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2.  Mid-wavelength infrared high operating temperature pBn photodetectors based on type-II InAs/InAsSb superlattice
Donghai Wu, Jiakai Li, Arash Dehzangi, and Manijeh Razeghi
AIP Advances 10, 025018-- February 11, 2020 ...[Visit Journal]
A high operating temperature mid-wavelength infrared pBn photodetector based on the type-II InAs/InAsSb superlattice on a GaSb substrate has been demonstrated. At 150 K, the photodetector exhibits a peak responsivity of 1.48 A/W, corresponding to a quantum efficiency of 47% at −50 mV applied bias under front-side illumination, with a 50% cutoff wavelength of 4.4 μm. With an R×A of 12,783 Ω·cm² and a dark current density of 1.16×10−5A/cm² under −50 mV applied bias, the photodetector exhibits a specific detectivity of 7.1×1011 cm·Hz½/W. At 300 K, the photodetector exhibits a dark current density of 0.44 A/cm²and a quantum efficiency of 39%, resultingin a specific detectivity of 2.5×109 cm·Hz½/W. [reprint (PDF)]
 
2.  Scaling in back-illuminated GaN avalanche photodiodes
K. Minder, J.L. Pau, R. McClintock, P. Kung, C. Bayram, M. Razeghi and D. Silversmith
Applied Physics Letters, Vol. 91, No. 7, p. 073513-1-- August 13, 2007 ...[Visit Journal]
Avalanche p-i-n photodiodes of various mesa areas were fabricated on AlN templates for back illumination for enhanced performance through hole-initiated multiplication, and the effects of increased area on device performance were studied. Avalanche multiplication was observed in mesa sizes up to 14,063 µm^2 under linear mode operation. Uniform gain and a linear increase of the dark current with area were demonstrated. [reprint (PDF)]
 
1.  Room-temperature continuous-wave operation of quantum-cascade lasers at λ ~ 4 µm
J.S. Yu, S.R. Darvish, A. Evans, J. Nguyen, S. Slivken, and M. Razeghi
Applied Physics Letters 88 (4)-- January 23, 2006 ...[Visit Journal]
High-power cw λ~4 μm quantum-cascade lasers (QCLs) are demonstrated. The effect of different cavity length and laser die bonding is also investigated. For a high-reflectivity-coated 11-μm-wide and 4-mm-long epilayer-down bonded QCL, cw output powers as high as 1.6 W at 80 K and 160 mW at 298 K are obtained, and the cw operation is achieved up to 313 K with 12 mW. [reprint (PDF)]
 
1.  High performance long wavelength infrared mega-pixel focal plane array based on type-II superlattices
P. Manurkar, S.R. Darvish, B.M. Nguyen, M. Razeghi and J. Hubbs
Applied Physics Letters, Vol. 97, No 19, p. 193505-1-- November 8, 2010 ...[Visit Journal]
A large format 1k × 1k focal plane array (FPA) is realized using type-II superlattice photodiodes for long wavelength infrared detection. Material growth on a 3 in. GaSb substrate exhibits a 50% cutoff wavelength of 11 μm across the entire wafer. The FPA shows excellent imaging. Noise equivalent temperature differences of 23.6 mK at 81 K and 22.5 mK at 68 K are achieved with an integration time of 0.13 ms, a 300 K background and f/4 optics. We report a dark current density of 3.3×10−4 A·cm−2 and differential resistance-area product at zero bias R0A of 166 Ω·cm² at 81 K, and 5.1×10−5 A·cm−2 and 1286 Ω·cm², respectively, at 68 K. The quantum efficiency obtained is 78%. [reprint (PDF)]
 
1.  Monolithic terahertz source
Q. Y. Lu, N. Bandyopadhyay, S. Slivken, Y. Bai and M. Razeghi
Nature Photonics | Research Highlights -- July 31, 2014 ...[Visit Journal]
To date, the production of continuous-wave terahertz (THz) sources based on intracavity difference-frequency generation from mid-infrared quantum cascade lasers operating at room temperature has proved elusive. A critical problem is that, to achieve a large nonlinear susceptibility for frequency conversion, the active region of the quantum cascade laser requires high doping, which elevates the lasing threshold current density. Now, Quan-Yong Lu and colleagues from Northwestern University in the USA have overcome this problem and demonstrated a room-temperature continuous-wave THz source based on difference-frequency generation in quantum cascade lasers. They designed quantum-well structures based on In0.53Ga0.47As/In0.52Al0.48As material system for two mid-infrared wavelengths. The average doping in the active region was about 2.5 × 1016 cm−3. A buried ridge, buried composite distributed-feedback waveguide with the Čerenkov phase-matching scheme was used to reduce the waveguide loss and enhance heat dissipation. As a result, single-mode emission at 3.6 THz was observed at 293 K. The continuous-wave THz power reached 3 μW with a conversion efficiency of 0.44 mW W−2 from mid-infrared to THz waves. Using a similar device design, a THz peak power of 1.4 mW was achieved in pulse mode. [reprint (PDF)]
 
1.  Bias-selectable dual-band mid-/long-wavelength infrared photodetectors based on InAs/InAs1−xSbx type-II superlattices
A. Haddadi, R. Chevallier, G. Chen, A. M. Hoang, and M. Razeghi
Applied Physics Letters 106 , 011104-- January 8, 2015 ...[Visit Journal]
A high performance bias-selectable mid-/long-wavelength infrared photodetector based on InAs/InAs1−xSbx type-II superlattices on GaSb substrate has been demonstrated. The mid- and long-wavelength channels' 50% cut-off wavelengths were ∼5.1 and ∼9.5 μm at 77 K. The mid-wavelength channel exhibited a quantum efficiency of 45% at 100 mV bias voltage under front-side illumination and without any anti-reflection coating. With a dark current density of 1 × 10−7 A/cm² under 100 mV applied bias, the mid-wavelength channel exhibited a specific detectivity of 8.2 × 1012 cm·Hz½·W-1 at 77 K. The long-wavelength channel exhibited a quantum efficiency of 40%, a dark current density of 5.7 × 10−4 A/cm² under −150 mV applied bias at 77 K, providing a specific detectivity value of 1.64 × 1011 cm·Hz½·W-1. [reprint (PDF)]
 
1.  Recent advances in IR semiconductor laser diodes and future trends
M. Razeghi; Y. Bai; N. Bandyopadhyay; B. Gokden; Q.Y. Lu; S. Slivken
Photonics Society Summer Topical Meeting Series, IEEE [6000041], pp. 55-56 (2011)-- July 18, 2011 ...[Visit Journal]
The wall plug efficiency of the mid-infrared quantum cascade laser in room temperature continuous wave (cw) operation is brought to 21%, with a maximum output power of 5.1 W. Using a surface grating distributed feedback (DFB) approach, we demonstrated 2.4 W single mode output in room temperature cw operation. With a photonic crystal distributed feedback (PCDFB) design, we achieved single mode spectrum and close to diffraction limited far field with a room temperature high peak power of 34 W. [reprint (PDF)]
 
1.  High‐purity GaAs layers grown by low‐pressure metalorganic chemical vapor deposition
M. Razeghi; F. Omnes; J. Nagle; M. Defour; O. Acher; P. Bove
Appl. Phys. Lett. 55, 1677–1679 (1989)-- October 16, 1989 ...[Visit Journal]
We report electrical and optical properties of very high purity GaAs epilayers grown by low‐pressure metalorganic chemical vapor deposition using AsH3 and triethylgallium as As and Ga sources. An electron mobility of 335 000 cm2/V s at 38 K has been measured for a 12‐μ‐thick layer. [reprint (PDF)]
 
1.  Direct growth of thick AlN layers on nanopatterned Si substrates by cantilever epitaxy
Ilkay Demir, Yoann Robin, Ryan McClintock, Sezai Elagoz, Konstantinos Zekentes, and Manijeh Razeghi
Phys. Status Solidi A, pp. 1–6-- September 30, 2016 ...[Visit Journal]
AlN layers have been grown on 200 nm period of nanopatterned Si (111) substrates by cantilever epitaxy and compared with AlN layers grown by maskless lateral epitaxial overgrowth (LEO) on micropatterned Si (111) substrates. The material quality of 5–10 µm thick AlN grown by LEO is comparable to that of much thinner layers (2 µm) grown by cantilever epitaxy on the nanopatterned substrates. Indeed, the latter exhibited root mean square (RMS) roughness of 0.65 nm and X-ray diffraction full width at half-maximum (FWHM) of 710 arcsec along the (0002) reflection and 930 arcsec along the (10̅15) reflection. The corresponding room temperature photoluminescence spectra was dominated by a sharp band edge peak. Back emission ultra violet light emitting diodes (UV LEDs) were fabricated by flip chip bonding to patterned AlN heat sinks followed by complete Si (111) substrate removal demonstrating a peak pulsed power of ∼0.7 mW at 344 nm peak emission wavelength. The demonstrated UV LEDs were fabricated on a cost effective epitaxial structure grown on the nanopatterned Si substrate with a total thickness of 3.3 µm [reprint (PDF)]
 
1.  Room temperature compact THz sources based on quantum cascade laser technology
M. Razeghi; Q.Y. Lu; N. Bandyopadhyay; S. Slivken; Y. Bai
Proc. SPIE 8846, Terahertz Emitters, Receivers, and Applications IV, 884602 (September 24, 2013)-- November 24, 2013 ...[Visit Journal]
We present the high performance THz sources based on intracavity difference-frequency generation from mid-infrared quantum cascade lasers. Room temperature single-mode operation in a wide THz spectral range of 1-4.6 THz is demonstrated from our Čerenkov phase-matched THz sources with dual-period DFB gratings. High THz power up to 215 μW at 3.5 THz is demonstrated via epi-down mounting of our THz device. The rapid development renders this type of THz sources promising local oscillators for many astronomical and medical applications. [reprint (PDF)]
 
1.  Type-II superlattice-based extended short-wavelength infrared focal plane array with an AlAsSb/GaSb superlattice etch-stop layer to allow near-visible light detection
Romain Chevallier, Arash Dehzangi, Abbas Haddadi, and Manijeh Razeghi
Optics Letters Vol. 42, Iss. 21, pp. 4299-4302-- October 17, 2017 ...[Visit Journal]
A versatile infrared imager capable of imaging the near-visible to the extended short-wavelength infrared (e-SWIR) is demonstrated using e-SWIR InAs/GaSb/AlSb type-II superlattice-based photodiodes. A bi-layer etch-stop scheme consisting of bulk InAs0.91Sb0.09 and AlAs0.1Sb0.9/GaSb superlattice layers is introduced for substrate removal from the hybridized back-side illuminated photodetectors. The implementation of this new technique on an e-SWIR focal plane array results in a significant enhancement in the external quantum efficiency (QE) in the 1.8–0.8μm spectral region, while maintaining a high QE at wavelengths longer than 1.8μm. Test pixels exhibit 100% cutoff wavelengths of ∼2.1 and ∼2.25μm at 150 and 300K, respectively. They achieve saturated QE values of 56% and 68% at 150 and 300K, respectively, under back-side illumination and without any anti-reflection coating. At 150K, the photodetectors (27μm×27μm area) exhibit a dark current density of 4.7×10−7  A/cm2 under a −50  mV applied bias providing a specific detectivity of 1.77×1012  cm·Hz1/2/W. At 300K, the dark current density reaches 6.6×10−2  A/cm2 under −50 mV bias, providing a specific detectivity of 5.17×109  cm·Hz1/2/W. [reprint (PDF)]
 
1.  High-quality MOCVD-grown heteroepitaxial gallium oxide growth on III-nitrides enabled by AlOx interlayer
Junhee Lee, Lakshay Gautam, and Manijeh Razeghi
Junhee Lee, Manijeh RazeghiAppl. Phys. Lett. 123, 151902 (2023) https://doi.org/10.1063/5.0170383 ...[Visit Journal]
We report high-quality Ga2O3 grown on an AlGaN/AlN/Sapphire in a single growth run in the same Metal Organic Chemical Vapor Deposition reactor with an AlOx interlayer at the Ga2O3/AlGaN interface. AlOx interlayer was found to enable the growth of single crystalline Ga2O3 on AlGaN in spite of the high lattice mismatch between the two material systems. The resulting nitride/oxide heterogenous heterostructures showed superior material qualities, which were characterized by structural, electrical, and optical characterization techniques. In particular, a significant enhancement of the electron mobility of the nitride/oxide heterogenous heterostructure is reported when compared to the individual electron mobilities of the Ga2O3 epilayer on the sapphire substrate and the AlGaN/AlN heterostructure on the sapphire substrate. This enhanced mobility marks a significant step in realizing the next generation of power electronic devices and transistors. [reprint (PDF)]
 
1.  Widely Tunable, Single-Mode, High-Power Quantum Cascade Lasers
M. Razeghi, B. Gokden, S. Tsao, A. Haddadi, N. Bandyopadhyay, and S. Slivken
SPIE Proceedings, Intergreated Photonics: Materials, Devices and Applications, SPIE Microtechnologies Symposium, Prague, Czech Republic, April 18-20, 2011, Vol. 8069, p. 806905-1-- May 31, 2011 ...[Visit Journal]
We demonstrate widely tunable high power distributed feedback quantum cascade laser array chips that span 190 nm and 200 nm from 4.4 um to 4.59 um and 4.5 um to 4.7 um respectively. The lasers emit single mode with a very narrow linewidth and side mode suppression ratio of 25 dB. Under pulsed operation power outputs up to 1.85 W was obtained from arrays with 3 mm cavity length and up to 0.95 W from arrays with 2 mm cavity length at room temperature. Continuous wave operation was also observed from both chips with 2 mm and 3 mm long cavity arrays up to 150 mW. The cleaved size of the array chip with 3 mm long cavities was around 4 mm x 5 mm and does not require sensitive external optical components to achieve wide tunability. With their small size and high portability, monolithically integrated DFB QCL Arrays are prominent candidates of widely tunable, compact, efficient and high power sources of mid-infrared radiation for gas sensing. [reprint (PDF)]
 
1.  Molecular Beam Epitaxial Growth of High Quality InSb for p-i-n Photodetectors
G. Singh, E. Michel, C. Jelen, S. Slivken, J. Xu, P. Bove, I. Ferguson, and M. Razeghi
Journal of Vacuum Science and Technology B, 13 (2)-- March 1, 1995 ...[Visit Journal]
The InSb infrared photodetectors grown heteroepitaxially on Si substrates by molecular beam epitaxy (MBE) are reported. Excellent InSb material quality is obtained on 3-inch Si substrates (with a GaAs predeposition) as confirmed by structural, optical, and electrical analysis. InSb infrared photodetectors on Si substrates that can operate from 77 K to room temperature have been demonstrated. The peak voltage-responsitivity at 4 μm is about 1.0×103 V/W and the corresponding Johnson-noise-limited detectivity is calculated to be 2.8×1010 cm·Hz½/W. This is the first important stage in developing InSb detector arrays or monolithic focal plane arrays (FPAs) on silicon. The development of this technology could provide a challenge to traditional hybrid FPA's in the future. [reprint (PDF)]
 
1.  Growth of AlGaN on silicon substrates: a novel way to make back-illuminated ultraviolet photodetectors
Ryan McClintock ; Manijeh Razeghi
Proc. SPIE 9555, Optical Sensing, Imaging, and Photon Counting: Nanostructured Devices and Applications, 95550U-- August 28, 2015 ...[Visit Journal]
AlGaN, with its tunable wide-bandgap is a good choice for the realization of ultraviolet photodetectors. AlGaN films tend to be grown on foreign substrates such as sapphire, which is the most common choice for back-illuminated devices. However, even ultraviolet opaque substrates like silicon holds promise because, silicon can be removed by chemical treatment to allow back-illumination,1 and it is a very low-cost substrate which is available in large diameters up to 300 mm. However, Implementation of silicon as the solar-blind PD substrates requires overcoming the lattice-mismatch (17%) with the AlxGa1-xN that leads to high density of dislocation and crack-initiating stress. In this talk, we report the growth of thick crack-free AlGaN films on (111) silicon substrates through the use of a substrate patterning and mask-less selective area regrowth. This technique is critical as it decouples the epilayers and the substrate and allows for crack-free growth; however, the masking also helps to reduce the dislocation density by inclining the growth direction and encouraging dislocations to annihilate. A back-illuminated p-i-n PD structure is subsequently grown on this high quality template layer. After processing and hybridizing the device we use a chemical process to selectively remove the silicon substrate. This removal has minimal effect on the device, but it removes the UV-opaque silicon and allows back-illumination of the photodetector. We report our latest results of back-illuminated solar-blind photodetectors growth on silicon. [reprint (PDF)]
 
1.  Antimonite-based gap-engineered type-II superlattice materials grown by MBE and MOCVD for the third generation of infrared imagers
Manijeh Razeghi, Arash Dehzangi, Donghai Wu, Ryan McClintock, Yiyun Zhang, Quentin Durlin, Jiakai Li, Fanfei Meng
Proc. SPIE Defense + Commercial Sensing,Infrared Technology and Applications XLV, 110020G -- May 7, 2019 ...[Visit Journal]
Third generation of infrared imagers demand performances for higher detectivity, higher operating temperature, higher resolution, and multi-color detection all accomplished with better yield and lower manufacturing costs. Antimonidebased gap-engineered Type-II superlattices (T2SLs) material system is considered as a potential alternative for MercuryCadmium-Telluride (HgCdTe) technology in all different infrared detection regimes from short to very long wavelengths for the third generation of infrared imagers. This is due to the incredible growth in the understanding of its material properties and improvement of device processing which leads to design and fabrication of better devices. We will present the most recent research results on Antimonide-based gap-engineered Type-II superlattices, such as highperformance dual-band SWIR/MWIR photo-detectors and focal plane arrays for different infrared regimes, toward the third generation of infrared imaging systems at the Center for Zuantum Devices. Comparing metal-organic chemical vapor deposition (MOCVD), vs molecular beam epitaxy (MBE). [reprint (PDF)]
 
1.  AlxGa1−xN-based solar-blind ultraviolet photodetector based on lateral epitaxial overgrowth of AlN on Si substrate
E. Cicek, R. McClintock, C. Y. Cho, B. Rahnema, and M. Razeghi
Appl. Phys. Lett. 103, 181113 (2013)-- October 30, 2013 ...[Visit Journal]
We report on AlxGa1−xN-based solar-blind ultraviolet (UV) photodetector (PD) grown on Si(111) substrate. First, Si(111) substrate is patterned, and then metalorganic chemical vapor deposition is implemented for a fully-coalesced ∼8.5 μm AlN template layer via a pulsed atomic layer epitaxial growth technique. A back-illuminated p-i-n PD structure is subsequently grown on the high quality AlN template layer. After processing and implementation of Si(111) substrate removal, the optical and electrical characteristic of PDs are studied. Solar-blind operation is observed throughout the array; at the peak detection wavelength of 290 nm, 625 μm² area PD showed unbiased peak external quantum efficiency and responsivity of ∼7% and 18.3 mA/W, respectively, with a UV and visible rejection ratio of more than three orders of magnitude. Electrical measurements yielded a low-dark current density below 1.6 × 10−8 A/cm² at 10 V reverse bias. [reprint (PDF)]
 
1.  Investigation of Enhanced Heteroepitaxy and Electrical Properties in k-Ga2O3 due to Interfacing with β-Ga2O3 Template Layers
Junhee Lee, Lakshay Gautam, Ferechteh H. Teherani, Eric V. Sandana, P. Bove, David J. Rogers and Manijeh Razeghi
J. Lee, M. Razeghi, Physica Status Solidi A 2023,220, 2200559, https://doi.org/10.1002/pssa.202200559 ...[Visit Journal]
Heteroepitaxial k-Ga2O3 films grown by metal-organic chemical vapor deposition (MOCVD) were found to have superior materials and electrical properties thanks to the interfacing with a b-Ga2O3 template layer. k-Ga2O3grown on sapphire has not been able to demonstrate its full potential due to materials imperfections created by strain induced by the lattice mismatch at the interface between the epilayer and the substrate. By adopting a b-Ga2O3 template on a c-sapphire substrate, higher quality k-Ga2O3thin films were obtained, as evidenced by a smoother surface morphology, narrower XRD peaks, and superior electrical performance. The implications of this phenomenon, caused by b-Ga2O3 buffer layer, are already very encouraging for both boosting current device performance and opening up the perspective of novel applications for Ga2O3. [reprint (PDF)]
 
1.  High Power Mid-Infrared Quantum Cascade Lasers Grown on Si
Steven Slivken, Nirajman Shrestha, and Manijeh Razeghi
Photonics, vol. 9, 626 ...[Visit Journal]
This article details the demonstration of a strain-balanced, InP-based mid-infrared quantum cascade laser structure that is grown directly on a Si substrate. This is facilitated by the creation of a metamorphic buffer layer that is used to convert from the lattice constant of Si (0.543 nm) to that of InP (0.587 nm). The laser geometry utilizes two top contacts in order to be compatible with future large-scale integration. Unlike previous reports, this device is capable of room temperature operation with up to 1.6 W of peak power. The emission wavelength at 293 K is 4.82 um, and the device operates in the fundamental transverse mode. [reprint (PDF)]
 
1.  Watt level performance of quantum cascade lasers in room temperature continuous wave operation at λ ∼ 3.76 μm
N. Bandyopadhyay, Y. Bai, B. Gokden, A. Myzaferi, S. Tsao, S. Slivken and M. Razeghi
Applied Physics Letters, Vol. 97, No. 13-- September 27, 2010 ...[Visit Journal]
An InP-based quantum cascade laser heterostructure emitting at 3.76 μm is grown with gas-source molecular beam epitaxy. The laser core is composed of strain balanced In0.76Ga0.24As/In0.26Al0.74As. Pulsed testing at room temperature exhibits a low threshold current density (1.5 kA/cm²) and high wall plug efficiency (10%). Room temperature continuous wave operation gives 6% wall plug efficiency with a maximum output power of 1.1 W. Continuous wave operation persists up to 95 °C. [reprint (PDF)]
 
1.  Investigation of MgZnO/ZnO heterostructures grown on c-sapphire substrates by pulsed laser deposition
D. J. Rogers ; F. Hosseini Teherani ; P. Bove ; A. Lusson ; M. Razeghi
Proc. SPIE 8626, Oxide-based Materials and Devices IV, 86261X (March 18, 2013)-- March 18, 2013 ...[Visit Journal]
MgZnO thin films were grown on c-sapphire and ZnO-coated c-sapphire substrates by pulsed laser deposition from a ZnMgO target with 4 at% Mg. The MgZnO grown on the ZnO underlayer showed significantly better crystal quality than that grown directly on sapphire. AFM studies revealed a significant deterioration in surface morphology for the MgZnO layers compared with the ZnO underlayer. Optical transmission studies indicated a MgZnO bandgap of 3.61eV (compared with 3.34eV for the ZnO), which corresponds to a Mg content of about 16.1 at%. The MgZnO/ZnO heterojunction showed an anomalously low resistivity, which was more than two orders of magnitude less than the MgZnO layer and an order of magnitude lower than that for the ZnO layer. It was suggested that this may be attributable to the presence of a 2D electron gas at the ZnMgO/ZnO heterointerface. [reprint (PDF)]
 
1.  Continuous operation of a monolithic semiconductor terahertz source at room temperature
Q. Y. Lu, N. Bandyopadhyay, S. Slivken, Y. Bai, and M. Razeghi
Appl. Phys. Lett. 104, 221105 (2014)-- June 3, 2014 ...[Visit Journal]
We demonstrate room temperature continuous wave THz sources based on intracavity difference-frequency generation from mid-infrared quantum cascade lasers. Buried ridge, buried composite distributed-feedback waveguide with Čerenkov phase-matching scheme is used to reduce the waveguide loss and enhance the heat dissipation for continuous wave operation. Continuous emission at 3.6 THz with a side-mode suppression ratio of 20 dB and output power up to 3 μW are achieved, respectively. THz peak power is further scaled up to 1.4 mW in pulsed mode by increasing the mid-infrared power through increasing the active region doping and device area. [reprint (PDF)]
 
1.  High Power Mid-Infrared Quantum Cascade Lasers Grown on GaAs
Steven Slivken and Manijeh Razeghi
Photonics 2022, 9(4), 231 (COVER ARTICLE) ...[Visit Journal]
The motivation behind this work is to show that InP-based intersubband lasers with high power can be realized on substrates with significant lattice mismatch. This is a primary concern for the integration of mid-infrared active optoelectronic devices on low-cost photonic platforms, such as Si. As evidence, an InP-based mid-infrared quantum cascade laser structure was grown on a GaAs substrate, which has a large (4%) lattice mismatch with respect to InP. Prior to laser core growth, a metamorphic buffer layer of InP was grown directly on a GaAs substrate to adjust the lattice constant. Wafer characterization data are given to establish general material characteristics. A simple fabrication procedure leads to lasers with high peak power (>14 W) at room temperature. These results are extremely promising for direct quantum cascade laser growth on Si substrates. [reprint (PDF)]
 
1.  High power photonic crystal distributed feedback quantum cascade lasers emitting at 4.5 micron
B. Gokden, S. Slivken and M. Razeghi
SPIE Proceedings, San Francisco, CA (January 22-28, 2010), Vol. 7608, p. 760806-1-- January 22, 2010 ...[Visit Journal]
Quantum cascade lasers possess very small linewidth enhancement factor, which makes them very prominent candidates for realization of high power, nearly diffraction limited and single mode photonic crystal distributed feedback broad area lasers in the mid-infrared frequencies. In this paper, we present room temperature operation of a two dimensional photonic crystal distributed feedback quantum cascade laser emitting at 4.5 µm. peak power up to ~0.9 W per facet is obtained from a 2 mm long laser with 100 µm cavity width at room temperature. The observed spectrum is single mode with a very narrow linewidth. Far-field profile has nearly diffraction limited single lobe with full width at half maximum of 3.5 degree normal to the facet. The mode selection and power output relationships are experimentally established with respect to different cavity lengths for photonic crystal distributed feedback quantum cascade lasers. [reprint (PDF)]
 
1.  Nickel oxide growth on Si (111), c-Al2O3 and FTO/glass by pulsed laser deposition
V. E. Sandana ; D. J. Rogers ; F. Hosseini Teherani ; P. Bove ; R. McClintock ; M. Razeghi
03/07/2014-- March 7, 2014 ...[Visit Journal]
NiO was grown on Si (111), c-Al2O3 and FTO/glass substrates by pulsed laser deposition (PLD). X-Ray Diffraction (XRD) and scanning electron microscope (SEM) studies revealed that layers grown on c-Al2O3 were fcc NiO with a dense morphology of cubic grains that were strongly (111) oriented along the growth direction. The relatively low ω rocking curve linewidth, of 0.12°suggests that there may have been epitaxial growth on the c-Al2O3 substrate. XRD and SEM indicated that films grown on Si (111) were also fcc NiO, with cubic grains, but that the grain orientation was random. This is consistent with the presence of an amorphous SiO2 layer at the surface of the Si substrate, which precluded epitaxial growth. NiO grown at lower temperature (200°C) on temperature-sensitive FTO/glass substrates showed no evidence of crystallinity in XRD and SEM studies. After flash annealing in air, however, peaks characteristic of randomly oriented fcc NiO appeared in the XRD scans and the surface morphology became more granular in appearance. Such layers appear promising for the development of future dye-sensitised solar cell devices based on NiO grown by PLD. [reprint (PDF)]
 

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