Center for Quantum Devices - Most Downloaded Journal Articles

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12.	GaN-based nanostructured photodetectors J.L. Pau, C. Bayram, P. Giedraitis, R. McClintock, and M. Razeghi SPIE Proceedings, San Jose, CA Volume 7222-14-- January 26, 2009 ...[Visit Journal] The use of nanostructures in semiconductor technology leads to the observation of new phenomena in device physics. Further quantum and non-quantum effects arise from the reduction of device dimension to a nanometric scale. In nanopillars, quantum confinement regime is only revealed when the lateral dimensions are lower than 50 nm. For larger mesoscopic systems, quantum effects are not observable but surface states play a key role and make the properties of nanostructured devices depart from those found in conventional devices. In this work, we present the fabrication of GaN nanostructured metal-semiconductor-metal (MSM) and p-i-n photodiodes (PIN PDs) by e-beam lithography, as well as the investigation of their photoelectrical properties at room temperature. The nanopillar height and diameter are about 520 nm and 200 nm, respectively. MSMs present dark currents densities of 0.4 A/cm² at ±100 V. A strong increase of the optical response with bias is observed, resulting in responsivities higher than 1 A/W. The relationship between this gain mechanism and surface states is discussed. PIN PDs yield peak responsivities (R_peak) of 35 mA/W at -4 V and show an abnormal increase of the response (R_peak > 100 A/W) under forward biases. [reprint (PDF)]
12.	Optical Investigations of GaAs-GaInP Quantum Wells Grown on the GaAs, InP, and Si Substrates H. Xiaoguang, M. Razeghi Applied Physics Letters 61 (14)-- October 5, 1992 ...[Visit Journal] We report the first photoluminescence investigation of GaAs‐Ga_0.51In_0.49P lattice matched multiquantum wells grown by the low pressure metalorganic chemical vapor deposition simultaneously in the same run on GaAs, Si, and InP substrates. The sharp photoluminescence peaks indicate the high quality of the samples on three different substrates. The temperature dependence of the photoluminescence indicates that the intrinsic excitonic transitions dominate at low temperature and free‐carrier recombinations at room temperature. The photoluminescence peaks of the samples grown on Si and InP substrates shift about 15 meV from the corresponding peaks of the sample grown on the GaAs substrate. Two possible interpretations are provided for the observed energy shift. One is the diffusion of In along the dislocation threads from GaInP to GaAs and another is the localized strain induced by defects and In segregations. [reprint (PDF)]
12.	Tunability of intersubband absorption from 4.5 to 5.3 µm in a GaN/Al_0.2Ga_0.8N superlattices grown by metalorganic chemical vapor deposition N. Péré-Laperne, C. Bayram, L. Nguyen-Thê, R. McClintock, and M. Razeghi Applied Physics Letters, Vol. 95, No. 13, p. 131109-- September 28, 2009 ...[Visit Journal] Intersubband (ISB) absorption at wavelengths as long as 5.3 µm is realized in GaN/Al_0.2Ga_0.8N superlattices grown by metalorganic chemical vapor deposition. By employing low aluminum content Al_0.2Ga_0.8N barriers and varying the well width from 2.6 to 5.1 nm, ISB absorption has been tuned from 4.5 to 5.3 µm. Theoretical ISB absorption and interband emission models are developed and compared to the experimental results. The effects of band offsets and the piezoelectric fields on these superlattices are investigated. [reprint (PDF)]
12.	A study into the impact of sapphire substrate orientation on the properties of nominally-undoped β-Ga2O3 thin films grown by pulsed laser deposition F. H. Teherani; D. J. Rogers; V. E. Sandana; P. Bove; C. Ton-That; L. L. C. Lem; E. Chikoidze; M. Neumann-Spallart; Y. Dumont; T. Huynh; M. R. Phillips; P. Chapon; R. McClintock; M. Razeghi Proceedings Volume 10105, Oxide-based Materials and Devices VIII; 101051R-- March 23, 2017 ...[Visit Journal] Nominally-undoped Ga2O3 layers were deposited on a-, c- and r-plane sapphire substrates using pulsed laser deposition. Conventional x-ray diffraction analysis for films grown on a- and c-plane sapphire showed the layers to be in the β-Ga2O3 phase with preferential orientation of the (-201) axis along the growth direction. Pole figures revealed the film grown on r-plane sapphire to also be in theβ-Ga2O3 phase but with epitaxial offsets of 29.5°, 38.5° and 64° from the growth direction for the (-201) axis. Optical transmission spectroscopy indicated that the bandgap was ~5.2eV, for all the layers and that the transparency was > 80% in the visible wavelength range. Four point collinear resistivity and Van der Pauw based Hall measurements revealed the β-Ga2O3 layer on r-plane sapphire to be 4 orders of magnitude more conducting than layers grown on a- and c-plane sapphire under similar conditions. The absolute values of conductivity, carrier mobility and carrier concentration for the β-Ga2O3 layer on r-sapphire (at 20Ω-1.cm-1, 6 cm2/Vs and 1.7 x 1019 cm-3, respectively) all exceeded values found in the literature for nominally-undoped β-Ga2O3 thin films by at least an order of magnitude. Gas discharge optical emission spectroscopy compositional depth profiling for common shallow donor impurities (Cl, F, Si and Sn) did not indicate any discernable increase in their concentrations compared to background levels in the sapphire substrate. It is proposed that the fundamentally anisotropic conductivity in β-Ga2O3 combined with the epitaxial offset of the (-201) axis observed for the layer grown on r-plane sapphire may explain the much larger carrier concentration, electrical conductivity and mobility compared with layers having the (-201) axis aligned along the growth direction. [reprint (PDF)]
12.	Investigation of the Heteroepitaxial Interfaces in the GaInP/GaAs Superlattices by High Resolution X-Ray Diffraction and Dynamical Solutions Xiaoguang He and Manijeh Razeghi Journal of Applied Physics 73 (7)-- April 1, 1993 ...[Visit Journal] Two GaAs/GaInP superlattices grown on GaAs substrates by low‐pressure metalorganic chemical vapor deposition have been studied using high resolution x‐ray diffraction measurements and simulations by solving Tagaki–Taupin equations. The strained layers at both interfaces of the GaAs well are identified from the simulations of the measured diffraction patterns. The purging of indium at the interface of GaInP/GaAs accounts for the strained layer at the GaInP/GaAs interface while the pressure difference in the gas lines, which results in the different traveling time to the sample surface, is attributed to the indium‐poor strained layer at the GaAs/GaInP interface. It is shown that high‐resolution x‐ray diffraction measurements combined with a dynamical simulation, are sensitive tools to study the heteroepitaxial interfaces on an atomic layer scale. In addition, the influence of a miscut of the substrate on the measurement is discussed in the article. It is shown that even though the miscut is small, the diffraction geometry is already an asymmetric one. More than 10% error in the superlattice period for a 2° miscut substrate can result when the miscut substrate is considered a symmetric geometry. [reprint (PDF)]
12.	Near bulk-limited R0A of long-wavelength infrared type-II InAs/GaSb superlattice photodiodes with polyimide surface passivation Andrew Hood, Pierre-Yves Delaunay, Darin Hoffman, Binh-Minh Nguyen, Yajun Wei, Manijeh Razeghi, and Vaidya Nathan Applied Physics Letters 90, 233513-- June 4, 2007 ...[Visit Journal] Effective surface passivation of Type-II InAs/GaSb superlattice photodiodes with cutoff wavelengths in the long-wavelength infrared is presented. A stable passivation layer, the electrical properties of which do not change as a function of the ambient environment nor time, has been prepared by a solvent-based surface preparation, vacuum desorption, and the application of an insulating polyimide layer. Passivated photodiodes, with dimensions ranging from 400×400 to 25×25 µm², with a cutoff wavelength of ~11 µm, exhibited near bulk-limited R₀A values of ~12 Ω·cm², surface resistivities in excess of 10⁴ Ω·cm, and very uniform current-voltage behavior at 77 K. [reprint (PDF)]
12.	High performance focal plane array based on type-II InAs/GaSb superlattice heterostructures P.Y. Delaunay and M. Razeghi SPIE Conference, January 20-25, 2008, San Jose, CA Proceedings – Quantum Sensing and Nanophotonic Devices V, Vol. 6900, p. 69000M-1-10.-- February 1, 2008 ...[Visit Journal] Recent progress in growth techniques, structure design and processing has lifted the performances of Type-II InAs/GaSb superlattice photodetectors. A double heterostructure design, based on a low band gap (11 µm) active region and high band gap (5 µm) superlattice contacts, reduced the sensitivity of the superlattice to surface effects. The heterodiodes with an 11 µm cutoff, passivated with SiO₂, presented similar performances to unpassivated devices and a one order of magnitude increase of the resistivity of the sidewalls, even after flip-chip bonding and underfill. Thanks to this new design and to the inversion of the polarity of the devices, a high performance focal plane array with an 11 µm cutoff was demonstrated. The noise equivalent temperature difference was measured as 26 mK and 19 mK for operating temperatures of 81 K and 67 K. At an integration time of 0.08 ms, the FPA presented a quantum efficiency superior to 50%. [reprint (PDF)]
12.	Back-illuminated separate absorption and multiplication GaN avalanche photodiodes J.L. Pau, C. Bayram, R. McClintock, M. Razeghi and D. Silversmith Applied Physics Letters, Vol. 92, No. 10, p. 101120-1-- March 10, 2008 ...[Visit Journal] The performance of back-illuminated avalanche photodiodes with separate absorption and multiplication regions is presented. Devices with an active area of 225 µm² show a maximum multiplication gain of 41,200. The calculation of the noise equivalent power yields a minimum value of 3.3×10⁻¹⁴ W·Hz^−1/2 at a gain of 3000, increasing to 2.0×10⁻¹³ W·Hz^−1/2 at a gain of 41,200. The broadening of the response edge has been analyzed as a function of bias. [reprint (PDF)]
12.	Crystallography of epitaxial growth of wurtzite-type thin films on sapphire substrates P. Kung, C.J. Sun, A. Saxler, H. Ohsato, and M. Razeghi Journal of Applied Physics 75 (9)-- May 1, 1994 ...[Visit Journal] In this article, we present a crystallographic model to describe the epitaxial growth of wurtzite‐type thin films such as gallium nitride (GaN) on different orientations of sapphire (Al2O3) substrates. Through this model, we demonstrate the thin films grown on (00⋅1)Al₂O₃ have a better epilayer‐substrate interface quality than those grown on (01⋅2)Al₂O₃. We also show the epilayer grown on (00⋅1)Al₂O₃ are gallium‐terminated, and both (00⋅1) and (01⋅2) surfaces of sapphire crystals are oxygen‐terminated. [reprint (PDF)]
12.	Scaling in back-illuminated GaN avalanche photodiodes K. Minder, J.L. Pau, R. McClintock, P. Kung, C. Bayram, M. Razeghi and D. Silversmith Applied Physics Letters, Vol. 91, No. 7, p. 073513-1-- August 13, 2007 ...[Visit Journal] Avalanche p-i-n photodiodes of various mesa areas were fabricated on AlN templates for back illumination for enhanced performance through hole-initiated multiplication, and the effects of increased area on device performance were studied. Avalanche multiplication was observed in mesa sizes up to 14,063 µm^2 under linear mode operation. Uniform gain and a linear increase of the dark current with area were demonstrated. [reprint (PDF)]
12.	Reliable GaN-based resonant tunneling diodes with reproducible room-temperature negative differential resistance C. Bayram, D.K. Sadana, Z. Vashaei and M. Razeghi SPIE Proceedings, Vol. 8268, p. 826827-- January 22, 2012 ...[Visit Journal] negative differential resistance (NDR). Compared to other negative resistance devices such as (Esaki) tunnel and transferred-electron devices, RTDs operate much faster and at higher temperatures. III-nitride materials, composed of AlGaInN alloys, have wide bandgap, high carrier mobility and thermal stability; making them ideal for high power high frequency RTDs. Moreover, larger conduction band discontinuity promise higher NDR than other materials (such as GaAs) and room-temperature operation. However, earlier efforts on GaN-based RTD structures have failed to achieve a reliable and reproducible NDR. Recently, we have demonstrated for the first time that minimizing dislocation density and eliminating the piezoelectric fields enable reliable and reproducible NDR in GaN-based RTDs even at room temperature. Observation of NDR under both forward and reverse bias as well as at room and low temperatures attribute the NDR behaviour to quantum tunneling. This demonstration marks an important milestone in exploring III-nitride quantum devices, and will pave the way towards fundamental quantum transport studies as well as for high frequency optoelectronic devices such as terahertz emitters based on oscillators and cascading structures. [reprint (PDF)]
12.	Demonstration of a 256x256 Middle-Wavelength Infrared Focal Plane Array based on InGaAs/InGaP Quantum Dot Infrared Photodetectors (QDIPs) J. Jiang, K. Mi, S. Tsao, W. Zhang, H. Lim, T.O'Sullivan, T. Sills, M. Razeghi, G.J. Brown, and M.Z. Tidrow Applied Physics Letters, 84 (13)-- April 29, 2004 ...[Visit Journal] We report a demonstration of an infrared focal plane array based on InGaAs/InGaP quantum dot infrared photodetectors. The middle-wavelength infrared quantum-dot infrared photodetector (QDIP) structure was grown via low-pressure metal organic chemical vapor deposition. A detectivity of 3.6×10¹⁰ cm·Hz^½/W was achieved at T = 95 K and a bias of –1.4 V. The background limited temperature of our QDIP was 140 K with a 45° field of view. A 256×256 detector array was fabricated with dry etching, and hybridized to a Litton readout chip by indium bumps. Thermal imaging was achieved at temperatures up to 120 K. At T = 77 K, the noise equivalent temperature difference was measured as 0.509 K with a 300 K background and f/2.3 optics. [reprint (PDF)]
12.	GaInN/GaN Multi-Quantum Well Laser Diodes Grown by Low-Pressure Metalorganic Chemical Vapor Deposition P. Kung, A. Saxler, D. Walker, A. Rybaltowski, X. Zhang, J. Diaz, and M. Razeghi MRS Internet Journal of Nitride Semiconductor Research 3 (1)-- January 1, 1998 ...[Visit Journal] We report the growth, fabrication and characterization of GaInN/GaN multi-quantum well lasers grown on (00·1) sapphire substrates by low pressure metalorganic chemical vapor deposition. The threshold current density of a 1800 µm long cavity length laser was 1.4 kA/cm² with a threshold voltage of 25 V. These lasers exhibited series resistances of 13 and 14 Ω at 300 and 79 K, respectively. [reprint (PDF)]
12.	Effect of the spin split-off band on optical absorption in p-type Ga1 xInxAsyP1-y quantum-well infrared detectors J.R. Hoff, M. Razeghi and G. Brown Physical Review B 54 (15)-- October 15, 1996 ...[Visit Journal] Experimental investigations of p-type Ga_1-xIn_xAs_yP_1-y quantum-well intersubband photodetectors (QWIP’s) led to the discovery of unique features in photoresponse spectra of these devices. In particular, the strong 2–5 μm photoresponse of these QWIP’s was not anticipated based on previous experimental and theoretical results for p-type GaAs/Al_xGa_1-xAs QWIP’s. Our theoretical modeling of p-type QWIP’s based on the Ga_1-xIn_xAs_yP_1-y system revealed that the intense short-wavelength photoresponse was due to a much stronger coupling to the spin-orbit split-off components in the continuum than occurs for GaAs/Al_xGa_1-xAs QWIP’s. Due to the strong influence of the spin split-off band, an eight-band Kane Hamiltonian was required to accurately model the measured photoresponse spectra. This theoretical model is first applied to a standard p-type GaAs/Al_0.3Ga_0.7As QWIP, and then to a series of GaAs/Ga_0.51In_0.49P, GaAs/Ga_0.62In_0.38As_0.22P_0.78, Ga_0.79In_0.21As_0.59P_0.41/Ga_0.51In_0.49P, and Ga_0.79In_0.21As_0.59P_0.41/Ga_0.62In_0.38As_0.22P_0.78 QWIP’s. Through this analysis, the insignificance of spin split-off absorption in GaAs/Al_xGa_1-xAs QWIP’s is verified, as is the dual role of light-hole extended-state and spin split-off hole-extended-state absorption on the spectral shape of Ga_1-xIn_xAs_yP_1-y QWIP’s. [reprint (PDF)]
12.	State-of-the-art Type II Antimonide-based superlattice photodiodes for infrared detection and imaging M. Razeghi, B.M. Nguyen, P.Y. Delaunay, E.K. Huang, S. Abdollahi Pour, P. Manurkar, and S. Bogdanov SPIE Proceedings, Nanophotonics and Macrophotonics for Space Environments II, San Diego, CA, Vol. 7467, p. 74670T-1-- August 5, 2009 ...[Visit Journal] Type-II InAs/GaSb Superlattice (SL), a system of multi interacting quantum wells was first introduced by Nobel Laureate L. Esaki in the 1970s. Since then, this low dimensional system has drawn a lot of attention for its attractive quantum mechanics properties and its grand potential for the emergence into the application world, especially in infrared detection. In recent years, Type-II InAs/GaSb superlattice photo-detectors have experienced significant improvements in material quality, structural designs and imaging applications which elevated the performances of Type-II InAs/GaSb superlattice photodetectors to a comparable level to the state-of-the-art Mercury Cadmium Telluride. We will present in this talk the current status of the state-of-the-art Type II superlattice photodetectors and focal plane arrays, and the future outlook for this material system. [reprint (PDF)]
12.	Gallium nitride on silicon for consumer & scalable photonics C. Bayram, K.T. Shiu, Y. Zhu, C.W. Cheng, D.K. Sadana, Z. Vashaei, E. Cicek, R. McClintock and M. Razeghi SPIE Proceedings, Vol. 8631, p. 863112-1, Photonics West, San Francisco, CA-- February 4, 2013 ...[Visit Journal] Gallium Nitride (GaN) is a unique material system that has been heavily exploited for photonic devices thanks to ultraviolet-to-terahertz spectral tunability. However, without a cost effective approach, GaN technology is limited to laboratory demonstrations and niche applications. In this investigation, integration of GaN on Silicon (100) substrates is attempted to enable widespread application of GaN based optoelectronics. Controlled local epitaxy of wurtzite phase GaN on on-axis Si(100) substrates is demonstrated via metal organic chemical vapor deposition (MOCVD). CMOS-compatible fabrication scheme is used to realize [SiO2-Si{111}-Si{100}] groove structures on conventional 200-mm Si(100) substrates. MOCVD growth (surface treatment, nucleation, initiation) conditions are studied to achieve controlled GaN epitaxy on such grooved Si(100) substrates. Scanning electron microscopy and transmission electron microscopy techniques are used to determine uniformity and defectivity of the GaN. Our results show that aforementioned groove structures along with optimized MOCVD growth conditions can be used to achieve controlled local epitaxy of wurtzite phase GaN on on-axis Si(100) substrates. [reprint (PDF)]
12.	Avalanche Photodetector Based on InAs/InSb Superlattice Arash Dehzangi, Jiakai Li, Lakshay Gautam and Manijeh Razeghi Quantum rep. 2020, 2(4), 591-599; https://doi.org/10.3390/quantum2040041 (registering DOI)-- December 4, 2020 ...[Visit Journal] This work demonstrates a mid-wavelength infrared InAs/InSb superlattice avalanche photodiode (APD). The superlattice APD structure was grown by molecular beam epitaxy on GaSb substrate. The device exhibits a 100 % cut-off wavelength of 4.6 µm at 150 K and 4.30 µm at 77 K. At 150 and 77 K, the device responsivity reaches peak values of 2.49 and 2.32 A/W at 3.75 µm under −1.0 V applied bias, respectively. The device reveals an electron dominated avalanching mechanism with a gain value of 6 at 150 K and 7.4 at 77 K which was observed under −6.5 V bias voltage. The gain value was measured at different temperatures and different diode sizes. The electron and hole impact ionization coefficients were calculated and compared to give a better prospect of the performance of the device. [reprint (PDF)]
12.	High performance Zn-diffused planar mid-wavelength infrared type-II InAs/InAs_1-xSb_x superlattice photodetector by MOCVD Donghai Wu, Arash Dehzangi, Jiakai Li, and Manijeh Razeghi Appl. Phys. Lett. 116, 161108-- April 21, 2020 ...[Visit Journal] We report a Zn-diffused planar mid-wavelength infrared photodetector based on type-II InAs/InAs_1-xSb_x superlattices. Both the superlattice growth and Zn diffusion were performed in a metal-organic chemical vapor deposition system. At 77K, the photodetector exhibits a peak responsivity of 0.70A/W at 3.65λ, corresponding to a quantum efﬁciency of 24% at zero bias without anti-reﬂection coating, with a 50% cutoff wavelength of 4.28λ. With an R₀A value of 3.2x10⁵ Ω·cm² and a dark current density of 9.6x10^-8 A/cm² bias of -20mV at 77K, the photodetector exhibits a speciﬁc detectivity of 2.9x10¹²cm·Hz^½/W. At 150K, the photodetector exhibits a dark current density of 9.1x10^-6 A/cm² and a quantum efﬁciency of 25%, resulting in a detectivity of 3.4x10¹¹cm·Hz/W. [reprint (PDF)]
12.	Gain and recombination dynamics in photodetectors made with quantum nanostructures: the quantum dot in a well and the quantum well B. Movaghar, S. Tsao, S. Abdollahi Pour, T. Yamanaka, and M. Razeghi Virtual Journal of Nanoscale Science & Technology, Vol. 18, No. 14-- October 6, 2008 ...[Visit Journal][reprint (PDF)]
12.	Metalorganic chemical vapor deposition of monocrystalline GaN thin films on β-LiGaO2substrates P. Kung, A. Saxler, X. Zhang, D. Walker, R. Lavado, and M. Razeghi Applied Physics Letters 69 (14)-- September 30, 1996 ...[Visit Journal] We report the metalorganic chemical vapor deposition growth and characterization of monocrystalline GaN thin films on β-LiGaO₂ substrates. The influence of the growth temperature on the crystal quality was studied. The structural, electrical, and optical properties of the films were assessed through scanning electron microscopy, x-ray diffraction, Hall measurements, optical transmission, photoluminescence. [reprint (PDF)]
12.	ZnO nanorod electrodes for hydrogen evolution and storage Harinipriya, S.; Usmani, B.; Rogers, D. J.; Sandana, V. E.; Teherani, F. Hosseini; Lusson, A.; Bove, P.; Drouhin, H.-J.; Razeghi, M. Proc. SPIE 8263, Oxide-based Materials and Devices III, 82631Y (February 9, 2012)-- February 9, 2012 ...[Visit Journal] Due to the attractive combination of a relatively high specific heat of combustion with a large specific energy capacity, molecular hydrogen (H2) is being investigated for use as an alternative to fossil fuels. Energy-efficient H₂ production and safe storage remain key technical obstacles to implementation of an H₂ based economy, however. ZnO has been investigated for use as an alternative photocatalytic electrode to TiO₂ for solarpowered photo-electro-chemical (PEC) electrolysis, in which H₂ is generated by direct water splitting in a cell with a metal cathode and a semiconducting anode. In this investigation, ZnO NR grown on Si (100) substrates by pulsed laser deposition were investigated for use as electrodes in the Hydrogen Evolution Reaction (HER). The electrochemical potential and Fermi energy of the ZnO NR were estimated from the electrochemical current density in acid and alkaline solutions via phenomenological thermodynamic analysis. As well as acting as an effective electrocalytic cathode, the ZnO NR appear to operate as a hydrogen reservoir. These results indicate that the ZnO NR have excellent potential for the storage of evolved H₂. [reprint (PDF)]
12.	Evaluating the size-dependent quantum efficiency loss in a SiO₂-Y₂O₃hybrid gated type-II InAs/GaSb long-infrared photodetector array G. Chen , A. M. Hoang , and M. Razeghi Applied Physics Letters 104 , 103509 (2014)-- March 14, 2014 ...[Visit Journal] Growing Y₂O₃ on 20 nm SiO₂ to passivate a 11 μm 50% cut-off wavelength long-wavelength infrared type-II superlattice gated photodetector array reduces its saturated gate bias (VG_sat ) to −7 V. Size-dependent quantum efficiency (QE) losses are evaluated from 400 μm to 57 μm size gated photodiode. Evolution of QE of the 57 μm gated photodiode with gate bias and diode operation bias reveals different surface recombination mechanisms. At 77 K and VG,sat , the 57 μm gated photodiode exhibits QE enhancement from 53% to 63%, and it has 1.2 × 10⁻⁵ A/cm² dark current density at −200 mV, and a specific detectivity of 2.3 × 10¹² Jones. [reprint (PDF)]
12.	Room temperature continuous wave operation of quantum cascade lasers with watt-level optical power Y. Bai, S.R. Darvish, S. Slivken, W. Zhang, A. Evans, J. Nguyen and M. Razeghi Applied Physics Letters, Vol. 92, No. 10, p. 101105-1-- March 10, 2008 ...[Visit Journal] We demonstrate quantum cascade lasers at an emitting wavelength of 4.6 µm, which are capable of room temperature, high power continuous wave (cw) operation. Buried ridge geometry with a width of 9.8 µm was utilized. A device with a 3 mm cavity length that was epilayer-down bonded on a diamond submount exhibited a maximum output power of 1.3 W at room temperature in cw operation. The maximum output power at 80 K was measured to be 4 W, with a wall plug efficiency of 27%. [reprint (PDF)]
12.	Quantum Sensing Using Type-II InAs/GaSb Superlattice for Infrared Detection M. Razeghi, A. Gin, Y. Wei, J. Bae, and J. Nah Microelectronics Journal, 34 (5-8)-- May 1, 2003 ...[Visit Journal] Large, regular arrays of bulk GaSb and InAs/GaSb Type-II superlattice pillars have been fabricated by electron beam lithography and dry etching. A 2.5 keV electron beam lithography system and metal evaporation are used to form the Au mask on superlattice and bulk substrates. Dry etching of these materials has been developed with BCl3:Ar, CH4:H2:Ar and cyclic CH₄:H₂:Ar/O₂ plasmas. Etch temperatures were varied from 20 to 150 °C. The diameter of the superlattice pillars was below 50 nm with regular 200 nm spacing. Bulk GaSb pillars were etched with diameters below 20 nm. Areas of dense nanopillars as large as 500 μm×500 μm were fabricated. The best height/diameter aspect ratio was approximately 10:1. To date, these are the smallest diameter III–V superlattice pillar structures reported, and the first nanopillars in the InAs/GaSb material system. The basic theory of these devices and surface passivation with SiO₂ and Si₃N₄ thin films has also been discussed. [reprint (PDF)]
12.	High-speed, low-noise metal-semiconductor-metal ultraviolet photodetectors based on GaN D. Walker, E. Monroy, P. Kung, J. Wu, M. Hamilton, F.J. Sanchez, J. Diaz, and M. Razeghi Applied Physics Letters 74 (5)-- February 1, 1999 ...[Visit Journal] We present the fabrication and characterization of nonintentionally doped GaN and GaN:Mg Schottky metal–semiconductor–metal (MSM) photodetectors, grown on sapphire by metalorganic chemical vapor deposition. Low-leakage, Schottky contacts were made with Pt/Au. The devices are visible blind, with an ultraviolet/green contrast of about five orders of magnitude. The response times of the MSM devices were <10 ns and about 200 ns for GaN and GaN:Mg, respectively. The noise power spectral density remains below the background level of the system (10−24 A²/Hz) up to 5 V, for the undoped GaN MSM detector. [reprint (PDF)]

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