Center for Quantum Devices - Most Downloaded Journal Articles

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12.	GaInN/GaN Multi-Quantum Well Laser Diodes Grown by Low-Pressure Metalorganic Chemical Vapor Deposition P. Kung, A. Saxler, D. Walker, A. Rybaltowski, X. Zhang, J. Diaz, and M. Razeghi MRS Internet Journal of Nitride Semiconductor Research 3 (1)-- January 1, 1998 ...[Visit Journal] We report the growth, fabrication and characterization of GaInN/GaN multi-quantum well lasers grown on (00·1) sapphire substrates by low pressure metalorganic chemical vapor deposition. The threshold current density of a 1800 µm long cavity length laser was 1.4 kA/cm² with a threshold voltage of 25 V. These lasers exhibited series resistances of 13 and 14 Ω at 300 and 79 K, respectively. [reprint (PDF)]
12.	Improved performance of quantum cascade lasers via manufacturable quality epitaxial side down mounting process utilizing aluminum nitride heatsinks A. Tsekoun, R. Go, M. Pushkarsky, M. Razeghi, C.K.N. Patel SPIE Conference, San Jose, CA, Vol. 6127, pp. 612702-- January 23, 2006 ...[Visit Journal] We report substantially improved performance of high power quantum cascade lasers by utilizing epi-side down mounting that provides superior heat dissipation properties. We have obtained CW power output of 450 mW at 20°C from mid-IR QCLs. The improved thermal management achieved with epi-side down mounting has also permitted us to carry out initial lifetime tests on the mid-IR QCLs. No degradation of power output is seen even after over 300 hours of CW operation at 25°C with power output in excess of 300 mW. We believe these improvements should permit incorporation of mid-IR QCLs in reliable instrumentation. [reprint (PDF)]
12.	Reliable GaN-based resonant tunneling diodes with reproducible room-temperature negative differential resistance C. Bayram, D.K. Sadana, Z. Vashaei and M. Razeghi SPIE Proceedings, Vol. 8268, p. 826827-- January 22, 2012 ...[Visit Journal] negative differential resistance (NDR). Compared to other negative resistance devices such as (Esaki) tunnel and transferred-electron devices, RTDs operate much faster and at higher temperatures. III-nitride materials, composed of AlGaInN alloys, have wide bandgap, high carrier mobility and thermal stability; making them ideal for high power high frequency RTDs. Moreover, larger conduction band discontinuity promise higher NDR than other materials (such as GaAs) and room-temperature operation. However, earlier efforts on GaN-based RTD structures have failed to achieve a reliable and reproducible NDR. Recently, we have demonstrated for the first time that minimizing dislocation density and eliminating the piezoelectric fields enable reliable and reproducible NDR in GaN-based RTDs even at room temperature. Observation of NDR under both forward and reverse bias as well as at room and low temperatures attribute the NDR behaviour to quantum tunneling. This demonstration marks an important milestone in exploring III-nitride quantum devices, and will pave the way towards fundamental quantum transport studies as well as for high frequency optoelectronic devices such as terahertz emitters based on oscillators and cascading structures. [reprint (PDF)]
12.	World's first demonstration of type-II superlattice dual band 640 x 512 LWIR focal plane array E.K. Huang and M. Razeghi SPIE Proceedings, Vol. 8268, p. 82680Z-- January 22, 2012 ...[Visit Journal] High resolution multi-band infrared detection of terrestrial objects is useful in applications such as long range and high altitude surveillance. In this paper, we present a 640 x 512 type-II superlattice focal plane array (FPA) in the long-wave infrared (LWIR) suitable for such purposes, featuring 100% cutoff wavelengths at 9.5 μm (blue channel) and 13 μm (red). The dual band camera is single-bump hybridized to an Indigo 30 μm pitch ISC0905 read-out integrated circuit. Test pixels revealed background limited behavior with specific detectivities as high as ~5x10¹¹ Jones at 7.9 μm (blue) and ~1x10¹¹ Jones at 10.2 μm (red) at 77K. [reprint (PDF)]
12.	Growth of GaInAs‐InP multiquantum wells on garnet (GGG=Gd3Ga5O12) substrate by metalorganic chemical vapor deposition M. Razeghi; P‐L. Meunier; P. Maurel M. Razeghi, P‐L. Meunier, P. Maurel; Growth of GaInAs‐InP multiquantum wells on garnet (GGG=Gd3Ga5O12) substrate by metalorganic chemical vapor deposition. J. Appl. Phys. 15 March 1986; 59 (6): 2261–2263-- March 15, 1986 ...[Visit Journal] Ga0.47In0.53As‐InP multiquantum wells grown by low‐pressure metalorganic chemical vapor deposition on garnet (GGG=Gd3Ga5O12 with a=12.383 Å) substrates are presented for the first time. The x‐ray diffraction pattern shows that the orientation of the epitaxial layer is (111) while the underlying substrate orientation is (100). The photoluminescence at 77 K is due to the GaInAs layers. [reprint (PDF)]
12.	Intersubband hole absorption in GaAs-GaInP Quantum Wells grown by Gas Source Molecular Beam Epitaxy J. Hoff, C. Jelen, S. Slivken, E. Michel, O. Duchemin, E. Bigan, and M. Razeghi with G. Brown and S.M. Hegde (Wright Laboratory) Applied Physics Letters 65 (9)-- August 29, 1994 ...[Visit Journal] P-doped GaAs‐GaInP quantum wells have been grown on GaAs substrate by gas source molecular beam epitaxy. Structural quality has been evidenced by x-ray diffraction. A narrow low-temperature photoluminescence full width at half‐maximum has been measured. Strong hole intersubband absorption has been observed at 9 μm, and its dependence on light polarization has been investigated. [reprint (PDF)]
12.	Stability of far fields in double heterostructure and multiple quantum well InAsSb/InPAsSb/InAs midinfrared lasers H. Yi, A. Rybaltowski, J. Diaz, D. Wu, B. Lane, Y. Xiao, and M. Razeghi Applied Physics Letters 70 (24)-- June 16, 1997 ...[Visit Journal] Far fields in perpendicular direction to the junction are investigated in double heterostructure (DH) and multiple quantum well (MQW) midwave-infrared InAsSb/InPAsSb/InAs lasers (λ = 3.2–3.6 μm). Strong broadening of the far fields in the DH lasers was observed with increases in temperature and/or current. On the contrary, MQW lasers with otherwise identical structure exhibit very stable far fields as narrow as 23° for all the operating conditions investigated. Our experiment and theoretical modeling suggest that these different behaviors of far fields in DH and MQW lasers are attributed to the refractive index fluctuation in the InAsSb laser active region. [reprint (PDF)]
12.	High-Performance Type-II InAs/GaSb Superlattice Photodiodes with Cutoff Wavelength Around 7 µm Y. Wei, A. Hood, H. Yau, V. Yazdanpanah, M. Razeghi, M.Z. Tidrow and V. Nathan Applied Physics Letters, 86 (9)-- February 28, 2005 ...[Visit Journal] We report the most recent result in the area of type-II InAs/GaSb superlattice photodiodes that have a cutoff wavelength around 7 µm at 77 K. Superlattice with a period of 40 Å lattice matched to GaSb was realized using Ga_xIn_1–x type interface engineering technique. Compared with significantly longer period superlattices, we have reduced the dark current density under reverse bias dramatically. For a 3 µm thick structure, using sulfide-based passivation, the dark current density reached 2.6×10^–5 A/cm² at –3 V reverse bias at 77 K. At this temperature the photodiodes have R₀A of 9300 Ω·cm² and a thermally limited zero bias detectivity of 1×10¹² cm·Hz^½/W. The 90%–10% cutoff energy width was only 16.5 meV. The devices did not show significant dark current change at 77 K after three months storage in the atmosphere. [reprint (PDF)]
12.	High Thermal Stability of κ-Ga2O3 Grown by MOCVD Junhee Lee, Honghyuk Kim, Lakshay Gautam and Manijeh Razeghi Lee, J.; Kim, H.; Gautam, L.; Razeghi, M. High Thermal Stability of κ-Ga2O3 Grown by MOCVD. Crystals 2021, 11, 446. https://doi.org/ 10.3390/cryst11040446 ...[Visit Journal] We report a high thermal stability of kappa gallium oxide grown on c-plane sapphire substrate by metal organic chemical vapor deposition. Kappa gallium oxide is widely known as a metastable polymorph transitioning its phase when subjected to a high temperature. Here, we show the kappa gallium oxide whose phase is stable in a high temperature annealing process at 1000 °C. These oxide films were grown at 690 °C under nitrogen carrier gas. The materials showed high electrical resistivity when doped with silicon, whereas the film conductivity was significantly improved when doped with both indium and silicon. This work provides a pathway to overcoming limitations for the advance in utilizing kappa gallium oxide possessing superior electrical characteristics. [reprint (PDF)]
12.	Generalized k·p perturbation theory for atomic-scale superlattices H. Yi and M. Razeghi Physical Review B 56 (7)-- August 15, 1997 ...[Visit Journal] We present a generalized k⋅p perturbation method that is applicable for atomic-scale superlattices. The present model is in good quantitative agreement with full band theories with local-density approximation, and approaches results of the conventional k⋅p perturbation method (i.e., Kane’s Hamiltonian) with the envelope function approximation for superlattices with large periods. The indirect band gap of AlAs/GaAs superlattices with short periods observed in experiments is explained using this method. [reprint (PDF)]
12.	MOCVD grown β-Ga₂O₃ metal-oxide-semiconductor field effect transistors on sapphire Ji-Hyeon Park , Ryan McClintock, Alexandre Jaud, Arash Dehzangi , Manijeh Razeghi Applied Physics Express 12, 095503-- August 28, 2019 ...[Visit Journal] We fabricated β-Ga₂O₃:Si metal-oxide field-effect transistors (MOSFETs) on c-plane sapphire substrates which typically showed maximum drain current of 100 mA·mm⁻¹. β-Ga₂O₃:Si thin films were realized on c-plane sapphire substrates through a combination of metalorganic chemical vapor deposition and post-annealing. The MOSFET device presented excellent on/off drain current ratio of ∼10¹¹ with very low gate leakage current, sharp pinch off behavior, and a breakdown voltage of 400 V at VG = −40 V. The growth and fabrication of β-Ga₂O₃:Si MOSFETs on c-plane sapphire is valuable to its demonstration of the great potential for future high-power electronic devices. [reprint (PDF)]
12.	Passivation of Type-II InAs/GaSb Superlattice Photodiodes A. Gin, Y. Wei, J. Bae, A. Hood, J. Nah, and M. Razeghi International Conference on Metallurgical Coatings and Thin Films (ICMCTF), San Diego, CA; Thin Solid Films 447-448-- January 30, 2004 ...[Visit Journal] Recently, excellent infrared detectors have been demonstrated using Type-II InAs/GaSb superlattice materials sensitive at wavelengths from 3 μm to greater than 32 μm. These results indicate that Type-II superlattice devices may challenge the preponderance of HgCdTe and other state-of-the-art infrared material systems. As such, surface passivation is becoming an increasingly important issue as progress is made towards the commercialization of Type-II devices and focal plane array applications. This work focuses on initial attempts at surface passivation of Type-II InAs/GaSb superlattice photodiodes using PECVD-grown thin layers of SiO₂. Our results indicate that silicon dioxide coatings deposited at various temperatures improve photodetector resistivity by several times. Furthermore, reverse-bias dark current has been reduced significantly in passivated devices. [reprint (PDF)]
12.	Background limited performance of long wavelength infrared focal plane arrays fabricated from M-structure InAs-GaSb superlattices P.Y. Delaunay, B.M. Nguyen, D. Hoffman, E.K. Huang, and M. Razeghi IEEE Journal of Quantum Electronics, Vol. 45, No. 2, p. 157-162.-- February 1, 2009 ...[Visit Journal] The recent introduction of a M-structure design improved both the dark current and R₀A performances of Type-II InAs-GaSb photodiodes. A focal plane array fabricated with this design was characterized at 81 K. The dark current of individual pixels was measured between 1.1 and 1.6 nA, 7 times lower than previous superlattice FPAs. This led to a higher dynamic range and longer integration times. The quantum efficiency of detectors without antireflective coating was 74%. The noise equivalent temperature difference reached 23 mK, limited only by the performance of the testing system and the read out integrated circuit. Background limited performances were demonstrated at 81 K for a 300 K background. [reprint (PDF)]
12.	Tunability of intersubband absorption from 4.5 to 5.3 µm in a GaN/Al_0.2Ga_0.8N superlattices grown by metalorganic chemical vapor deposition N. Péré-Laperne, C. Bayram, L. Nguyen-Thê, R. McClintock, and M. Razeghi Applied Physics Letters, Vol. 95, No. 13, p. 131109-- September 28, 2009 ...[Visit Journal] Intersubband (ISB) absorption at wavelengths as long as 5.3 µm is realized in GaN/Al_0.2Ga_0.8N superlattices grown by metalorganic chemical vapor deposition. By employing low aluminum content Al_0.2Ga_0.8N barriers and varying the well width from 2.6 to 5.1 nm, ISB absorption has been tuned from 4.5 to 5.3 µm. Theoretical ISB absorption and interband emission models are developed and compared to the experimental results. The effects of band offsets and the piezoelectric fields on these superlattices are investigated. [reprint (PDF)]
12.	Back-illuminated separate absorption and multiplication GaN avalanche photodiodes J.L. Pau, C. Bayram, R. McClintock, M. Razeghi and D. Silversmith Applied Physics Letters, Vol. 92, No. 10, p. 101120-1-- March 10, 2008 ...[Visit Journal] The performance of back-illuminated avalanche photodiodes with separate absorption and multiplication regions is presented. Devices with an active area of 225 µm² show a maximum multiplication gain of 41,200. The calculation of the noise equivalent power yields a minimum value of 3.3×10⁻¹⁴ W·Hz^−1/2 at a gain of 3000, increasing to 2.0×10⁻¹³ W·Hz^−1/2 at a gain of 41,200. The broadening of the response edge has been analyzed as a function of bias. [reprint (PDF)]
12.	Gain-length scaling in quantum dot/quantum well infrared photodetectors T. Yamanaka, B. Movaghar, S. Tsao, S. Kuboya, A. Myzaferi and M. Razeghi Virtual Journal of Nanoscale Science & Technology-- September 14, 2009 ...[Visit Journal][reprint (PDF)]
12.	First room‐temperature cw operation of a GaInAsP/InP light‐emitting diode on a silicon substrate M. Razeghi; R. Blondeau; M. Defour; F. Omnes; P. Maurel; F. Brillouet Appl. Phys. Lett. 53, 854–855 (1988)-- July 4, 1988 ...[Visit Journal] We report in this letter the first successful fabrication of an InP-GalnAsP light-emitting diode, emitting at 1.15 pm grown by low-pressure metalorganic chemical vapor deposition on a silicon substrate. The device has been operated under continuous wave operation at room temperature for 24 h (with an injection current of 200 rnA), and showed no degradation. [reprint (PDF)]
12.	Characterization of high quality GaInP/GaAs superlattices grown on GaAs and Si substrates by gas source molecular beam epitaxy C. Jelen, S. Slivken, X.G. He, and M. Razeghi and S. Shastry Journal of Vacuum Science and Technology B 12 (2)-- March 1, 1994 ...[Visit Journal] We report an analysis of the heteroepitaxial interfaces in high quality GaInP–GaAs superlattices grown simultaneously on GaAs and Si substrates by gas source molecular beam epitaxy. These two superlattices have been studied using high resolution x-ray diffraction measurements. Sharp superlattice satellites, with very little broadening, are observed within a 6° range for the sample on GaAs. Photoluminescence peaks with full widths at half-maximums of 5 and 7 meV are obtained at 4 K for samples with 58 Å wells on GaAs and Si, respectively. Room temperature exciton absorption is observed in the photovoltage measurements for a superlattice grown on Si substrate. The thicknesses determined by x-ray analysis are consistent with those obtained by a Kronig–Penny model fitting of the photovoltage spectroscopy. [reprint (PDF)]
12.	Temperature insensitivity of the Al-free InGaAsP/GaAs lasers for λ = 808 and 908 nm M. Razeghi, H. Yi, J. Diaz, S. Kim, and M. Erdtmann SPIE Conference, San Jose, CA; Proceedings 3001-- February 12, 1997 ...[Visit Journal] n this work, we present our recent achievements for the reliability of the Al-free lasers at high temperatures and high powers. Laser operations up to 30,000 hours were achieved without any degradation in the lasers characteristics from 7 randomly selected InGaAsP/GaAs diodes for λ = 808 nm. The test were performed for lasers without mirror-coating for optical power of 0.5 to 1 W CW at 50 approximately 60 °C. To the best of our knowledge, this is the first direct demonstration of the extremely high reliability of Al-free diodes operations at high powers and temperatures for periods of time much longer than practical need (approximately 3 years). The characteristics during the tests are discussed in detail. [reprint (PDF)]
12.	Recent advances in LWIR type-II InAs/GaSb superlattice photodetectors and focal plane arrays at the Center for Quantum Devices M. Razeghi, D. Hoffman, B.M. Nguyen, P.Y. Delaunay, E.K. Huang, and M.Z. Tidrow SPIE Porceedings, Vol. 6940, Orlando, FL 2008, p. 694009-- March 17, 2008 ...[Visit Journal] In recent years, Type-II InAs/GaSb superlattice photo-detectors have experienced significant improvements in material quality, structural designs, and imaging applications. They now appear to be a possible alternative to the state-of-the-art HgCdTe (MCT) technology in the long and very long wavelength infrared regimes. At the Center for Quantum Devices,we have successfully realized very high quantum efficiency, very high dynamic differential resistance R0A - product LWIR Type – II InAs/GaSb superlattice photodiodes with efficient surface passivation techniques. The demonstration of high quality LWIR Focal Plane Arrays that were 100 % fabricated in - house reaffirms the pioneer position of this university-based laboratory. [reprint (PDF)]
12.	Wafer-scale epitaxial lift-off of optoelectronic grade GaN from a GaN substrate using a sacrificial ZnO interlayer Akhil Rajan, David J Rogers, Cuong Ton-That, Liangchen Zhu, Matthew R Phillips, Suresh Sundaram, Simon Gautier, Tarik Moudakir, Youssef El-Gmili, Abdallah Ougazzaden, Vinod E Sandana, Ferechteh H Teherani, Philippe Bove, Kevin A Prior, Zakaria Djebbour, Ryan McClintock and Manijeh Razeghi Journal of Physics D: Applied Physics, Volume 49, Number 31 -- July 15, 2016 ...[Visit Journal] Full 2 inch GaN epilayers were lifted off GaN and c-sapphire substrates by preferential chemical dissolution of sacrificial ZnO underlayers. Modification of the standard epitaxial lift-off (ELO) process by supporting the wax host with a glass substrate proved key in enabling full wafer scale-up. Scanning electron microscopy and x-ray diffraction confirmed that intact epitaxial GaN had been transferred to the glass host. Depth-resolved cathodoluminescence (CL) analysis of the bottom surface of the lifted-off GaN layer revealed strong near-band-edge (3.33 eV) emission indicating a superior optical quality for the GaN which was lifted off the GaN substrate. This modified ELO approach demonstrates that previous theories proposing that wax host curling was necessary to keep the ELO etch channel open do not apply to the GaN/ZnO system. The unprecedented full wafer transfer of epitaxial GaN to an alternative support by ELO offers the perspective of accelerating industrial adoption of the expensive GaN substrate through cost-reducing recycling. [reprint (PDF)]
12.	Solar-blind AlGaN photodiodes with very low cutoff wavelength D. Walker, V. Kumar, K. Mi, P. Sandvik, P. Kung, X.H. Zhang, and M. Razeghi Applied Physics Letters 76 (4)-- January 24, 2000 ...[Visit Journal] We report the fabrication and characterization of AlxGa1–xN photodiodes (x~0.70) grown on sapphire by low-pressure metalorganic chemical vapor deposition. The peak responsivity for –5 V bias is 0.11 A/W at 232 nm, corresponding to an internal quantum efficiency greater than 90%. The device response drops four orders of magnitude by 275 nm and remains at low response for the entire near-ultraviolet and visible spectrum. Improvements were made to the device design including a semitransparent Ni/Au contact layer and a GaN:Mg cap layer, which dramatically increased device response by enhancing the carrier collection efficiency. [reprint (PDF)]
12.	High‐purity GaAs layers grown by low‐pressure metalorganic chemical vapor deposition M. Razeghi; F. Omnes; J. Nagle; M. Defour; O. Acher; P. Bove Appl. Phys. Lett. 55, 1677–1679 (1989)-- October 16, 1989 ...[Visit Journal] We report electrical and optical properties of very high purity GaAs epilayers grown by low‐pressure metalorganic chemical vapor deposition using AsH3 and triethylgallium as As and Ga sources. An electron mobility of 335 000 cm2/V s at 38 K has been measured for a 12‐μ‐thick layer. [reprint (PDF)]
12.	Electron spin resonance in the two-dimensional electron gas of a GaAs-Gax In1-xP heterostructure M DoberstS, J P Vierent, M RazeghiS, M DefourS and F Ornnes Semicond. Sci. Technol. 4 (1989) 687-690-- June 12, 1989 The microwave-induced change of the magnetoresistivity of GaAs-GalnP heterostructures reveals resonant structure which is attributed to electron spin resonance of the two-dimensional conduction electrons. The spin splitting of the two lowest Landau levels has been investigated as a function of the magnetic field. From these studies we obtain the dependence of the g-factor on the magnetic field and the Landau level. These results are compared with those obtained in GaAs-AIGaAs heterostructures. [reprint (PDF)]
12.	High operating temperature midwave infrared photodiodes and focal plane arrays based on type-II InAs/GaSb superlattices S. Abdollahi Pour, E.K. Huang, G. Chen, A. Haddadi, B.M. Nguyen and M. Razeghi Applied Physics Letters, Vol. 98, No. 14, p. 143501-1-- April 4, 2011 ...[Visit Journal] The dominant dark current mechanisms are identified and suppressed to improve the performance of midwave infrared InAs/GaSb Type-II superlattice photodiodes at high temperatures. The optimized heterojunction photodiode exhibits a quantum efficiency of 50% for 2 μm thick active region without any bias dependence. At 150 K, R₀A of 5100 Ω·cm² and specific detectivity of 1.05×10¹² cm·Hz^0.5·W^-1 are demonstrated for a 50% cutoff wavelength of 4.2 μm. Assuming 300 K background temperature and 2π field of view, the performance of the detector is background limited up to 180 K, which is improved by 25 °C compared to the homojunction photodiode. Infrared imaging using f/2.3 optics and an integration time of 10.02 ms demonstrates a noise equivalent temperature difference of 11 mK at operating temperatures below 120 K. [reprint (PDF)]

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