Center for Quantum Devices - Most Downloaded Journal Articles

Page 7 of 10: Prev << 1 2 3 4 5 6 7 8 9 10 >> Next (239 Items)

1.	Semiconductor ultraviolet detectors M. Razeghi and A. Rogalski SPIE Photonics West '96 Photodetectors: Materials and Devices; Proceedings 2685-- January 27, 1996 ...[Visit Journal] This paper presents an overview of semiconductor ultraviolet (UV) detectors that are currently available and associated technologies that are undergoing further development. At the beginning, the classification of UV detectors and general requirements imposed on these detectors are presented. Further consideration are restricted to modern semiconductor UV detectors, so the current state-of-the-art of different types of semiconductor UV detectors is presented. Hitherto, the semiconductor UV detectors have been mainly fabricated using Si. Industries such as the aerospace, automotive, petroleum, and others have continuously provided the impetus pushing the development of fringe technologies which are tolerant of increasingly high temperatures and hostile environments. As a result, the main effort are currently directed to a new generation of UV detectors fabricated from wide-band-gap semiconductors between them the most promising are diamond and AlGaN. The latest progress in development of AlGaN UV detectors is finally described in detail. [reprint (PDF)]
1.	Surface plasmon enhanced light emission from AlGaN-based ultraviolet light-emitting diodes grown on Si (111) Chu-Young Cho, Yinjun Zhang, Erdem Cicek, Benjamin Rahnema, Yanbo Bai, Ryan McClintock, and Manijeh Razeghi Appl. Phys. Lett. 102, 211110 (2013)-- May 31, 2013 ...[Visit Journal] We report on the development of surface plasmon (SP) enhanced AlGaN-based multiple quantum wells (MQWs) ultraviolet (UV) light-emitting diodes (LEDs) grown on silicon (111) substrates. In order to generate SP-coupling with the radiating dipoles in MQWs, an aluminum layer is selectively deposited in holes etched in the top p-AlGaN to p-GaN layers. After flip-chip bonding and substrate removal, an optical output power of ∼1.2 mW is achieved at an emission wavelength of 346 nm; the output power of these UV LEDs with Al layer is increased by 45% compared to that of conventional UV LEDs without Al layer. This enhancement can be attributed to an increase in the spontaneous emission rate and improved internal quantum efficiency via resonance coupling between excitons in MQWs and SPs in the aluminum layer. [reprint (PDF)]
1.	Negative luminescence of long-wavelength InAs/GaSb superlattice photodiodes D. Hoffman, A. Hood, Y. Wei, A. Gin, F. Fuchs, and M. Razeghi Applied Physics Letters 87 (20)-- November 14, 2005 ...[Visit Journal] The electrically pumped emission behavior of binary type-II InAs/GaSb superlattice photodiodes has been studied in the spectral range between 8 µm and 13 µm. With a radiometric calibration of the experimental setup, the internal and external quantum efficiency has been determined in the temperature range between 80 K and 300 K for both, the negative and positive luminescence. The negative luminescence efficiency approaches values as high as 35% without antireflection coating. The temperature dependence of the internal quantum efficiency near zero-bias voltage allows for the determination of the electron-hole-electron Auger recombination coefficient of Γ_n=1×10²⁴ cm⁶ s^–1. [reprint (PDF)]
1.	Quantum Dot Infrared Photodetectors: Comparison Experiment and Theory H. Lim, W. Zhang, S. Tsao, T. Sills, J. Szafraniec, K. Mi, B. Movaghar, and M. Razeghi Physical Review B, 72-- August 17, 2005 ...[Visit Journal] We present data and calculations and examine the factors that determine the detectivities in self-assembled InAs and InGaAs based quantum dot infrared photodetectors (QDIPs). We investigate a class of devices that combine good wavelength selectivity with “high detectivity.” We study the factors that limit the temperature performance of quantum dot detectors. For this we develop a formalism to evaluate the optical absorption and the electron transport properties. We examine the performance limiting factors and compare theory with experimental data. We find that the notion of a phonon bottleneck does not apply to large-diameter lenslike quantum dots, which have many closely spaced energy levels. The observed strong decrease of responsivity with temperature is ultimately due to a rapid thermal cascade back into the ground states. High temperature performance is improved by engineering the excited state to be near the continuum. The good low temperature (77 K) performance in strongly bound QDIPs is shown to be due to the high gain and the low noise achievable in these micron size devices. [reprint (PDF)]
1.	A detailed analysis of carrier transport in InAs0.3Sb0.7 layers grown on GaAs substrates by metalorganic chemical vapor deposition C. Besikci, Y.H. Choi, G. Labeyrie, E. Bigan and M. Razeghi with J.B. Cohen, J. Carsello, and V.P. Dravid Journal of Applied Physics 76 (10)-- November 15, 1994 ...[Visit Journal] InAs_0.3Sb_0.7 layers with mirrorlike morphology have been grown on GaAs substrates by low‐pressure metalorganic chemical vapor deposition. A room‐temperature electron Hall mobility of 2×10⁴ cm²/V· s has been obtained for a 2 μm thick layer. Low‐temperature resistivity of the layers depended on TMIn flow rate and layer thickness. Hall mobility decreased monotonically with decreasing temperature below 300 K. A 77 K conductivity profile has shown an anomalous increase in the sample conductivity with decreasing thickness except in the near vicinity of the heterointerface. In order to interpret the experimental data, the effects of different scattering mechanisms on carrier mobility have been calculated, and the influences of the lattice mismatch and surface conduction on the Hall measurements have been investigated by applying a three‐layer Hall‐effect model. Experimental and theoretical results suggest that the combined effects of the dislocations generated by the large lattice mismatch and strong surface inversion may lead to deceptive Hall measurements by reflecting typical n‐type behavior for a p‐type sample, and the measured carrier concentration may considerably be affected by the surface conduction up to near room temperature. A quantitative analysis of dislocation scattering has shown significant degradation in electron mobility for dislocation densities above 10⁷ cm⁻². The effects of dislocation scattering on hole mobility have been found to be less severe. It has also been observed that there is a critical epilayer thickness (∼1 μm) below which the surface electron mobility is limited by dislocation scattering. [reprint (PDF)]
1.	Growth of In_1-xTl_xSb, a New Infrared Material, by Low-Pressure Metalorganic Chemical Vapor Deposition Y.H. Choi, R. Sudharsanan, C, Besikci, and M. Razeghi Applied Physics Letters 63 (3)-- July 19, 1993 ...[Visit Journal] We report the growth of In_1-xTl_xSb, a new III-V alloy for long-wavelength infrared detector applications, by low-pressure metalorganic chemical vapor deposition. In_1-xTl_xSb with good surface morphology was obtained on both GaAs and InSb substrates at a growth temperature of 455 °C. X-ray diffraction measurements showed resolved peaks of In_1-xTl_xSb and InSb films. Infrared absorption spectrum of In_1-xTl_xSb showed a shift toward lower energies compared to InSb spectrum. Hall mobility data on In_1-xTl_xSb/InSb/GaAs structure showed enhanced mobility at low temperatures compared to InSb/GaAs structure. [reprint (PDF)]
1.	Demonstration of shortwavelength infrared photodiodes based on type-II InAs/GaSb/AlSb superlattices A.M. Hoang, G. Chen, A. Haddadi, S. Abdollahi Pour, and M. Razeghi Applied Physics Letters, Vol. 100, No. 21, p. 211101-1-- May 21, 2012 ...[Visit Journal] We demonstrate the feasibility of the InAs/GaSb/AlSb type-II superlattice photodiodes operating at the short wavelength infrared regime below 3 μm. An n-i-p type-II InAs/GaSb/AlSb photodiode was grown with a designed cut-off wavelength of 2 μm on a GaSb substrate. At 150 K, the photodiode exhibited a dark current density of 5.6 × 10⁻⁸ A/cm² and a front-side-illuminated quantum efficiency of 40.3%, providing an associated shot noise detectivity of 1.0 × 10¹³ Jones. The uncooled photodiode showed a dark current density of 2.2 × 10⁻³ A/cm² and a quantum efficiency of 41.5%, resulting in a detectivity of 1.7 × 10¹⁰ Jones [reprint (PDF)]
1.	Resonant cavity enhanced heterojunction phototransistors based on type-II superlattices Jiakai Li, Arash Dehzangi, Donghai Wu, Ryan McClintock, Manijeh Razeghi Infrared Physics & Technology Available online 27 October 2020, 103552 https://doi.org/10.1016/j.infrared.2020.103552-- October 27, 2020 ...[Visit Journal] Resonant cavity enhanced heterojunction phototransistor based on InAs/GaSb/AlSb type-II superlattice grown by molecular beam epitaxy has been demonstrated. The resonant wavelength was designed to be at near 1.9 μm wavelength range at room temperature. An eleven-pair lattice matched GaSb-AlAsSb quarter-wavelength Bragg reflector was used in the RCE-HPT to enhance the photoresponse. The device showed the wavelength selectivity and a cavity enhancement of the responsivity at 1.9 μm at room temperature. [reprint (PDF)]
1.	Structural, Optical, Electrical and Morphological Study of Transparent p-NiO/n-ZnO Heterojunctions Grown by PLD V. E. Sandana, D. J. Rogers, F. Hosseini Teherani, P. Bove, N. Ben Sedrine, M. R. Correia, T. Monteiro, R. McClintock, and M. Razeghi Proc. SPIE 9364, Oxide-based Materials and Devices VI, 93641O-- March 24, 2015 ...[Visit Journal] NiO/ZnO heterostructures were fabricated on FTO/glass and bulk hydrothermal ZnO substrates by pulsed laser deposition. X-Ray diffraction and Room Temperature (RT) Raman studies were consistent with the formation of (0002) oriented wurtzite ZnO and (111) oriented fcc NiO. RT optical transmission studies revealed bandgap energy values of ~3.70 eV and ~3.30 eV for NiO and ZnO, respectively and more than 80% transmission for the whole ZnO/NiO/FTO/glass stack over the majority of the visible spectrum. Lateral p-n heterojunction mesas (~6mm x 6mm) were fabricated using a shadow mask during PLD growth. n-n and p-p measurements showed that Ti/Au contacting gave an Ohmic reponse for the NiO, ZnO and FTO. Both heterojunctions had rectifying I/V characteristics. The junction on FTO/glass gave forward bias currents (243mA at +10V) that were over 5 orders of magnitude higher than those for the junction formed on bulk ZnO. At ~ 10^-7 A (for 10V of reverse bias) the heterojunction leakage current was approximately two orders of magnitude lower on the bulk ZnO substrate than on FTO. Overall, the lateral p-NiO/n-ZnO/FTO/glass device proved far superior to that formed by growing p-NiO directly on the bulk n-ZnO substrate and gave a combination of electrical performance and visible wavelength transparency that could predispose it for use in various third generation transparent electronics applications. [reprint (PDF)]
1.	Delta-doping optimization for high qualityp-type GaN C. Bayram, J.L. Pau, R. McClintock and M. Razeghi Journal of Applied Physics, Vol. 104, No. 8-- October 15, 2008 ...[Visit Journal] Delta-doping is studied in order to achieve high quality p-type GaN. Atomic force microscopy, x-ray diffraction, photoluminescence, and Hall measurements are performed on the samples to optimize the delta-doping characteristics. The effect of annealing on the electrical, optical, and structural quality is also investigated for different delta-doping parameters. Optimized pulsing conditions result in layers with hole concentrations near 10¹⁸ cm⁻³ and superior crystal quality compared to conventional p-GaN. This material improvement is achieved thanks to the reduction in the Mg activation energy and self-compensation effects in delta-doped p-GaN. [reprint (PDF)]
1.	Future of Al_xGa_1-xN Materials and Device Technology for Ultraviolet Photodetectors P. Kung, A. Yasan, R. McClintock, S. Darvish, K. Mi, and M. Razeghi SPIE Conference, San Jose, CA, Vol. 4650, pp. 199-- May 1, 2002 ...[Visit Journal] Design of the photodetector structure is one of the key issues in obtaining high performance devices; especially the thickness of the intrinsic region for p-i-n photodiodes is a crucial value and needs to be optimized. We compare the performance of the p-i-n photodiodes with different widths for the depletion region, which shows a trade-off between speed and responsivity of the devices. [reprint (PDF)]
1.	Electrical Transport Properties of Highly Doped N-type GaN Epilayers H.J. Lee, M.G. Cheong, E.K. Suh, and M. Razeghi SPIE Conference, San Jose, CA, -- January 28, 1998 ...[Visit Journal] Temperature-dependent Hall-effects in MOCVD-grown Si-doped GaN epilayers were measured as a function of temperature in the range 10-800 K. The results were satisfactorily analyzed in terms of a two-band model including the (Gamma) and impurity bands at lower temperatures than room. The (Gamma) band electrons are dominant only high temperatures. The ionized impurity scattering is the most important in the (Gamma) band except at very high temperatures. [reprint (PDF)]
1.	Tight-binding theory for the thermal evolution of optical band gaps in semiconductors and superlattices S. Abdollahi Pour, B. Movaghar, and M. Razeghi American Physical Review, Vol. 83, No. 11, p. 115331-1-- March 15, 2011 ...[Visit Journal] A method to handle the variation of the band gap with temperature in direct band-gap III–V semiconductors and superlattices using an empirical tight-binding method has been developed. The approach follows closely established procedures and allows parameter variations which give rise to perfect fits to the experimental data. We also apply the tight-binding method to the far more complex problem of band structures in Type-II infrared superlattices for which we have access to original experimental data recently acquired by our group. Given the close packing of bands in small band-gap Type-II designs, k·p methods become difficult to handle, and it turns out that the sp3s* tight-binding scheme is a practical and powerful asset. Other approaches to band-gap shrinkage explored in the past are discussed, scrutinized, and compared. This includes the lattice expansion term, the phonon softening mechanism, and the electron-phonon polaronic shifts calculated in perturbation theory. [reprint (PDF)]
1.	High Power 3-12 μm Infrared Lasers: Recent Improvements and Future Trends M. Razeghi, S. Slivken, A. Tahraoui, A. Matlis, and Y.S. Park Advanced Research Workshop on Semiconductor Nanostructures, Queenstown, New Zealand; Proceedings -- February 5, 2003 ...[Visit Journal] In this paper, we discuss the progress of quantum cascade lasers (QCLs) grown by gas-source molecular beam epitaxy. Room temperature QCL operation has been reported for lasers emitting between 5-11 μm, with 9-11 μm lasers operating up to 425 K. Laser technology for the 3-5 μm range takes advantage of a strain-balanced active layer design. We also demonstrate record room temperature peak output powers at 9 and 11 μm (2.5 and 1 W, respectively) as well as record low 80K threshold current densities (250 A/cm²) for some laser designs. Preliminary distributed feedback (DFB) results are also presented and exhibit single mode operation for 9 μm lasers at room temperature. [reprint (PDF)]
1.	Dark current suppression in Type-II InAs/GaSb superlattice long wavelength infrared photodiodes with M-structure barrier B.M. Nguyen, D. Hoffman, P.Y. Delaunay, and M. Razeghi Applied Physics Letters, Vol. 91, No. 16, p. 163511-1-- October 15, 2007 ...[Visit Journal] We presented an alternative design of Type-II superlattice photodiodes with the insertion of a mid-wavelength infrared M-structure AlSb/GaSb/InAs/GaSb/AlSb superlattice for the reduction of dark current. The M-structure superlattice has a larger carrier effective mass and a greater band discontinuity as compared to the standard Type-II superlattices at the valence band. It acts as an effective medium that weakens the diffusion and tunneling transport at the depletion region. As a result, a 10.5 µm cutoff Type-II superlattice with 500 nm M-superlattice barrier exhibited a R₀A of 200 cm² at 77 K, approximately one order of magnitude higher than the design without the barrier. The quantum efficiency of such structures does not show dependence on either barrier thickness or applied bias. [reprint (PDF)]
1.	Type-II InAs/GaSb/AlSb superlatticebased heterojunction phototransistors: back to the future Abbas Haddadi, Arash Dehzangi, Romain Chevallier, Thomas Yang, Manijeh Razeghi Proc. SPIE 10540, Quantum Sensing and Nano Electronics and Photonics XV- Page-1054004-1-- January 26, 2018 ...[Visit Journal] Most of reported HPTs in literatures are based on InGaAs compounds that cover NIR spectral region. However, InGaAs compounds provide limited cut-off wavelength tunability. In contrast, type-II superlattices (T2SLs) are a developing new material system with intrinsic advantages such as great flexibility in bandgap engineering, low growth and manufacturing cost, high-uniformity, auger recombination suppression, and high carrier effective mass that are becoming an attractive candidate for infrared detection and imaging from short-wavelength infrared to very long wavelength infrared regime. We present the recent advancements in T2SL-based heterojunction phototransistors in e– SWIR, MWIR and LWIR spectral ranges. A mid-wavelength infrared heterojunction phototransistor based on type-II InAs/AlSb/GaSb superlattices on GaSb substrate has been demonstrated. Then, we present the effect of vertical scaling on the optical and electrical performance of heterojunction phototransistors, where the performance of devices with different base width was compared as the base was scaled from 60 down to 40 nm. [reprint (PDF)]
1.	Scale-up of the Chemical Lift-off of (In)GaN-based p-i-n Junctions from Sapphire Substrates Using Sacrificial ZnO Template Layers D. J. Rogers, S. Sundaram, Y. El Gmili, F. Hosseini Teherani, P. Bove, V. Sandana, P. L. Voss, A. Ougazzaden, A. Rajan, K.A. Prior, R. McClintock, & M. Razeghi Proc. SPIE 9364, Oxide-based Materials and Devices VI, 936424 -- March 24, 2015 ...[Visit Journal] (In)GaN p-i-n structures were grown by MOVPE on both GaN- and ZnO-coated c-sapphire substrates. XRD studies of the as-grown layers revealed that a strongly c-axis oriented wurtzite crystal structure was obtained on both templates and that there was a slight compressive strain in the ZnO underlayer which increased after GaN overgrowth. The InGaN peak position gave an estimate of 13.6at% for the indium content in the active layer. SEM and AFM revealed that the top surface morphologies were similar for both substrates, with an RMS roughness (5 μm x 5 μm) of about 10 nm. Granularity appeared slightly coarser (40nm for the device grown on ZnO vs 30nm for the device grown on the GaN template) however. CL revealed a weaker GaN near band edge UV emission peak and a stronger broad defect-related visible emission band for the structure grown on the GaN template. Only a strong ZnO NBE UV emission was observed for the sample grown on the ZnO template. Quarter-wafer chemical lift-off (CLO) of the InGaN-based p-i-n structures from the sapphire substrate was achieved by temporary-bonding the GaN surface to rigid glass support with wax and then selectively dissolving the ZnO in 0.1M HCl. XRD studies revealed that the epitaxial nature and strong preferential c-axis orientation of the layers had been maintained after lift-off. This demonstration of CLO scale-up, without compromising the crystallographic integrity of the (In)GaN p-i-n structure opens up the perspective of transferring GaN based devices off of sapphire substrates industrially. [reprint (PDF)]
1.	State-of-the-art Type II Antimonide-based superlattice photodiodes for infrared detection and imaging M. Razeghi, B.M. Nguyen, P.Y. Delaunay, E.K. Huang, S. Abdollahi Pour, P. Manurkar, and S. Bogdanov SPIE Proceedings, Nanophotonics and Macrophotonics for Space Environments II, San Diego, CA, Vol. 7467, p. 74670T-1-- August 5, 2009 ...[Visit Journal] Type-II InAs/GaSb Superlattice (SL), a system of multi interacting quantum wells was first introduced by Nobel Laureate L. Esaki in the 1970s. Since then, this low dimensional system has drawn a lot of attention for its attractive quantum mechanics properties and its grand potential for the emergence into the application world, especially in infrared detection. In recent years, Type-II InAs/GaSb superlattice photo-detectors have experienced significant improvements in material quality, structural designs and imaging applications which elevated the performances of Type-II InAs/GaSb superlattice photodetectors to a comparable level to the state-of-the-art Mercury Cadmium Telluride. We will present in this talk the current status of the state-of-the-art Type II superlattice photodetectors and focal plane arrays, and the future outlook for this material system. [reprint (PDF)]
1.	Back-illuminated solar-blind photodetectors for imaging applications R. McClintock, A. Yasan, K. Mayes, P. Kung, and M. Razeghi SPIE Conference, Jose, CA, Vol. 5732, pp.175-- January 22, 2005 ...[Visit Journal] Back-illuminated solar-blind ultraviolet p-i-n photodetectors and focal plane arrays are investigated. We initially study single-pixel devices and then discuss the hybridization to a read-out integrated circuit to form focal plane arrays for solar-blind UV imaging. [reprint (PDF)]
1.	Near bulk-limited R0A of long-wavelength infrared type-II InAs/GaSb superlattice photodiodes with polyimide surface passivation Andrew Hood, Pierre-Yves Delaunay, Darin Hoffman, Binh-Minh Nguyen, Yajun Wei, Manijeh Razeghi, and Vaidya Nathan Applied Physics Letters 90, 233513-- June 4, 2007 ...[Visit Journal] Effective surface passivation of Type-II InAs/GaSb superlattice photodiodes with cutoff wavelengths in the long-wavelength infrared is presented. A stable passivation layer, the electrical properties of which do not change as a function of the ambient environment nor time, has been prepared by a solvent-based surface preparation, vacuum desorption, and the application of an insulating polyimide layer. Passivated photodiodes, with dimensions ranging from 400×400 to 25×25 µm², with a cutoff wavelength of ~11 µm, exhibited near bulk-limited R₀A values of ~12 Ω·cm², surface resistivities in excess of 10⁴ Ω·cm, and very uniform current-voltage behavior at 77 K. [reprint (PDF)]
1.	Persistent photoconductivity in thin undoped GaInP/GaAs quantum wells S. Elhamri, M. Ahoujja, K. Ravindran, D.B. Mast, R.S. Newrock, W.C. Mitchel, G.J. Brown, I. Lo, M. Razeghi and X. He Applied Physics Letters 66 (2)-- January 9, 1995 ...[Visit Journal] Persistent photoconductivity has been observed at low temperatures in thin, unintentionally doped GaInP/GaAs/GaInP quantum wells. The two‐dimensional electron gas was studied by low field Hall and Shubnikov–de Haas effects. After illumination with red light, the electron concentration increased from low 10¹¹ cm⁻² to more than 7×10¹¹ cm⁻² resulting in an enhancement of both the carrier mobility and the quantum lifetime. The persistent photocarriers cannot be produced by DX-like defects since the shallow dopant concentration in the GaInP layers is too low to produce the observed concentration. We suggest that the persistent carriers are produced by photoionization of deep intrinsic donors in the GaInP barrier layer. We also report observation of a parallel conduction path in GaInP induced by extended illumination. [reprint (PDF)]
1.	Continuous-wave operation of λ ~ 4.8 µm quantum-cascade lasers at room temperature A. Evans, J.S. Yu, S. Slivken, and M. Razeghi Applied Physics Letters, 85 (12)-- September 20, 2004 ...[Visit Journal] Continuous-wave (cw) operation of quantum-cascade lasers emitting at λ~4.8 µm is reported up to a temperature of 323 K. Accurate control of layer thickness and strain-balanced material composition is demonstrated using x-ray diffraction. cw output power is reported to be in excess of 370 mW per facet at 293 K, and 38 mW per facet at 323 K. Room-temperature average power measurements are demonstrated with over 600 mW per facet at 50% duty cycle with over 300 mW still observed at 100% (cw) duty cycle. [reprint (PDF)]
1.	Roadmap of Semiconductor Infrared Lasers and Detectors for the 21st Century M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] Since the first discovery, semiconductor infrared lasers and detectors have found many various applications in military, communications, medical, and industry sections. In this paper, the current status of semiconductor infrared lasers and detectors will be reviewed. Advantages and disadvantages of different methods and techniques is discussed later. Some basic physical limitations of current technology are studied and the direction to overcome these problems will be suggested. [reprint (PDF)]
1.	InSb Infrared Photodetectors on Si Substrates Grown by Molecular Beam Epitaxy E. Michel, J. Xu, J.D. Kim, I. Ferguson, and M. Razeghi IEEE Photonics Technology Letters 8 (5) pp. 673-- May 1, 1996 ...[Visit Journal] The InSb infrared photodetectors grown heteroepitaxially on Si substrates by molecular beam epitaxy (MBE) are reported. Excellent InSb material quality is obtained on 3-in Si substrates (with a GaAs predeposition) as confirmed by structural, optical, and electrical analysis. InSb infrared photodetectors on Si substrates that can operate from 77 K to room temperature have been demonstrated. The peak voltage-responsitivity at 4 μm is about 1.0×10³ V/W and the corresponding Johnson-noise-limited detectivity is calculated to be 2.8×10¹⁰ cm·Hz^½/W. This is the first important stage in developing InSb detector arrays or monolithic focal plane arrays (FPAs) on silicon. The development of this technology could provide a challenge to traditional hybrid FPA's in the future. [reprint (PDF)]
1.	Impact of scaling base thickness on the performance of heterojunction phototransistors Arash Dehzangi, Abbas Haddadi, Sourav Adhikary, and Manijeh Razeghi Nanotechnology 28, 10LT01-- February 2, 2017 ...[Visit Journal] In this letter we report the effect of vertical scaling on the optical and electrical performance of mid-wavelength infrared heterojunction phototransistors based on type-II InAs/GaSb/AlSb superlattices. The performance of devices with different base thickness was compared as the base was scaled from 60 down to 40 nm. The overall optical performance shows enhancement in responsively, optical gain, and specific detectivity upon scaling the base width. The saturated responsivity for devices with 40 nm bases reaches 8,845 and 9,528 A/W at 77 and 150 K, respectively, which is almost five times greater than devices with 60 nm bases. The saturated optical gain for devices with 40 nm bases is measured as 2,760 at 77 K and 3,081 at 150 K. The devices with 40 nm bases also exhibit remarkable enhancement in saturated current gain, with 17,690 at 77 K, and 19,050 at 150 K. [reprint (PDF)]

Page 7 of 10: Prev << 1 2 3 4 5 6 7 8 9 10 >> Next (239 Items)