Center for Quantum Devices - Most Downloaded Journal Articles

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6.	Study of Phase Transition in MOCVD Grown Ga2O3 from κ to β Phase by Ex Situ and In Situ Annealing Junhee Lee, Honghyuk Kim, Lakshay Gautam, Kun He, Xiaobing Hu, Vinayak P. Dravid and Manijeh Razeghi Photonics 2021, 8, 17. https://doi.org/10.3390/ photonics8010017 ...[Visit Journal] We report the post-growth thermal annealing and the subsequent phase transition of Ga2O3 grown on c-plane sapphire substrates by metal organic chemical vapor deposition (MOCVD). We demonstrated the post-growth thermal annealing at temperatures higher than 900 °C under N2 ambience, by either in situ or ex situ thermal annealing, can induce phase transition from nominally metastable κ- to thermodynamically stable β-phase. This was analyzed by structural characterizations such as high-resolution scanning transmission electron microscopy and x-ray diffraction. The highly resistive as-grown Ga2O3 epitaxial layer becomes conductive after annealing at 1000 °C. Furthermore, we demonstrate that in situ annealing can lead to a crack-free β-Ga2O3. [reprint (PDF)]
6.	Investigation of the factors influencing nanostructure array growth by PLD towards reproducible wafer-scale growth Vinod E. Sandana; David. J. Rogers; Ferechteh Hosseini Teherani; Philippe Bove; Manijeh Razeghi physica status solidi (a) Applications and Materials Science. Volume 211, Issue 2, pages 449–454, (February 2014)-- January 14, 2014 ...[Visit Journal] The growth of catalyst-free ZnO nanostructure arrays on silicon (111) substrates by pulsed laser deposition was investigated. Without an underlayer, randomly oriented, micron-scale structures were obtained. Introduction of a c-axis oriented ZnO underlayer resulted in denser arrays of vertically oriented nanostructures with either tapering, vertical-walled or broadening forms, depending on background Ar pressure. Nanostructure pitch seemed to be determined by underlayer grain size while nanostructure widths could be narrowed from ∼100–500 to ∼10–50 nm by a 50 °C increase in growth temperature. A dimpled underlayer topography correlated with the moth-eye type arrays while a more granular surface was linked to vertically walled nanocolumns. Between-wafer reproducibility was demonstrated for both moth-eye and vertical nanocolumn arrays. Broadening nanostructures proved difficult to replicate, however. Full 2 inch wafer coverage was obtained by rastering the target with the laser beam. [reprint (PDF)]
6.	Demonstration of Zn-Diffused Planar Long-Wavelength Infrared Photodetector Based on Type-II Superlattice Grown by MBE Rajendra K. Saroj, Van Hoang Nguyen, Steven Slivken, Gail J. Brown and Manijeh Razeghi IEEE Journal of Quantum Electronics ...[Visit Journal] We report on a planar long-wavelength infrared photodetector based on InAs/InAs1−xSbx type-II superlattice with zinc diffusion. The superlattice structures were grown by molecular beam epitaxy, followed by a post-growth Zinc diffusion process in a metal-organic chemical vapor deposition reactor. The planar photodetectors showed a peak responsivity of 2.18 A/W, under an applied bias of −20 mV, with a corresponding quantum efficiency of 44.5%, without any anti-reflection coating, and had a 100% cut-off wavelength of 8.5 μm at 77 K temperature. These photodetectors exhibit a specific peak detectivity of 3.0×10^12 cm.Hz^1/2/W, with a dark current density of 1.5 × 10−5 A/cm2 and the differential-resistance-area product of ∼8.6 × 10−1 Ω.cm2, under an applied bias of −20 mV at 77 K. A comparative study between the planar and conventional mesa isolated photodetectors was also carried out. [reprint (PDF)]
5.	Bias–selectable nBn dual–band long–/very long–wavelength infrared photodetectors based on InAs/InAsSb/AlAsSb type–II superlattices Abbas Haddadi, Arash Dehzangi, Romain Chevallier, Sourav Adhikary, & Manijeh Razeghi Nature Scientific Reports 7, Article number: 3379-- June 13, 2017 ...[Visit Journal] Type–II superlattices (T2SLs) are a class of artificial semiconductors that have demonstrated themselves as a viable candidate to compete with the state–of–the–art mercury–cadmium–telluride material system in the field of infrared detection and imaging. Within type–II superlattices, InAs/InAs_1−xSb_x T2SLs have been shown to have a significantly longer minority carrier lifetime. However, demonstration of high–performance dual–band photodetectors based on InAs/InAs_1−xSb_x T2SLs in the long and very long wavelength infrared (LWIR & VLWIR) regimes remains challenging. We report the demonstration of high–performance bias–selectable dual–band long–wavelength infrared photodetectors based on new InAs/InAsSb/AlAsSb type–II superlattice design. Our design uses two different bandgap absorption regions separated by an electron barrier that blocks the transport of majority carriers to reduce the dark current density of the device. As the applied bias is varied, the device exhibits well–defined cut–off wavelengths of either ∼8.7 or ∼12.5 μm at 77 K. This bias–selectable dual–band photodetector is compact, with no moving parts, and will open new opportunities for multi–spectral LWIR and VLWIR imaging and detection. [reprint (PDF)]
5.	Solar-blind photodetectors based on Ga₂O₃ and III-nitrides Ryan McClintock; Alexandre Jaud; Lakshay Gautam; Manijeh Razeghi Proc. SPIE 11288, Quantum Sensing and Nano Electronics and Photonics XVII, 1128803-- January 31, 2020 ...[Visit Journal] Recently, there has been a surge of interest in the wide bandgap semiconductors for solar blind photo detectors (SBPD). This work presents our recent progress in the growth/doping of AlGaN and Ga₂O₃ thin films for solar blind detection applications. Both of these thin films grown are grown by metal organic chemical vapor deposition (MOCVD) in the same Aixtron MOCVD system. Solar-blind metal-semiconductor-metal photodetectors were fabricated with Ga₂O₃. Spectral responsivity studies of the MSM photodetectors revealed a peak at 261 nm and a maximum EQE of 41.7% for a −2.5 V bias. We have also demonstrated AlGaN based solar-blind avalanche photodiodes with a gain in excess of 57,000 at ~100 volts of reverse bias. This gain can be attributed to avalanche multiplication of the photogenerated carriers within the device. Both of these devices show the potential of wide bandgap semiconductors for solar blind photo detectors. [reprint (PDF)]
5.	Sb-based third generation at Center for Quantum Devices Razeghi, Manijeh SPIE Proceedings Volume 11407, Infrared Technology and Applications XLVI; 114070T-- April 23, 2020 ...[Visit Journal] Sb-based III-V semiconductors are a promising alternative to HgCdTe. They can be produced with a similar bandgap to HgCdTe, but take advantage of the strong bonding between group III and group V elements which leads to very stable materials, good radiation hardness, and high uniformity. In this paper, we will discuss the recent progress of our research and present the main contributions of the Center for Quantum Devices to the Sb-based 3th generation imagers. [reprint (PDF)]
5.	Type–II superlattices base visible/extended short–wavelength infrared photodetectors with a bandstructure–engineered photo–generated carrier extractor Arash Dehzangi, Ryan McClintock, Abbas Haddadi, Donghai Wu, Romain Chevallier, Manijeh Razeghi Scientific Reports volume 9, Article number: 5003 -- March 21, 2019 ...[Visit Journal] Visible/extended short–wavelength infrared photodetectors with a bandstructure–engineered photo–generated carrier extractor based on type–II InAs/AlSb/GaSb superlattices have been demonstrated. The photodetectors are designed to have a 100% cut-off wavelength of ~2.4 μm at 300K, with sensitivity down to visible wavelengths. The photodetectors exhibit room–temperature (300K) peak responsivity of 0.6 A/W at ~1.7 μm, corresponding to a quantum efficiency of 43% at zero bias under front–side illumination, without any anti–reflection coating where the visible cut−on wavelength of the devices is <0.5 µm. With a dark current density of 5.3 × 10⁻⁴ A/cm² under −20 mV applied bias at 300K, the photodetectors exhibit a specific detectivity of 4.72 × 10¹⁰ cm·Hz^½W^-1. At 150K, the photodetectors exhibit a dark current density of 1.8 × 10⁻¹⁰ A/cm² and a quantum efficiency of 40%, resulting in a detectivity of 5.56 × 10¹³ cm·Hz^½/W [reprint (PDF)]
5.	Monolithic terahertz source Q. Y. Lu, N. Bandyopadhyay, S. Slivken, Y. Bai and M. Razeghi Nature Photonics \| Research Highlights -- July 31, 2014 ...[Visit Journal] To date, the production of continuous-wave terahertz (THz) sources based on intracavity difference-frequency generation from mid-infrared quantum cascade lasers operating at room temperature has proved elusive. A critical problem is that, to achieve a large nonlinear susceptibility for frequency conversion, the active region of the quantum cascade laser requires high doping, which elevates the lasing threshold current density. Now, Quan-Yong Lu and colleagues from Northwestern University in the USA have overcome this problem and demonstrated a room-temperature continuous-wave THz source based on difference-frequency generation in quantum cascade lasers. They designed quantum-well structures based on In_0.53Ga_0.47As/In_0.52Al_0.48As material system for two mid-infrared wavelengths. The average doping in the active region was about 2.5 × 10¹⁶ cm⁻³. A buried ridge, buried composite distributed-feedback waveguide with the Čerenkov phase-matching scheme was used to reduce the waveguide loss and enhance heat dissipation. As a result, single-mode emission at 3.6 THz was observed at 293 K. The continuous-wave THz power reached 3 μW with a conversion efficiency of 0.44 mW W⁻² from mid-infrared to THz waves. Using a similar device design, a THz peak power of 1.4 mW was achieved in pulse mode. [reprint (PDF)]
5.	Type-II ‘M’ Structure Photodiodes: An Alternative Material Design for Mid-Wave to Long Wavelength Infrared Regimes B-M. Nguyen, M. Razeghi, V. Nathan, and G.J. Brown SPIE Conference, January 25-29, 2007, San Jose, CA Proceedings – Quantum Sensing and Nanophotonic Devices IV, Vol. 6479, p. 64790S-1-10-- January 29, 2007 ...[Visit Journal] In this work, an AlSb-containing Type-II InAs/GaSb superlattice, the so-called M-structure, is presented as a candidate for mid and long wavelength infrared detection devices. The effect of inserting an AlSb barrier in the GaSb layer is discussed and predicts many promising properties relevant to practical use. A good agreement between the theoretical calculation based on Empirical Tight Binding Method framework and experimental results is observed, showing the feasibility of the structure and its properties. A band gap engineering method without material stress constraint is proposed. [reprint (PDF)]
5.	Highly Conductive Co-Doped Ga2O3Si-In Grown by MOCVD Junhee Lee, Honghyuk Kim, Lakshay Gautam and Manijeh Razeghi Coatings 2021, 11(3), 287; https://doi.org/10.3390/coatings11030287 ...[Visit Journal] We report a highly conductive gallium oxide doped with both silicon and indium grown on c-plane sapphire substrate by MOCVD. From a superlattice structure of indium oxide and gallium oxide doped with silicon, we obtained a highly conductive material with an electron hall mobility up to 150 cm2/V·s with the carrier concentration near 2 × 1017 cm−3. However, if not doped with silicon, both Ga2O3:In and Ga2O3 are highly resistive. Optical and structural characterization techniques such as X-ray, transmission electron microscope, and photoluminescence, reveal no significant incorporation of indium into the superlattice materials, which suggests the indium plays a role of a surfactant passivating electron trapping defect levels. [reprint (PDF)]
5.	High Thermal Stability of κ-Ga2O3 Grown by MOCVD Junhee Lee, Honghyuk Kim, Lakshay Gautam and Manijeh Razeghi Lee, J.; Kim, H.; Gautam, L.; Razeghi, M. High Thermal Stability of κ-Ga2O3 Grown by MOCVD. Crystals 2021, 11, 446. https://doi.org/ 10.3390/cryst11040446 ...[Visit Journal] We report a high thermal stability of kappa gallium oxide grown on c-plane sapphire substrate by metal organic chemical vapor deposition. Kappa gallium oxide is widely known as a metastable polymorph transitioning its phase when subjected to a high temperature. Here, we show the kappa gallium oxide whose phase is stable in a high temperature annealing process at 1000 °C. These oxide films were grown at 690 °C under nitrogen carrier gas. The materials showed high electrical resistivity when doped with silicon, whereas the film conductivity was significantly improved when doped with both indium and silicon. This work provides a pathway to overcoming limitations for the advance in utilizing kappa gallium oxide possessing superior electrical characteristics. [reprint (PDF)]
5.	Gas sensing spectroscopy system utilizing a sample grating distributed feedback quantum cascade laser array and type II superlattice detector Nathaniel R. Coirier; Andrea I. Gomez-Patron; Manijeh Razeghi Proc. SPIE 11288, Quantum Sensing and Nano Electronics and Photonics XVII, 1128815-- January 31, 2020 ...[Visit Journal] Gas spectroscopy is a tool that can be used in a variety of applications. One example is in the medical field, where it can diagnose patients by detecting biomarkers in breath, and another is in the security field, where it can safely alert personnel about ambient concentrations of dangerous gas. In this paper, we document the design and construction of a system compact enough to be easily deployable in defense, healthcare, and chemical safety environments. Current gas sensing systems use basic quantum cascade lasers (QCLs) or distributed feedback quantum cascade lasers (DFB QCLs) with large benchtop signal recovery systems to determine gas concentrations. There are significant issues with these setups, namely the lack of laser tunability and the lack of practicality outside of a very clean lab setting. QCLs are advantageous for gas sensing purposes because they are the most efficient lasers at the mid infrared region (MIR). This is necessary since gases tend to have stronger absorption lines in the MIR range than in the near-infrared (NIR) region. To incorporate the efficiency of a QCL with wide tuning capabilities in the MIR region, sampled grating distributed feedback (SGDFB) QCLs are the answer as they have produced systems that are widely tunable, which is advantageous for scanning a robust and complete absorption spectrum. The system employs a SGDFB QCL array emitter, a Type II InAsSb Superlattice detector receiver, a gas cell, and a cooling system. [reprint (PDF)]
5.	Fabrication of 12 µm pixel-pitch 1280 × 1024 extended short wavelength infrared focal plane array using heterojunction type-II superlattice-based photodetector Arash Dehzangi , Abbas Haddadi, Romain Chevallier, Yiyun Zhang and Manijeh Razegh Semicond. Sci. Technol. 34, 03LT01-- February 4, 2019 ...[Visit Journal] We present an initial demonstration of a 1280 × 1024 extended short-wavelength infrared focal plane array (FPA) imager with 12μm pixel-pitch based on type–II InAs/AlSb/GaSb superlattice heterojunction photodetectors, with a novel bandstructure-engineered photo-generated carrier extractor as the window layer in the hetero structure to efﬁciently extract the photo-generated carriers. This heterostructure with a larger bandgap top window/contact layer leads to the device having lower dark current density compared to conventional pn junction devices. The large format FPA was fabricated with 12 μm pixel-pitch using a developed fabrication process. Test pixels fabricated separately exhibit 100% cut–off wavelengths of ∼2.22, ∼2.34μm, and ∼2.45μm at 150, 200K, and 300K. The test devices achieve saturated quantum efﬁciency values under zero bias of 54.3% and 68.4% at 150 and 300K, under back-side illumination and without any anti-reﬂection coating. At 150K, these photodetectors exhibit dark current density of 1.63 × 10⁻⁷ A·cm⁻² under −20mV applied bias providing a speciﬁc detectivity of 1.01 × 10¹¹ cm ·Hz^½/W at 1.9μm. [reprint (PDF)]
5.	Continuous-wave room-temperature operation of InGaN/GaN multiquantum well lasers grown by low-pressure metalorganic chemical vapor deposition M. Razeghi, A. Saxler, P. Kung, D. Walker, X. Zhang, A. Rybaltowski, Y. Xiao, H.J. Yi and J. Diaz SPIE Conference, San Jose, CA, Vol. 3284, pp. 113-- January 28, 1998 ...[Visit Journal] Continuous-wave (CW) room temperature operation of InGaN/GaN multi-quantum well (MQW) lasers is reported. Far-field beam divergence as narrow as 13 degrees and 20 degrees for parallel and perpendicular directions to epilayer planes were measured, respectively. The MQW lasers showed strong beam polarization anisotropy as consistent with QW laser gain theory. Dependencies of threshold current on cavity-length and temperature are also consistent with conventional laser theory. No significant degradation in laser characteristics was observed during lifetime testing for over 140 hours of CW room temperature operation. [reprint (PDF)]
5.	Thin film transistors with wurtzite ZnO channels grown on Si₃N₄/SiO₂/Si (111) substrates by pulsed laser deposition D.J. Rogers; V.E. Sandana; F. Hosseini Teherani; M. Razeghi Proc. SPIE 7603, Oxide-based Materials and Devices, 760318 (March 02, 2010)-- March 7, 2010 ...[Visit Journal] Thin Film Transistors (TFT) were made by growing ZnO on Si₃N₄/SiO₂/Si (111) substrates by pulsed laser deposition. X-ray diffraction and scanning electron microscope studies revealed the ZnO to have a polycrystalline wurtzite structure with a smooth surface, good crystallographic quality and a strong preferential c-axis orientation. Transmission studies in similar ZnO layers on glass substrates showed high transmission over the whole visible spectrum. Electrical measurements of a back gate geometry FET showed an enhancement-mode response with hard saturation, mA range Id and a V_ON ∼ 0V. When scaled down, such TFTs may be of interest for high frequency applications. [reprint (PDF)]
5.	MOCVD grown β-Ga₂O₃ metal-oxide-semiconductor field effect transistors on sapphire Ji-Hyeon Park , Ryan McClintock, Alexandre Jaud, Arash Dehzangi , Manijeh Razeghi Applied Physics Express 12, 095503-- August 28, 2019 ...[Visit Journal] We fabricated β-Ga₂O₃:Si metal-oxide field-effect transistors (MOSFETs) on c-plane sapphire substrates which typically showed maximum drain current of 100 mA·mm⁻¹. β-Ga₂O₃:Si thin films were realized on c-plane sapphire substrates through a combination of metalorganic chemical vapor deposition and post-annealing. The MOSFET device presented excellent on/off drain current ratio of ∼10¹¹ with very low gate leakage current, sharp pinch off behavior, and a breakdown voltage of 400 V at VG = −40 V. The growth and fabrication of β-Ga₂O₃:Si MOSFETs on c-plane sapphire is valuable to its demonstration of the great potential for future high-power electronic devices. [reprint (PDF)]
5.	High Frequency Extended Short-Wavelength Infrared Heterojunction Photodetectors Based on InAs/GaSb/AlSb Type-II Superlattices Romain Chevallier, Abbas Haddadi, Ryan McClintock, Arash Dehzangi , Victor Lopez-Dominguez, Pedram Khalili Amiri, Manijeh Razeghi IEEE JOURNAL OF QUANTUM ELECTRONICS, VOL. 54, NO. 6-- December 1, 2018 ...[Visit Journal] InAs/GaSb/AlSb type-II superlattice-based photodetectors, with 50% cut-off wavelength of 2.1 µm and a −3 dB cut-off frequency of 4.8 GHz, are demonstrated, for 10 µm diameter circular mesas under 15 V applied reverse bias. A study of the cut-off frequency with applied bias and mesa size was performed to evaluate some of the limiting factors of photodetectors high frequency performance. [reprint (PDF)]
5.	Chemical lift-off and direct wafer bonding of GaN/InGaN P-I-N structures grown on ZnO K. Pantzas, D.J. Rogers, P. Bove, V.E. Sandana, F.H. Teherani, Y. El Gmili, M. Molinari, G. Patriarche, L. Largeau, O. Mauguin, S. Suresh, P.L. Voss, M. Razeghi, A. Ougazzaden Journal of Crystal Growth, Volume 435, Pages 105-109-- November 7, 2015 ...[Visit Journal] p-GaN/i-InGaN/n-GaN (PIN) structures were grown epitaxially on ZnO-buffered c-sapphire substrates by metal organic vapor phase epitaxy using the industry standard ammonia precursor for nitrogen. Scanning electron microscopy revealed continuous layers with a smooth interface between GaN and ZnO and no evidence of ZnO back-etching. Energy Dispersive X-ray Spectroscopy revealed a peak indium content of just under 5at% in the active layers. The PIN structure was lifted off the sapphire by selectively etching away the ZnO buffer in an acid and then direct bonded onto a glass substrate. Detailed high resolution transmission electron microscopy and grazing incidence X-ray diffraction studies revealed that the structural quality of the PIN structures was preserved during the transfer process. [reprint (PDF)]
5.	High performance InAs quantum dot infrared photodetectors (QDIP) on InP by MOCVD W. Zhang, H. Lim, M. Taguchi, S. Tsao, J. Szafraniec, B. Movaghar, M. Razeghi, and M. Tidrow SPIE Conference, Jose, CA, Vol. 5732, pp. 326-- January 22, 2005 ...[Visit Journal] Inter-subband detectors such as quantum well infrared photodetectors (QWIP) have been widely used in infrared detection. Quantum dot infrared photodetectors (QDIPs) have been predicted to have better performance than QWIPs including higher operation temperature and normal incidence detection. Here we report our recent results of InAs QDIP grown on InP substrate by low-pressure metalorganic chemical vapor deposition (MOCVD). The device structures consist of multiple stacks of InAs quantum dots with InP barriers. High detectivities in the range of 10¹⁰cm·Hz^1/2/W were obtained at 77K. The measurements at higher temperatures show better temperature dependent performance than QWIP. However, the performances of QDIPs are still far from the expected. One of the reasons is the low quantum efficiency due to the low fill factor of quantum dots layer. Resonant cavity enhanced QDIP has been studied to increase the quantum efficiency. Different schemes of mirrors using free carrier plasma and distributed Bragg reflector are discussed. [reprint (PDF)]
5.	High-quality MOCVD-grown heteroepitaxial gallium oxide growth on III-nitrides enabled by AlOx interlayer Junhee Lee, Lakshay Gautam, and Manijeh Razeghi Junhee Lee, Manijeh RazeghiAppl. Phys. Lett. 123, 151902 (2023) https://doi.org/10.1063/5.0170383 ...[Visit Journal] We report high-quality Ga2O3 grown on an AlGaN/AlN/Sapphire in a single growth run in the same Metal Organic Chemical Vapor Deposition reactor with an AlOx interlayer at the Ga2O3/AlGaN interface. AlOx interlayer was found to enable the growth of single crystalline Ga2O3 on AlGaN in spite of the high lattice mismatch between the two material systems. The resulting nitride/oxide heterogenous heterostructures showed superior material qualities, which were characterized by structural, electrical, and optical characterization techniques. In particular, a significant enhancement of the electron mobility of the nitride/oxide heterogenous heterostructure is reported when compared to the individual electron mobilities of the Ga2O3 epilayer on the sapphire substrate and the AlGaN/AlN heterostructure on the sapphire substrate. This enhanced mobility marks a significant step in realizing the next generation of power electronic devices and transistors. [reprint (PDF)]
5.	Investigation of Enhanced Heteroepitaxy and Electrical Properties in k-Ga2O3 due to Interfacing with β-Ga2O3 Template Layers Junhee Lee, Lakshay Gautam, Ferechteh H. Teherani, Eric V. Sandana, P. Bove, David J. Rogers and Manijeh Razeghi J. Lee, M. Razeghi, Physica Status Solidi A 2023,220, 2200559, https://doi.org/10.1002/pssa.202200559 ...[Visit Journal] Heteroepitaxial k-Ga2O3 films grown by metal-organic chemical vapor deposition (MOCVD) were found to have superior materials and electrical properties thanks to the interfacing with a b-Ga2O3 template layer. k-Ga2O3grown on sapphire has not been able to demonstrate its full potential due to materials imperfections created by strain induced by the lattice mismatch at the interface between the epilayer and the substrate. By adopting a b-Ga2O3 template on a c-sapphire substrate, higher quality k-Ga2O3thin films were obtained, as evidenced by a smoother surface morphology, narrower XRD peaks, and superior electrical performance. The implications of this phenomenon, caused by b-Ga2O3 buffer layer, are already very encouraging for both boosting current device performance and opening up the perspective of novel applications for Ga2O3. [reprint (PDF)]
5.	Nickel oxide growth on Si (111), c-Al₂O₃ and FTO/glass by pulsed laser deposition V. E. Sandana ; D. J. Rogers ; F. Hosseini Teherani ; P. Bove ; R. McClintock ; M. Razeghi 03/07/2014-- March 7, 2014 ...[Visit Journal] NiO was grown on Si (111), c-Al₂O₃ and FTO/glass substrates by pulsed laser deposition (PLD). X-Ray Diffraction (XRD) and scanning electron microscope (SEM) studies revealed that layers grown on c-Al₂O₃ were fcc NiO with a dense morphology of cubic grains that were strongly (111) oriented along the growth direction. The relatively low ω rocking curve linewidth, of 0.12°suggests that there may have been epitaxial growth on the c-Al₂O₃ substrate. XRD and SEM indicated that films grown on Si (111) were also fcc NiO, with cubic grains, but that the grain orientation was random. This is consistent with the presence of an amorphous SiO₂ layer at the surface of the Si substrate, which precluded epitaxial growth. NiO grown at lower temperature (200°C) on temperature-sensitive FTO/glass substrates showed no evidence of crystallinity in XRD and SEM studies. After flash annealing in air, however, peaks characteristic of randomly oriented fcc NiO appeared in the XRD scans and the surface morphology became more granular in appearance. Such layers appear promising for the development of future dye-sensitised solar cell devices based on NiO grown by PLD. [reprint (PDF)]
5.	Advances in mid-infrared detection and imaging: a key issues review Manijeh Razeghi and Binh-Minh Nguyen Rep. Prog. Phys. 77 (2014) 082401-- August 4, 2014 ...[Visit Journal] It has been over 200 years since people recognized the presence of infrared radiation, and developed methods to capture this signal. However, current material systems and technologies for infrared detections have not met the increasing demand for high performance infrared detectors/cameras, with each system having intrinsic drawbacks. Type-II InAs/GaSb superlattice has been recently considered as a promising candidate for the next generation of infrared detection and imaging. Type-II superlattice is a man-made crystal structure, consisting of multiple quantum wells placed next to each other in a controlled way such that adjacent quantum wells can interact. The interaction between multiple quantum wells offers an additional degree of freedom in tailoring the material's properties. Another advantage of type-II superlattice is the experimental benefit of inheriting previous research on material synthesis and device fabrication of bulk semiconductors. It is the combination of these two unique strengths of type-II superlattice—novel physics and easy manipulation—that has enabled unprecedented progress in recent years. In this review, we will describe historical development, and current status of type-II InAs/GaSb superlattice for advanced detection and imaging in the mid-infrared regime (λ = 3–5 µm). [reprint (PDF)]
5.	Antimonite-based gap-engineered type-II superlattice materials grown by MBE and MOCVD for the third generation of infrared imagers Manijeh Razeghi, Arash Dehzangi, Donghai Wu, Ryan McClintock, Yiyun Zhang, Quentin Durlin, Jiakai Li, Fanfei Meng Proc. SPIE Defense + Commercial Sensing,Infrared Technology and Applications XLV, 110020G -- May 7, 2019 ...[Visit Journal] Third generation of infrared imagers demand performances for higher detectivity, higher operating temperature, higher resolution, and multi-color detection all accomplished with better yield and lower manufacturing costs. Antimonidebased gap-engineered Type-II superlattices (T2SLs) material system is considered as a potential alternative for MercuryCadmium-Telluride (HgCdTe) technology in all different infrared detection regimes from short to very long wavelengths for the third generation of infrared imagers. This is due to the incredible growth in the understanding of its material properties and improvement of device processing which leads to design and fabrication of better devices. We will present the most recent research results on Antimonide-based gap-engineered Type-II superlattices, such as highperformance dual-band SWIR/MWIR photo-detectors and focal plane arrays for different infrared regimes, toward the third generation of infrared imaging systems at the Center for Zuantum Devices. Comparing metal-organic chemical vapor deposition (MOCVD), vs molecular beam epitaxy (MBE). [reprint (PDF)]
5.	Amorphous ZnO films grown by room temperature pulsed laser deposition on paper and mylar for transparent electronics applications D.J. Rogers, V.E. Sandana, F. Hosseini Teherani, R. McClintock, M. Razeghi, and H.J. Drouhin SPIE Proceedings, San Francisco, CA (January 22-27, 2011), Vol. 7940, p. 79401K-- January 24, 2011 ...[Visit Journal] Recently, there has been a surge of activity in the development of next-generation transparent thin film transistors for use in applications such as electronic paper and flexible organic light emitting diode panels. Amongst the transparent conducting oxides attracting the most interest at present are Amorphous Oxide Semiconductors (AOS) based on ZnO because they exhibit enhanced electron mobility (μ), superior capacity for processability in air and improved thermodynamic stability compared with conventional covalent amorphous semiconductors and existing AOS. Moreover, they give excellent performance when fabricated at relatively low temperature and can readily be made in large area format. Thus, they are projected to resolve the trade-off between processing temperature and device performance and thereby allow fabrication on inexpensive heatsensitive substrates. For the moment, however, an undesireable post-deposition annealing step at a temperature of about 200ºC is necessary in order to obtain suitable electrical and optical properties. This paper demonstrates the possibility of directly engineering amorphous ZnO with relatively high conductiviy at room temperature on paper and mylar substrates using pulsed laser deposition. [reprint (PDF)]

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