Center for Quantum Devices - Most Downloaded Journal Articles

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15.	Near bulk-limited R0A of long-wavelength infrared type-II InAs/GaSb superlattice photodiodes with polyimide surface passivation Andrew Hood, Pierre-Yves Delaunay, Darin Hoffman, Binh-Minh Nguyen, Yajun Wei, Manijeh Razeghi, and Vaidya Nathan Applied Physics Letters 90, 233513-- June 4, 2007 ...[Visit Journal] Effective surface passivation of Type-II InAs/GaSb superlattice photodiodes with cutoff wavelengths in the long-wavelength infrared is presented. A stable passivation layer, the electrical properties of which do not change as a function of the ambient environment nor time, has been prepared by a solvent-based surface preparation, vacuum desorption, and the application of an insulating polyimide layer. Passivated photodiodes, with dimensions ranging from 400×400 to 25×25 µm², with a cutoff wavelength of ~11 µm, exhibited near bulk-limited R₀A values of ~12 Ω·cm², surface resistivities in excess of 10⁴ Ω·cm, and very uniform current-voltage behavior at 77 K. [reprint (PDF)]
15.	Study of Au coated ZnO nanoarrays for surface enhanced Raman scattering chemical sensing Gre´gory Barbillon, Vinod E. Sandana,Christophe Humbert, Benoit Be´lier, David J. Rogers, Ferechteh H. Teherani, Philippe Bove Ryan McClintock and Manijeh Razeghid J. Mater. Chem. C, 2017, 5, 3528-- March 20, 2017 ...[Visit Journal] At present, the simultaneous attainment of good reproducibility and high enhancement factors (EF) are key challenges in the development of surface enhanced Raman scattering (SERS)substrates for improved chemical and biological sensing. SERS substrates are generally based on distributions of metallic nanoparticles/structures with different shapes and architectures which are prepared by either thermal dewetting, precipitation from colloidal suspensions1–4 or advanced (e.g. deep UV or electron beam (EBL)) lithographic techniques.5–9 Although such substrates can exhibit large Raman enhancements, the former two techniques (colloidal and thermal dewetting) give poor SERS reproducibility while deep UV and EBL are too expensive and/or complex for mass production. [reprint (PDF)]
15.	Chemical lift-off and direct wafer bonding of GaN/InGaN P-I-N structures grown on ZnO K. Pantzas, D.J. Rogers, P. Bove, V.E. Sandana, F.H. Teherani, Y. El Gmili, M. Molinari, G. Patriarche, L. Largeau, O. Mauguin, S. Suresh, P.L. Voss, M. Razeghi, A. Ougazzaden Journal of Crystal Growth, Volume 435, Pages 105-109-- November 7, 2015 ...[Visit Journal] p-GaN/i-InGaN/n-GaN (PIN) structures were grown epitaxially on ZnO-buffered c-sapphire substrates by metal organic vapor phase epitaxy using the industry standard ammonia precursor for nitrogen. Scanning electron microscopy revealed continuous layers with a smooth interface between GaN and ZnO and no evidence of ZnO back-etching. Energy Dispersive X-ray Spectroscopy revealed a peak indium content of just under 5at% in the active layers. The PIN structure was lifted off the sapphire by selectively etching away the ZnO buffer in an acid and then direct bonded onto a glass substrate. Detailed high resolution transmission electron microscopy and grazing incidence X-ray diffraction studies revealed that the structural quality of the PIN structures was preserved during the transfer process. [reprint (PDF)]
15.	GaN nanostructured p-i-n photodiodes J.L. Pau, C. Bayram, P. Giedraitis, R. McClintock, and M. Razeghi Applied Physics Letters, Vol. 93, No. 22, p. 221104-1-- December 1, 2008 ...[Visit Journal] We report the fabrication of nanostructured p-i-n photodiodes based on GaN. Each device comprises arrays of ~200 nm diameter and 520 nm tall nanopillars on a 1 µm period, fabricated by e-beam lithography. Strong rectifying behavior was obtained with an average reverse current per nanopillar of 5 fA at −5 V. In contrast to conventional GaN diodes, nanostructured devices reproducibly show ideality factors lower than 2. Enhanced tunneling through sidewall surface states is proposed as the responsible mechanism for this behavior. Under backillumination, the quantum efficiency in nanostructured devices is partly limited by the collection efficiency of holes into the nanopillars. [reprint (PDF)]
15.	Direct growth of thick AlN layers on nanopatterned Si substrates by cantilever epitaxy Ilkay Demir, Yoann Robin, Ryan McClintock, Sezai Elagoz, Konstantinos Zekentes, and Manijeh Razeghi Phys. Status Solidi A, pp. 1–6-- September 30, 2016 ...[Visit Journal] AlN layers have been grown on 200 nm period of nanopatterned Si (111) substrates by cantilever epitaxy and compared with AlN layers grown by maskless lateral epitaxial overgrowth (LEO) on micropatterned Si (111) substrates. The material quality of 5–10 µm thick AlN grown by LEO is comparable to that of much thinner layers (2 µm) grown by cantilever epitaxy on the nanopatterned substrates. Indeed, the latter exhibited root mean square (RMS) roughness of 0.65 nm and X-ray diffraction full width at half-maximum (FWHM) of 710 arcsec along the (0002) reflection and 930 arcsec along the (10̅15) reflection. The corresponding room temperature photoluminescence spectra was dominated by a sharp band edge peak. Back emission ultra violet light emitting diodes (UV LEDs) were fabricated by flip chip bonding to patterned AlN heat sinks followed by complete Si (111) substrate removal demonstrating a peak pulsed power of ∼0.7 mW at 344 nm peak emission wavelength. The demonstrated UV LEDs were fabricated on a cost effective epitaxial structure grown on the nanopatterned Si substrate with a total thickness of 3.3 µm [reprint (PDF)]
15.	Room temperature operation of 8-12 μm InSbBi infrared photodetectors on GaAs substrates J.J. Lee, J.D. Kim, and M. Razeghi Applied Physics Letters 73 (5)-- August 3, 1998 ...[Visit Journal] We report the room temperature operation of 8–12 μm InSbBi long-wavelength infrared photodetectors. The InSbBi/InSb heterostructures were grown on semi-insulating GaAs (001) substrates by low pressure metalorganic chemical vapor deposition. The voltage responsivity at 10.6 μm was about 1.9 mV/W at room temperature and the corresponding Johnson noise limited detectivity was estimated to be about 1.2×10⁶ cm·Hz^½/W. The carrier lifetime derived from the voltage dependent responsivity measurements was about 0.7 ns. [reprint (PDF)]
15.	Quantum Hall effect in In0.53Ga0.47As-InP heterojunctions with two populated electric subbands Y. Guldner, J. P. Vieren, and M. Voos F. Delahaye and D. Dominguez J. P. Hirtz and M. Razeghi Phys. Rev. B 33, 3990 1986-- March 15, 1986 ...[Visit Journal] Quantum-Hall-effect and Shubnikov–de Haas measurements are presented for InxGa1−xAs?(hyInP heterojunctions with two populated electric subbands and low electron density (𝑛𝑠≤5×1011 cm−2). The Shubnikov–de Haas oscillations clearly show two different periodicities. An anomalous behavior of the quantum Hall effect is observed, in particular some plateaus are missing and other plateaus are enhanced. Precise measurements of the Hall resistance have been performed and it is shown that the resistance of the i=2 plateau is equal to its theoretical value h/2𝑒2 with an uncertainty of ∼10−8. [reprint (PDF)]
15.	Investigation of MgZnO/ZnO heterostructures grown on c-sapphire substrates by pulsed laser deposition D. J. Rogers ; F. Hosseini Teherani ; P. Bove ; A. Lusson ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 86261X (March 18, 2013)-- March 18, 2013 ...[Visit Journal] MgZnO thin films were grown on c-sapphire and ZnO-coated c-sapphire substrates by pulsed laser deposition from a ZnMgO target with 4 at% Mg. The MgZnO grown on the ZnO underlayer showed significantly better crystal quality than that grown directly on sapphire. AFM studies revealed a significant deterioration in surface morphology for the MgZnO layers compared with the ZnO underlayer. Optical transmission studies indicated a MgZnO bandgap of 3.61eV (compared with 3.34eV for the ZnO), which corresponds to a Mg content of about 16.1 at%. The MgZnO/ZnO heterojunction showed an anomalously low resistivity, which was more than two orders of magnitude less than the MgZnO layer and an order of magnitude lower than that for the ZnO layer. It was suggested that this may be attributable to the presence of a 2D electron gas at the ZnMgO/ZnO heterointerface. [reprint (PDF)]
15.	Status of III-V semiconductor thin films and their applications to future OEICs Manijeh Razeghi Proc. SPIE 10267, Integrated Optics and Optoelectronics, 102670T -- June 26, 2017 ...[Visit Journal] In the last decade, semiconductor technology has been advanced to a great extent in terms of electronic and photonic discrete devices. One of the main reasons for such a progress, is the result of advancement in the epitaxial growth techniques such as molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD), where device quality films can be grown with great control over composition, uniformity and thickness. MOCVD has proven to be one of the best growth methods for many IH-V semiconductor thin films 1. Its flexibility and potential to yield a broad range of growth rates resulted in the layers featuring the thicknesses from tens of microns down to several nanometers. Planar structures containing quantum wells with atomically flat interfaces, superlattices, strained or graded-index layers were successfully grown by MOCVD. Furthermore, MOCVD proved its efficiency in producing a laser devices by overgrowth and epitaxy on patterned substrates. The importance of MOCVD is strongly enhanced by the possibility of large-scale production by simultaneous growth on several substrates in one process. Several III-V semiconductor films with bandgaps ranging from infrared to ultraviolet (15 to 0.2 μm) have been successfully grown by MOCVD. [reprint (PDF)]
15.	Positive and negative luminescence in binary Type-II InAs/GaSb superlattice photodiodes D. Hoffman and M. Razeghi SPIE Conference, San Jose, CA, Vol. 6127, pp. 61271H-- January 23, 2006 ...[Visit Journal] In the present work, we show measurements of both positive and negative luminescence of binary Type-II InAs/GaSb superlattice photodiodes in the 3 to 13 μm spectral range. Through a radiometric calibration technique, we demonstrate temperature independent negative luminescence efficiencies of 45 % in the midwavelength (MWIR) sample from 220 K to 320 K without anti-reflective coating and values reaching 35 % in the long wavelength infrared (LWIR) spectrum sample. [reprint (PDF)]
15.	Monolithic terahertz source Q. Y. Lu, N. Bandyopadhyay, S. Slivken, Y. Bai and M. Razeghi Nature Photonics \| Research Highlights -- July 31, 2014 ...[Visit Journal] To date, the production of continuous-wave terahertz (THz) sources based on intracavity difference-frequency generation from mid-infrared quantum cascade lasers operating at room temperature has proved elusive. A critical problem is that, to achieve a large nonlinear susceptibility for frequency conversion, the active region of the quantum cascade laser requires high doping, which elevates the lasing threshold current density. Now, Quan-Yong Lu and colleagues from Northwestern University in the USA have overcome this problem and demonstrated a room-temperature continuous-wave THz source based on difference-frequency generation in quantum cascade lasers. They designed quantum-well structures based on In_0.53Ga_0.47As/In_0.52Al_0.48As material system for two mid-infrared wavelengths. The average doping in the active region was about 2.5 × 10¹⁶ cm⁻³. A buried ridge, buried composite distributed-feedback waveguide with the Čerenkov phase-matching scheme was used to reduce the waveguide loss and enhance heat dissipation. As a result, single-mode emission at 3.6 THz was observed at 293 K. The continuous-wave THz power reached 3 μW with a conversion efficiency of 0.44 mW W⁻² from mid-infrared to THz waves. Using a similar device design, a THz peak power of 1.4 mW was achieved in pulse mode. [reprint (PDF)]
15.	High operating temperature 320 x 256 middle-wavelength infrared focal plane array imaging based on an InAs/InGaAs/InAlAs/InP quantum dot infrared photodetector S. Tsao, H. Lim, W. Zhang, and M. Razeghi Virtual Journal of Nanoscale Science and Technology-- May 28, 2007 ...[Visit Journal][reprint (PDF)]
15.	Characterization of high quality GaInP/GaAs superlattices grown on GaAs and Si substrates by gas source molecular beam epitaxy C. Jelen, S. Slivken, X.G. He, and M. Razeghi and S. Shastry Journal of Vacuum Science and Technology B 12 (2)-- March 1, 1994 ...[Visit Journal] We report an analysis of the heteroepitaxial interfaces in high quality GaInP–GaAs superlattices grown simultaneously on GaAs and Si substrates by gas source molecular beam epitaxy. These two superlattices have been studied using high resolution x-ray diffraction measurements. Sharp superlattice satellites, with very little broadening, are observed within a 6° range for the sample on GaAs. Photoluminescence peaks with full widths at half-maximums of 5 and 7 meV are obtained at 4 K for samples with 58 Å wells on GaAs and Si, respectively. Room temperature exciton absorption is observed in the photovoltage measurements for a superlattice grown on Si substrate. The thicknesses determined by x-ray analysis are consistent with those obtained by a Kronig–Penny model fitting of the photovoltage spectroscopy. [reprint (PDF)]
15.	Negative and positive luminescence in mid-wavelength infrared InAs/GaSb superlattice photodiodes D. Hoffman, A. Gin, Y. Wei, A. Hood, F. Fuchs, and M. Razeghi IEEE Journal of Quantum Electronics, 41 (12)-- December 1, 2005 ...[Visit Journal] The quantum efficiency of negative and positive luminescence in binary type-II InAs-GaSb superlattice photodiodes has been investigated in the midinfrared spectral range around the 5-μm wavelength. The negative luminescence efficiency is nearly independent on temperature in the entire range from 220 to 325 K. For infrared diodes with a 2-μm absorbing layer, processed without anti-reflection coating, a negative luminescence efficiency of 45% is found, indicating very efficient minority carrier extraction. The temperature dependent measurements of the quantum efficiency of the positive luminescence enables for the determination of the capture cross section of the Shockley-Read-Hall centers involved in the competing nonradiative recombination. [reprint (PDF)]
15.	Recent advances in MOCVD growth of InxGa1-xAsyP1-y alloys M. Razeghi, J.P. Duchemin M. Razeghi, J.P. Duchemin, Recent advances in MOCVD growth of InxGa1-xAsyP1-y alloys, Journal of Crystal Growth, Volume 70, Issues 1–2, 1984, Pages 145-149,-- December 1, 1984 ...[Visit Journal] The low pressure metalorganic chemical vapour deposition (LPMOCVD) growth of GaxIn1-xAsyP1-y-InP lattice matched system, with high mobilities, sharp interfaces, low background doping densities, and the formation of a two-dimensional electron gas (2DEG) at the interfaces, has recently made spectacular advances, as in evidenced by the availability of high quality DH lasers, PIN photodiodes, and Gunn diodes. We present here some new results obtained on the above-mentioned material and devices. [reprint (PDF)]
15.	Optical Investigations of GaAs-GaInP Quantum Wells and Superlattices Grown by Metalorganic Chemical Vapor Deposition Omnes F., and Razeghi M. Applied Physics Letters 59 (9), p. 1034-- May 28, 1991 ...[Visit Journal] Recent experimental results on the photoluminescence and photoluminescence excitation of GaAs‐Ga_0.51In_0.49P lattice‐matched quantum wells and superlattices are discussed. The full width at half maximum of a 10‐period GaAs‐GaInP superlattice with Lz=90 Å and LB=100 Å is 4 meV at 4 K. The photoluminescence excitation exhibits very sharp peaks attributed to the electron to light‐hole and electron to heavy‐hole transitions. The GaInP‐GaAs interface suffers from memory effect of In, rather than P or As elements. [reprint (PDF)]
15.	Thin film transistors with wurtzite ZnO channels grown on Si₃N₄/SiO₂/Si (111) substrates by pulsed laser deposition D.J. Rogers; V.E. Sandana; F. Hosseini Teherani; M. Razeghi Proc. SPIE 7603, Oxide-based Materials and Devices, 760318 (March 02, 2010)-- March 7, 2010 ...[Visit Journal] Thin Film Transistors (TFT) were made by growing ZnO on Si₃N₄/SiO₂/Si (111) substrates by pulsed laser deposition. X-ray diffraction and scanning electron microscope studies revealed the ZnO to have a polycrystalline wurtzite structure with a smooth surface, good crystallographic quality and a strong preferential c-axis orientation. Transmission studies in similar ZnO layers on glass substrates showed high transmission over the whole visible spectrum. Electrical measurements of a back gate geometry FET showed an enhancement-mode response with hard saturation, mA range Id and a V_ON ∼ 0V. When scaled down, such TFTs may be of interest for high frequency applications. [reprint (PDF)]
15.	Room temperature quantum cascade laser with ∼ 31% wall-plug efficiency F. Wang, S. Slivken, D. H. Wu, and M. Razeghi AIP Advances 10, 075012-- July 14, 2020 ...[Visit Journal] In this article, we report the demonstration of a quantum cascade laser emitting at λ ≈ 4.9 μm with a wall-plug efficiency of ∼31% and an output power of ∼23 W in pulsed operation at room temperature with 50 cascade stages (Ns). With proper fabrication and packaging, this buried ridge quantum cascade laser with a cavity length of 5 mm delivers more than ∼15 W output power, and its wall-plug efficiency exceeds ∼20% at 100 °C. The experimental results of the lasers are well in agreement with the numerical predictions. [reprint (PDF)]
15.	Bias-selectable dual-band mid-/long-wavelength infrared photodetectors based on InAs/InAs_1−xSb_x type-II superlattices A. Haddadi, R. Chevallier, G. Chen, A. M. Hoang, and M. Razeghi Applied Physics Letters 106 , 011104-- January 8, 2015 ...[Visit Journal] A high performance bias-selectable mid-/long-wavelength infrared photodetector based on InAs/InAs_1−xSb_x type-II superlattices on GaSb substrate has been demonstrated. The mid- and long-wavelength channels' 50% cut-off wavelengths were ∼5.1 and ∼9.5 μm at 77 K. The mid-wavelength channel exhibited a quantum efficiency of 45% at 100 mV bias voltage under front-side illumination and without any anti-reflection coating. With a dark current density of 1 × 10⁻⁷ A/cm² under 100 mV applied bias, the mid-wavelength channel exhibited a specific detectivity of 8.2 × 10¹² cm·Hz^½·W^-1 at 77 K. The long-wavelength channel exhibited a quantum efficiency of 40%, a dark current density of 5.7 × 10⁻⁴ A/cm² under −150 mV applied bias at 77 K, providing a specific detectivity value of 1.64 × 10¹¹ cm·Hz^½·W^-1. [reprint (PDF)]
15.	GaN-based nanostructured photodetectors J.L. Pau, C. Bayram, P. Giedraitis, R. McClintock, and M. Razeghi SPIE Proceedings, San Jose, CA Volume 7222-14-- January 26, 2009 ...[Visit Journal] The use of nanostructures in semiconductor technology leads to the observation of new phenomena in device physics. Further quantum and non-quantum effects arise from the reduction of device dimension to a nanometric scale. In nanopillars, quantum confinement regime is only revealed when the lateral dimensions are lower than 50 nm. For larger mesoscopic systems, quantum effects are not observable but surface states play a key role and make the properties of nanostructured devices depart from those found in conventional devices. In this work, we present the fabrication of GaN nanostructured metal-semiconductor-metal (MSM) and p-i-n photodiodes (PIN PDs) by e-beam lithography, as well as the investigation of their photoelectrical properties at room temperature. The nanopillar height and diameter are about 520 nm and 200 nm, respectively. MSMs present dark currents densities of 0.4 A/cm² at ±100 V. A strong increase of the optical response with bias is observed, resulting in responsivities higher than 1 A/W. The relationship between this gain mechanism and surface states is discussed. PIN PDs yield peak responsivities (R_peak) of 35 mA/W at -4 V and show an abnormal increase of the response (R_peak > 100 A/W) under forward biases. [reprint (PDF)]
15.	Solar-blind AlGaN photodiodes with very low cutoff wavelength D. Walker, V. Kumar, K. Mi, P. Sandvik, P. Kung, X.H. Zhang, and M. Razeghi Applied Physics Letters 76 (4)-- January 24, 2000 ...[Visit Journal] We report the fabrication and characterization of AlxGa1–xN photodiodes (x~0.70) grown on sapphire by low-pressure metalorganic chemical vapor deposition. The peak responsivity for –5 V bias is 0.11 A/W at 232 nm, corresponding to an internal quantum efficiency greater than 90%. The device response drops four orders of magnitude by 275 nm and remains at low response for the entire near-ultraviolet and visible spectrum. Improvements were made to the device design including a semitransparent Ni/Au contact layer and a GaN:Mg cap layer, which dramatically increased device response by enhancing the carrier collection efficiency. [reprint (PDF)]
15.	Gallium nitride on silicon for consumer & scalable photonics C. Bayram, K.T. Shiu, Y. Zhu, C.W. Cheng, D.K. Sadana, Z. Vashaei, E. Cicek, R. McClintock and M. Razeghi SPIE Proceedings, Vol. 8631, p. 863112-1, Photonics West, San Francisco, CA-- February 4, 2013 ...[Visit Journal] Gallium Nitride (GaN) is a unique material system that has been heavily exploited for photonic devices thanks to ultraviolet-to-terahertz spectral tunability. However, without a cost effective approach, GaN technology is limited to laboratory demonstrations and niche applications. In this investigation, integration of GaN on Silicon (100) substrates is attempted to enable widespread application of GaN based optoelectronics. Controlled local epitaxy of wurtzite phase GaN on on-axis Si(100) substrates is demonstrated via metal organic chemical vapor deposition (MOCVD). CMOS-compatible fabrication scheme is used to realize [SiO2-Si{111}-Si{100}] groove structures on conventional 200-mm Si(100) substrates. MOCVD growth (surface treatment, nucleation, initiation) conditions are studied to achieve controlled GaN epitaxy on such grooved Si(100) substrates. Scanning electron microscopy and transmission electron microscopy techniques are used to determine uniformity and defectivity of the GaN. Our results show that aforementioned groove structures along with optimized MOCVD growth conditions can be used to achieve controlled local epitaxy of wurtzite phase GaN on on-axis Si(100) substrates. [reprint (PDF)]
15.	Room-temperature continuous wave operation of distributed feedback quantum cascade lasers with watt-level power output Q.Y. Lu, Y. Bai, N. Bandyopadhyay, Sl Slivken, and M. Razeghi Applied Physics Letters, Vol. 97, No. 23, p. 231119-1-- December 6, 2010 ...[Visit Journal] We demonstrate surface-grating distributed feedback quantum cascade lasers (QCLs) with a watt-level power output at 4.75 μm. A device with a 5 mm cavity length exhibits an output power of 1.1 W in room-temperature cw operation. Single-mode operation with a side mode suppression ratio of 30 dB is obtained in the working temperature of 15–105 °C. A double-lobed far field with negligible beam steering is observed. The significance of this demonstration lies in its simplicity and readiness to be applied to standard QCL wafers with the promise of high-power performances. [reprint (PDF)]
15.	High performance quantum dot-quantum well infrared focal plane arrays S. Tsao, A. Myzaferi, and M. Razeghi SPIE Proceedings, San Francisco, CA (January 22-28, 2010), Vol. 7605, p. 76050J-1-- January 27, 2010 ...[Visit Journal] Quantum dot (QD) devices are a promising technology for high operating temperature detectors. We have studied InAs QDs embedded in an InGaAs/InAlAs quantum well structure on InP substrate for middle wavelength infrared detectors and focal plane arrays (FPAs). This combined dot-well structure has weak dot confinement of carriers, and as a result, the device behavior differs significantly from that in more common dot systems with stronger confinement. We report on our studies of the energy levels in the QDWIP devices and on QD-based detectors operating at high temperature with D* over 10¹⁰ cm·Hz^½/W at 150 K operating temperature and high quantum efficiency over 50%. FPAs have been demonstrated operating at up to 200 K. We also studied two methods of adapting the QDWIP device to better accommodate FPA readout circuit limitations. [reprint (PDF)]
15.	Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure M. Razeghi, J.P. Duchemin M. Razeghi, J.P. Duchemin, Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure, Journal of Crystal Growth, Volume 64, Issue 1, 1983, Pages 76-82,-- November 1, 1983 ...[Visit Journal] M. Razeghi, J.P. Duchemin, Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure, Journal of Crystal Growth, Volume 64, Issue 1, 1983, Pages 76-82, [reprint (PDF)]

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