Center for Quantum Devices - Most Downloaded Journal Articles

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17.	Characteristics of Self-Assembled InGaAs/InGaP Quantum Dot Mid-Infrared Photoconductive Detectors Grown by Low Pressure MOCVD S. Kim, M. Erdtmann, and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] We report the first self-assembled InGaAs/InGaP quantum dot intersubband infrared photoconductive detectors (QDIPs) grown on semi-insulating GaAs substrate by low pressure metal organic chemical vapor deposition (MOCVD). The InGaAs quantum dots were constructed on an InGaP matrix as self assembling in Stranski-Krastanow growth mode in optimum growth conditions. The detector structure was prepared for single layer and multi-stacked quantum dots for active region. Normal incident photoconductive response was observed at a peak wavelength of 5.5 μm with a high responsivity of 130 mA/W, and a detectivity of 4.74 X 10⁷ cm·Hz^½/W at 77 K for multi-stack QDIP. Low temperature photoresponse of the single quantum dot photodetector was characterized. Peak response was obtained between 16 K and 60 K. The detailed dark current noise measurements were carried on single and multistack quantum dot infrared detectors. High photoconductive gain as 7.6 x 10³ biased at 0.5 V results in increasing the intersubband carrier relaxation time as two order of magnitude compared quantum well infrared photodetectors. [reprint (PDF)]
17.	Investigation of Enhanced Heteroepitaxy and Electrical Properties in k-Ga2O3 due to Interfacing with β-Ga2O3 Template Layers Junhee Lee, Lakshay Gautam, Ferechteh H. Teherani, Eric V. Sandana, P. Bove, David J. Rogers and Manijeh Razeghi J. Lee, M. Razeghi, Physica Status Solidi A 2023,220, 2200559, https://doi.org/10.1002/pssa.202200559 ...[Visit Journal] Heteroepitaxial k-Ga2O3 films grown by metal-organic chemical vapor deposition (MOCVD) were found to have superior materials and electrical properties thanks to the interfacing with a b-Ga2O3 template layer. k-Ga2O3grown on sapphire has not been able to demonstrate its full potential due to materials imperfections created by strain induced by the lattice mismatch at the interface between the epilayer and the substrate. By adopting a b-Ga2O3 template on a c-sapphire substrate, higher quality k-Ga2O3thin films were obtained, as evidenced by a smoother surface morphology, narrower XRD peaks, and superior electrical performance. The implications of this phenomenon, caused by b-Ga2O3 buffer layer, are already very encouraging for both boosting current device performance and opening up the perspective of novel applications for Ga2O3. [reprint (PDF)]
17.	High-Average-Power, High-Duty-Cycle (~6 μm) Quantum Cascade Lasers S. Slivken, A. Evans, J. David, and M. Razeghi Applied Physics Letters, 81 (23)-- December 2, 2002 ...[Visit Journal] High-power quantum cascade lasers emitting at λ = 6.1 μm are demonstrated. Accurate control of growth parameters and strain balancing results in a near-perfect lattice match, which leads to excellent material quality. Excellent peak power for uncoated lasers, up to 1.5 W per facet for a 21 μm emitter width, is obtained at 300 K for 30 period structures. The threshold current density at 300 K is only 2.4 kA/cm². From 300 to 425 K, the laser exhibits a characteristic temperature T₀ of 167 K. Next, Y₂O₃/Ti/Au mirror coatings were deposited on 1.5 mm cavities and mounted epilayer down. These lasers show an average output power of up to 225 mW at 17% duty cycle, and still show 8 mW average power at 45% duty cycle. [reprint (PDF)]
17.	Development of high power, InP-based quantum cascade lasers on alternative epitaxial platforms Steven Slivken, Nirajman Shrestha, Manijeh Razeghi Proc. of SPIE Vol. 12895, Quantum Sensing and Nano Electronics and Photonics XX, 1289503 (28 January - 1 February 2024, San Francisco) doi: 10.1117/12.3009335 ...[Visit Journal] In this talk, challenges and solutions associated with the monolithic, epitaxial integration of mid- and longwave- infrared, InP-based quantum cascade lasers on GaAs and Si wafers will be discussed. Initial results, including room temperature, high power, and continuous wave operation, will be described. [reprint (PDF)]
17.	Gas Source Molecular Beam Epitaxy Growth and Characterization of Ga_0.51In_0.49P/In_xGa_1-xAs/GaAs Modulation-doped Field-effect Transistor Structures C. Besikci, Y. Civan, S. Ozder, O. Sen, C. Jelen, S. Slivken, and M. Razeghi Semiconductor Science Technology 12-- January 1, 1997 ...[Visit Journal] Lattice-matched Ga_0.51In_0.49P/GaAs and strained Ga_0.51In_0.49P/In_xGa_1−xAs/GaAs (0.1 ≤ x ≤ 0.25) modulation-doped field-effect transistor structures were grown by gas source molecular beam epitaxy by using Si as dopant. Detailed electrical characterization results are presented. The Ga_0.5In_0.49P/In_0.25Ga_0.75As/GaAs sample yielded dark two-dimensional electron gas densities of 3.75 x 10¹² cm^-2 (300 K) and 2.3 x 10¹² cm^-2 (77 K) which are comparable to the highest sheet electron densities reported in AlGaAs/InGaAs/GaAs and InAlAs/InGaAs/InP modulation-doped heterostructures. Persistent photoconductivity was observed in the strained samples only. A 0.797 eV deep level has been detected in the undoped GaInP layers of the structures. Another level, with DLTS peak height dependent on the filling pulse width, has been detected at the interface of the strained samples. Based on the DLTS and Hall effect measurement results, this level, which seems to be the origin of persistent photoconductivity, can be attributed to the strain relaxation related defects. [reprint (PDF)]
17.	Recent Advances in Room Temperature, High-Power Terahertz Quantum Cascade Laser Sources Based on Difference-Frequency Generation Quanyong Lu and Manijeh Razeghi Photonics, 3, 42-- July 7, 2016 ...[Visit Journal] We present the current status of high-performance, compact, THz sources based on intracavity nonlinear frequency generation in mid-infrared quantum cascade lasers. Significant performance improvements of our THz sources in the power and wall plug efficiency are achieved by systematic optimizing the device’s active region, waveguide, and chip bonding strategy. High THz power up to 1.9 mW and 0.014 mW for pulsed mode and continuous wave operations at room temperature are demonstrated, respectively. Even higher power and efficiency are envisioned based on enhancements in outcoupling efficiency and mid-IR performance. Our compact THz device with high power and wide tuning range is highly suitable for imaging, sensing, spectroscopy, medical diagnosis, and many other applications. [reprint (PDF)]
17.	Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure M. Razeghi, J.P. Duchemin M. Razeghi, J.P. Duchemin, Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure, Journal of Crystal Growth, Volume 64, Issue 1, 1983, Pages 76-82,-- November 1, 1983 ...[Visit Journal] M. Razeghi, J.P. Duchemin, Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure, Journal of Crystal Growth, Volume 64, Issue 1, 1983, Pages 76-82, [reprint (PDF)]
17.	High Power 280 nm AlGaN Light Emitting Diodes Based on an Asymmetric Single Quantum Well K. Mayes, A. Yasan, R. McClintock, D. Shiell, S.R. Darvish, P. Kung, and M. Razeghi Applied Physics Letters, 84 (7)-- February 16, 2004 ...[Visit Journal] We demonstrate high-power AlGaN-based ultraviolet light-emitting diodes grown on sapphire with an emission wavelength of 280 nm using an asymmetric single-quantum-well active layer configuration on top of a high-quality AlGaN/AlN template layer. An output power of 1.8 mW at a pulsed current of 400 mA was achieved for a single 300 µm×300 µm diode. This device reached a high peak external quantum efficiency of 0.24% at 40 mA. An array of four diodes produced 6.5 mW at 880 mA of pulsed current. [reprint (PDF)]
17.	Top-emission ultraviolet light-emitting diodes with peak emission at 280 nm A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, and M. Razeghi Applied Physics Letters 81 (5)-- July 29, 2002 ...[Visit Journal] We demonstrate light emission at 280 nm from UV light-emitting diodes consisting of AlInGaN/AlInGaN multiple quantum wells. Turn-on voltage of the devices is ~5 V with a differential resistance of ~40 Ω. The peak emission wavelength redshifts ~1 nm at high injection currents. [reprint (PDF)]
17.	High performance antimony based type-II superlattice photodiodes on GaAs substrates B.M. Nguyen, D. Hoffman, E.K. Huang, P.Y. Delaunay, and M. Razeghi SPIE Porceedings, Vol. 7298, Orlando, FL 2009, p. 72981T-- April 13, 2009 ...[Visit Journal] In recent years, Type-II InAs/GaSb superlattices grown on GaSb substrate have achieved significant advances in both structural design and material growth, making Type-II superlattice infrared detector a rival competitor to the state-of-the-art MCT technology. However, the limited size and strong infrared absorption of GaSb substrates prevent large format type-II superlattice infrared imagers from being realized. In this work, we demonstrate type-II superlattices grown on GaAs substrates, which is a significant step toward third generation infrared imaging at low cost. The device performances of Type-II superalttice photodetectors grown on these two substrates are compared. [reprint (PDF)]
17.	Material and design engineering of (Al)GaN for high-performance avalanche photodiodes and intersubband applications M. Razeghi and C. Bayram SPIE Proceedings, Dresden, Germany (May 4-6, 2009), Vol. 7366, p. 73661F-1-- May 20, 2009 ...[Visit Journal] Numerous applications in scientific, medical, and military areas demand robust, compact, sensitive, and fast ultraviolet (UV) detection. Our (Al)GaN photodiodes pose high avalanche gain and single-photon detection efficiency that can measure up to these requirements. Inherit advantage of back-illumination in our devices offers an easier integration and layout packaging via flip-chip hybridization for UV focal plane arrays that may find uses from space applications to hostile-agent detection. Thanks to the recent (Al)GaN material optimization, III-Nitrides, known to have fast carrier dynamics and short relaxation times, are employed in (Al)GaN based superlattices that absorb in near-infrared regime. In this work, we explain the origins of our high performance UV APDs, and employ our (Al)GaN material knowledge for intersubband applications. We also discuss the extension of this material engineering into the far infrared, and even the terahertz (THz) region. [reprint (PDF)]
17.	High operating temperature MWIR photon detectors based on Type-II InAs/GaSb superlattice M. Razeghi, B.M. Nguyen, P.Y. Delaunay, S. Abdollahi Pour, E.K.W. Huang, P. Manukar, S. Bogdanov, and G. Chen SPIE Proceedings, San Francisco, CA (January 22-28, 2010), Vol. 7608, p. 76081Q-1-- January 22, 2010 ...[Visit Journal] Recent efforts have been paid to elevate the operating temperature of Type-II InAs/GaSb superlattice Mid Infrared photon detectors. Optimized growth parameters and interface engineering technique enable high quality material with a quantum efficiency above 50%. Intensive study on device architecture and doping profile has resulted in almost one order of magnitude of improvement to the electrical performance and lifted up the 300 K-background BLIP operation temperature to 166 K. At 77 K, the ~4.2 µm cut-off devices exhibit a differential resistance area product in excess of the measurement system limit (10⁶ Ω·cm²) and a detectivity of 3x10¹³ cm·Hz^½·W⁻¹. High quality focal plane arrays were demonstrated with a noise equivalent temperature of 10 mK at 77 K. Uncooled camera is capable to capture hot objects such as soldering iron. [reprint (PDF)]
17.	Sampled grating, distributed feedback quantum cascade lasers with broad tunability and continuous operation at room temperature S. Slivken, N. Bandyopadhyay, S. Tsao, S. Nida, Y. Bai, Q.Y. Lu and M. Razeghi Applied Physics Letters, Vol. 100, No. 26, p. 261112-1-- June 25, 2012 ...[Visit Journal] A dual-section, single-mode quantum cascade laser is demonstrated in continuous wave at room temperature with up to 114 nm (50 cm⁻¹) of tuning near a wavelength of 4.8 μm. Power above 100 mW is demonstrated, with a mean side mode suppression ratio of 24 dB. By changing the grating period, 270 nm (120 cm⁻¹) of gap-free electrical tuning for a single gain medium has been realized. [reprint (PDF)]
17.	InAsSbP/InAsSb/InAs Laser Diodes λ = 3.2 μm) Grown by Low-Pressure Metalorganic Chemical Vapor Deposition J. Diaz, G. Lukas, D. Wu, S. Kim, M. Erdtmann, E. Kaas, and M. Razeghi Applied Physics Letters 70 (1)-- January 6, 1997 ...[Visit Journal] We report metal–organic chemical-vapor deposition-grown double heterostructure InAsSbP/InAsSb/InAs diode lasers emitting at 3.2 μm operating at temperatures up to 220 K with threshold current density of 40 A/cm² at 77 K and characteristic temperature up to 42 K. Output powers as high as 260 mW in pulse mode and 60 mW in continuous wave operation have been obtained from an uncoated 100 μm stripe-width broad-area laser at 77 K. Comparison with theory shows that there is no significant nonradiative recombination mechanism for these lasers at 77 K. [reprint (PDF)]
17.	Crack-free AlGaN for solar-blind focal plane arrays through reduced area expitaxy E. Cicek, R. McClintock, Z. Vashaei, Y. Zhang, S. Gautier, C.Y. Cho and M. Razeghi Applied Physics Letters, Vol. 102, No. 05, p. 051102-1-- February 4, 2013 ...[Visit Journal] We report on crack reduction for solar-blind ultraviolet detectors via the use of a reduced area epitaxy (RAE) method to regrow on patterned AlN templates. With the RAE method, a pre-deposited AlN template is patterned into isolated mesas in order to reduce the formation of cracks in the subsequently grown high Al-content Al_xGa_1−xN structure. By restricting the lateral dimensions of the epitaxial growth area, the biaxial strain is relaxed by the edges of the patterned squares, which resulted in ∼97% of the pixels being crack-free. After successful implementation of RAE method, we studied the optical characteristics, the external quantum efficiency, and responsivity of average pixel-sized detectors of the patterned sample increased from 38% and 86.2 mA/W to 57% and 129.4 mA/W, respectively, as the reverse bias is increased from 0 V to 5 V. Finally, we discussed the possibility of extending this approach for focal plane array, where crack-free large area material is necessary for high quality imaging. [reprint (PDF)]
17.	Type-II superlattice dual-band LWIR imager with M-barrier and Fabry-Perot resonance E.K. Huang, A. Haddadi, G. Chen, B.M. Nguyen, M.A. Hoang, R. McClintock, M. Stegall, and M. Razeghi OSA Optics Letters, Vol. 36, No. 13, p. 2560-2562-- July 1, 2011 ...[Visit Journal] We report a high performance long-wavelength IR dual-band imager based on type-II superlattices with 100% cutoff wavelengths at 9.5 μm (blue channel) and 13 μm (red channel). Test pixels reveal background-limited behavior with specific detectivities as high as ∼5×10¹¹ Jones at 7.9 μm in the blue channel and ∼1×10¹¹ Jones at 10.2 μm in the red channel at 77 K. These performances were attributed to low dark currents thanks to the M-barrier and Fabry–Perot enhanced quantum efficiencies despite using thin 2 μm absorbing regions. In the imager, the high signal-to-noise ratio contributed to median noise equivalent temperature differences of ∼20 mK for both channels with integration times on the order of 0.5 ms, making it suitable for high speed applications. [reprint (PDF)]
17.	InP-based quantum-dot infrared photodetectors with high quantum efficiency and high temperature imaging S. Tsao, H. Lim, H. Seo, W. Zhang and M. Razeghi IEEE Sensors Journal, Vol. 8, No. 6, p. 936-941-- June 1, 2008 ...[Visit Journal] We report a room temperature operating InAs quantum-dot infrared photodetector grown on InP substrate. The self-assembled InAs quantum dots and the device structure were grown by low-pressure metalorganic chemical vapor depositon. The detectivity was 6 x 10¹⁰cm·Hz^1/2·W^-1 at 150 K and a bias of 5 V with a peak detection wavelength around 4.0 micron and a quantum efficiency of 48%. Due to the low dark current and high responsivity, a clear photoresponse has been observed at room temperature. A 320 x 256 middle wavelength infrared focal plane array operating at temperatures up to 200 K was also demonstrated. The focal plane array had 34 mA/W responsivity, 1.1% conversion efficiency, and noise equivalent temperature difference of 344 mK at 120 K operating temperature. [reprint (PDF)]
17.	Microstrip Array Ring FETs with 2D p-Ga2O3 Channels Grown by MOCVD Manijeh Razeghi, Junhee Lee, Lakshay Gautam, Jean-Pierre Leburton, Ferechteh H. Teherani, Pedram Khalili Amiri, Vinayak P. Dravid and Dimitris Pavlidis Photonics 2021, 8(12), 578; ...[Visit Journal] Gallium oxide (Ga2O3) thin films of various thicknesses were grown on sapphire (0001) substrates by metal organic chemical vapor deposition (MOCVD) using trimethylgallium (TMGa), high purity deionized water, and silane (SiH4) as gallium, oxygen, and silicon precursors, respectively. N2 was used as carrier gas. Hall measurements revealed that films grown with a lower VI/III ratio had a dominant p-type conduction with room temperature mobilities up to 7 cm2/Vs and carrier concentrations up to ~1020 cm−3 for thinner layers. High resolution transmission electron microscopy suggested that the layers were mainly κ phase. Microstrip field-effect transistors (FETs) were fabricated using 2D p-type Ga2O3:Si, channels. They achieved a maximum drain current of 2.19 mA and an on/off ratio as high as ~108. A phenomenological model for the p-type conduction was also presented. As the first demonstration of a p-type Ga2O3, this work represents a significant advance which is state of the art, which would allow the fabrication of p-n junction based devices which could be smaller/thinner and bring both cost (more devices/wafer and less growth time) and operating speed (due to miniaturization) advantages. Moreover, the first scaling down to 2D device channels opens the prospect of faster devices and improved heat evacuation [reprint (PDF)]
17.	Techniques for High-Quality SiO₂ Films J. Nguyen and M. Razeghi SPIE Conference, January 25-29, 2007, San Jose, CA Proceedings – Quantum Sensing and Nanophotonic Devices IV, Vol. 6479, p. 64791K-1-8-- January 29, 2007 ...[Visit Journal] We report on the comparison of optical, structural, and electrical properties of SiO₂ using plasma-enhanced chemical vapor deposition and ion-beam sputtering deposition. High-quality, low-temperature deposition of SiO₂ by ion-beam sputtering deposition is shown to have lower absorption, smoother and more densely packed films, a lower amount of fixed oxide charges, and a lower trapped-interface density than SiO₂ by plasma-enhanced chemical vapor deposition. This high-quality SiO₂ is then demonstrated as an excellent electrical and mechanical surface passivation layer on Type-II InAs/GaSb photodetectors [reprint (PDF)]
17.	GalnAs AND GaInAsP MATERIALS GROWN BY LOW PRESSURE MOCVD FOR MICROWAVE AND OPTOELECTRONIC APPLICATIONS J.P. Duchemin, J.P. Hirtz, M. Razeghi, M. Bonnet , S.D. Hersee J.P. Duchemin, J.P. Hirtz, M. Razeghi, GaInAs and GaInAsP materials grown by low pressure MOCVD for microwave and optoelectronic applications, Journal of Crystal Growth, 55, 1, 1981, Pages 64-73,-- August 1, 1981 ...[Visit Journal] The low pressure MOCVD technique has been successfully used to grow GaInAsP, lattice-matched to InP, for the complete compositional range between InP (λ=0.91 μm) and the ternary compound Ga0.47In0.53As (λ=1.67 μm). By contrast to LPE growth it has been found that during the MOCVD growth of double heterostructures InP can be grown directly onto the ternary or quaternary with no disturbance of the active layer, i.e. there is no effect equivalent to “melt back”. The compositional grading on both sides of the active layer was measured by scanning Auger spectroscopy on bevelled samples. It was found that the graded regions were typically less than 100 Å wide for GaInAsP active layers and less than 50 Å wide for GaInAs active layers. Single layers of undoped GaInAs exhibited a typical mobility of 6700 cm2 V-1s-1 at 1.5×1017 cm-3. The compositional uniformity of the ternary layers was characterised by measurement of the photoluminescence wavelength at various points on a large sample. The wavelength varied by <3 nm over 95% of the area, which was approximately 8 cm2. Our early MOCVD grown GaInAsP/InP DH lasers exhibited high thresholds due to a poor interface between the p-InP and the active layer. However, recently fabricated broad area lasers emitting at 1.27 μm show an average threshold current density of 1.5 kA cm-2 with a T0 of between 70 to 80 K. Stripe geometry lasers have being fabricated from this material and CW operation has been obtained. [reprint (PDF)]
17.	Fabrication and characterization of novel hybrid green light emitting didoes based on substituting n-type ZnO for n-type GaN in an inverted p-n junction C. Bayram, D. Rogers, F. H. Teherani, and M. Razeghi Journal of Vacuum Science and Technology B, Vol. 27, No. 3, May/June, p. 1784-1788-- May 29, 2009 ...[Visit Journal] Details of the fabrication and characterization of hybrid green light emitting diodes, composed of n-ZnO/(InGaN/GaN) multi-quantum-wells/p-GaN on AlN/sapphire, are reported. Scanning electron microscope, atomic force microscopy, high resolution x-ray diffraction, and photoluminescence were used to study the hybrid device. The effects of solvents, annealing, and etching on n-ZnO are discussed. Successful hybridization of ZnO and (In)GaN into a green light emitting diode was realized. [reprint (PDF)]
17.	Highly selective two-color mid-wave and long-wave infrared detector hybrid based on Type-II superlattices E.K. Huang, M.A. Hoang, G. Chen, S.R. Darvish, A. Haddadi, and M. Razeghi Optics Letters, Vol. 37, No. 22, p. 4744-4746-- November 15, 2012 ...[Visit Journal] We report a two-color mid-wave infrared (MWIR) and long-wave infrared (LWIR) co-located detector with 3 μm active region thickness per channel that is highly selective and can perform under high operating temperatures for the MWIR band. Under back-side illumination, a temperature evolution study of the MWIR detector’s electro-optical performance found the 300 K background-limit with 2π field-of-view to be achieved below operating temperatures of 160 K, at which the temperature’s 50% cutoff wavelength was 5.2 μm. The measured current reached the system limit of 0.1 pA at 110 K for 30 μm pixel-sized diodes. At 77 K, where the LWIR channel operated with a 50% cutoff wavelength at 11.2 μm, an LWIR selectivity of ∼17% was achieved in the MWIR wave band between 3 and 4.7 μm, making the detector highly selective. [reprint (PDF)]
17.	High-performance bias-selectable dual-band Short-/Mid-wavelength infrared photodetectors and focal plane arrays based on InAs/GaSb/AlSb Type-II superlattices M. Razeghi; A.M. Hoang; A. Haddadi; G. Chen; S. Ramezani-Darvish; P. Bijjam; P. Wijewarnasuriy; E. Decuir Proc. SPIE 8704, Infrared Technology and Applications XXXIX, 87041W (June 18, 2013)-- June 18, 2013 ...[Visit Journal] We report a bias selectable dual-band Type-II superlattice-based short-wave infrared (SWIR) and mid-wave infrared (MWIR) co-located photodetector capable of active and passive imaging. A new double-layer etch-stop scheme is introduced for back-side-illuminated photodetectors, which enhanced the external quantum efficiency both in the SWIR and MWIR spectral regions. Temperature-dependent dark current measurements of pixel-sized 27 μm detectors found the dark current density to be ∼1×10-5 A/cm2 for the ∼4.2 μm cut-off MWIR channel at 140 K. This corresponded to a reasonable imager noise equivalent difference in temperature of ∼49 mK using F/2.3 optics and a 10 ms integration time (tint), which lowered to ∼13 mK at 110 K using and integration time of 30 ms, illustrating the potential for high-temperature operation. The SWIR channel was found to be limited by readout noise below 150 K. An excellent imagery from the dual-band imager exemplifying pixel coincidence is shown. [reprint (PDF)]
17.	Low Dark Current Deep UV AlGaN Photodetectors on AlN Substrate Lakshay Gautam, Junhee Lee, Gail Brown, Manijeh Razeghi IEEE Journal of Quantum Electronics, vol. 58, no. 3, pp. 1-5, June 2022, Art no. 4000205 ...[Visit Journal] We report high quality, low dark current, deep Ultraviolet AlGaN/AlN Photodetectors on AlN substrate. AlGaN based Photodetectors are grown and fabricated both on AlN and Sapphire substrates with the same epilayer structure. Subsequently, electrical characteristics of both photodetectors on AlN substrate and Sapphire are compared. A reduction of 4 orders of magnitude of dark current density is reported in UV detectors grown on AlN substrate with respect to Sapphire substrate. [reprint (PDF)]
17.	Comparison of type-II superlattice and HgCdTe infrared detector technologies Jagmohan Bajaj; Gerry Sullivan; Don Lee; Ed Aifer; Manijeh Razeghi Proc. SPIE 6542, Infrared Technology and Applications XXXIII, 65420B (May 14, 2007)-- May 14, 2007 ...[Visit Journal] Performance of HgCdTe detector technology surpasses all others in the mid-wave and long-wave infrared spectrum. This technology is relatively mature with current effort focused on improving uniformity, and demonstrating increased focal plane array (FPA) functionality. Type-II superlattice (InAs-GaSb and related alloys) detector technology has seen rapid progress over the past few years. The merits of the superlattice material system rest on predictions of even higher performance than HgCdTe and of engineering advantages. While no one has demonstrated Type-II superlattice detectors with performance superior to HgCdTe detectors, the difference in performance between these two technologies is decreasing. In this paper, we review the status and highlight relative merits of both HgCdTe and Type-II superlattice based detector technologies. [reprint (PDF)]

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