Center for Quantum Devices - Most Downloaded Journal Articles

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2.	Impact of scaling base thickness on the performance of heterojunction phototransistors Arash Dehzangi, Abbas Haddadi, Sourav Adhikary, and Manijeh Razeghi Nanotechnology 28, 10LT01-- February 2, 2017 ...[Visit Journal] In this letter we report the effect of vertical scaling on the optical and electrical performance of mid-wavelength infrared heterojunction phototransistors based on type-II InAs/GaSb/AlSb superlattices. The performance of devices with different base thickness was compared as the base was scaled from 60 down to 40 nm. The overall optical performance shows enhancement in responsively, optical gain, and specific detectivity upon scaling the base width. The saturated responsivity for devices with 40 nm bases reaches 8,845 and 9,528 A/W at 77 and 150 K, respectively, which is almost five times greater than devices with 60 nm bases. The saturated optical gain for devices with 40 nm bases is measured as 2,760 at 77 K and 3,081 at 150 K. The devices with 40 nm bases also exhibit remarkable enhancement in saturated current gain, with 17,690 at 77 K, and 19,050 at 150 K. [reprint (PDF)]
2.	Gain and recombination dynamics in photodetectors made with quantum nanostructures: the quantum dot in a well and the quantum well B. Movaghar, S. Tsao, S. Abdollahi Pour, T. Yamanaka, and M. Razeghi Virtual Journal of Nanoscale Science & Technology, Vol. 18, No. 14-- October 6, 2008 ...[Visit Journal][reprint (PDF)]
2.	Quantum Sensing Using Type-II InAs/GaSb Superlattice for Infrared Detection M. Razeghi, A. Gin, Y. Wei, J. Bae, and J. Nah Microelectronics Journal, 34 (5-8)-- May 1, 2003 ...[Visit Journal] Large, regular arrays of bulk GaSb and InAs/GaSb Type-II superlattice pillars have been fabricated by electron beam lithography and dry etching. A 2.5 keV electron beam lithography system and metal evaporation are used to form the Au mask on superlattice and bulk substrates. Dry etching of these materials has been developed with BCl3:Ar, CH4:H2:Ar and cyclic CH₄:H₂:Ar/O₂ plasmas. Etch temperatures were varied from 20 to 150 °C. The diameter of the superlattice pillars was below 50 nm with regular 200 nm spacing. Bulk GaSb pillars were etched with diameters below 20 nm. Areas of dense nanopillars as large as 500 μm×500 μm were fabricated. The best height/diameter aspect ratio was approximately 10:1. To date, these are the smallest diameter III–V superlattice pillar structures reported, and the first nanopillars in the InAs/GaSb material system. The basic theory of these devices and surface passivation with SiO₂ and Si₃N₄ thin films has also been discussed. [reprint (PDF)]
2.	High quality LEO growth and characterization of GaN films on Al₂O₃ and Si substrates M. Razeghi, P. Kung, D. Walker, M. Hamilton, and J. Diaz SPIE International Conference on Solid State Crystals, Zakopane, Poland; Proceedings 3725-- October 12, 1998 ...[Visit Journal] We report the lateral epitaxial overgrowth (LEO) of GaN films on (00.1) Al₂O₃ and (111) Si substrates by metalorganic chemical vapor deposition. The LEO on Si substrates was possible after achieving quasi monocrystalline GaN template films on (111) Si substrates. X-ray diffraction, photoluminescence, scanning electron microscopy and atomic force microscopy were used to assess the quality of the LEO films. Lateral growth rates more than 5 times as high as vertical growth rates were achieved for both LEO growths of GaN on sapphire and silicon substrates. [reprint (PDF)]
2.	Cubic Phase GaN on Nano-grooved Si (100) via Maskless Selective Area Epitaxy Bayram, C., Ott, J. A., Shiu, K.-T., Cheng, C.-W., Zhu, Y., Kim, J., Razeghi, M. and Sadana, D. K. Adv. Funct. Mater. 2014-- April 1, 2014 ...[Visit Journal] A method of forming cubic phase (zinc blende) GaN (referred as c-GaN) on a CMOS-compatible on-axis Si (100) substrate is reported. Conventional GaN materials are hexagonal phase (wurtzite) (referred as h-GaN) and possess very high polarization fields (∼MV/cm) along the common growth direction of <0001>. Such large polarization fields lead to undesired shifts (e.g., wavelength and current) in the performance of photonic and vertical transport electronic devices. The cubic phase of GaN materials is polarization-free along the common growth direction of <001>, however, this phase is thermodynamically unstable, requiring low-temperature deposition conditions and unconventional substrates (e.g., GaAs). Here, novel nano-groove patterning and maskless selective area epitaxy processes are employed to integrate thermodynamically stable, stress-free, and low-defectivity c-GaN on CMOS-compatible on-axis Si. These results suggest that epitaxial growth conditions and nano-groove pattern parameters are critical to obtain such high quality c-GaN. InGaN/GaN multi-quantum-well structures grown on c-GaN/Si (100) show strong room temperature luminescence in the visible spectrum, promising visible emitter applications for this technology. [reprint (PDF)]
2.	Strain-Induced Metastable Phase Stabilization in Ga₂O₃ Thin Films Yaobin Xu, Ji-hyeon Park, Zhenpeng Yao, Christopher Wolverton, Manijeh Razeghi, Jinsong Wu, and Vinayak P. Dravid ACS Appl. Mater. Interfaces-- January 10, 2019 ...[Visit Journal] It is well known that metastable and transient structures in bulk can be stabilized in thin films via epitaxial strain (heteroepitaxy) and appropriate growth conditions that are often far from equilibrium. However, the mechanism of heteroepitaxy, particularly how the nominally unstable or metastable phase gets stabilized, remains largely unclear. This is especially intriguing for thin film Ga₂O₃, where multiple crystal phases may exist under varied growth conditions with spatial and dimensional constraints. Herein, the development and distribution of epitaxial strain at the Ga₂O₃/Al₂O₃ film-substrate interfaces is revealed down to the atomic resolution along different orientations, with an aberration-corrected scanning transmission electron microscope (STEM). Just a few layers of metastable α-Ga₂O₃ structure were found to accommodate the misfit strain in direct contact with the substrate. Following an epitaxial α-Ga₂O₃ structure of about couple unit cells, several layers (4~5) of transient phase appear as the intermediate structure to release the misfit strain. Subsequent to this transient crystal phase, the nominally unstable κ-Ga₂O₃ phase is stabilized as the major thin film phase form. We show that the epitaxial strain is gracefully accommodated by rearrangement of the oxygen polyhedra. When the structure is under large compressive strain, Ga3+ ions occupy only the oxygen octahedral sites to form a dense structure. With gradual release of the compressive strain, more and more Ga3+ ions occupy the oxygen tetrahedral sites, leading to volumetric expansion and the phase transformation. The structure of the transition phase is identified by high resolution electron microscopy (HREM) observation, complemented by the density functional theory (DFT) calculations. This study provides insights from the atomic scale and their implications for the design of functional thin film materials using epitaxial engineering.
2.	Schottky barrier heights and conduction-band offsets of In_1-xGa_xAs_1-yP_y lattice matched to GaAs J.K. Lee, Y.H. Cho, B.D. Choe, K.S. Kim, H.I. Jeon, H. Lim and M. Razeghi Applied Physics Letters 71 (7)-- August 18, 1997 ...[Visit Journal] The Schottky barrier heights of Au/In_1−xGa_xAs_1−yP_y contacts have been determined as a function of y by the capacitance–voltage and temperature dependent current–voltage characteristics measurements. The barrier height is observed to increase as y is increased for both n- and p-type materials, with a more rapid increase for the p-type material. The compositional variation of the barrier heights for Au/n-In_1−xGa_xAs_1−yP_y is found to be identical to that of the conduction-band offsets in In_1−xGa_xAs_1−yP_y/GaAs heterojunctions. A possible cause of this phenomenon is also discussed. [reprint (PDF)]
2.	High-speed, low-noise metal-semiconductor-metal ultraviolet photodetectors based on GaN D. Walker, E. Monroy, P. Kung, J. Wu, M. Hamilton, F.J. Sanchez, J. Diaz, and M. Razeghi Applied Physics Letters 74 (5)-- February 1, 1999 ...[Visit Journal] We present the fabrication and characterization of nonintentionally doped GaN and GaN:Mg Schottky metal–semiconductor–metal (MSM) photodetectors, grown on sapphire by metalorganic chemical vapor deposition. Low-leakage, Schottky contacts were made with Pt/Au. The devices are visible blind, with an ultraviolet/green contrast of about five orders of magnitude. The response times of the MSM devices were <10 ns and about 200 ns for GaN and GaN:Mg, respectively. The noise power spectral density remains below the background level of the system (10−24 A²/Hz) up to 5 V, for the undoped GaN MSM detector. [reprint (PDF)]
2.	Aluminum nitride films on different orientations of sapphire and silicon K. Dovidenko, S. Oktyabrsky, J. Narayan, and M. Razeghi Journal of Applied Physics79 (5)-- March 1, 1996 ...[Visit Journal] The details of epitaxial growth and microstrictural characteristics of AlN films grown on sapphire (0001), (1012) and Si (100), (111) substrates were investigated using plan‐view and cross‐sectional high‐resolution transmission electron microscopy and x‐ray diffraction techniques. The films were grown by metalorganic chemical vapor deposition using TMA1+NH3+N2 gas mixtures. Different degrees of epitaxy were observed for the films grown on α‐Al₂O₃ and Si substrates in different orientations. The epitaxial relationship for (0001) sapphire was found to be (0001)AlN∥(0001)sap with in‐plane orientation relationship of [0110]AlN∥[1210]sap. This is equivalent to a 30° rotation in the basal (0001) plane. For (1012) sapphire substrates, the epitaxial relationship was determined to be (1120)AlN∥(1012)sap with the in‐plane alignment of [0001]AlN∥[1011]sap. The AlN films on (0001) α‐Al₂O₃ were found to contain inverted domain boundaries and a/3〈1120〉 threading dislocations with the estimated density of 10¹⁰ cm⁻². The density of planar defects (stacking faults) found in AlN films was considerably higher in the case of (1012) compared to (0001) substrates. Films on Si substrates were found to be highly textured c axis oriented when grown on (111) Si, and c axis textured with random in‐plane orientation on (100) Si. The role of thin‐film defects and interfaces on device fabrication is discussed. [reprint (PDF)]
2.	Scale-up of the Chemical Lift-off of (In)GaN-based p-i-n Junctions from Sapphire Substrates Using Sacrificial ZnO Template Layers D. J. Rogers, S. Sundaram, Y. El Gmili, F. Hosseini Teherani, P. Bove, V. Sandana, P. L. Voss, A. Ougazzaden, A. Rajan, K.A. Prior, R. McClintock, & M. Razeghi Proc. SPIE 9364, Oxide-based Materials and Devices VI, 936424 -- March 24, 2015 ...[Visit Journal] (In)GaN p-i-n structures were grown by MOVPE on both GaN- and ZnO-coated c-sapphire substrates. XRD studies of the as-grown layers revealed that a strongly c-axis oriented wurtzite crystal structure was obtained on both templates and that there was a slight compressive strain in the ZnO underlayer which increased after GaN overgrowth. The InGaN peak position gave an estimate of 13.6at% for the indium content in the active layer. SEM and AFM revealed that the top surface morphologies were similar for both substrates, with an RMS roughness (5 μm x 5 μm) of about 10 nm. Granularity appeared slightly coarser (40nm for the device grown on ZnO vs 30nm for the device grown on the GaN template) however. CL revealed a weaker GaN near band edge UV emission peak and a stronger broad defect-related visible emission band for the structure grown on the GaN template. Only a strong ZnO NBE UV emission was observed for the sample grown on the ZnO template. Quarter-wafer chemical lift-off (CLO) of the InGaN-based p-i-n structures from the sapphire substrate was achieved by temporary-bonding the GaN surface to rigid glass support with wax and then selectively dissolving the ZnO in 0.1M HCl. XRD studies revealed that the epitaxial nature and strong preferential c-axis orientation of the layers had been maintained after lift-off. This demonstration of CLO scale-up, without compromising the crystallographic integrity of the (In)GaN p-i-n structure opens up the perspective of transferring GaN based devices off of sapphire substrates industrially. [reprint (PDF)]
2.	Geiger-mode operation of ultraviolet avalanche photodiodes grown on sapphire and free-standing GaN substrates E. Cicek, Z. Vashaei, R. McClintock, C. Bayram, and M. Razeghi Applied Physics Letters, Vol. 96, No. 26, p. 261107 (2010);-- June 28, 2010 ...[Visit Journal] GaN avalanche photodiodes (APDs) were grown on both conventional sapphire and low dislocation density free-standing (FS) c-plane GaN substrates. Leakage current, gain, and single photon detection efficiency (SPDE) of these APDs were compared. At a reverse-bias of 70 V, APDs grown on sapphire substrates exhibited a dark current density of 2.7×10⁻⁴ A/cm² whereas APDs grown on FS-GaN substrates had a significantly lower dark current density of 2.1×10⁻⁶ A/cm². Under linear-mode operation, APDs grown on FS-GaN achieved avalanche gain as high as 14 000. Geiger-mode operation conditions were studied for enhanced SPDE. Under front-illumination the 625 μm² area APD yielded a SPDE of 13% when grown on sapphire substrates compared to more than 24% when grown on FS-GaN. The SPDE of the same APD on sapphire substrate increased to 30% under back-illumination—the FS-GaN APDs were only tested under front illumination due to the thick absorbing GaN substrate. [reprint (PDF)]
2.	Background limited long wavelength infrared type-II InAs/GaSb superlattice photodiodes operating at 110 K B.M. Nguyen, D. Hoffman, E.K. Huang, P.Y. Delaunay, and M. Razeghi Applied Physics Letters, Vol. 93, No. 12, p. 123502-1-- September 22, 2008 ...[Visit Journal] The utilization of the P+-pi-M-N+ photodiode architecture in conjunction with a thick active region can significantly improve long wavelength infrared Type-II InAs/GaSb superlattice photodiodes. By studying the effect of the depletion region placement on the quantum efficiency in a thick structure, we achieved a topside illuminated quantum efficiency of 50% for an N-on-P diode at 8.0 µm at 77 K. Both the double heterostructure design and the application of polyimide passivation greatly reduce the surface leakage, giving an R₀A of 416 Ω·cm² for a 1% cutoff wavelength of 10.52 µm, a Shot–Johnson detectivity of 8.1×10¹¹ cm·Hz^½/W at 77 K, and a background limited operating temperature of 110 K with 300 K background. [reprint (PDF)]
2.	Recent advances in high power mid- and far-wavelength infrared lasers for free space communication S. Slivken and M. Razeghi SPIE Optics East Conference, October 1-4, 2006, Boston, MA Proceedings – Active and Passive Optical Components for Communications VI, Vol. 6389, p. 63890S-1-- October 4, 2006 ...[Visit Journal] Link reliability is a significant issue for free space optical links. Inclement weather, such as fog, can seriously reduce the transmission of light through the atmosphere. However, this effect, for some types of fog, is wavelength-dependent. In order to improve link availability in both metro and hostile environments, mid- and far-wavelength infrared diode lasers can be of use. This paper will discuss some of the recent advances in high-power, uncooled quantum cascade lasers and their potential for use in long range and/or highly reliable free space communication links. [reprint (PDF)]
2.	Electroluminescence of InAs/GaSb heterodiodes D. Hoffman, A. Hood, E. Michel, F. Fuchs, and M. Razeghi IEEE Journal of Quantum Electronics, 42 (2)-- February 1, 2006 ...[Visit Journal] The electroluminescence of a Type-II InAs-GaSb superlattice heterodiode has been studied as a function of injection current and temperature in the spectral range between 3 and 13 μm. The heterodiode comprises a Be-doped midwavelength infrared (MWIR) superlattice with an effective bandgap around 270 meV and an undoped long wavelength infrared (LWIR) superlattice with an effective bandgap of 115 meV. [reprint (PDF)]
2.	High Performance Quantum Cascade Lasers at λ ~ 6 μm M. Razeghi, S. Slivken, J. Yu, A. Evans, and J. David Microelectronics Journal, 34 (5-8)-- May 1, 2003 ...[Visit Journal] This talk will focus on the recent efforts at the Center for Quantum Devices to deliver a high average power quantum cascade laser source at λ ~6 μm. Strain-balancing is used to reduce leakage for these shorter wavelength quantum cascade lasers. Further, the effect of reducing the doping in the injector is explored relative to the threshold current density and maximum average output power. Lastly, to demonstrate more of the potential of these devices, epilayer down bonding is explored as a technique to significantly enhance device performance. [reprint (PDF)]
2.	High Detectivity GaInAs/InP Quantum Well Infrared Photodetectors Grown on Si Substrates J. Jiang, C. Jelen, M. Razeghi and G.J. Brown IEEE Photonics Technology Letters 14 (3)-- March 1, 2002 ...[Visit Journal] In this letter, we report an improvement in the growth and the device performance of GaInAs-InP quantum well infrared photodetectors grown on Si substrates. Material growth techniques, like low-temperature nucleation layers and thick buffer layers were used to grow InP on Si. An in situ thermal cycle annealing technique was used to reduce the threading dislocation density in the InP-on-Si. Detector dark current was reduced 2 orders of magnitude by this method. Record high detectivity of 2.3 × 10⁹ cm·Hz^½·W^-1 was obtained for QWIP-on-Si detectors in the 7-9 μm range at 77 K [reprint (PDF)]
2.	Growth and characterization of InGaAs/InGaP quantum dots for mid-infrared photoconductive detector S. Kim, H. Mohseni, M. Erdtmann, E. Michel, C. Jelen and M. Razeghi Applied Physics Letters 73 (7)-- August 17, 1998 ...[Visit Journal] We report InGaAs quantum dot intersubband infrared photodetectors grown by low-pressure metalorganic chemical vapor deposition on semi-insulating GaAs substrates. The optimum growth conditions were studied to obtain uniform InGaAs quantum dots constructed in an InGaP matrix. Normal incidence photoconductivity was observed at a peak wavelength of 5.5 μm with a high responsivity of 130 mA/W and a detectivity of 4.74×10⁷ cm· Hz^½/W at 77 K. [reprint (PDF)]
2.	Infrared Imaging Arrays Using Advanced III-V Materials and technology M. Razeghi, J.D. Kim, C. Jelen, S. Slivken, E. Michel, H. Mohseni, J.J. Lee, J. Wojkowski, K.S. Kim, H.I. Jeon, and J. X IEEE Proceedings, Advanced Workshop on Frontiers in Electronics (WOFE), Tenerife, Spain;-- January 6, 1997 ...[Visit Journal] Photodetectors operating in the 3-5 and 8-12 μm atmospheric windows are of great importance for applications in infrared (IR) thermal imaging. HgCdTe has been the dominant material system for these applications. However, it suffers from instability and non-uniformity problems over large areas due to high Hg vapor pressure during the material, growth. There has been a lot of interest in the use of heteroepitaxially grown Sb-based alloys, its strained layer superlattices, and GaAs based quantum wells as alternatives to MCT. This interest has been driven by the advanced material growth and processing technology available for the III-V material system [reprint (PDF)]
2.	High-performance, continuous-wave operation of λ ~ 4.6 μm quantum-cascade lasers above room temperature J.S. Yu, S. Slivken, A. Evans and M. Razeghi IEEE Journal of Quantum Electronics, Vol. 44, No. 8, p. 747-754-- August 1, 2008 ...[Visit Journal] We report the high-performance continuous-wave (CW) operation of 10-μm-wide quantum-cascade lasers (QCLs) emitting at λ ~ 4.6 μm, based on the GaInAs–AlInAs material without regrowth, in epilayer-up and -down bonding configurations. The operational characteristics of QCLs such as the maximum average power, peak output power, CW output power, and maximum CW operating temperature are investigated, depending on cavity length. Also, important device parameters, i.e., the waveguide loss, the transparency current density, the modal gain, and the internal quantum efficiency, are calculated from length-dependent results. For a high-reflectivity (HR) coated 4-mm-long cavity with epilayer-up bonding, the highest maximum average output power of 633 mW is measured at 65% duty cycle, with 469 mW still observed at 100%. The laser exhibits the maximum wall-plug efficiencies of 8.6% and 3.1% at 298 K, in pulsed and CW operatons, respectively. From 298 to 393 K, the temperature dependent threshold current density in pulsed operation shows a high characteristic temperature of 200 K. The use of an epilayer-down bonding further improves the device performance. A CW output power of 685 mW at 288 K is achieved for the 4-micron-long cavity. At 298 K, the output power of 590 mW, threshold current density of 1.52 kA / cm2, and maximum wall-plug efficiency of 3.73% are obtained under CW mode, operating up to 363 K (90 °C). For HR coated 3-micron-long cavities, laser characteristics across the same processed wafer show a good uniformity across the area of 2 x 1 cm², giving similar output powers, threshold current densities, and emission wavelengths. The CW beam full-width at half-maximum of far-field patterns are 25 degree and 46 degree for the parallel and the perpendicular directions, respectively. [reprint (PDF)]
2.	Multi-band SWIR-MWIR-LWIR Type-II superlattice based infrared photodetector Manijeh Razeghi, Arash Dehzangi, Jiakai Li Results in Optics Volume 2, January 2021, 100054 https://doi.org/10.1016/j.rio.2021.100054 ...[Visit Journal] Type-II InAs/GaSb superlattices (T2SLs) has drawn a lot of attention since it was introduced in 1970, especially for infrared detection as a system of multi-interacting quantum wells. In recent years, T2SL material system has experienced incredible improvements in material quality, device structure designs and device fabrication process, which elevated the performances of T2SL-based photo-detectors to a comparable level to the state-of-the-art material systems for infrared detection such as Mercury Cadmium Telluride (MCT). As a pioneer in the field, center for quantum devices (CQD) has been involved in growth, design, characterization, and introduction of T2SL material system for infrared photodetection. In this review paper, we will present the latest development of bias-selectable multi-band infrared photodetectors at the CQD, based on InAs/GaSb/AlSb and InAs/InAs1-xSbx type-II superlattice. [reprint (PDF)]
2.	High power operation of λ ∼ 5.2–11 μm strain balanced quantum cascade lasers based on the same material composition N. Bandyopadhyay, Y. Bai, S. Slivken, and M. Razeghi Appl. Phys. Lett. 105, 071106 (2014)-- August 20, 2014 ...[Visit Journal] A technique based on composite quantum wells for design and growth of strain balanced Al_0.63In_0.37As/Ga_0.35In_0.65As/Ga_0.47In_0.53As quantum cascade lasers (QCLs) by molecular beam epitaxy (MBE), emitting in 5.2–11 μm wavelength range, is reported. The strained Al_0.63In_0.37As provides good electron confinement at all wavelengths, and strain balancing can be achieved through composite wells of Ga_0.35In_0.65As/Ga_0.47In_0.53As for different wavelength. The use of these fixed composition materials can avoid the need for frequent calibration of a MBE reactor to grow active regions with different strain levels for different wavelengths. Experimental results for QCLs emitting at 5.2, 6.7, 8.2, 9.1, and 11 μm exhibit good wall plug efficiencies and power across the whole wavelength range. It is shown that the emission wavelength can be predictably changed using the same design template. These lasers are also compatible with a heterogeneous broadband active region, consisting of multiple QCL cores, which can be produced in a single growth run. [reprint (PDF)]
2.	Low irradiance background limited type-II superlattice MWIR M-barrier imager E.K. Huang, S. Abdollahi Pour, M.A. Hoang, A. Haddadi, M. Razeghi and M.Z. Tidrow OSA Optics Letters (OL), Vol. 37, No. 11, p. 2025-2027-- June 1, 2012 ...[Visit Journal] We report a type-II superlattice mid-wave infrared 320 × 256 imager at 81 K with the M-barrier design that achieved background limited performance (BLIP) and ∼99%operability. The 280 K blackbody’s photon irradiance was limited by an aperture and a band-pass filter from 3.6 μm to 3.8 μm resulting in a total flux of ∼5 × 10¹² ph·cm⁻²·s⁻¹. Under these low-light conditions, and consequently the use of a 13.5 ms integration time, the imager was observed to be BLIP thanks to a ∼5 pA dark current from the 27 μm wide pixels. The total noise was dominated by the photon flux and read-out circuit which gave the imager a noise equivalent input of ∼5 × 10¹⁰ ph·cm⁻²·s⁻¹ and temperature sensitivity of 9 mK with F∕2.3 optics. Excellent imagery obtained using a 1-point correction alludes to the array’s uniform responsivity. [reprint (PDF)]
2.	Al_xGa_1-xN (0 ≤ x ≤ 1) Ultraviolet Photodetectors Grown on Sapphire by Metal-organic Chemical-vapor Deposition D. Walker, X. Zhang, A. Saxler, P. Kung, J. Xu, and M. Razeghi Applied Physics Letters 70 (8)-- February 24, 1997 ...[Visit Journal] Al_xGa_1–xN (0 ≤ x ≤ 1) ultraviolet photoconductors with cutoff wavelengths from 365 to 200 nm have been fabricated and characterized. The maximum detectivity reached 5.5 × 10⁸ cm·Hz^1/2/W at a modulating frequency of 14 Hz. The effective majority carrier lifetime in Al_xGa_1–xN materials, derived from frequency-dependent photoconductivity measurements, has been estimated to be from 6 to 35 ms. The frequency-dependent noise spectrum shows that it is dominated by Johnson noise at high frequencies for low-Al-composition samples. [reprint (PDF)]
2.	High power, high wall-plug efficiency, high reliability, continuous-wave operation quantum cascade lasers at Center for Quantum Devices Razeghi, Manijeh SPIE Proceedings Volume 11296, Optical, Opto-Atomic, and Entanglement-Enhanced Precision Metrology II; 112961C-- February 25, 2020 ...[Visit Journal] Since the demonstration of the first quantum cascade laser (QCL) in 1997, QCLs have undergone considerable developments in output power, wall plug efficiency (WPE), beam quality, wavelength coverage and tunability. Among them, many world-class breakthroughs were achieved at the Center for Quantum Device at Northwestern University. In this paper, we will discuss the recent progress of our research and present the main contributions of the Center for Quantum Devices to the QCL family on high power, high wall-plug efficiency (WPE), continuous-wave (CW) and room temperature operation lasers. [reprint (PDF)]
2.	A detailed analysis of carrier transport in InAs0.3Sb0.7 layers grown on GaAs substrates by metalorganic chemical vapor deposition C. Besikci, Y.H. Choi, G. Labeyrie, E. Bigan and M. Razeghi with J.B. Cohen, J. Carsello, and V.P. Dravid Journal of Applied Physics 76 (10)-- November 15, 1994 ...[Visit Journal] InAs_0.3Sb_0.7 layers with mirrorlike morphology have been grown on GaAs substrates by low‐pressure metalorganic chemical vapor deposition. A room‐temperature electron Hall mobility of 2×10⁴ cm²/V· s has been obtained for a 2 μm thick layer. Low‐temperature resistivity of the layers depended on TMIn flow rate and layer thickness. Hall mobility decreased monotonically with decreasing temperature below 300 K. A 77 K conductivity profile has shown an anomalous increase in the sample conductivity with decreasing thickness except in the near vicinity of the heterointerface. In order to interpret the experimental data, the effects of different scattering mechanisms on carrier mobility have been calculated, and the influences of the lattice mismatch and surface conduction on the Hall measurements have been investigated by applying a three‐layer Hall‐effect model. Experimental and theoretical results suggest that the combined effects of the dislocations generated by the large lattice mismatch and strong surface inversion may lead to deceptive Hall measurements by reflecting typical n‐type behavior for a p‐type sample, and the measured carrier concentration may considerably be affected by the surface conduction up to near room temperature. A quantitative analysis of dislocation scattering has shown significant degradation in electron mobility for dislocation densities above 10⁷ cm⁻². The effects of dislocation scattering on hole mobility have been found to be less severe. It has also been observed that there is a critical epilayer thickness (∼1 μm) below which the surface electron mobility is limited by dislocation scattering. [reprint (PDF)]

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