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10.  Reliability of Aluminum-Free 808 nm High-Power Laser Diodes with Uncoated Mirrors
I. Eliashevich, J. Diaz, H. Yi, L. Wang, and M. Razeghi
Applied Physics Letters 66 (23)-- June 5, 1995 ...[Visit Journal]
The reliability of uncoated InGaAsP/GaAs high‐power diode lasers emitting at 808 nm wavelength has been studied. 47 W of quasicontinuous wave output power (pulse width 200 μs, frequency 20 Hz) have been obtained from a 1 cm wide laser bar. A single‐stripe diode without mirror coating has been life tested at 40 °C for emitting power of 800 mW continuous wave (cw) and showed no noticeable degradation and no change of the lasing wavelength after 6000 h of operation. [reprint (PDF)]
 
10.  Thin film transistors with wurtzite ZnO channels grown on Si3N4/SiO2/Si (111) substrates by pulsed laser deposition
D.J. Rogers; V.E. Sandana; F. Hosseini Teherani; M. Razeghi
Proc. SPIE 7603, Oxide-based Materials and Devices, 760318 (March 02, 2010)-- March 7, 2010 ...[Visit Journal]
Thin Film Transistors (TFT) were made by growing ZnO on Si3N4/SiO2/Si (111) substrates by pulsed laser deposition. X-ray diffraction and scanning electron microscope studies revealed the ZnO to have a polycrystalline wurtzite structure with a smooth surface, good crystallographic quality and a strong preferential c-axis orientation. Transmission studies in similar ZnO layers on glass substrates showed high transmission over the whole visible spectrum. Electrical measurements of a back gate geometry FET showed an enhancement-mode response with hard saturation, mA range Id and a VON ∼ 0V. When scaled down, such TFTs may be of interest for high frequency applications. [reprint (PDF)]
 
10.  p-Type thin film field effect transistors based on lithium-doped nickel oxide channels grown by pulsed laser deposition
V. E. Sandana; D. J. Rogers; F. H. Teherani; P. Bove; R. McClintock; M. Razeghi
SPIE Proceedings Volume 10919, Oxide-based Materials and Devices X; 109191H -- March 12, 2019 ...[Visit Journal]
Staggered back-gated Field Effect Transistor (FET) structures were made by growing Li-doped NiO on Si3N4/SiO2/Si (111) using room temperature pulsed laser deposition. Optical studies showed over 80% transmission for the NiO:Li channel at wavelengths > 500nm. The MISFET revealed rectifying transfer characteristics, with a VON close to zero, a channel mobility of ~ 1 cm²/V·s, a gate leakage current (at +5V) of 0.8 mA and an ION/IOFF ratio (at a Vgs of −15V) of ~ 103. The transistors showed enhancement-mode output characteristics indicative of a p-type channel with sharp pinchoff, hard saturation, a comparatively high (milliampere range) Id and a relatively low on-resistance of ~11 kΩ. Hence the adoption of Li doping in NiO channels would appear to be a promising approach to obtain p-type TFTs with superior transparency, speed and energy efficiency. [reprint (PDF)]
 
10.  AlN/GaN double-barrier resonant tunneling diodes grown by metal-organic chemical vapor deposition
C. Bayram, Z. Vashaei and M. Razeghi
Applied Physics Letters, Vol. 96, No. 4, p. 042103-1-- January 25, 2010 ...[Visit Journal]
AlN/GaN double-barrier resonant tunneling diodes (RTDs) were grown by metal-organic chemical vapor deposition on sapphire. RTDs were fabricated via standard processing steps. RTDs demonstrate a clear negative differential resistance (NDR) at room temperature (RT). The NDR was observed around 4.7 V with a peak current density of 59 kA/cm² and a peak-to-valley ratio of 1.6 at RT. Dislocation-free material is shown to be the key for the performance of GaN RTDs. [reprint (PDF)]
 
10.  Passivation of Type-II InAs/GaSb superlattice photodetectors
A. Hood, Y. Wei, A. Gin, M. Razeghi, M. Tidrow, and V. Nathan
SPIE Conference, Jose, CA, Vol. 5732, pp. 316-- January 22, 2005 ...[Visit Journal]
Leakage currents limit the operation of high performance Type-II InAs/GaSb superlattice photodiode technology. Surface leakage current becomes a dominant limiting factor, especially at the scale of a focal plane array pixel (< 25 µm) and must be addressed. A reduction of the surface state density, unpinning the Fermi level at the surface, and appropriate termination of the semiconductor crystal are all aims of effective passivation. Recent work in the passivation of Type-II InAs\GaSb superlattice photodetectors with aqueous sulfur-based solutions has resulted in increased R0A products and reduced dark current densities by reducing the surface trap density. Additionally, photoluminescence of similarly passivated Type-II InAs/GaSb superlattice and InAs GaSb bulk material will be discussed. [reprint (PDF)]
 
10.  Planar nBn type-II superlattice mid-wavelength infrared photodetectors using zinc ion-implantation
Arash Dehzangi, Donghai Wu, Ryan McClintock, Jiakai Li, and Manijeh Razeghi
Appl. Phys. Lett. 116, 221103 https://doi.org/10.1063/5.0010273-- June 2, 2020 ...[Visit Journal]
In this Letter, we report the demonstration of zinc ion-implantation to realize planar mid-wavelength infrared photodetectors based on type-II InAs/InAs1−xSbx superlattices. At 77 K, the photodetectors exhibit a peak responsivity of 0.68 A/W at 3.35 μm, corresponding to a quantum efficiency of 23.5% under Vb = −80 mV, without anti-reflection coating; these photodetectors have a 100% cutoff wavelength of 4.28 μm. With an R0 × A value of 1.53 × 104 Ω cm2 and a dark current density of 1.23 × 10−6 A/cm2 under an applied bias of −80 mV at 77 K, the photodetectors exhibit a specific detectivity of 9.12 × 1011 cm·Hz1/2/W. [reprint (PDF)]
 
10.  High quality LEO growth and characterization of GaN films on Al2O3 and Si substrates
M. Razeghi, P. Kung, D. Walker, M. Hamilton, and J. Diaz
SPIE International Conference on Solid State Crystals, Zakopane, Poland; Proceedings 3725-- October 12, 1998 ...[Visit Journal]
We report the lateral epitaxial overgrowth (LEO) of GaN films on (00.1) Al2O3 and (111) Si substrates by metalorganic chemical vapor deposition. The LEO on Si substrates was possible after achieving quasi monocrystalline GaN template films on (111) Si substrates. X-ray diffraction, photoluminescence, scanning electron microscopy and atomic force microscopy were used to assess the quality of the LEO films. Lateral growth rates more than 5 times as high as vertical growth rates were achieved for both LEO growths of GaN on sapphire and silicon substrates. [reprint (PDF)]
 
9.  Quntum Cascade Laser Breakthrough for Advanced Remote Detection
Manijeh Razeghi, Wenjia Zhou, Donghai Wu, Ryan McClintock, and Steven Slivken
Photonics Spectra, November issue-- November 1, 2016 ...[Visit Journal]
The atoms in a molecule can bend, stretch and rotate with respect to one an­other, and these excitations are largely optically active. Most molecules, from simple to moderately complex, have a characteristic absorption spectrum in the 3- to 14-µrn wavelength range that can be uniquely identified and quantified in real time. Infrared spectroscopy has been used to study these absorption features and de­velop different molecular "fingerprints."
 
9.  Gain and recombination dynamics of quantum-dot infrared photodetecto
H. Lim, B. Movaghar, S. Tsao, M. Taguchi, W. Zhang, A.A. Quivy, and M. Razeghi
Virtual Journal of Nanoscale Science & Technology-- December 4, 2006 ...[Visit Journal][reprint (PDF)]
 
9.  Effects of well width and growth temperature on optical and structural characteristics of AlN/GaN superlattices grown by metal-organic chemical vapor deposition
C. Bayram, N. Pere-Laperne, and M. Razeghi
Applied Physics Letters, Vol. 95, No. 20, p. 201906-1-- November 16, 2009 ...[Visit Journal]
AlN/GaN superlattices (SLs) employing various well widths (from 1.5 to 7.0 nm) are grown by metal-organic chemical vapor deposition technique at various growth temperatures (Ts) (from 900 to 1035 °C). The photoluminescence (PL), x-ray diffraction, and intersubband (ISB) absorption characteristics of these SLs and their dependency on well width and growth temperature are investigated. Superlattices with thinner wells (grown at the same Ts) or grown at lower Ts (employing the same well width) are shown to demonstrate higher strain effects leading to a higher PL energy and ISB absorption energy. Simulations are employed to explain the experimental observations. ISB absorptions from 1.04 to 2.15 µm are demonstrated via controlling well width and growth temperature. [reprint (PDF)]
 
9.  QEPAS based ppb-level detection of CO and N2O using a high power CW DFB-QCL
Y. Ma, R. Lewicki, M. Razeghi and F. Tittel
Optics Express, Vol. 21, No. 1, p. 1008-- January 14, 2013 ...[Visit Journal]
An ultra-sensitive and selective quartz-enhanced photoacoustic spectroscopy (QEPAS) sensor platform was demonstrated for detection of carbon monoxide (CO) and nitrous oxide (N2O). This sensor used a stateof-the art 4.61 μm high power, continuous wave (CW), distributed feedback quantum cascade laser (DFB-QCL) operating at 10°C as the excitation source. For the R(6) CO absorption line, located at 2169.2 cm−1, a minimum detection limit (MDL) of 1.5 parts per billion by volume (ppbv) at atmospheric pressure was achieved with a 1 sec acquisition time and the addition of 2.6% water vapor concentration in the analyzed gas mixture. For the N2O detection, a MDL of 23 ppbv was obtained at an optimum gas pressure of 100 Torr and with the same water vapor content of 2.6%. In both cases the presence of water vapor increases the detected CO and N2O QEPAS signal levels as a result of enhancing the vibrational-translational relaxation rate of both target gases. Allan deviation analyses were performed to investigate the long term performance of the CO and N2O QEPAS sensor systems. For the optimum data acquisition time of 500 sec a MDL of 340 pptv and 4 ppbv was obtained for CO and N2O detection,respectively. To demonstrate reliable and robust operation of the QEPAS sensor a continuous monitoring of atmospheric CO and N2O concentration levels for a period of 5 hours were performed. [reprint (PDF)]
 
9.  Growth of In1-xTlxSb, a New Infrared Material, by Low-Pressure Metalorganic Chemical Vapor Deposition
Y.H. Choi, R. Sudharsanan, C, Besikci, and M. Razeghi
Applied Physics Letters 63 (3)-- July 19, 1993 ...[Visit Journal]
We report the growth of In1-xTlxSb, a new III-V alloy for long-wavelength infrared detector applications, by low-pressure metalorganic chemical vapor deposition. In1-xTlxSb with good surface morphology was obtained on both GaAs and InSb substrates at a growth temperature of 455 °C. X-ray diffraction measurements showed resolved peaks of In1-xTlxSb and InSb films. Infrared absorption spectrum of In1-xTlxSb showed a shift toward lower energies compared to InSb spectrum. Hall mobility data on In1-xTlxSb/InSb/GaAs structure showed enhanced mobility at low temperatures compared to InSb/GaAs structure. [reprint (PDF)]
 
9.  Capacitance-voltage investigation of high purity InAs/GaSb superlattice photodiodes
A. Hood, D. Hoffman, Y. Wei, F. Fuchs, and M. Razeghi
Applied Physics Letters 88 (6)-- February 6, 2006 ...[Visit Journal]
The residual carrier backgrounds of binary type-II InAs/GaSb superlattice photodiodes with cutoff wavelengths around 5 μm have been studied in the temperature range between 20 and 200 K. By applying a capacitance-voltage measurement technique, a residual background concentration below 1015 cm–3 has been found. [reprint (PDF)]
 
9.  High performance long wavelength infrared mega-pixel focal plane array based on type-II superlattices
P. Manurkar, S.R. Darvish, B.M. Nguyen, M. Razeghi and J. Hubbs
Applied Physics Letters, Vol. 97, No 19, p. 193505-1-- November 8, 2010 ...[Visit Journal]
A large format 1k × 1k focal plane array (FPA) is realized using type-II superlattice photodiodes for long wavelength infrared detection. Material growth on a 3 in. GaSb substrate exhibits a 50% cutoff wavelength of 11 μm across the entire wafer. The FPA shows excellent imaging. Noise equivalent temperature differences of 23.6 mK at 81 K and 22.5 mK at 68 K are achieved with an integration time of 0.13 ms, a 300 K background and f/4 optics. We report a dark current density of 3.3×10−4 A·cm−2 and differential resistance-area product at zero bias R0A of 166 Ω·cm² at 81 K, and 5.1×10−5 A·cm−2 and 1286 Ω·cm², respectively, at 68 K. The quantum efficiency obtained is 78%. [reprint (PDF)]
 
9.  First cw operation of a Ga0.25In0.75As0.5P0.5‐InP laser on a silicon substrate
M. Razeghi; M. Defour; R. Blondeau; F. Omnes; P. Maurel; O. Acher; F. Brillouet; J. C. C‐Fan; J. Salerno
Appl. Phys. Lett. 53, 2389–2390 (1988) -- December 12, 1988 ...[Visit Journal]
We report the first successful room-temperature cw operations of a GaO. 25 1110.75 ASo. 5 po. s -InP buried ridge structure laser emitting at 1.3 f-tm grown by two-step low-pressure metalorganic chemical vapor deposition on a silicon substrate. An output power of 20 m W with an external quantum efficiency of 16% at room temperature has been obtained. A threshold current as low as 45 rnA under cw operation at room temperature has been measured. The first cw aging test at room temperature, at 2 mW during 5 h, shows a very low degradation (Ill 11,;;5%). [reprint (PDF)]
 
9.  Lateral epitaxial overgrowth of GaN films on sapphire and silicon substrates
P. Kung, D. Walker, M. Hamilton, J. Diaz, and M. Razeghi
Applied Physics Letters 74 (4)-- January 25, 1999 ...[Visit Journal]
We report the lateral epitaxial overgrowth of GaN films on (00.1) Al2O3 and (111) Si substrates by metalorganic chemical vapor deposition. The lateral epitaxial overgrowth on Si substrates was possible after achieving quasi-monocrystalline GaN template films on (111) Si substrates. X-ray diffraction, photoluminescence, scanning electron microscopy, and atomic force microscopy were used to assess the quality of the lateral epitaxial overgrown films. Lateral growth rates more than five times as high as vertical growth rates were achieved for both lateral epitaxial overgrowths of GaN on sapphire and silicon substrates. [reprint (PDF)]
 
9.  Electrical Transport Properties of Highly Doped N-type GaN Epilayers
H.J. Lee, M.G. Cheong, E.K. Suh, and M. Razeghi
SPIE Conference, San Jose, CA, -- January 28, 1998 ...[Visit Journal]
Temperature-dependent Hall-effects in MOCVD-grown Si-doped GaN epilayers were measured as a function of temperature in the range 10-800 K. The results were satisfactorily analyzed in terms of a two-band model including the (Gamma) and impurity bands at lower temperatures than room. The (Gamma) band electrons are dominant only high temperatures. The ionized impurity scattering is the most important in the (Gamma) band except at very high temperatures. [reprint (PDF)]
 
9.  Interface roughness scattering in thin, undoped GaInP/GaAs quantum wells
W. C. Mitchel, G.J. Brown, I. Lo, S. Elhamri, M. Aboujja, K. Ravindran, R.S. Newrock, M. Razeghi, and X. He
Applied Physics Letters 65 (12)-- September 19, 1994 ...[Visit Journal]
Electronic transport properties of very thin undoped GaInP/GaAs quantum wells have been measured by temperature dependent low field Hall effect and by Shubnikov–de Haas effect. Strong Shubnikov–de Haas oscillations were observed after increasing the electron concentration via the persistent photocurrent effect. Low temperature mobilities of up to 70 ,000 cm²/V· s at carrier concentrations of 6.5×1011 cm−2 were observed in a 20 Å quantum well. The results are compared with the theory of interface roughness scattering which indicates extremely smooth interfaces; however, discrepancies between experiment and theory are observed. [reprint (PDF)]
 
9.  Light People: Professor Manijeh Razeghi
Hui Wang, and Cun Yu
Light Sci Appl 13, 164 ...[Visit Journal]
Editorial The sense of light is the first sensation the human body develops. The importance of light is self-evident. However, we all know that the light we can see and perceive covers only a small section of the spectrum. Today, for Light People, we feature a researcher who is committed to exploring different spectral bands of light ranging from deep ultraviolet to terahertz waves and working on quantum semiconductor technology, Prof. Manijeh Razeghi of the Northwestern University in the United States. Known for her quick thinking and witty remarks, Prof. Razeghi is passionate about life and always kind to others. As a scientist, she does not limit her research to a single focus, instead, she works on the entire process from material selection, device design, processing, and manufacturing, all the way to product application. She has a strong passion for education, a commitment unwavered by fame or fortune. For her students, she is both a reliable source of knowledge and a motherly figure with a caring heart. She firmly believes that all things in nature can give her energy and inspiration. In science, she is a true “pioneer” in research and a “miner” of scientific discoveries. She advises young scientists to enjoy and love what they do, and turn their research into their hobby. As a female scientist, she calls on all women to realize their true value and potential. Next, let’s hear from Professor Manijeh Razeghi, a true star who radiates energy and light [reprint (PDF)]
 
9.  Widely tuned room temperature terahertz quantum cascade laser sources
Q.Y. Lu, N. Bandyopadhyay, S. Slivken, Y. Bai and M. Razeghi
SPIE Proceedings, Vol. 8631, p. 863108-1, Photonics West, San Francisco, CA-- February 3, 2013 ...[Visit Journal]
Room temperature THz quantum cascade laser sources with a broad spectral coverage based on intracavity difference frequency generation are demonstrated. Two mid-infrared active cores in the longer mid-IR wavelength range (9-11 micron)based on the single-phonon resonance scheme are designed with a second-order difference frequency nonlinearity specially optimized for the high operating fields that correspond to the highest mid-infrared output powers. A Čerenkov phase-matching scheme along with integrated dual-period distributed feedback gratings are used for efficient THz extraction and spectral purification. Single mode emissions from 1.0 to 4.6 THz with a side-mode suppression ratio and output power up to 40 dB and 32 μW are obtained, respectively. [reprint (PDF)]
 
9.  Growth and Characterization of Long-Wavelength Infrared Type-II Superlattice Photodiodes on a 3-in GaSb Wafer
B.M. Nguyen, G. Chen, M.A. Hoang, and M. Razeghi
IEEE Journal of Quantum Electronics (JQE), Vol. 47, No. 5, May 2011, p. 686-690-- May 11, 2011 ...[Visit Journal]
We report the molecular beam epitaxial growth and characterization of high performance Type-II superlattice photodiodes on 3” GaSb substrates for long wavelength infrared detection. A 7.3 micron thick device structure shows excellent structural homogeneity via atomic force microscopy and x-ray diffraction characterization. Optical and electrical measurements of photodiodes reveal not only the uniformity of the Type-II superlattice material but also of the fabrication process. Across the wafer, at 77 K, photodiodes with a 50% cut-off wavelength of 11 micron exhibit more than 45% quantum efficiency, and a dark current density of 1.0 x 10-4 A/cm² at 50 mV, resulting in a specific detectivity of 6x1011 cm·Hz1/2/W. [reprint (PDF)]
 
8.  Surface leakage investigation via gated type-II InAs/GaSb long-wavelength infrared photodetectors
G. Chen, E.K. Huang, A.M. Hoang, S. Bogdanov, S.R. Darvish, and M. Razeghi
Applied Physics Letters, Vol. 101, No. 21, p. 213501-1-- November 19, 2012 ...[Visit Journal]
By using gating technique, surface leakage generated by SiO2 passivation in long-wavelength infrared type-II superlattice photodetector is suppressed, and different surface leakage mechanisms are disclosed. By reducing the SiO2 passivation layer thickness, the saturated gated bias is reduced to −4.5 V. At 77 K, dark current densities of gated devices are reduced by more than 2 orders of magnitude, with 3071 Ω·cm² differential-resistance-area product at −100 mV. With quantum efficiency of 50%, the 11 μm 50% cut-off gated photodiode has a specific detectivity of 7 × 1011 Jones, and the detectivity stays above 2 × 1011 Jones from 0 to −500 mV operation bias. [reprint (PDF)]
 
8.  High Quantum Efficiency AlGaN Solar-Blind Photodetectors
R. McClintock, A. Yasan, K. Mayes, D. Shiell, S.R. Darvish, P. Kung and M. Razeghi
Applied Physics Letters, 84 (8)-- February 23, 2004 ...[Visit Journal]
We report AlGaN-based back-illuminated solar-blind ultraviolet p-i-n photodetectors with a peak responsivity of 136 mA/W at 282 nm without bias. This corresponds to a high external quantum efficiency of 60%, which improves to a value as high as 72% under 5 V reverse bias. We attribute the high performance of these devices to the use of a very-high quality AlN and Al0.87Ga0.13N/AlN superlattice material and a highly conductive Si–In co-doped Al0.5Ga0.5N layer [reprint (PDF)]
 
8.  Thermal Conductivity of InAs/GaSb Type II Superlattice
C. Zhou, B.M. Nguyen, M. Razeghi and M. Grayson
Journal of Electronic Materials, Vol. 41, No. 9, p. 2322-2325-- August 1, 2012 ...[Visit Journal]
The cross-plane thermal conductivity of a type II InAs/GaSb superlattice(T2SL) is measured from 13 K to 300 K using the 3x method. Thermal conductivity is reduced by up to two orders of magnitude relative to the GaSb bulk substrate. The low thermal conductivity of around 1 W/m K to 8 W/m K may serve as an advantage for thermoelectric applications at low temperatures, while presenting a challenge for T2SL interband cascade lasers and highpower photodiodes. We describe a power-law approximation to model nonlinearities in the thermal conductivity, resulting in increased or decreased peak temperature for negative or positive exponents, respectively. [reprint (PDF)]
 
8.  III-Nitride/Ga2O3 heterostructure for future power electronics: opportunity and challenges
Nirajman Shrestha, Jun Hee Lee, F. H. Teherani, Manijeh Razeghi
Proc. of SPIE Vol. 12895, Quantum Sensing and Nano Electronics and Photonics XX, 128950B (28 January - 1 February 2024, San Francisco)http://dx.doi.org/10.1117/12.3011688 ...[Visit Journal]
Ga2O3 has become the new focal point of high-power semiconductor device research due to its superior capability to handle high voltages in smaller dimensions and with higher efficiencies compared to other commercialized semiconductors. However, the low thermal conductivity of the material is expected to limit device performance. To compensate for the low thermal conductivity of Ga2O3 and to achieve a very high density 2-dimensional electron gas (2DEG), an innovative idea is to combine Ga2O3 with III-Nitrides (which have higher thermal conductivity), such as AlN. However, metal-polar AlN/β-Ga2O3 heterojunction provides type-II heterojunction which are beneficial for optoelectronic application, because of the negative value of specific charge density. On the other hand, N-polar AlN/β- Ga2O3 heterostructures provide higher 2DEG concentration and larger breakdown voltage compared to conventional AlGaN/GaN devices. This advancement would allow the demonstration of RF power transistors with a 10x increase in power density compared to today’s State of the Art (SoA) and provide a solution to size, weight, and power-constrained applications [reprint (PDF)]
 

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