Center for Quantum Devices - Most Downloaded Journal Articles

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20.	Advanced InAs/GaSb Superlattice Photovoltaic Detectors for Very-Long Wavelength Infrared Applications Y. Wei, A. Gin, M. Razeghi, and G.J. Brown Applied Physics Letters 80 (18)-- May 6, 2002 ...[Visit Journal] We report on the temperature dependence of the photoresponse of very long wavelength infrared type-II InAs/GaSb superlattice based photovoltaic detectors grown by molecular-beam epitaxy. The detectors had a 50% cutoff wavelength of 18.8 μm and a peak current responsivity of 4 A·W^-1 at 80 K. A peak detectivity of 4.5×10¹⁰ cm· Hz^½·W^-1 was achieved at 80 K at a reverse bias of 110 mV. The generation–recombination lifetime was 0.4 ns at 80 K. The cutoff wavelength increased very slowly with increasing temperature with a net shift from 20 to 80 K of only 1.2 μm [reprint (PDF)]
20.	InAsSbP/InAsSb/InAs Laser Diodes λ = 3.2 μm) Grown by Low-Pressure Metalorganic Chemical Vapor Deposition J. Diaz, G. Lukas, D. Wu, S. Kim, M. Erdtmann, E. Kaas, and M. Razeghi Applied Physics Letters 70 (1)-- January 6, 1997 ...[Visit Journal] We report metal–organic chemical-vapor deposition-grown double heterostructure InAsSbP/InAsSb/InAs diode lasers emitting at 3.2 μm operating at temperatures up to 220 K with threshold current density of 40 A/cm² at 77 K and characteristic temperature up to 42 K. Output powers as high as 260 mW in pulse mode and 60 mW in continuous wave operation have been obtained from an uncoated 100 μm stripe-width broad-area laser at 77 K. Comparison with theory shows that there is no significant nonradiative recombination mechanism for these lasers at 77 K. [reprint (PDF)]
20.	Novel Method for Reclaim/Reuse of Bulk GaN Substrates using Sacrifical ZnO Release Layers A. Rajan, S. Sundaram, Y. El Gmili, P. L. Voss, K. Pantzas, T. Moudakir, A. Ougazzaden, D. J. Rogers, F. Hosseini Teherani, V. E. Sandana, P. Bove, K. Prior, R. McClintock & M. Razeghi Proc. SPIE 8987, Oxide-based Materials and Devices V, 898719-- April 2, 2014 ...[Visit Journal] Free-standing (0002)-oriented GaN substrates (f = 2”) were coated with 200 nm of ZnO and used as templates for the growth of GaN thin films. SEM and AFM revealed that such GaN layers had a relatively homogenous surface morphology with an RMS roughness (5 μm x 5 μm) of less than 4nm. XRD studies revealed strained ZnO growth on the GaN substrate and the reproduction of the substrate rocking curve for the GaN overlayers after only a hundred nm of growth, thus indicating that the GaN films had superior crystallographic quality compared to those grown on sapphire or ZnO/sapphire substrates. Quarter-wafer areas of GaN were removed from the GaN substrate (by selective chemical etching away of the ZnO interlayer). The expensive GaN substrates were then reclaimed/reused (without the need for polishing) for a second cycle of ZnO and GaN growth, which gave similar XRD, SEM, CL and AFM results to the first cycle. [reprint (PDF)]
20.	1-5 jim ROOM-TEMPERATURE PULSED OPERATION OF GalnAsP/lnP DOUBLE HETEROSTRUCTURE GROWN BY LP MOCVD Manijeh Razeghi, P. Hirtz, J.P. Larivain, R. Blondeau, B. de Crémoux, J.P. Duchemin, ELECTRONICS LETTERS, vol. 17, no.18-- September 3, 1981 ...[Visit Journal] The letter reports the first successful room-temperature pulsed operation of a broad-area contact laser of GaInAsP/InP double heterostructure, grown by LP MOCVD, emitting at 1.5 μm. Pulsed thresholds as low as 2.5 kA/cm2 have been obtained for 1.5 μm, for an active layer thickness of 0.48 μm. This is equal to a current density per micrometre of 5.2 kA cm−2 μm−1. InxGa1−xAsyP1−y, III, III, V, V alloys are of great interest for use in infra-red devices. They can be grown lattice matched on InP over a wide range of compositions. The resulting bandgap (1.35–0.75 eV) covers a spectral range which contains the region of lowest losses and lowest dispersion in modern optical fibres. This property makes In1−xGaxASyP1−y, very attractive as a semiconductor laser and detector material for future fibre communication systems. [reprint (PDF)]
20.	Dark current reduction in microjunction-based double electron barrier type-II InAs/InAsSb superlattice long-wavelength infrared photodetectors Romain Chevallier, Abbas Haddadi, & Manijeh Razeghi Scientific Reports 7, Article number: 12617-- October 3, 2017 ...[Visit Journal] Microjunction InAs/InAsSb type-II superlattice-based long-wavelength infrared photodetectors with reduced dark current density were demonstrated. A double electron barrier design was employed to reduce both bulk and surface dark currents. The photodetectors exhibited low surface leakage after passivation with SiO2, allowing the use of very small size features without degradation of the dark current. Fabricating microjunction photodetectors (25 × 25 µm² diodes with 10 × 10 µm² microjunctions) in combination with the double electron barrier design results in a dark current density of 6.3 × 10⁻⁶ A/cm² at 77 K. The device has an 8 µm cut-off wavelength at 77 K and exhibits a quantum efficiency of 31% for a 2 µm-thick absorption region, which results in a specific detectivity value of 1.2 × 10¹² cm·Hz^½/W. [reprint (PDF)]
20.	280 nm UV LEDs Grown on HVPE GaN Substrates A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, M. Razeghi, and R.J. Molnar Opto-Electronics Review, 10 (4)-- January 1, 2002 ...[Visit Journal] We report on the enhancement of optical and electrical properties of 280 nm UV LEDs using low dislocation density HVPE-grown GaN substrate. Compared with the same structure grown on sapphire, these LEDs show ~30% reduction in current-voltage differential resistance, ~15% reduction in turn-on voltage, more than 200% increase in output power slope efficiency and saturation at higher currents. Lower density of defects due to higher material quality and better heat dissipation are believed to be the reason behind these improvements. [reprint (PDF)]
20.	Comprehensive study of blue and green multi-quantum-well light-emitting diodes grown on conventional and lateral epitaxial overgrowth GaN C. Bayram, J.L. Pau, R. McClintock and M. Razeghi Applied Physics B: Lasers and Optics, Vol. 95, p. 307-314-- November 29, 2008 ...[Visit Journal] Growths of blue and green multi-quantum wells (MQWs) and light-emitting diodes (LEDs) are realized on lateral epitaxial overgrowth (LEO) GaN, and compared with identical structures grown on conventional GaN. Atomic force microscopy is used to confirm the significant reduction of dislocations in the wing region of our LEO samples before active-region growth. Differences between surface morphologies of blue and green MQWs are analyzed. These MQWs are integrated into LEDs. All devices show a blue shift in the electroluminescence (EL) peak and narrowing in EL spectra with increasing injection current, both characteristics attributed to the band-gap renormalization. Green LEDs show a larger EL peak shift and a broader EL spectrum due to larger piezoelectric field and more indium segregation in the MQWs, respectively. Blue LEDs on LEO GaN show a higher performance than those on conventional GaN; however, no performance difference is observed for green LEDs on LEO GaN versus conventional GaN. The performance of the green LEDs is shown to be primarily limited by the active layer growth quality. [reprint (PDF)]
20.	Thermal stability of GaN thin films grown on (0001) Al₂O₃, (0112) Al₂O₃ and (0001)Si 6H-SiC substrates C.J. Sun, P. Kung, A. Saxler, H. Ohsato, E. Bigan, M. Razeghi, and D.K. Gaskill Journal of Applied Physics 76 (1)-- July 1, 1994 ...[Visit Journal] Single crystals of GaN were grown on (0001), (0112) Al₂O₃ and (0001)Si 6H‐SiC substrates using an atmospheric pressure metalorganic chemical‐vapor‐deposition reactor. The relationship has been studied between the thermal stability of the GaN films and the substrate’s surface polarity. It appeared that the N‐terminated (0001) GaN surface grown on (0001)Si 6H‐SiC has the most stable surface, followed by the nonpolar (1120) GaN surface grown on (0112) Al₂O₃, while the Ga‐terminated (0001) GaN surface grown on (0001) Al₂O₃ has the least stable surface. This is explained with the difference in the atomic configuration of each of these surfaces which induces a difference in their thermal decomposition. [reprint (PDF)]
20.	High-performance bias-selectable dual-band Short-/Mid-wavelength infrared photodetectors and focal plane arrays based on InAs/GaSb/AlSb Type-II superlattices M. Razeghi; A.M. Hoang; A. Haddadi; G. Chen; S. Ramezani-Darvish; P. Bijjam; P. Wijewarnasuriy; E. Decuir Proc. SPIE 8704, Infrared Technology and Applications XXXIX, 87041W (June 18, 2013)-- June 18, 2013 ...[Visit Journal] We report a bias selectable dual-band Type-II superlattice-based short-wave infrared (SWIR) and mid-wave infrared (MWIR) co-located photodetector capable of active and passive imaging. A new double-layer etch-stop scheme is introduced for back-side-illuminated photodetectors, which enhanced the external quantum efficiency both in the SWIR and MWIR spectral regions. Temperature-dependent dark current measurements of pixel-sized 27 μm detectors found the dark current density to be ∼1×10-5 A/cm2 for the ∼4.2 μm cut-off MWIR channel at 140 K. This corresponded to a reasonable imager noise equivalent difference in temperature of ∼49 mK using F/2.3 optics and a 10 ms integration time (tint), which lowered to ∼13 mK at 110 K using and integration time of 30 ms, illustrating the potential for high-temperature operation. The SWIR channel was found to be limited by readout noise below 150 K. An excellent imagery from the dual-band imager exemplifying pixel coincidence is shown. [reprint (PDF)]
20.	Al_xGa_1-xN (0 ≤ x ≤ 1) Ultraviolet Photodetectors Grown on Sapphire by Metal-organic Chemical-vapor Deposition D. Walker, X. Zhang, A. Saxler, P. Kung, J. Xu, and M. Razeghi Applied Physics Letters 70 (8)-- February 24, 1997 ...[Visit Journal] Al_xGa_1–xN (0 ≤ x ≤ 1) ultraviolet photoconductors with cutoff wavelengths from 365 to 200 nm have been fabricated and characterized. The maximum detectivity reached 5.5 × 10⁸ cm·Hz^1/2/W at a modulating frequency of 14 Hz. The effective majority carrier lifetime in Al_xGa_1–xN materials, derived from frequency-dependent photoconductivity measurements, has been estimated to be from 6 to 35 ms. The frequency-dependent noise spectrum shows that it is dominated by Johnson noise at high frequencies for low-Al-composition samples. [reprint (PDF)]
20.	Photoluminescence characteristics of polar and nonpolar AlGaN/GaN superlattices Z. Vashaei, C. Bayram, P. Lavenus, and M. Razeghi Applied Physics Letters, Vol. 97, No. 12, p. 121918-1-- September 20, 2010 ...[Visit Journal] High quality Al_0.2Ga_0.8N/GaN superlattices (SLs) with various (GaN) well widths (1.6 to 6.4 nm) have been grown on polar c-plane and nonpolar m-plane freestanding GaN substrates by metal-organic chemical vapor deposition. Atomic force microscopy, high resolution x-ray diffraction, and photoluminescence (PL) studies of SLs have been carried out to determine and correlate effects of well width and polarization field on the room-temperature PL characteristics. A theoretical model was applied to explain PL energy-dependency on well width and crystalline orientation taking into account internal electric field for polar substrate. Absence of induced-internal electric field in nonpolar SLs was confirmed by stable PL peak energy and stronger PL intensity as a function of excitation power density than polar ones. [reprint (PDF)]
20.	Terahertz emitters at Center for Quantum Devices: recent advances and future trends Manijeh Razeghi Proc. SPIE 10177, Infrared Technology and Applications XLIII, 1017705-- August 23, 2018 ...[Visit Journal] This paper reviews the recent advances and future trends of terahertz (THz) emitters at CQD/NU, highlights the high-performance THz sources based on intracavity nonlinear frequency generation in mid-infrared quantum cascade lasers. Significant performance improvements of our THz sources in the power, wall plug efficiency are achieved by systematic optimizing the device's active region, waveguide, and chip bonding strategy. High THz power up to 1.9 mW and 0.014 mW for pulsed mode and continuous wave operations at room temperature are demonstrated, respectively. Even higher power and efficiency are envisioned based on enhancements in outcoupling efficiency and mid-IR performance. Our compact THz device with high power and wide tuning range is highly suitable for the imaging, sensing, spectroscopy, medical diagnosis, and many other applications. [reprint (PDF)]
20.	InAs/InAs_1-xSb_x type-II superlattices for high performance long wavelength infrared detection M. Razeghi, A. Haddadi, A. M. Hoang, R. Chevallier, S. Adhikary, A. Dehzangi Proc. SPIE 9819, Infrared Technology and Applications XLII, 981909-- May 20, 2016 ...[Visit Journal] We report InAs/InAs1-xSbx type-II superlattice base photodetector as high performance long-wavelength infrared nBn device grown on GaSb substrate. The device has 6 μm-thick absorption region, and shows optical performance with a peak responsivity of 4.47 A/W at 7.9 μm, which is corresponding to the quantum efficiency of 54% at a bias voltage of negative 90 mV, where no anti-reflection coating was used for front-side illumination. At 77K, the photodetector’s 50% cut-off wavelength was ~10 μm. The device shows the detectivity of 2.8x10¹¹ cm•Hz^½/W at 77 K, where RxA and dark current density were 119 Ω•cm² and 4.4x10^-4 A/cm² , respectively, under -90 mV applied bias voltage [reprint (PDF)]
20.	Electron capture processes in optically excited In0.53Ga 0.47As/InP quantum wells U. Cebulla, G. Bacher, A. Forchel, D. Schmitz, H. Jürgensen, M. Razeghi Appl. Phys. Lett. 55, 933–935 (1989)-- September 4, 1989* ...[Visit Journal] We have performed picosecond time-resolved measurements on Ir:.O. 53 GaO. 47 As/lnP quantum wells with varying barrier thicknesses using 10 ps Nd:Y AG excitation. For this excitation, holes and electrons are created in the Ino . 53 GaOA7 As layers. Due to momentum conservation the Nd:YAG excitation accelerates the electrons above the InP barrier where they can diffuse but cannot recombine. By examining the rise time of the quantum well emission, we can show that for samples with thick barriers, the harrier geometry largely controls the dynamic properties of the carriers after Nd:YAG excitation. [reprint (PDF)]
20.	Investigations of p-type signal for ZnO thin films grown on (100) GaAs substrates by pulsed laser deposition D.J. Rogers, F. Hosseini Teherani, T. Monteiro, M. Soares, A. Neves, M. Carmo, S. Periera, M.R. Correia, A. Lusson, E. Alves, N.P. Barradas, J.K. Morrod, K.A. Prior, P. Kung, A. Yasan, and M. Razeghi Phys. Stat. Sol. C, 3 (4)-- March 1, 2006 ...[Visit Journal] n this work we investigated ZnO films grown on semi-insulating (100) GaAs substrates by pulsed laser deposition. Samples were studied using techniques including X-ray diffraction (XRD), scanning electron microscopy, atomic force microscopy, Raman spectroscopy, temperature dependent photoluminescence, C-V profiling and temperature dependent Hall measurements. [reprint (PDF)]
20.	Semiconductor ultraviolet detectors M. Razeghi and A. Rogalski Journal of Applied Physics Applied Physics Review 79 (10)-- May 15, 1996 ...[Visit Journal] In this review article a comprehensive analysis of the developments in ultraviolet (UV) detector technology is described. At the beginning, the classification of UV detectors and general requirements imposed on these detectors are presented. Further considerations are restricted to modern semiconductor UV detectors, so the basic theory of photoconductive and photovoltaic detectors is presented in a uniform way convenient for various detector materials. Next, the current state of the art of different types of semiconductor UV detectors is presented. Hitherto, the semiconductor UV detectors have been mainly fabricated using Si. Industries such as the aerospace, automotive, petroleum, and others have continuously provided the impetus pushing the development of fringe technologies which are tolerant of increasingly high temperatures and hostile environments. As a result, the main efforts are currently directed to a new generation of UV detectors fabricated from wide band-gap semiconductors the most promising of which are diamond and AlGaN. The latest progress in development of AlGaN UV detectors is finally described in detail. [reprint (PDF)]
20.	Continuous operation of a monolithic semiconductor terahertz source at room temperature Q. Y. Lu, N. Bandyopadhyay, S. Slivken, Y. Bai, and M. Razeghi Appl. Phys. Lett. 104, 221105 (2014)-- June 3, 2014 ...[Visit Journal] We demonstrate room temperature continuous wave THz sources based on intracavity difference-frequency generation from mid-infrared quantum cascade lasers. Buried ridge, buried composite distributed-feedback waveguide with Čerenkov phase-matching scheme is used to reduce the waveguide loss and enhance the heat dissipation for continuous wave operation. Continuous emission at 3.6 THz with a side-mode suppression ratio of 20 dB and output power up to 3 μW are achieved, respectively. THz peak power is further scaled up to 1.4 mW in pulsed mode by increasing the mid-infrared power through increasing the active region doping and device area. [reprint (PDF)]
20.	Optical and crystallographic properties and impurity incorporation of GaxIn1−xAs grown by liquid phase epitaxy, vapor phase epitaxy, and metal organic chemical vapor deposition K.‐H. Goetz; D. Bimberg; H. Jürgensen; J. Selders; A. V. Solomonov; G. F. Glinskii; M. Razeghi J. Appl. Phys. 54 (8): 4543–4552 (1983)-- March 29, 1983 ...[Visit Journal] Optical, crystallographic, and transport properties of nominally undoped n‐type and Zn doped p‐type Gax In1−xAs /InP (0.44 [reprint (PDF)]
20.	Quantum Sensing Using Type-II InAs/GaSb Superlattice for Infrared Detection M. Razeghi, A. Gin, Y. Wei, J. Bae, and J. Nah Microelectronics Journal, 34 (5-8)-- May 1, 2003 ...[Visit Journal] Large, regular arrays of bulk GaSb and InAs/GaSb Type-II superlattice pillars have been fabricated by electron beam lithography and dry etching. A 2.5 keV electron beam lithography system and metal evaporation are used to form the Au mask on superlattice and bulk substrates. Dry etching of these materials has been developed with BCl3:Ar, CH4:H2:Ar and cyclic CH₄:H₂:Ar/O₂ plasmas. Etch temperatures were varied from 20 to 150 °C. The diameter of the superlattice pillars was below 50 nm with regular 200 nm spacing. Bulk GaSb pillars were etched with diameters below 20 nm. Areas of dense nanopillars as large as 500 μm×500 μm were fabricated. The best height/diameter aspect ratio was approximately 10:1. To date, these are the smallest diameter III–V superlattice pillar structures reported, and the first nanopillars in the InAs/GaSb material system. The basic theory of these devices and surface passivation with SiO₂ and Si₃N₄ thin films has also been discussed. [reprint (PDF)]
20.	MOCVD challenge for III-V semiconductor materials for photonic and electronic devices on alternative substrates M. Razeghi, M. Defour , F. Omnes, P. Maurel , E. Bigan , O. Acher, J. Nagle, F. Brillouet , J.C. Portal M. Razeghi, M. Defour, F. Omnes, P. Maurel, E. Bigan, O. Acher, J. Nagle, F. Brillouet, J.C. Portal, MOCVD challenge for III-V semiconductor materials for photonic and electronic devices on alternative substrates, Journal of Crystal Growth, Volume 93, Issues 1–4, 1988, Pages 776-781,-- January 1, 1988 ...[Visit Journal] High quality II[-V semiconductor heterojunctions, quantum wells and superlauices have been grown on lattice matched and alternative substrates such as silicon for photonic and electronic devices, using low pressure metalorganic chemical vapor deposition growth technique. [reprint (PDF)]
20.	Status of III-V semiconductor thin films and their applications to future OEICs Manijeh Razeghi Proc. SPIE 10267, Integrated Optics and Optoelectronics, 102670T -- June 26, 2017 ...[Visit Journal] In the last decade, semiconductor technology has been advanced to a great extent in terms of electronic and photonic discrete devices. One of the main reasons for such a progress, is the result of advancement in the epitaxial growth techniques such as molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD), where device quality films can be grown with great control over composition, uniformity and thickness. MOCVD has proven to be one of the best growth methods for many IH-V semiconductor thin films 1. Its flexibility and potential to yield a broad range of growth rates resulted in the layers featuring the thicknesses from tens of microns down to several nanometers. Planar structures containing quantum wells with atomically flat interfaces, superlattices, strained or graded-index layers were successfully grown by MOCVD. Furthermore, MOCVD proved its efficiency in producing a laser devices by overgrowth and epitaxy on patterned substrates. The importance of MOCVD is strongly enhanced by the possibility of large-scale production by simultaneous growth on several substrates in one process. Several III-V semiconductor films with bandgaps ranging from infrared to ultraviolet (15 to 0.2 μm) have been successfully grown by MOCVD. [reprint (PDF)]
20.	Monolithic integration of a short‐length GaInAs photoconductor with a GaAs/GaAlAs optical waveguide on a GaAs semi‐insulating substrate F. Mallecot; J. F. Vinchant; M. Razeghi; D. Vandermoere; J. P. Vilcot; D. Decoster Appl. Phys. Lett. 53, 2522–2524 (1988)-- December 19, 1988 ...[Visit Journal] We report the first fabrication of a GaO. 47 Inn. 53 As planar photoconductive detector, associated with a GaAs/GaAIAs rib waveguide grown on a semi-insulating GaAs substrate, which needs a short-length absorbing layer to detect the optical signal. Because of the GaAIAs epilayer, a GalnAs length of about 100 tl1n only is needed to detect 90% of the opticai signal, accordingly to results predicted using a four-layer model with complex refractive indices in each layer. [reprint (PDF)]
20.	Continuous-wave operation of λ ~ 4.8 µm quantum-cascade lasers at room temperature A. Evans, J.S. Yu, S. Slivken, and M. Razeghi Applied Physics Letters, 85 (12)-- September 20, 2004 ...[Visit Journal] Continuous-wave (cw) operation of quantum-cascade lasers emitting at λ~4.8 µm is reported up to a temperature of 323 K. Accurate control of layer thickness and strain-balanced material composition is demonstrated using x-ray diffraction. cw output power is reported to be in excess of 370 mW per facet at 293 K, and 38 mW per facet at 323 K. Room-temperature average power measurements are demonstrated with over 600 mW per facet at 50% duty cycle with over 300 mW still observed at 100% (cw) duty cycle. [reprint (PDF)]
20.	Gas-Source Molecular Beam Epitaxy Growth of 8.5 μm Quantum Cascade Laser S. Slivken, C. Jelen, A. Rybaltowski, J. Diaz and M. Razeghi Applied Physics Letters 71 (18)-- November 1, 1997 ...[Visit Journal] We demonstrate preliminary results for an 8.5 μm laser emission from quantum cascade lasers grown in a single step by gas-source molecular beam epitaxy. 70 mW peak power per two facets is recorded for all devices tested at 79 K with 1 μs pulses at 200 Hz. For a 3 mm cavity length, lasing persists up to 270 K with a T0 of 180 K. [reprint (PDF)]
20.	Molecular beam epitaxial growth of InSb p-i-n photodetectors on GaAs and Si E. Michel, R. Peters, S. Slivken, C. Jelen, P. Bove, J. Xu, I. Ferguson, and M. Razeghi Optoelectronic Integrated Circuit Materials, Physics and Devices, SPIE Conference, San Jose, CA; Proceedings, Vol. 2397-- February 6, 1995 ...[Visit Journal] High quality InSb has been grown by Molecular Beam Epitaxy and optimized using Reflection High Energy Electron Diffraction. A 4.8 micrometers InSb layer grown on GaAs at a growth temperature of 395 degree(s)C and a III/V incorporation ratio of 1:1.2 had an X-ray rocking curve FWHM of 158 arcsec and a Hall mobility of 92300 cm2V-1s-1 at 77 K, the best reported to date for InSb nucleated directly onto GaAs. InSb p-i-n structures of 5.8 micrometers grown under the same conditions demonstrated a X-ray Full Width at Half Maximum of 101 arcsec and 131 arcsec for GaAs and Si substrates, respectively, and exhibited excellent uniformity of +/- 3 arcsec over a 3' substrate. Prototype InSb p-i-n detectors on Si have been fabricated and have demonstrated photovoltaic response at 6.5 micrometers up to 200 K. These p-i-n detectors have also exhibited the highest D* for a device grown onto Si. [reprint (PDF)]

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