zhang, P. Kung, A. Saxler, D. Walker, T. Wang, and M. Razeghi
Acta Physica Polonica A 88 (4)-- May 29, 1995
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| 410. | High Power Aluminum-free InGaAsP/GaAs Pumping Diode Lasers
M. Razeghi, I. Eliashevich, J. Diaz, H.J. Yi, S. Kim, M. Erdtmann, D. Wu, and L.J. Wang
Materials Science and Engineering B 35-- May 8, 1995
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| 411. | Second Harmonic Generation in Hexagonal SiC
P.M. Lundquist, W.P. Lin, G.K. Wong, M. Razeghi, and J.B. Ketterson
Applied Physics Letters 66 (15)-- April 10, 1995
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| 412. | Molecular Beam Epitaxial Growth of High Quality InSb for p-i-n Photodetectors
G. Singh, E. Michel, C. Jelen, S. Slivken, J. Xu, P. Bove, I. Ferguson, and M. Razeghi
Journal of Vacuum Science and Technology B, 13 (2)-- March 1, 1995
The InSb infrared photodetectors grown heteroepitaxially on Si substrates by molecular beam epitaxy (MBE) are reported. Excellent InSb material quality is obtained on 3-inch Si substrates (with a GaAs predeposition) as confirmed by structural, optical, and electrical analysis. InSb infrared photodetectors on Si substrates that can operate from 77 K to room temperature have been demonstrated. The peak voltage-responsitivity at 4 μm is about 1.0×103 V/W and the corresponding Johnson-noise-limited detectivity is calculated to be 2.8×1010 cm·Hz½/W. This is the first important stage in developing InSb detector arrays or monolithic focal plane arrays (FPAs) on silicon. The development of this technology could provide a challenge to traditional hybrid FPA's in the future. ...[Visit Journal]
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| 413. | Ultra-Violet Detectors for AstroPhysics Present and Future
M. Ulmer, M. Razeghi, and E. Bigan
Optoelectronic Integrated Circuit Materials, Physics and Devices, SPIE Conference, San Jose, CA; Proceedings, Vol. 239-- February 6, 1995
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| 414. | Improved performance of IR photodetectors with 3D gap engineering
J. Piotrowski and M. Razeghi
Optoelectronic Integrated Circuit Materials, Physics and Devices, SPIE Conference, San Jose, CA; Proceedings, Vol. 2397-- February 6, 1995
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| 415. | Investigation of 0.8 µm InGaAsP-GaAs laser diodes with Multiple Quantum Wells
J. Diaz, H. Yi, S. Kim, M. Erdtmann, L.J. Wang, I. Eliashevich, E. Bigan and M. Razeghi
Optoelectronic Integrated Circuit Materials, Physics and Devices, SPIE Conference, San Jose, CA; Proceedings, Vol. 2397-- February 6, 1995
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| 416. | Molecular beam epitaxial growth of InSb p-i-n photodetectors on GaAs and Si
E. Michel, R. Peters, S. Slivken, C. Jelen, P. Bove, J. Xu, I. Ferguson, and M. Razeghi
Optoelectronic Integrated Circuit Materials, Physics and Devices, SPIE Conference, San Jose, CA; Proceedings, Vol. 2397-- February 6, 1995
High quality InSb has been grown by Molecular Beam Epitaxy and optimized using Reflection High Energy Electron Diffraction. A 4.8 micrometers InSb layer grown on GaAs at a growth temperature of 395 degree(s)C and a III/V incorporation ratio of 1:1.2 had an X-ray rocking curve FWHM of 158 arcsec and a Hall mobility of 92300 cm2V-1s-1 at 77 K, the best reported to date for InSb nucleated directly onto GaAs. InSb p-i-n structures of 5.8 micrometers grown under the same conditions demonstrated a X-ray Full Width at Half Maximum of 101 arcsec and 131 arcsec for GaAs and Si substrates, respectively, and exhibited excellent uniformity of +/- 3 arcsec over a 3' substrate. Prototype InSb p-i-n detectors on Si have been fabricated and have demonstrated photovoltaic response at 6.5 micrometers up to 200 K. These p-i-n detectors have also exhibited the highest D* for a device grown onto Si. ...[Visit Journal]
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| 417. | Aluminum-free Quantum Well Intersubband Photodetectors with p-type GaAs Wells and lattice-matched ternary and quaternary barriers
J. Hoff, E. Bigan, G.J. Brown, and M. Razeghi
Optoelectronic Integrated Circuit Materials, Physics and Devices, SPIE Conference, San Jose, CA; Proceedings, Vol. 2397-- February 6, 1995
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| 418. | Low pressure metalorganic chemical vapor deposition of high quality AlN and GaN thin films on sapphire and silicon substrates
P. Kung, X. Zhang, E. Bigan, and M. Razeghi
Optoelectronic Integrated Circuit Materials, Physics and Devices, SPIE Conference, San Jose, CA; Proceedings, Vol. 2397-- February 6, 1995
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| 419. | Temperature dependence of threshold current density Jth and differential efficiency of High Power InGaAsP/GaAs ( l = 0.8 µm) lasers
H. Yi, J. Diaz, I. Eliashevich, M. Stanton, M. Erdtmann, X. He, L. Wang, and M. Razeghi
Applied Physics Letters 66 (3)-- January 16, 1995
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| 420. | Persistent photoconductivity in thin undoped GaInP/GaAs quantum wells
S. Elhamri, M. Ahoujja, K. Ravindran, D.B. Mast, R.S. Newrock, W.C. Mitchel, G.J. Brown, I. Lo, M. Razeghi and X. He
Applied Physics Letters 66 (2)-- January 9, 1995
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| 421. | Exploration of entire range of III-V semiconductors and their device applications
M. Razeghi, Y.H. Choi, X. He, and C.J. Sun
Materials Science and Technology 11-- January 1, 1995
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| 422. | Defects of 6H-SiC substrates made by Acheson's method and by modified Lely's method
T. Kato, H. Ohsato, M. Razeghi, and T. Okuda
Proceedings - Silicon Carbide and Related Materials Conference, Kyoto, Japan; Institute of Physics Conference Seris 142 (2)-- January 1, 1995
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| 423. | Analysis of Spectral Response in p-type GaAs/GaInP QWIPs
J. Hoff, C. Jelen, S. Slivken, E. Bigan, M. Razeghi, and G.J. Brown
Superlattices and Microstructures, 8 (4)-- January 1, 1995
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| 424. | Molecular Beam Epitaxial Growth of High Quality InSb
E. Michel, G. Singh, S. Slivken, C. Besikci, P. Bove, I. Ferguson, and M. Razeghi
Applied Physics Letters 65 (26)-- December 26, 1994
In this letter we report on the growth of high quality InSb by molecular beam epitaxy that has been optimized using reflection high energy electron diffraction. A 4.8 µm InSb layer grown on GaAs at a growth temperature of 395 °C and a III/V incorporation ratio of 1:1.2 had an x-ray rocking curve of 158 arcsec and a Hall mobility of 92 300 cm2 V−1 at 77 K. This is the best material quality obtained for InSb nucleated directly onto GaAs reported to date. ...[Visit Journal]
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| 425. | The correlation between x-ray diffraction patterns and strain distribution inside GaInP/GaAs superlattices
X.G. He, M. Erdtmann, R. Williams, S. Kim, and M. Razeghi
Applied Physics Letters 65 (22)-- November 28, 1994
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