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Page 27 of 31: Prev << 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 >> Next (768 Items)
| 14. | Passivation of Type-II InAs/GaSb superlattice photodetectors A. Hood, Y. Wei, A. Gin, M. Razeghi, M. Tidrow, and V. Nathan SPIE Conference, Jose, CA, Vol. 5732, pp. 316-- January 22, 2005 ...[Visit Journal] Leakage currents limit the operation of high performance Type-II InAs/GaSb superlattice photodiode technology. Surface leakage current becomes a dominant limiting factor, especially at the scale of a focal plane array pixel (< 25 µm) and must be addressed. A reduction of the surface state density, unpinning the Fermi level at the surface, and appropriate termination of the semiconductor crystal are all aims of effective passivation. Recent work in the passivation of Type-II InAs\GaSb superlattice photodetectors with aqueous sulfur-based solutions has resulted in increased R0A products and reduced dark current densities by reducing the surface trap density. Additionally, photoluminescence of similarly passivated Type-II InAs/GaSb superlattice and InAs GaSb bulk material will be discussed. [reprint (PDF)] |
| 14. | Persistent photoconductivity in Ga0.49In0.51P/GaAs heterojunctions S. Ben Amor; L. Dmowski; J. C. Portal; N. J. Pulsford; R. J. Nicholas; J. Singleton; M. Razeghi J. Appl. Phys. 65, 2756–2760 (1989-- November 18, 1988 ...[Visit Journal] We have studied the persistent photoconductivity (PPC) effect in Ga0.49 Ino.
sl P IGaAs
heterostructures. Through time- and temperature-dependent Hall effect, we observe very small
relaxation rates and the PPC remains observable at room temperature. Optical experiments
show an optical energy threshold of 1.15 e V and an infrared quenching of the ppc. Thermal
cycling of the samples strongly affects the PPC and the quenching temperature. The center
responsible for the observed PPC, therefore, appears related to defects, Most of our
observations are qualitatively understood in a large lattice relaxation DX-like center approach.
However, the origin of the high quenching temperature remains to be explained. [reprint (PDF)] |
| 14. | GaN avalanche photodiodes grown on m-plane freestanding GaN substrate Z. Vashaei, E. Cicek, C. Bayram, R. McClintock and M. Razeghi Applied Physics Letters, Vol. 96, No. 20, p. 201908-1-- May 17, 2010 ...[Visit Journal] M-plane GaN avalanche p-i-n photodiodes on low dislocation density freestanding m-plane GaN substrates were realized using metal-organic chemical vapor deposition. High quality homoepitaxial m-plane GaN layers were developed; the root-mean-square surface roughness was less than 1 Å and the full-width-at-half-maximum value of the x-ray rocking curve for (1010) diffraction of m-plane GaN epilayer was 32 arcsec. High quality material led to a low reverse-bias dark current of 8.11 pA for 225 μm² mesa photodetectors prior to avalanche breakdown, with the maximum multiplication gain reaching about 8000. [reprint (PDF)] |
| 14. | Effects of well width and growth temperature on optical and structural characteristics of AlN/GaN superlattices grown by metal-organic chemical vapor deposition C. Bayram, N. Pere-Laperne, and M. Razeghi Applied Physics Letters, Vol. 95, No. 20, p. 201906-1-- November 16, 2009 ...[Visit Journal] AlN/GaN superlattices (SLs) employing various well widths (from 1.5 to 7.0 nm) are grown by metal-organic chemical vapor deposition technique at various growth temperatures (Ts) (from 900 to 1035 °C). The photoluminescence (PL), x-ray diffraction, and intersubband (ISB) absorption characteristics of these SLs and their dependency on well width and growth temperature are investigated. Superlattices with thinner wells (grown at the same Ts) or grown at lower Ts (employing the same well width) are shown to demonstrate higher strain effects leading to a higher PL energy and ISB absorption energy. Simulations are employed to explain the experimental observations. ISB absorptions from 1.04 to 2.15 µm are demonstrated via controlling well width and growth temperature. [reprint (PDF)] |
| 14. | Exciton localization in group-III nitride quantum wells V.I. Litvinov and M. Razeghi Physical Review B 59 (15)-- May 15, 1999 ...[Visit Journal] Exciton density of states broadened by compositional disorder in the group-III nitride quantum well is calculated. The excitonic photoluminescence linewidth is estimated and related to the material parameters of the alloy for two limiting cases of two-dimensional (2D) and three-dimensional excitons in the quantum well. It is shown that the effect of the compositional fluctuations depends on dimensionality of the exciton: the 2D excitons are more sensitive to the inhomogeneities than 3D ones. The broad near-band-gap energy states distribution for quasi-two-dimensional excitons is consistent with the experimental evidence of the spontaneous and stimulated emissions from excitonic states localized on compositional fluctuations. [reprint (PDF)] |
| 14. | Optical losses of Al-free lasers for λ = 0.808 and 0.98 μm H. Yi, J. Diaz, B. Lane, and M. Razeghi Applied Physics Letters 69 (20)-- November 11, 1996 ...[Visit Journal] In this work, we study the origin of the optical losses in Al‐free InGaAsP/GaAs (λ=0.808 μm) and InGaAs/GaAs/InGaP (λ=0.980 μm) lasers. Theoretical modeling and the experimental results indicate that the scattering of the laser beam by refractive index fluctuation in the alloys is the dominant loss in our lasers, and the loss due to the free‐carrier absorption and scattering by interface roughness are negligible. [reprint (PDF)] |
| 14. | Miniaturization: enabling technology for the new millennium M. Razeghi and H. Mohseni SPIE International Conference on Solid State Crystals, Zakopane, Poland, -- April 1, 2001 ...[Visit Journal] The history of semiconductor devices has been characterized by a constant drive toward lower dimensions in order to increase integration density, system functionality and performance. However, this is still far from being comparable with the performance of natural systems such as human brain. The challenges facing semiconductor technologies in the millennium will be to move toward miniaturization. The influence of this trend on the quantum sensing of infrared radiation is one example that is elaborated here. A new generation of infrared detectors has been developed by growing layers of different semiconductors with nanometer thicknesses. The resulted badgap engineered semiconductor has superior performance compared to the bulk material. To enhance this technology further, we plan to move from quantum wells to quantum wire and quantum dots. [reprint (PDF)] |
| 14. | QEPAS based ppb-level detection of CO and N2O using a high power CW DFB-QCL Y. Ma, R. Lewicki, M. Razeghi and F. Tittel Optics Express, Vol. 21, No. 1, p. 1008-- January 14, 2013 ...[Visit Journal] An ultra-sensitive and selective quartz-enhanced photoacoustic spectroscopy (QEPAS) sensor platform was demonstrated for detection of carbon monoxide (CO) and nitrous oxide (N2O). This sensor used a stateof-the art 4.61 μm high power, continuous wave (CW), distributed feedback quantum cascade laser (DFB-QCL) operating at 10°C as the excitation source. For the R(6) CO absorption line, located at 2169.2 cm−1, a minimum detection limit (MDL) of 1.5 parts per billion by volume (ppbv) at atmospheric pressure was achieved with a 1 sec acquisition time and the addition of 2.6% water vapor concentration in the analyzed gas mixture. For the N2O detection, a MDL of 23 ppbv was obtained at an optimum gas pressure of 100 Torr and with the same water vapor content of 2.6%. In both cases the presence of water vapor increases the detected CO and N2O QEPAS signal levels as a result of enhancing the vibrational-translational relaxation rate of both target gases. Allan deviation analyses were performed to investigate the long term performance of the CO and N2O QEPAS sensor systems. For the optimum data acquisition time of 500 sec a MDL of 340 pptv and 4 ppbv was obtained for CO and N2O detection,respectively. To demonstrate reliable and robust operation of the QEPAS sensor a continuous monitoring of atmospheric CO and N2O concentration levels for a period of 5 hours were performed. [reprint (PDF)] |
| 14. | Recent advances in III-Nitride materials, characterization and device applications M. Razeghi, X. Zhang, P. Kung, A. Saxler, D. Walker, K.Y. Lim, and K.S. Kim SPIE Conference: Solid State Crystals in Optoelectronics and Semiconductor Technology; Proceedings 3179-- October 7, 1996 ...[Visit Journal] High-quality AlN, GaN, AlGaN have been grown on sapphire substrate by low-pressure metalorganic chemical vapor deposition (LP-MOCVD). The x-ray rocking curve of AlN and GaN were 100 arcsecs and 30 arcsecs respectively with Pendelloesung oscillations, which are the best reported to date. GaN with high crystallinity simultaneously exhibited high optical and electrical quality. Photoluminescence linewidth of GaN at 77K was as low as 17 meV, which is the best reported to date. Si-doped GaN had a mobility higher than 300 cm²/V·s. GaN has been also successfully grown on LiGaO2 substrate with LP-MOCVD for the first time. AlGaN for the entire composition range has been grown. These layers exhibited the lowest x-ray FWHM reported to date. The excellent optical quality of these layers have been characterized by room temperature UV transmission and photoluminescence. N-type doping of AlGaN with Si has ben achieved up to 60 percent Al with mobility as high as 78 cm²/V·s. AlxGa1-xN/AlyGa1-yN superlattice with atomically sharp interface have been demonstrated. Optically-pumped stimulated emission in GaN:Ge and GaN:Si has been observed with threshold optical power density as low as 0.4 MW/cm². AlGaN photoconductors with cut-off wavelengths from 200 nm to 365 nm have been achieved for the first time. GaN p-n junction photovoltaic detector with very selective photoresponse have been demonstrated and theoretically modeled. Ti/AlN/Si metal-insulator- semiconductor capacitor with high capacitance-voltage performances at both low and high frequencies and low interface trap level density have been demonstrated for the first time in this material system. [reprint (PDF)] |
| 14. | Phase-matched optical second-harmonic generation in GaN and AlN slab waveguides D.N. Hahn, G.T. Kiehne, G.K.L. Wong, J.B. Ketterson, P. Kung, A. Saxler and M. Razeghi Journal of Applied Physics 85 (5)-- March 1, 1999 ...[Visit Journal] Phase-matched optical second-harmonic (SH) generation was observed in GaN and AlN slab waveguides. Phase matching was achieved by waveguide modal dispersion. By tuning the output wavelength of an optical parametric amplifier, several phased-matched SH peaks were observed in the visible spectrum covering blue to red wavelengths. The peak positions are in agreement with the values calculated using the dispersive refractive indices of the film and substrate materials. [reprint (PDF)] |
| 14. | AlGaN/AlN MOVPE heteroepitaxy: pulsed co-doping SiH4 and TMIn Ilkay Demir, Yusuf Koçak, A. Emre Kasapoğlu, Manijeh Razeghi, Emre Gür and Sezai Elagoz Semicond. Sci. Technol. 34 075028-- June 24, 2019 ...[Visit Journal] We report a new growth approach pulsed co-doping growth of AlxGa1−xN (x > 0.5) epilayers on AlN/Al2O3 templates by metal organic vapor phase epitaxy (MOVPE). Using this approach SiH4 (silane) and TMIn (trimethylindium) supplied to the growth chamber alternately and pulsed during the growth of AlGaN epilayers. Structural and morphological quality of AlGaN epilayers were investigated by high resolution x-ray diffraction (HR-XRD), atomic force microscopy (AFM), Raman spectroscopy, and scanning electron microscopy (SEM) techniques. It has shown that higher crystalline quality with low full width at half maximum (FWHM) and smoother surface morphology with reduced hexagonal hillock density has been obtained by the pulsed co-doping growth approach. Volcano like hillock structures has been confirmed by Raman mapping. [reprint (PDF)] |
| 14. | High quality LEO growth and characterization of GaN films on Al2O3 and Si substrates M. Razeghi, P. Kung, D. Walker, M. Hamilton, and J. Diaz SPIE International Conference on Solid State Crystals, Zakopane, Poland; Proceedings 3725-- October 12, 1998 ...[Visit Journal] We report the lateral epitaxial overgrowth (LEO) of GaN films on (00.1) Al2O3 and (111) Si substrates by metalorganic chemical vapor deposition. The LEO on Si substrates was possible after achieving quasi monocrystalline GaN template films on (111) Si substrates. X-ray diffraction, photoluminescence, scanning electron microscopy and atomic force microscopy were used to assess the quality of the LEO films. Lateral growth rates more than 5 times as high as vertical growth rates were achieved for both LEO growths of GaN on sapphire and silicon substrates. [reprint (PDF)] |
| 13. | Characterization of high quality GaInP/GaAs superlattices grown on GaAs and Si substrates by gas source molecular beam epitaxy C. Jelen, S. Slivken, X.G. He, and M. Razeghi and S. Shastry Journal of Vacuum Science and Technology B 12 (2)-- March 1, 1994 ...[Visit Journal] We report an analysis of the heteroepitaxial interfaces in high quality GaInP–GaAs superlattices grown simultaneously on GaAs and Si substrates by gas source molecular beam epitaxy. These two superlattices have been studied using high resolution x-ray diffraction measurements. Sharp superlattice satellites, with very little broadening, are observed within a 6° range for the sample on GaAs. Photoluminescence peaks with full widths at half-maximums of 5 and 7 meV are obtained at 4 K for samples with 58 Å wells on GaAs and Si, respectively. Room temperature exciton absorption is observed in the photovoltage measurements for a superlattice grown on Si substrate. The thicknesses determined by x-ray analysis are consistent with those obtained by a Kronig–Penny model fitting of the photovoltage spectroscopy. [reprint (PDF)] |
| 13. | High‐quality GaAs/Ga0.49In0.51P superlattices grown on GaAs and silicon substrates by low‐pressure metalorganic chemical vapor deposition Available M. Razeghi; Ph. Maurel; F. Omnes; M. Defour; C. Boothroyd; W. M. Stobbs; M. Kelly J. Appl. Phys. 63, 4511–4514 (1988) -- May 1, 1988 ...[Visit Journal] We report the successful growth of Ga0.49 Iuo.5 ! P-GaAs superlattices on GaAs and Si
substrates by low-pressure metalorganic chemical vapor deposition. The high quality of the
structure grown on GaAs and silicon substrates has been evidenced by transmission electron
microscopy photographs, that show very sharp interfaces between GaAs wells and
Gao.49InO.51 P barriers, with perfect control of thicknesses and compositions. Classical Hall
measurements performed on the sample further demonstrated the presence of a twodimensional electron ga.<; with a mobility at T = 4 K , fL (4 K) = 50000 cm2
1V Is, and a carrier
concentration n _ (4 K) = 2,9 X 1011 em -2. GaAs/Gao.49 InO.
51 P superlattices have been used,
as well as buffer layer in order to grow GaAs on silicon substrates. Mirrorlike single-crystal
GaAs has thus been obtained. A GaInP IGaAs heterostructure with electron HaH mobility as
high as 6000 cm2
/V Is at 300 K and 80000 cm2
/V Is at 4 K has been grown, which is the
highest mobility that has yet been reported for these materials, [reprint (PDF)] |
| 13. | High performance long wavelength infrared mega-pixel focal plane array based on type-II superlattices P. Manurkar, S.R. Darvish, B.M. Nguyen, M. Razeghi and J. Hubbs Applied Physics Letters, Vol. 97, No 19, p. 193505-1-- November 8, 2010 ...[Visit Journal] A large format 1k × 1k focal plane array (FPA) is realized using type-II superlattice photodiodes for long wavelength infrared detection. Material growth on a 3 in. GaSb substrate exhibits a 50% cutoff wavelength of 11 μm across the entire wafer. The FPA shows excellent imaging. Noise equivalent temperature differences of 23.6 mK at 81 K and 22.5 mK at 68 K are achieved with an integration time of 0.13 ms, a 300 K background and f/4 optics. We report a dark current density of 3.3×10−4 A·cm−2 and differential resistance-area product at zero bias R0A of 166 Ω·cm² at 81 K, and 5.1×10−5 A·cm−2 and 1286 Ω·cm², respectively, at 68 K. The quantum efficiency obtained is 78%. [reprint (PDF)] |
| 13. | Solar-blind photodetectors based on Ga2O3 and III-nitrides Ryan McClintock; Alexandre Jaud; Lakshay Gautam; Manijeh Razeghi Proc. SPIE 11288, Quantum Sensing and Nano Electronics and Photonics XVII, 1128803-- January 31, 2020 ...[Visit Journal] Recently, there has been a surge of interest in the wide bandgap semiconductors for solar blind photo detectors (SBPD). This work presents our recent progress in the growth/doping of AlGaN and Ga2O3 thin films for solar blind detection applications. Both of these thin films grown are grown by metal organic chemical vapor deposition (MOCVD) in the same Aixtron MOCVD system. Solar-blind metal-semiconductor-metal photodetectors were fabricated with Ga2O3. Spectral responsivity studies of the MSM photodetectors revealed a peak at 261 nm and a maximum EQE of 41.7% for a −2.5 V bias. We have also demonstrated AlGaN based solar-blind avalanche photodiodes with a gain in excess of 57,000 at ~100 volts of reverse bias. This gain can be attributed to avalanche multiplication of the photogenerated carriers within the device. Both of these devices show the potential of wide bandgap semiconductors for solar blind photo detectors. [reprint (PDF)] |
| 13. | Very High Average Power at Room Temperature from λ ~ 5.9 μm Quantum Cascade Lasers J.S. Yu, S. Slivken, A. Evans, J. David and M. Razeghi Applied Physics Letters, 82 (20)-- May 19, 2003 ...[Visit Journal] We report a very high average output power at room temperature for quantum-cascade lasers emitting at λ ~ 5.9 µm. For high-reflectivity-coated 2-mm-long cavities, a low threshold current density of 1.7 kA/cm2 was obtained at room temperature. From 300 to 400 K, the characteristic temperature (T0) was 198 K. A maximum average output power of 0.67 W was achieved. In addition, 0.56 W average output power was observed at a duty cycle of 56%. [reprint (PDF)] |
| 13. | Type-II superlattice photodetectors for MWIR to VLWIR focal plane arrays M. Razeghi, Y. Wei, A. Hood, D. Hoffman, B.M. Nguyen, P.Y. Delaunay, E. Michel and R. McClintock SPIE Infrared Technology and Applications Conference, April 17-21, 2006, Orlando, FL Proceedings – Infrared Technology and Applications XXXII, Vol. 6206, p. 62060N-1-- April 21, 2006 ...[Visit Journal] Results obtained on GaSb/InAs Type-II superlattices have shown performance comparable to HgCdTe detectors, with the promise of higher performance due to reduced Auger recombination and dark current through improvements in device design and material quality. In this paper, we discuss advancements in Type-II IR sensors that cover the 3 to > 30 µm wavelength range. Specific topics covered will be device design and modeling using the Empirical Tight Binding Method (ETBM), material growth and characterization, device fabrication and testing, as well as focal plane array processing and imaging. Imaging has been demonstrated at room temperature for the first time with a 5 µm cutoff wavelength 256×256 focal plane array. [reprint (PDF)] |
| 13. | Characterization and Analysis of Single-Mode High-Power CW Quantum-Cascade Laser W.W. Bewley, I. Vurgaftman, C.S. Kim, J.R. Meyer, J. Nguyen, A. Evans, J.S. Yu, S.R. Darvish, S. Slivken, and M. Razeghi Journal of Applied Physics 98-- October 15, 2005 ...[Visit Journal] We measured and modeled the performance characteristics of a distributed-feedback quantum-cascade laser exhibiting high-power continuous-wave (CW) operation in a single spectral mode at λ~4.8 µm and temperatures up to 333 K. The sidemode suppression ratio exceeds 25 dB, and the emission remains robustly single mode at all currents and temperatures tested. CW output powers of 99 mW at 298 K and 357 mW at 200 K are obtained at currents well below the thermal rollover point. The slope efficiency and subthreshold amplified spontaneous emission spectra are shown to be consistent with a coupling coefficient of no more than κL ~ 4–5, which is substantially lower than the estimate of 9 based on the nominal grating fabrication parameters. [reprint (PDF)] |
| 13. | Inductively coupled plasma etching and processing techniques for type-II InAs/GaSb superlattices infrared detectors toward high fill factor focal plane arrays E.K. Huang, B.M. Nguyen, D. Hoffman, P.Y. Delaunay and M. Razeghi SPIE Proceedings, San Jose, CA Volume 7222-0Z-- January 26, 2009 ...[Visit Journal] A challenge for Type-II InAs/GaSb superlattice (T2SL) photodetectors is to achieve high fill factor, high aspect ratio etching for third generation focal plane arrays (FPAs). Initially, we compare the morphological and electrical results of single element T2SL photodiodes after BCl3/Ar inductively coupled plasma (ICP) and electron cyclotron resonance (ECR) dry etching. Using a Si3N4 hard mask, ICP-etched structures exemplify greater sidewall verticality and smoothness, which are essential toward the realization of high fill factor FPAs. ICP-etched single element devices with SiO2 passivation that are 9.3 µm in cutoff wavelength achieved vertical sidewalls of 7.7 µm in depth with a resistance area product at zero bias of greater than 1,000 Ω·cm2 and maximum differential resistance in excess of 10,000 Ω·cm2 at 77 K. By only modifying the etching technique in the fabrication steps, the ICP-etched photodiodes showed an order of magnitude decrease in their dark current densities in comparison to the ECR-etched devices. Finally, high aspect ratio etching is demonstrated on mutli-element arrays with 3 µm-wide trenches that are 11 µm deep. [reprint (PDF)] |
| 13. | GaInN/GaN Multi-Quantum Well Laser Diodes Grown by Low-Pressure Metalorganic Chemical Vapor Deposition P. Kung, A. Saxler, D. Walker, A. Rybaltowski, X. Zhang, J. Diaz, and M. Razeghi MRS Internet Journal of Nitride Semiconductor Research 3 (1)-- January 1, 1998 ...[Visit Journal] We report the growth, fabrication and characterization of GaInN/GaN multi-quantum well lasers grown on (00·1) sapphire substrates by low pressure metalorganic chemical vapor deposition. The threshold current density of a 1800 µm long cavity length laser was 1.4 kA/cm² with a threshold voltage of 25 V. These lasers exhibited series resistances of 13 and 14 Ω at 300 and 79 K, respectively. [reprint (PDF)] |
| 13. | LEO of III-Nitride on Al2O3 and Si Substrates M. Razeghi, P. Kung, P. Sandvik, K. Mi, X. Zhang, V.P. Dravid, J. Freitas, and A. Saxler SPIE Conference, San Jose, CA, -- January 26, 2000 ...[Visit Journal] Lateral epitaxial overgrowth (LEO) has recently become the method of choice to reduce the density of dislocations in heteroepitaxial GaN thin films, and is thus expected to lead to enhanced performance devices. We present here the LEO growth and characterization of GaN films by low pressure metalorganic chemical vapor deposition. Various substrates were used, including basal plane sapphire and oriented Si substrates. The steps in the LEO growth technology will be briefly reviewed. The characterization results will be discussed in detail. The structural, electrical and optical properties of the films were assessed through scanning, atomic and transmission electron microscopy, x-ray diffraction, capacitance-voltage, deep level transient spectroscopy, photoluminescence, and scanning cathodoluminenscence measurements. Single-step and double- step LEO GaN was achieved on sapphire. Similarly high quality LEO grown GaN films were obtained on sapphire and silicon substrates. Clear and dramatic reduction in the density of defects are observed in LEO grown materials using the various characterization techniques mentioned previously. [reprint (PDF)] |
| 13. | Thin-Film Antimonide-Based Photodetectors Integrated on Si Yiyun Zhang , Member, IEEE, Abbas Haddadi, Member, IEEE, Romain Chevallier, Arash Dehzangi, Member, IEEE, and Manijeh Razeghi , Life Fellow, IEEE IEEE JOURNAL OF QUANTUM ELECTRONICS, VOL. 54, NO. 2-- April 1, 2018 ...[Visit Journal] Monolithic integration of antimonide (Sb)-based
compound semiconductors on Si is in high demand to enrich silicon photonics by extending the detection range to longer infrared wavelengths. In this paper, we have demonstrated the damage-free transfer of large-area (1×1 cm² ) narrow-bandgap Sb-based type-II superlattice (T2SL)-based thin-film materials onto a Si substrate using a combination of wafer-bonding and chemical epilayer release techniques. An array of Sb-based T2SL-based long-wavelength infrared (LWIR) photodetectors with diameters from 100 to 400 μm has been successfully fabricated using standard "top–down" processing technique. The transferred LWIR photodetectors exhibit a cut-off wavelength of λ 8.6 μm at 77 K. The dark current density of the transferred photodetectors under 200 mV applied bias at 77 K is as low as
5.7×10−4 A/cm² and the R×A reaches 66.3 Ω·cm², exhibiting no electrical degradation compared with reference samples on GaSb native substrate. The quantum efficiency and peak responsivity at 6.75 μm (@77 K, 200 mV) are 46.2% and 2.44 A/W, respectively. The specific detectivity (D*) at 6.75 μm reaches as
high as 1.6×1011 cm·Hz1/2/W under 200 mV bias at 77 K. Our method opens a reliable pathway to realize high performance
and practical Sb-based optoelectronic devices on a Si platform.
[reprint (PDF)] |
| 13. | Transport and photodetection in self-assembled semiconductor quantum dots M Razeghi, H Lim, S Tsao, J Szafraniec, W Zhang, K Mi and B Movaghar Nanotechnology 16 219-- January 7, 2005 ...[Visit Journal] A great step forward in science and technology was made when it was
discovered that lattice mismatch can be used to grow highly ordered,
artificial atom-like structures called self-assembled quantum dots. Several
groups have in the meantime successfully demonstrated useful infrared
photodetection devices which are based on this technology. The new
physics is fascinating, and there is no doubt that many new applications will
be found when we have developed a better understanding of the underlying
physical processes, and in particular when we have learned how to integrate
the exciting new developments made in nanoscopic addressing and
molecular self-assembly methods with semiconducting dots. In this paper
we examine the scientific and technical questions encountered in current
state of the art infrared detector technology and suggest ways of overcoming
these difficulties. Promoting simple physical pictures, we focus in particular
on the problem of high temperature detector operation and discuss the origin
of dark current, noise, and photoresponse. [reprint (PDF)] |
| 13. | Type-II superlattice-based heterojunction phototransistors for high speed applications Jiakai Li, Arash Dehzangi, Donghai Wu, Ryan McClintock, Manijeh Razeghi Infrared Physics and Technology 108, 1033502-- May 2, 2020 ...[Visit Journal] In this study, high speed performance of heterojunction phototransistors (HPTs) based on InAs/GaSb/AlSb type-II superlattice with 30 nm base thickness and 50% cut-off wavelength of 2.0 μm at room temperature are demonstrated. We studied the relationship between -3 dB cut-off frequency of these HPT versus mesa size, applied bias, and collector layer thickness. For 8 μm diameter circular mesas HPT devices with a 0.5 μm collector layer, under 20 V applied bias voltage, we achieved a -3 dB cut-off frequency of 2.8 GHz.
[reprint (PDF)] |
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