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12.  AlGaN-based deep UV light emitting diodes with peak emission below 255 nm
A. Yasan, R. McClintock, K. Mayes, P. Kung, and M. Razeghi
SPIE Conference, Jose, CA, Vol. 5732, pp. 197-- January 22, 2005 ...[Visit Journal]
We report on the growth and fabrication of AlGaN-based deep ultraviolet light-emitting diodes (LEDs) with peak emission of below 255 nm. In order to achieve such short wavelength UV LEDs, the Al mole fractions in the device layers should be greater than ~60%. This introdues serious challenges on the growth and doping of AlxGa1-xN epilayers. However, with the aid of a high-quality AlN template layer and refinement of the growth conditions we have been able to demonstrate UV LEDs emitting below 255 nm. [reprint (PDF)]
 
12.  GaInAsP/InP 1.35 μm Double Heterostructure Laser Grown on Silicon Substrate by Metalorganic Chemical Vapor Deposition
K. Mobarhan, C. Jelen, E. Kolev, and M. Razeghi
Journal of Applied Physics 74 (1)-- July 1, 1993 ...[Visit Journal]
A 1.35 μm GaInAsP/InP double heterostructure laser has been grown on a Si substrate using low‐pressure metalorganic chemical vapor deposition. This was done without the use of a superlattice layer or a very thick InP buffer layer, which are used to prevent the dislocations from spreading into the active layer. Pulsed operation with output power of over 200 mW per facet was achieved at room temperature for broad area lasers with 20 μm width and 170 μm cavity length. The threshold current density of a 350 μm cavity length device was 9.8 kA/cm². The characteristic temperature was 66 K. [reprint (PDF)]
 
12.  Temperature dependent characteristics of λ ~ 3.8 µm room-temperature continuous-wave quantum-cascade lasers
J.S. Yu, A. Evans, S. Slivken, S.R. Darvish and M. Razeghi
Applied Physics Letters, 88 (25)-- June 19, 2006 ...[Visit Journal]
The highest-performance device displays pulsed laser action at wavelengths between 3.4 and 3.6 μm, for temperatures up to 300 K, with a low temperature (80 K) threshold current density of approximately 2.6 kA/cm2, and a characteristic temperature of T0~130 K. The shortest wavelength QCL (λ ~ 3.05 μm) has a higher threshold current density (~12 kA/cm2 at T=20 K) and operates in pulsed mode at temperatures up to 110 K. [reprint (PDF)]
 
12.  High quality AlN and GaN epilayers grown on (00*1) sapphire, (100) and (111) silicon substrates
P. Kung, A. Saxler, X. Zhang, D. Walker, T.C. Wang, I. Ferguson, and M. Razeghi
Applied Physics Letters 66 (22)-- May 29, 1995 ...[Visit Journal]
The growth of high quality AlN and GaN thin films on basal plane sapphire, (100), and (111) silicon substrates is reported using low pressure metalorganic chemical vapor deposition. X-ray rocking curve linewidths of about 100 and 30 arcsec were obtained for AlN and GaN on sapphire, respectively. Room‐temperature optical transmission and photoluminescence (of GaN) measurements confirmed the high quality of the films. The luminescence at 300 and 77 K of the GaN films grown on basal plane sapphire, (100), and (111) silicon was compared. [reprint (PDF)]
 
12.  Optical Absorption and Photoresponse in fully Quaternary p-type Quantum Well Detectors
J. Hoff, C. Jelen, S. Slivken, G.J. Brown, and M. Razeghi
SPIE Photonics West '96 Photodetectors: Materials and Devices; Proceedings 2685-- January 27, 1996 ...[Visit Journal]
Acceptor doped, non-strained aluminum-free Quantum Well Intersubband Photodetectors lattice matched to GaAs with Ga0.79In0.21As0.59P0.41 wells and Ga0.62In0.38As0.22P0.78 barriers have been demonstrated on semi-insulating GaAs substrates. These devices which operate at normal incidence demonstrate a unique spectral response which extends from approximately 2 μm up to 10 μm. To explain such a broad spectral shape, a detailed theoretical analysis based on the 8 x 8 Kane Hamiltonian was necessary to probe all aspect of optical absorption. The results of this analysis revealed that spectral shape results from the influence of the Spin Split-off band on the band structure and the optical matrix. [reprint (PDF)]
 
12.  Solar-blind AlGaN photodiodes with very low cutoff wavelength
D. Walker, V. Kumar, K. Mi, P. Sandvik, P. Kung, X.H. Zhang, and M. Razeghi
Applied Physics Letters 76 (4)-- January 24, 2000 ...[Visit Journal]
We report the fabrication and characterization of AlxGa1–xN photodiodes (x~0.70) grown on sapphire by low-pressure metalorganic chemical vapor deposition. The peak responsivity for –5 V bias is 0.11 A/W at 232 nm, corresponding to an internal quantum efficiency greater than 90%. The device response drops four orders of magnitude by 275 nm and remains at low response for the entire near-ultraviolet and visible spectrum. Improvements were made to the device design including a semitransparent Ni/Au contact layer and a GaN:Mg cap layer, which dramatically increased device response by enhancing the carrier collection efficiency. [reprint (PDF)]
 
12.  Investigations of ZnO thin films grown on c-Al(2)O(3) by pulsed laser deposition in N(2) + O(2) ambient
D.J. Rogers, D.C. Look, F.H. Teherani, K. Minder, M. Razeghi, A. Largeteau, G. Demazeau, J. Morrod, K.A. Prior, A. Lusson, and S. Hassani
Physica Status Solidi (c), Vol. 5, No. 9, p. 3084-3087-- July 1, 2008 ...[Visit Journal]
ZnO films were deposited on c-Al2O3 using pulsed laser deposition both with and without N2 in the growth ambient. X-ray diffraction revealed poorer crystal quality and surface morphology for one-step growths with N2 in the ambient. A marked improvement in both the crystallographic and surface quality was obtained through use of two-step growths employing nominally undoped ZnO buffer layers prior to growth with N2 in the ambient. All films showed majority n-type conduction in Hall measurements. Post-annealing for 30 minutes at 600 ºC in O2 systematically reduced both the carrier concentration and the conductivity. A base room temperature carrier concentration of ~ 1016 cm-3 was linked to Al diffusing from the substrate. 4.2 K photoluminescence spectra exhibited blue bands associated with the growths having N2 in the ambient. Temperature dependent Hall measurements were consistent with N being incorporated in the films. Processed devices did not, however, show rectifying behavior or electroluminescence. [reprint (PDF)]
 
12.  Stable single mode terahertz semiconductor sources at room temperature
M. Razeghi
2011 International Semiconductor Device Research Symposium, ISDRS [6135180] (2011).-- December 7, 2011 ...[Visit Journal]
Terahertz (THz) range is an area of the electromagnetic spectra which has lots of applications but it suffers from the lack of simple working devices which can emit THz radiation, such as the high performance mid-infrared (mid-IR) quantum cascade lasers (QCLs) based on InP technology. The applications for the THz can be found in astronomy and space research, biology imaging, security, industrial inspection, etc. Unlike THz QCLs based on the fundamental oscillators, which are limited to cryogenic operations, semiconductor THz sources based on nonlinear effects of mid-IR QCLs do not suffer from operating temperature limitations, because mid-IR QCLs can operate well above room temperature. THz sources based on difference frequency generation (DFG) utilize nonlinear properties of asymmetric quantum structures, such as QCL structures. [reprint (PDF)]
 
12.  High‐quality GaAs/Ga0.49In0.51P superlattices grown on GaAs and silicon substrates by low‐pressure metalorganic chemical vapor deposition Available
M. Razeghi; Ph. Maurel; F. Omnes; M. Defour; C. Boothroyd; W. M. Stobbs; M. Kelly
J. Appl. Phys. 63, 4511–4514 (1988) -- May 1, 1988 ...[Visit Journal]
We report the successful growth of Ga0.49 Iuo.5 ! P-GaAs superlattices on GaAs and Si substrates by low-pressure metalorganic chemical vapor deposition. The high quality of the structure grown on GaAs and silicon substrates has been evidenced by transmission electron microscopy photographs, that show very sharp interfaces between GaAs wells and Gao.49InO.51 P barriers, with perfect control of thicknesses and compositions. Classical Hall measurements performed on the sample further demonstrated the presence of a twodimensional electron ga.<; with a mobility at T = 4 K , fL (4 K) = 50000 cm2 1V Is, and a carrier concentration n _ (4 K) = 2,9 X 1011 em -2. GaAs/Gao.49 InO. 51 P superlattices have been used, as well as buffer layer in order to grow GaAs on silicon substrates. Mirrorlike single-crystal GaAs has thus been obtained. A GaInP IGaAs heterostructure with electron HaH mobility as high as 6000 cm2 /V Is at 300 K and 80000 cm2 /V Is at 4 K has been grown, which is the highest mobility that has yet been reported for these materials, [reprint (PDF)]
 
12.  High quantum efficiency mid-wavelength infrared type-II InAs/InAs1-xSbx superlattice photodiodes grown by metal-organic chemical vapor deposition
Donghai Wu , Quentin Durlin, Arash Dehzangi , Yiyun Zhang , and Manijeh Razeghi
Appl. Phys. Lett. 114, 011104-- January 8, 2019 ...[Visit Journal]
We report the growth and characterization of mid-wavelength infrared type-II InAs/InAs1-xSbx superlattice photodiodes on GaSb substrates grown by metal-organic chemical vapor deposition. At 150 K, the 50% cut-off wavelength is 5.0 um, the dark current density is 3.3x10−4 A/cm2 under −20mV bias, and the peak responsivity is 1.76A/W corresponding to a quantum efficiency of 55% without anti-reflection coating. A specific detectivity of 1.2x1011cmHz1/2/W is achieved at 4.0 um under −20mV bias at 150 K. [reprint (PDF)]
 
12.  AlGaN/AlN MOVPE heteroepitaxy: pulsed co-doping SiH4 and TMIn
Ilkay Demir, Yusuf Koçak, A. Emre Kasapoğlu, Manijeh Razeghi, Emre Gür and Sezai Elagoz
Semicond. Sci. Technol. 34 075028-- June 24, 2019 ...[Visit Journal]
We report a new growth approach pulsed co-doping growth of AlxGa1−xN (x > 0.5) epilayers on AlN/Al2O3 templates by metal organic vapor phase epitaxy (MOVPE). Using this approach SiH4 (silane) and TMIn (trimethylindium) supplied to the growth chamber alternately and pulsed during the growth of AlGaN epilayers. Structural and morphological quality of AlGaN epilayers were investigated by high resolution x-ray diffraction (HR-XRD), atomic force microscopy (AFM), Raman spectroscopy, and scanning electron microscopy (SEM) techniques. It has shown that higher crystalline quality with low full width at half maximum (FWHM) and smoother surface morphology with reduced hexagonal hillock density has been obtained by the pulsed co-doping growth approach. Volcano like hillock structures has been confirmed by Raman mapping. [reprint (PDF)]
 
12.  Inductively coupled plasma etching and processing techniques for type-II InAs/GaSb superlattices infrared detectors toward high fill factor focal plane arrays
E.K. Huang, B.M. Nguyen, D. Hoffman, P.Y. Delaunay and M. Razeghi
SPIE Proceedings, San Jose, CA Volume 7222-0Z-- January 26, 2009 ...[Visit Journal]
A challenge for Type-II InAs/GaSb superlattice (T2SL) photodetectors is to achieve high fill factor, high aspect ratio etching for third generation focal plane arrays (FPAs). Initially, we compare the morphological and electrical results of single element T2SL photodiodes after BCl3/Ar inductively coupled plasma (ICP) and electron cyclotron resonance (ECR) dry etching. Using a Si3N4 hard mask, ICP-etched structures exemplify greater sidewall verticality and smoothness, which are essential toward the realization of high fill factor FPAs. ICP-etched single element devices with SiO2 passivation that are 9.3 µm in cutoff wavelength achieved vertical sidewalls of 7.7 µm in depth with a resistance area product at zero bias of greater than 1,000 Ω·cm2 and maximum differential resistance in excess of 10,000 Ω·cm2 at 77 K. By only modifying the etching technique in the fabrication steps, the ICP-etched photodiodes showed an order of magnitude decrease in their dark current densities in comparison to the ECR-etched devices. Finally, high aspect ratio etching is demonstrated on mutli-element arrays with 3 µm-wide trenches that are 11 µm deep. [reprint (PDF)]
 
12.  Roadmap of Semiconductor Infrared Lasers and Detectors for the 21st Century
M. Razeghi
SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal]
Since the first discovery, semiconductor infrared lasers and detectors have found many various applications in military, communications, medical, and industry sections. In this paper, the current status of semiconductor infrared lasers and detectors will be reviewed. Advantages and disadvantages of different methods and techniques is discussed later. Some basic physical limitations of current technology are studied and the direction to overcome these problems will be suggested. [reprint (PDF)]
 
12.  Stranski-Krastanov growth of InGaN quantum dots emitting in green spectra
C. Bayram and M. Razeghi
Applied Physics A: Materials Science and Processing, Vol. 96, No. 2, p. 403-408-- August 1, 2009 ...[Visit Journal]
Self-assembled InGaN quantum dots (QDs) were grown on GaN templates by metalorganic chemical vapor deposition. 2D–3D growth mode transition through Stranski–Krastanov mode was observed via atomic force microscopy. The critical thickness for In0.67Ga0.33N QDs was determined to be four monolayers. The effects of growth temperature, deposition thickness, and V/III ratio on QD formation were examined. The capping of InGaN QDs with GaN was analyzed. Optimized InGaN quantum dots emitted in green spectra at room temperature. [reprint (PDF)]
 
12.  Stability of far fields in double heterostructure and multiple quantum well InAsSb/InPAsSb/InAs midinfrared lasers
H. Yi, A. Rybaltowski, J. Diaz, D. Wu, B. Lane, Y. Xiao, and M. Razeghi
Applied Physics Letters 70 (24)-- June 16, 1997 ...[Visit Journal]
Far fields in perpendicular direction to the junction are investigated in double heterostructure (DH) and multiple quantum well (MQW) midwave-infrared InAsSb/InPAsSb/InAs lasers (λ = 3.2–3.6 μm). Strong broadening of the far fields in the DH lasers was observed with increases in temperature and/or current. On the contrary, MQW lasers with otherwise identical structure exhibit very stable far fields as narrow as 23° for all the operating conditions investigated. Our experiment and theoretical modeling suggest that these different behaviors of far fields in DH and MQW lasers are attributed to the refractive index fluctuation in the InAsSb laser active region. [reprint (PDF)]
 
12.  Characterization and Analysis of Single-Mode High-Power CW Quantum-Cascade Laser
W.W. Bewley, I. Vurgaftman, C.S. Kim, J.R. Meyer, J. Nguyen, A. Evans, J.S. Yu, S.R. Darvish, S. Slivken, and M. Razeghi
Journal of Applied Physics 98-- October 15, 2005 ...[Visit Journal]
We measured and modeled the performance characteristics of a distributed-feedback quantum-cascade laser exhibiting high-power continuous-wave (CW) operation in a single spectral mode at λ~4.8 µm and temperatures up to 333 K. The sidemode suppression ratio exceeds 25 dB, and the emission remains robustly single mode at all currents and temperatures tested. CW output powers of 99 mW at 298 K and 357 mW at 200 K are obtained at currents well below the thermal rollover point. The slope efficiency and subthreshold amplified spontaneous emission spectra are shown to be consistent with a coupling coefficient of no more than κL ~ 4–5, which is substantially lower than the estimate of 9 based on the nominal grating fabrication parameters. [reprint (PDF)]
 
12.  Persistent photoconductivity in thin undoped GaInP/GaAs quantum wells
S. Elhamri, M. Ahoujja, K. Ravindran, D.B. Mast, R.S. Newrock, W.C. Mitchel, G.J. Brown, I. Lo, M. Razeghi and X. He
Applied Physics Letters 66 (2)-- January 9, 1995 ...[Visit Journal]
Persistent photoconductivity has been observed at low temperatures in thin, unintentionally doped GaInP/GaAs/GaInP quantum wells. The two‐dimensional electron gas was studied by low field Hall and Shubnikov–de Haas effects. After illumination with red light, the electron concentration increased from low 1011 cm−2 to more than 7×1011 cm−2 resulting in an enhancement of both the carrier mobility and the quantum lifetime. The persistent photocarriers cannot be produced by DX-like defects since the shallow dopant concentration in the GaInP layers is too low to produce the observed concentration. We suggest that the persistent carriers are produced by photoionization of deep intrinsic donors in the GaInP barrier layer. We also report observation of a parallel conduction path in GaInP induced by extended illumination. [reprint (PDF)]
 
12.  Demonstration of Planar Type-II Superlattice-Based Photodetectors Using Silicon Ion-Implantation
Arash Dehzangi, Donghai Wu, Ryan McClintock, Jiakai Li, Alexander Jaud and Manijeh Razeghi
Photonics 2020, 7(3), 68; https://doi.org/10.3390/photonics7030068-- September 3, 2020 ...[Visit Journal]
In this letter, we report the demonstration of a pBn planar mid-wavelength infrared photodetectors based on type-II InAs/InAs1−xSbx superlattices, using silicon ion-implantation to isolate the devices. At 77 K the photodetectors exhibited peak responsivity of 0.76 A/W at 3.8 µm, corresponding to a quantum efficiency, without anti-reflection coating, of 21.5% under an applied bias of +40 mV with a 100% cut-off wavelength of 4.6 µm. With a dark current density of 5.21 × 10−6 A/cm2, under +40 mV applied bias and at 77 K, the photodetector exhibited a specific detectivity of 4.95 × 1011 cm·Hz1/2/W. [reprint (PDF)]
 
12.  MOCVD Growth of ZnO Nanostructures Using Au Droplets as Catalysts
V.E. Sandana, D.J. Rogers, F.H. Teherani, R. McClintock, M. Razeghi, H.J. Drouhin, M.C. Clochard, V. Sallett, G. Garry and F. Fayoud
SPIE Conference, January 20-25, 2008, San Jose, CA Proceedings – Zinc Oxide Materials and Devices III, Vol. 6895, p. 68950Z-1-6.-- February 1, 2008 ...[Visit Journal]
ZnO nanostructures were synthesised by Metal Organic Chemical Vapor Deposition growth on Si (100) and c-Al2O3 substrates coated with a 5nm thick layer of Au. The Au coated substrates were annealed in air prior to deposition of ZnO so as to promote formation of Au nanodroplets. The development of the nanodroplets was studied as a function of annealing duration and temperature. Under optimised conditions, a relatively homogeneous distribution of regular Au nanodroplets was obtained. Using the Au nanodroplets as a catalyst, MOCVD growth of ZnO nanostructures was studied. Scanning electron microscopy revealed nanostructures with various forms including commonly observed structures such as nanorods, nanoneedles and nanotubes. Some novel nanostructures were also observed, however, which resembled twist pastries and bevelled-multifaceted table legs. [reprint (PDF)]
 
12.  Noise analysis in type-II InAs/GaSb focal plane arrays
P.Y. Delaunay and M. Razeghi
Journal of Applied Physics, Vol. 106, Issue 6, p. 063110-- September 15, 2009 ...[Visit Journal]
A long wavelength infrared focal plane array based on type-II InAs/GaSb superlattices was fabricated and characterized at 80 K. The noise equivalent temperature difference in the array was measured as low as 23 mK for an integration time of 0.129 ms. The noise behavior of the detectors was properly described by a model based on thermal, shot, read out integrated circuit, and photon noises. The noise of the imager was dominated by photon noise for photon fluxes higher than 1.8×1015 ph·s−1·cm−2. At lower irradiance, the imager was limited by the shot noise generated by the dark current or the noise of the testing system. The superlattice detector did not create 1/f noise for frequencies above 4 mHz. As a result, the focal plane array did not require frequent calibrations. [reprint (PDF)]
 
11.  High performance quantum cascade lasers (~11 μm) operating at high temperature (T>= 425K)
A. Tahraoui, A. Matlis, S. Slivken, J. Diaz, and M. Razeghi
Applied Physics Letters 78 (4)-- January 22, 2001 ...[Visit Journal]
We report record-low threshold current density and high output power for λ ∼ 11 μm Al0.48In0.52As/Ga0.47In0.53As quantum cascade lasers operating up to 425 K. The threshold current density is 1.1, 3.83, and 7.08 kA/cm² at 80, 300, and 425 K, respectively, for 5 μs pulses at a 200 Hz repetition rate. The cavity length is 3 mm with a stripe width of 20 μm. The maximum peak output power per facet is 1 W at 80 K, 0.5 W at 300 K, and more than 75 mW at 425 K. The characteristic temperature of these lasers is 174 K between 80 and 300 K and 218 K in the range of 300–425 K. [reprint (PDF)]
 
11.  High-performance, continuous-wave quantum-cascade lasers operating up to 85° C at λ ~ 8.8 μm
J.S. Yu, S. Slivken, A. Evans, and M. Razeghi
Applied Physics A: Materials Science & Processing, Vo. 93, No. 2, p. 405-408-- November 1, 2008 ...[Visit Journal]
High-temperature, high-power, and continuous-wave (CW) operation of quantum-cascade lasers with 35 active/injector stages at λ∼8.85 μm above room temperature is achieved without using a buried heterostructure. At this long wavelength, the use of a wider ridge waveguide in an epilayer-down bonding scheme leads to a superior performance of the laser. For a high-reflectivity-coated 21 μm×3 mm laser, the output power of 237 mW and the threshold current density of 1.44 kA·cm-2 at 298 K under CW mode are obtained with a maximum wall-plug efficiency of 1.7%. Further improvements were observed by using a 4-mm-long cavity. The device exhibits 294 mW of output power at 298 K and it operates at a high temperature, even up to 358 K (85°C). The full widths at half-maximum of the laser beam in CW operation for the parallel and the perpendicular far-field patterns are 25°and 63°, respectively. [reprint (PDF)]
 
11.  Passivation of Type-II InAs/GaSb superlattice photodetectors
A. Hood, Y. Wei, A. Gin, M. Razeghi, M. Tidrow, and V. Nathan
SPIE Conference, Jose, CA, Vol. 5732, pp. 316-- January 22, 2005 ...[Visit Journal]
Leakage currents limit the operation of high performance Type-II InAs/GaSb superlattice photodiode technology. Surface leakage current becomes a dominant limiting factor, especially at the scale of a focal plane array pixel (< 25 µm) and must be addressed. A reduction of the surface state density, unpinning the Fermi level at the surface, and appropriate termination of the semiconductor crystal are all aims of effective passivation. Recent work in the passivation of Type-II InAs\GaSb superlattice photodetectors with aqueous sulfur-based solutions has resulted in increased R0A products and reduced dark current densities by reducing the surface trap density. Additionally, photoluminescence of similarly passivated Type-II InAs/GaSb superlattice and InAs GaSb bulk material will be discussed. [reprint (PDF)]
 
11.  Ga2O3 Metal-oxide-semiconductor Field Effect Transistors on Sapphire Substrate by MOCVD
Ji-Hyeon Park, Ryan McClintock and Manijeh Razeghi
Semiconductor Science and Technology, Volume 34, Number 8-- June 26, 2019 ...[Visit Journal]
Si-doped gallium oxide (Ga2O3) thin films were grown on a c-plane sapphire substrate by metalorganic chemical vapor deposition (MOCVD) and fabricated into metal oxide semiconductor field effect transistors (MOSFETs). The Ga2O3 MOSFETs exhibited effective gate modulation of the drain current with a complete channel pinch-off for VG < −25 V, and the three-terminal off-state breakdown voltage was 390 V. The device shows a very low gate leakage current (~50 pA/mm), which led to a high on/off ratio of ~108. These transistor characteristics were stable from room temperature to 250 °C [reprint (PDF)]
 
11.  Very high performance LWIR and VLWIR type-II InAs/GaSb superlattice photodiodes with M-structure barrier
B.M. Nguyen, D. Hoffman, P.Y. Delaunay, E.K. Huang and M. Razeghi
SPIE Proceedings, Vol. 7082, San Diego, CA 2008, p. 708205-- September 3, 2008 ...[Visit Journal]
LWIR and VLWIR type-II InAs/GaSb superlattice photodetectors have for long time suffered from a high dark current level and a low dynamic resistance which hampers the its emergence to the infrared detection and imaging industry. However, with the use of M-structure superlattice, a new Type-II binary InAs/GaSb/AlSb superlattice design, as an effective blocking barrier, the dark current in type-II superlattice diode has been significantly reduced. We have obtained comparable differential resistance product to the MCT technology at the cut-off wavelength of 10 and 14μm. Also, this new design is compatible with the optical optimization scheme, leading to high quantum efficiency, high special detectivity devices for photon detectors and focal plane arrays. [reprint (PDF)]
 

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