Center for Quantum Devices - Most Downloaded Journal Articles

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1.	Temperature dependence of the quantized Hall effect H. P. Wei, A. M. Chang, and D. C. Tsui M. Razeghi Phys. Rev. B 32, 7016(R) 1985-- November 15, 1985 ...[Visit Journal] We reported detailed measurements of the temperature dependence of the quantized Hall effect from 4.2 to 50 K in the i=2 plateau region in InGaAs-InP. We deduce from the data that there is a significant density of localized states between the two Landau levels, with a value of ∼1×1010 cm−2 meV−1 at the middle of the mobility gap. We also found that the correlations between 𝜎xx and 𝜎xy show the trend predicted by the recent two-parameter scaling theory of localization in quantized Hall effect. [reprint (PDF)]
1.	Evaluating the size-dependent quantum efficiency loss in a SiO₂-Y₂O₃hybrid gated type-II InAs/GaSb long-infrared photodetector array G. Chen , A. M. Hoang , and M. Razeghi Applied Physics Letters 104 , 103509 (2014)-- March 14, 2014 ...[Visit Journal] Growing Y₂O₃ on 20 nm SiO₂ to passivate a 11 μm 50% cut-off wavelength long-wavelength infrared type-II superlattice gated photodetector array reduces its saturated gate bias (VG_sat ) to −7 V. Size-dependent quantum efficiency (QE) losses are evaluated from 400 μm to 57 μm size gated photodiode. Evolution of QE of the 57 μm gated photodiode with gate bias and diode operation bias reveals different surface recombination mechanisms. At 77 K and VG,sat , the 57 μm gated photodiode exhibits QE enhancement from 53% to 63%, and it has 1.2 × 10⁻⁵ A/cm² dark current density at −200 mV, and a specific detectivity of 2.3 × 10¹² Jones. [reprint (PDF)]
1.	*High quality AlN and GaN epilayers grown on (001) sapphire, (100) and (111) silicon substrates P. Kung, A. Saxler, X. Zhang, D. Walker, T.C. Wang, I. Ferguson, and M. Razeghi Applied Physics Letters 66 (22)-- May 29, 1995** ...[Visit Journal] The growth of high quality AlN and GaN thin films on basal plane sapphire, (100), and (111) silicon substrates is reported using low pressure metalorganic chemical vapor deposition. X-ray rocking curve linewidths of about 100 and 30 arcsec were obtained for AlN and GaN on sapphire, respectively. Room‐temperature optical transmission and photoluminescence (of GaN) measurements confirmed the high quality of the films. The luminescence at 300 and 77 K of the GaN films grown on basal plane sapphire, (100), and (111) silicon was compared. [reprint (PDF)]
1.	Mid‑wavelength infrared avalanche photodetector with AlAsSb/GaSb superlattice Jiakai Li, Arash Dehzangi, Gail Brown, Manijeh Razeghi Scientifc Reports \| (2021) 11:7104 \| https://doi.org/10.1038/s41598-021-86566-8 ...[Visit Journal] In this work, a mid-wavelength infrared separate absorption and multiplication avalanche photodiode (SAM-APD) with 100% cut-of wavelength of ~ 5.0 µm at 200 K grown by molecular beam epitaxy was demonstrated. The InAsSb-based SAM-APD device was designed to have electron dominated avalanche mechanism via the band structure engineered multi-quantum well structure based on AlAsSb/GaSb H-structure superlattice and InAsSb material in the multiplication region. The device exhibits a maximum multiplication gain of 29 at 200 K under -14.7 bias voltage. The maximum multiplication gain value for the MWIR SAM-APD increases from 29 at 200 K to 121 at 150 K. The electron and hole impact ionization coefficients were derived and the large difference between their value was observed. The carrier ionization ratio for the MWIR SAM-APD device was calculated to be ~ 0.097 at 200 K. [reprint (PDF)]
1.	Avalanche Photodetector Based on InAs/InSb Superlattice Arash Dehzangi, Jiakai Li, Lakshay Gautam and Manijeh Razeghi Quantum rep. 2020, 2(4), 591-599; https://doi.org/10.3390/quantum2040041 (registering DOI)-- December 4, 2020 ...[Visit Journal] This work demonstrates a mid-wavelength infrared InAs/InSb superlattice avalanche photodiode (APD). The superlattice APD structure was grown by molecular beam epitaxy on GaSb substrate. The device exhibits a 100 % cut-off wavelength of 4.6 µm at 150 K and 4.30 µm at 77 K. At 150 and 77 K, the device responsivity reaches peak values of 2.49 and 2.32 A/W at 3.75 µm under −1.0 V applied bias, respectively. The device reveals an electron dominated avalanching mechanism with a gain value of 6 at 150 K and 7.4 at 77 K which was observed under −6.5 V bias voltage. The gain value was measured at different temperatures and different diode sizes. The electron and hole impact ionization coefficients were calculated and compared to give a better prospect of the performance of the device. [reprint (PDF)]
1.	Structural and compositional characterization of MOVPE GaN thin films transferred from sapphire to glass substrates using chemical lift-off and room temperature direct wafer bonding and GaN wafer scale MOVPE growth on ZnO-buffered sapphire S. Gautier, T. Moudakir, G. Patriarche, D.J. Rogers, V.E. Sandana, F. Hosseini Teherani, P. Bove, Y. El Gmili, K. Pantzas, Suresh Sundaram, D. Troadec, P.L. Voss, M. Razeghi, A. Ougazzaden Journal of Crystal Growth, Volume 370, Pages 63-67 (2013)-- May 1, 2013 ...[Visit Journal] GaN thin films were grown on ZnO/c-Al₂O₃ with excellent uniformity over 2 in. diameter wafers using a low temperature/pressure MOVPE process with N₂ as a carrier and dimethylhydrazine as an N source. 5 mm×5 mm sections of similar GaN layers were direct-fusion-bonded onto soda lime glass substrates after chemical lift-off from the sapphire substrates. X-Ray Diffraction, Scanning Electron Microscopy and Transmission Electron Microscopy confirmed the bonding of crack-free wurtzite GaN films onto a glass substrate with a very good quality of interface, i.e. continuous/uniform adherence and absence of voids or particle inclusions. Using this approach, (In) GaN based devices can be lifted-off expensive single crystal substrates and bonded onto supports with a better cost-performance profile. Moreover, the approach offers the possibility of reclaiming the expensive sapphire substrate so it can be utilized again for growth. [reprint (PDF)]
1.	On the performance and surface passivation of type-II InAs/GaSb superlattice photodiodes for the very-long- wavelength infrared A. Hood, M. Razeghi, E. Aifer, G.J. Brown Applied Physics Letters 87 (1)-- October 10, 2005 ...[Visit Journal] We demonstrate very-long-wavelength infrared Type-II InAs/GaSb superlattice photodiodes with a cutoff wavelength (λ_c,50%) of 17 μm. We observed a zero-bias, peak Johnson noise-limited detectivity of 7.63×10⁹ cm·Hz^½/W at 77 K with a 90%-10% cutoff width of 17 meV, and quantum efficiency of 30%. Variable area diode zero-bias resistance-area product (R₀A) measurements indicated that silicon dioxide passivation increased surface resistivity by nearly a factor of 5, over unpassivated photodiodes, and increased overall R₀A uniformity. The bulk R₀A at 77 K was found to be 0.08 Ω·cm², with RA increasing more than twofold at 25 mV reverse bias. [reprint (PDF)]
1.	Growth of “moth-eye” ZnO nanostructures on Si(111), c-Al2O3, ZnO and steel substrates by pulsed laser deposition Vinod E. Sandana, David J. Rogers, Ferechteh Hosseini Teherani, Philippe Bove, Michael Molinari, Michel Troyon, Alain Largeteau, Gérard Demazeau, Colin Scott, Gaelle Orsal, Henri-Jean Drouhin, Abdallah Ougazzaden, Manijeh Razeghi Phys. Status Solidi C., 1-5 (2013)-- August 6, 2013 ...[Visit Journal] Self-forming, vertically-aligned, arrays of black-body-like ZnO moth-eye nanostructures were grown on Si(111), c-Al₂O₃, ZnO and high manganese austenitic steel substrates using Pulsed Laser Deposition. X-ray diffraction (XRD) revealed the nanostructures to be well-crystallised wurtzite ZnO with strong preferential c-axis crystallographic orientation along the growth direction for all the substrates. Cathodoluminescence (CL) studies revealed emission characteristic of the ZnO near band edge for all substrates. Such moth-eye nanostructures have a graded effective refractive index and exhibit black-body characteristics. Coatings with these features may offer improvements in photovoltaic and LED performance. Moreover, since ZnO nanostructures can be grown readily on a wide range of substrates it is suggested that such an approach could facilitate growth of GaN-based devices on mismatched and/or technologically important substrates, which may have been inaccessible till present. [reprint (PDF)]
1.	Monolithic integrated photoreceiver for 1.3–1.55‐μm wavelengths: Association of a Schottky photodiode and a field‐effect transistor on GaInP‐GaInAs heteroepitaxy A. Hosseini Therani; D. Decoster; J. P. Vilcot; M. Razeghi J. Appl. Phys. 64, 2215–2218 (1988) -- March 24, 1988 ...[Visit Journal] We present a monolithic integrated circuit associating a Schottky photodiode and a field-effect transistor which has been fabricated, for the first time, on G8.0.49 InO.51 P /GaO,47 Ino.53 As strained heteroepitaxiaI material. Static, dynamic, and noise properties of the Schottky photodiode, the field-effect transistor, and the integrated circuit have been investigated and are reported. As an example, dynamic responsivity up to 50 A/W can be achieved at 1.3-pm wavelength for the integrated photoreceiver. The performance of the device is discussed, taking into account the integrated circuit design and the main characteristics of the material. [reprint (PDF)]
1.	Improved performance of quantum cascade lasers via manufacturable quality epitaxial side down mounting process utilizing aluminum nitride heatsinks A. Tsekoun, R. Go, M. Pushkarsky, M. Razeghi, C.K.N. Patel SPIE Conference, San Jose, CA, Vol. 6127, pp. 612702-- January 23, 2006 ...[Visit Journal] We report substantially improved performance of high power quantum cascade lasers by utilizing epi-side down mounting that provides superior heat dissipation properties. We have obtained CW power output of 450 mW at 20°C from mid-IR QCLs. The improved thermal management achieved with epi-side down mounting has also permitted us to carry out initial lifetime tests on the mid-IR QCLs. No degradation of power output is seen even after over 300 hours of CW operation at 25°C with power output in excess of 300 mW. We believe these improvements should permit incorporation of mid-IR QCLs in reliable instrumentation. [reprint (PDF)]
1.	Reliability of strain-balanced Ga_0.331In_0.669As/Al_0.659In_0.341As/InP quantum-cascade lasers under continuous-wave room-temperature operation A. Evans and M. Razeghi Applied Physics Letters, 88 (26)-- June 26, 2006 ...[Visit Journal] Constant current aging is reported for two randomly selected high-reflectivity-coated QCLs with an output power over 100 mW. QCLs are tested under continuous-wave operation at a heat sink temperature of 298 K(25 °C) corresponding to an internal temperature of 378 K (105 °C). Over 4000 h of continuous testing is reported without any decrease in output power. [reprint (PDF)]
1.	-- November 30, 1999
1.	Comparison of ultraviolet APDs grown on free-standing GaN and sapphire substrates E. Cicek, Z. Vashaei, C. Bayram, R. McClintock, M. Razeghi and M. Ulmer Proceedings, Vol. 7780, p. 77801P, SPIE Optics and Photonics Symposium, Conference on Detectors and Imaging Devices: Infrared, Focal Plane and Single Photon, San Diego, CA -- August 4, 2010 ...[Visit Journal] There is a need for semiconductor-based ultraviolet photodetectors to support avalanche gain in order to realize better performance andmore effective compete with existing technologies. Wide bandgap III-Nitride semiconductors are the promising material system for the development of avalanche photodiodes (APDs) that could be a viable alternative to current bulky UV detectors such as photomultiplier tubes. In this paper, we review the current state-of-the-art in IIINitride visible-blind APDs, and present our latest results on GaN APDs grown on both conventional sapphire and low dislocation density free-standing c- and m-plane GaN substrates. Leakage current, gain, and single photon detection efficiency (SPDE) of these APDs were compared. The spectral response and Geiger-mode photon counting performance of UV APDs are studied under low photon fluxes, with single photon detection capabilities as much as 30% being demonstrated in smaller devices. Geiger-mode operation conditions are optimized for enhanced SPDE. [reprint (PDF)]
1.	Optical and crystallographic properties and impurity incorporation of GaxIn1−xAs grown by liquid phase epitaxy, vapor phase epitaxy, and metal organic chemical vapor deposition K.‐H. Goetz; D. Bimberg; H. Jürgensen; J. Selders; A. V. Solomonov; G. F. Glinskii; M. Razeghi K.‐H. Goetz, D. Bimberg, H. Jürgensen, J. Selders, A. V. Solomonov, G. F. Glinskii, M. Razeghi; Optical and crystallographic properties and impurity incorporation of GaxIn1−xAs (0.44March 29, 1983 ...[Visit Journal] Optical, crystallographic, and transport properties of nominally undoped n‐type and Zn doped p‐type Gax In1−xAs /InP (0.44 [reprint (PDF)]
1.	1.2–1.6 μm GaxIn1−xAsyP1−y-InP DH lasers grown by LPMOCVD M. Razeghi, B. de Crémoux, J.P. Duchemin M. Razeghi, B. de Crémoux, J.P. Duchemin, 1.2–1.6 μm GaxIn1−xAsyP1−y-InP DH lasers grown by LPMOCVD, Journal of Crystal Growth, Volume 68, Issue 1, 1984, Pages 389-397,-- September 1, 1984 ...[Visit Journal] Room temperature pulse operation and continuous wave (CW) operation in the 1.2–1.6 μm region have been achieved in GaInAsP-InP DH lasers fabricated on material grown by LPMOCVD. Threshold currents density as low as 430 A/cm2 (cavity length of 950 μm) have been measured for devices emitting at 1.3 μm. Threshold current densities of 1060 A/cm2 (cavity length of 400 μm) have been obtained for devices emitting at 1.55 μm, with active layer thicknesses of 0.22 μm. Values of T0 between 60 and 70 K have been obtained. Fundamental transverse mode oscillation has been achieved (for CW operation) up to an output power of 10 mW. The preliminary results on the aging test are most encouraging and demonstrate that the LPMOCVD lasers emitting at 1.2–1.6 μm have comparable degradation rates to those of LPE lasers suggesting the LPMOCVD technique is promising for large scale production of laser diodes. [reprint (PDF)]
1.	Background–limited long wavelength infrared InAs/InAsSb type-II superlattice-based photodetectors operating at 110 K Abbas Haddadi, Arash Dehzangi, Sourav Adhikary, Romain Chevallier, and Manijeh Razeghi APL Materials 5, 035502 -- February 13, 2017 ...[Visit Journal] We report the demonstration of high-performance long-wavelength infrared (LWIR) nBn photodetectors based on InAs/InAsSb type-II superlattices. A new saw-tooth superlattice design was used to implement the electron barrier of the photodetectors. The device exhibited a cut-off wavelength of ∼10 μm at 77 K. The photodetector exhibited a peak responsivity of 2.65 A/W, corresponding to a quantum efficiency of 43%. With an R × A of 664 Ω·cm² and a dark current density of 8 × 10⁻⁵ A/cm², under −80 mV bias voltage at 77 K, the photodetector exhibited a specific detectivity of 4.72 × 10¹¹ Jones and a background–limited operating temperature of 110 K. [reprint (PDF)]
1.	Current status of high performance quantum cascade lasers at the center for quantum devices M. Razeghi; A. Evans; Y. Bai; J. Nguyen; S. Slivken; S.R. Darvish; K. Mi Conference Proceedings - International Conference on Indium Phosphide and Related Materials. 588-593:[4266015] (2007)-- May 14, 2007 ...[Visit Journal] Mid-infrared laser sources are highly desired for laser-based trace chemical sensors, military countermeasures, free-space communications, as well as developing medical applications. While application development has been limited by the availability of adequate mid-infrared sources, InP-based quantum cascade lasers (QCLs) hold promise as inexpensive, miniature, portable solutions capable of producing high powers and operating at high temperatures with excellent beam quality and superior reliability. This paper discusses the most recent developments of application-ready high power (> 100 mW), continuous-wave (CW), mid-infrared QCLs operating above room temperature with lifetimes exceeding 13,000 hours. [reprint (PDF)]
1.	Ultraviolet avalanche photodiodes Ryan McClintock ; Manijeh Razeghi Proc. SPIE 9555, Optical Sensing, Imaging, and Photon Counting: Nanostructured Devices and Applications, 95550B -- August 28, 2015 ...[Visit Journal] The III-Nitride material system is rapidly maturing; having proved itself as a material for LEDs and laser, and now finding use in the area of UV photodetectors. However, many UV applications are still dominated by the use of photomultiplier tubes (PMT). PMTs are capable of obtaining very high sensitivity using internal electron multiplication gain (typically ~106). It is highly desirable to develop a compact semiconductor-based photodetector capable of realizing this level of sensitivity. In principle, this can be obtained in III-Nitrides by taking advantage of avalanche multiplication under high electric fields – typically 2.7 MV/cm, which with proper design can correspond to an external reverse bias of less than 100 volts. In this talk, we review the current state-of-the-art in III-Nitride solar- and visible-blind APDs, and present our latest results on GaN APDs grown on both conventional sapphire and low dislocation density free-standing c- and m-plane GaN substrates. Leakage current, gain, and single photon detection efficiency (SPDE) of these APDs were compared. The spectral response and Geiger-mode photon counting performance of UV APDs are studied under low photon fluxes, with single photon detection capabilities as much as 30% being demonstrated in smaller devices. Geiger-mode operation conditions are optimized for enhanced SPDE. [reprint (PDF)]
1.	Short Wavelength (λ~ 4.3 μm) High-Performance Continuous-Wave Quantum-Cascade Lasers J.S. Yu, A. Evans, S. Slivken, S.R. Darvish, and M. Razeghi IEEE Photonics Technology Letters, 17 (6)-- June 1, 2005 ...[Visit Journal] We report continuous-wave (CW) operation of a 4.3-μm quantum-cascade laser from 80 K to 313 K. For a high-reflectivity-coated 11-μm-wide and 4-mm-long laser, CW output powers of 1.34 W at 80 K and 26 mW at 313 K are achieved. At 298 K, the CW threshold current density of 1.5 kA/cm² is observed with a CW output power of 166 mW and maximum wall-plug efficiency of 1.47%. The CW emission wavelength varies from 4.15 μm at 80 K to 4.34 μm at 298 K, corresponding to a temperature-tuning rate of 0.87 nm/K. The beam full-width at half-maximum values for the parallel and the perpendicular far-field patterns are 26° and 49° in CW mode, respectively. [reprint (PDF)]
1.	Electrical Characterization of Al_xGa_1-xN for UV Photodetector Applications A. Saxler, M. Ahoujja, W.C. Mitchel, P. Kung, D. Walker, and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] Ultraviolet photodetectors have many military and commercial applications. However, for many of these applications, the photodetectors must be solar blind. This means that the photodetectors must have a cutoff wavelength of less than about 270 nm. Semiconductor based devices would then need energy gaps of over 4.6 eV. In the Al_xGa_1-xN system, the aluminum mole fraction, x, required is over 40%. As the energy gap is increased, doping becomes much more difficult, especially p-type doping. This report is a study of the electrical properties of Al_xGa_1-xN to enable better control of the doping. Magnesium doped p-type Al_xGa_1-xN has been studied using high-temperature Hall effect measurements. The acceptor ionization energy has been found to increase substantially with the aluminum content. Short-period superlattices consisting of alternating layers of GaN:Mg and AlGaN:Mg were also grown by low-pressure organometallic vapor phase epitaxy. The electrical properties of these superlattices were measured as a function of temperature and compared to conventional AlGaN:Mg layers. It is shown that the optical absorption edge can be shifted to shorter wavelengths while lowering the acceptor ionization energy by using short- period superlattice structures instead of bulk-like AlGaN:Mg. Silicon doped n-type films have also been studied. [reprint (PDF)]
1.	Background Limited Performance in p-doped GaAs/Ga[0.71]In[0.29]As[0.39]P[0.61] Quantum Well Infrared Photodetectors J. Hoff, S. Kim, M. Erdtmann, R. Williams, J. Piotrowski, E. Bigan, M. Razeghi and G. Brown Applied Physics Letters 67 (1)-- July 3, 1995 ...[Visit Journal] Background limited infrared photodetection has been achieved up to 100 K at normal incidence with p-type GaAs/Ga_0.71In_0.29As_0.39P_0.61 quantum well intersubband photodetectors grown by low-pressure metalorganic chemical vapor deposition. Photoresponse covers the wavelength range from 2.5 μm up to 7 μm. The device shows photovoltaic response, the cutoff wavelength increases slightly with bias, and the responsivity increases nonlinearly with bias. These effects are attributed to an asymmetric quantum well profile. [reprint (PDF)]
1.	High performance GaAs/GaInP heterostructure bipolar transistors grown by low-pressure metal-organic chemical vapour deposition M Razeghi, F Omnes, M Defour, P Maurel, J Hu, E Wolk and D Pavlidis M Razeghi et al 1990 Semicond. Sci. Technol. 5 278-- December 11, 1989 ...[Visit Journal] The authors report the fabrication of high-quality GaAs/GaInP n-p-n heterojunction bipolar transistors grown by low-pressure metal-organic chemical vapour deposition on semi-insulating substrates. Various structures with homogeneous and graded bases have been fabricated. Doping profiles together with X-ray double diffraction patterns demonstrate the excellent control of growth parameters such as thicknesses, doping levels and interface quality. The static characteristics of the devices show current gains as high as 400, which is the highest value reported in that system [reprint (PDF)]
1.	Nickel oxide growth on Si (111), c-Al₂O₃ and FTO/glass by pulsed laser deposition V. E. Sandana ; D. J. Rogers ; F. Hosseini Teherani ; P. Bove ; R. McClintock ; M. Razeghi 03/07/2014-- March 7, 2014 ...[Visit Journal] NiO was grown on Si (111), c-Al₂O₃ and FTO/glass substrates by pulsed laser deposition (PLD). X-Ray Diffraction (XRD) and scanning electron microscope (SEM) studies revealed that layers grown on c-Al₂O₃ were fcc NiO with a dense morphology of cubic grains that were strongly (111) oriented along the growth direction. The relatively low ω rocking curve linewidth, of 0.12°suggests that there may have been epitaxial growth on the c-Al₂O₃ substrate. XRD and SEM indicated that films grown on Si (111) were also fcc NiO, with cubic grains, but that the grain orientation was random. This is consistent with the presence of an amorphous SiO₂ layer at the surface of the Si substrate, which precluded epitaxial growth. NiO grown at lower temperature (200°C) on temperature-sensitive FTO/glass substrates showed no evidence of crystallinity in XRD and SEM studies. After flash annealing in air, however, peaks characteristic of randomly oriented fcc NiO appeared in the XRD scans and the surface morphology became more granular in appearance. Such layers appear promising for the development of future dye-sensitised solar cell devices based on NiO grown by PLD. [reprint (PDF)]
1.	High-detectivity quantum-dot infrared photodetectors grown by metal-organic chemical-vapor deposition J. Szafraniec, S. Tsao, W. Zhang, H. Lim, M. Taguchi, A.A. Quivy, B. Movaghar and M. Razeghi Applied Physics Letters 88 (121102)-- March 20, 2006 ...[Visit Journal] A mid-wavelength infrared photodetector based on InGaAs quantum dots buried in an InGaP matrix and deposited on a GaAs substrate was demonstrated. Its photoresponse at T=77 K was measured to be around 4.7 μm with a cutoff at 5.5 μm. Due to the high peak responsivity of 1.2 A/W and low dark-current noise of the device, a specific peak detectivity of 1.1 x 10¹² cm·Hz^½·W⁻¹ was achieved at −0.9 V bias [reprint (PDF)]
1.	Al_xGa_1−xN-based solar-blind ultraviolet photodetector based on lateral epitaxial overgrowth of AlN on Si substrate E. Cicek, R. McClintock, C. Y. Cho, B. Rahnema, and M. Razeghi Appl. Phys. Lett. 103, 181113 (2013)-- October 30, 2013 ...[Visit Journal] We report on Al_xGa_1−xN-based solar-blind ultraviolet (UV) photodetector (PD) grown on Si(111) substrate. First, Si(111) substrate is patterned, and then metalorganic chemical vapor deposition is implemented for a fully-coalesced ∼8.5 μm AlN template layer via a pulsed atomic layer epitaxial growth technique. A back-illuminated p-i-n PD structure is subsequently grown on the high quality AlN template layer. After processing and implementation of Si(111) substrate removal, the optical and electrical characteristic of PDs are studied. Solar-blind operation is observed throughout the array; at the peak detection wavelength of 290 nm, 625 μm² area PD showed unbiased peak external quantum efficiency and responsivity of ∼7% and 18.3 mA/W, respectively, with a UV and visible rejection ratio of more than three orders of magnitude. Electrical measurements yielded a low-dark current density below 1.6 × 10⁻⁸ A/cm² at 10 V reverse bias. [reprint (PDF)]

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