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1.  280 nm UV LEDs Grown on HVPE GaN Substrates
A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, M. Razeghi, and R.J. Molnar
Opto-Electronics Review, 10 (4)-- January 1, 2002 ...[Visit Journal]
We report on the enhancement of optical and electrical properties of 280 nm UV LEDs using low dislocation density HVPE-grown GaN substrate. Compared with the same structure grown on sapphire, these LEDs show ~30% reduction in current-voltage differential resistance, ~15% reduction in turn-on voltage, more than 200% increase in output power slope efficiency and saturation at higher currents. Lower density of defects due to higher material quality and better heat dissipation are believed to be the reason behind these improvements. [reprint (PDF)]
 
1.  Growth and Characterization of Very Long Wavelength Type-II Infrared Detectors
H. Mohseni, A. Tahraoui, J. Wojkowski, M. Razeghi, W. Mitchel, and A. Saxler
SPIE Conference, San Jose, CA, -- January 26, 2000 ...[Visit Journal]
We report on the growth and characterization of type-II IR detectors with a InAs/GaSb superlattice active layer in the 15-19 μm wavelength range. The material was grown by molecular beam epitaxy on semi-insulating GaAs substrates. The material was processed into photoconductive detectors using standard photolithography, dry etching, and metalization. The 50 percent cut-off wavelength of the detectors is about 15.5 μm with a responsivity of 90 mA/W at 80 K. The 90 percent-10 percent cut-off energy width of the responsivity is only 17 meV which is an indication of the uniformity of the superlattices. These are the best reported values for type-II superlattices grown on GaAs substrates. [reprint (PDF)]
 
1.  InAsSb/InAsP strained-layer superlattice injection lasers operating at 4.0 μm grown by metal-organic chemical vapor deposition
B. Lane, Z. Wu, A. Stein, J. Diaz, and M. Razeghi
Applied Physics Letters 74 (23)-- June 7, 1999 ...[Visit Journal]
We report high power mid-infrared electrical injection operation of laser diodes based on InAsSb/InAsP strained-layer superlattices grown on InAs substrate by metal-organic chemical vapor deposition. The broad-area laser diodes with 100 μm aperture and 1800 μm cavity length demonstrate peak output powers of 546 and 94 mW in pulsed and cw operation respectively at 100 K with a threshold current density as low as 100 A/cm². [reprint (PDF)]
 
1.  Schottky MSM Photodetectors on GaN Films Grown on Sapphire by Lateral Epitaxial Overgrowth
P. Kung, D. Walker, P. Sandvik, M. Hamilton, J. Diaz, I.H. Lee and M. Razeghi
SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal]
We report the growth and characterization of Schottky based metal-semiconductor-metal ultraviolet photodetectors fabricated on lateral epitaxially overgrown GaN films. The lateral epitaxial overgrowth of GaN was carried out on basal plane sapphire substrates by low pressure metalorganic chemical vapor deposition and exhibited lateral growth rates more than 5 times as high as vertical growth rates. The spectral responsivity, the dependence on bias voltage, on incident optical power, and the time response of these photodetectors have been characterized. Two detector orientations were investigated: one with the interdigitated finger pattern parallel and the other perpendicular to the underlying SiOx mask stripes. [reprint (PDF)]
 
1.  High Carrier Lifetime InSb Grown on GaAs Substrates
E. Michel, H. Mohseni, J.D. Kim, J. Wojkowski, J. Sandven, J. Xu, M. Razeghi, R. Bredthauer, P. Vu, W. Mitchel, and M. Ahoujja
Applied Physics Letters 71 (8-- August 25, 1997 ...[Visit Journal]
We report on the growth of near bulklike InSb on GaAs substrates by molecular beam epitaxy despite the 14% lattice mismatch between the epilayer and the substrate. Structural, electrical, and optical properties were measured to assess material quality. X-ray full widths at half-maximum were as low as 55 arcsec for a 10 µm epilayer, peak mobilities as high as ~ 125 000 cm2/V s, and carrier lifetimes up to 240 ns at 80 K. [reprint (PDF)]
 
1.  Infrared Imaging Arrays Using Advanced III-V Materials and technology
M. Razeghi, J.D. Kim, C. Jelen, S. Slivken, E. Michel, H. Mohseni, J.J. Lee, J. Wojkowski, K.S. Kim, H.I. Jeon, and J. X
IEEE Proceedings, Advanced Workshop on Frontiers in Electronics (WOFE), Tenerife, Spain;-- January 6, 1997 ...[Visit Journal]
Photodetectors operating in the 3-5 and 8-12 μm atmospheric windows are of great importance for applications in infrared (IR) thermal imaging. HgCdTe has been the dominant material system for these applications. However, it suffers from instability and non-uniformity problems over large areas due to high Hg vapor pressure during the material, growth. There has been a lot of interest in the use of heteroepitaxially grown Sb-based alloys, its strained layer superlattices, and GaAs based quantum wells as alternatives to MCT. This interest has been driven by the advanced material growth and processing technology available for the III-V material system [reprint (PDF)]
 
1.  UV photodetectors based on AlxGa1-xN grown by MOCVD
A. Saxler, D. Walker, X. Zhang, P. Kung, J. Xu, and M. Razeghi
SPIE Photonics West '96 Photodetectors: Materials and Devices; Proceedings 2685-- January 27, 1996 ...[Visit Journal]
Metalorganic chemical vapor deposition was used to deposit AlxGa1-xN active layers with varying aluminum compositions on basal plane sapphire substrate. AlxGa1-xN (x < 0.5) ultraviolet photodetectors have been fabricated and characterized with cut-off wavelengths as short as 260 nm. Carrier lifetimes on the order of 10 milliseconds were estimated from frequency dependent measurements of the responsivity. [reprint (PDF)]
 
1.  Crystallography of epitaxial growth of wurtzite-type thin films on sapphire substrates
P. Kung, C.J. Sun, A. Saxler, H. Ohsato, and M. Razeghi
Journal of Applied Physics 75 (9)-- May 1, 1994 ...[Visit Journal]
In this article, we present a crystallographic model to describe the epitaxial growth of wurtzite‐type thin films such as gallium nitride (GaN) on different orientations of sapphire (Al2O3) substrates. Through this model, we demonstrate the thin films grown on (00⋅1)Al2O3 have a better epilayer‐substrate interface quality than those grown on (01⋅2)Al2O3. We also show the epilayer grown on (00⋅1)Al2O3 are gallium‐terminated, and both (00⋅1) and (01⋅2) surfaces of sapphire crystals are oxygen‐terminated. [reprint (PDF)]
 
1.  Aluminum-free Quantum Well Intersubband Photodetectors with p-type GaAs Wells and lattice-matched ternary and quaternary barriers
J. Hoff, E. Bigan, G.J. Brown, and M. Razeghi
Optoelectronic Integrated Circuit Materials, Physics and Devices, SPIE Conference, San Jose, CA; Proceedings, Vol. 2397-- February 6, 1995 ...[Visit Journal]
Acceptor doped Quantum Well Intersubband Photodetectors with GaAs wells and lattice matched barriers of both ternary (In0.49Ga0.51P) and quaternary (In0.62Ga0.38As0.22P0.78) materials have been grown on semi-insulating GaAs substrates by Low Pressure Metal Organic Chemical Vapor Deposition. Mesa devices were fabricated and subjected to a series of tests to illuminate experimentally some of the detection capabilities of the lattice matched quaternary InxGa1-xAsyP1-y system with (0 ≤ x ≤ 0.52) and (0 ≤ y ≤ 1). The observed photoresponse cut-off wavelengths are in good agreement with the activation energies observed in the temperature dependence of the dark currents. Kronig-Penney calculations were used to model the intersubband transition energies. [reprint (PDF)]
 
1.  High Power 0.98 μm GaInAs/GaAs/GaInP Multiple Quantum Well Laser
K. Mobarhan, M. Razeghi, G. Marquebielle and E. Vassilaki
Journal of Applied Physics 72 (9)-- November 1, 1992 ...[Visit Journal]
We report the fabrication of high quality Ga0.8In0.2As/GaAs/Ga0.51In0.49P multiple quantum well laser emitting at 0.98 μm grown by low pressure metalorganic chemical vapor deposition. Continuous wave operation with output power of 500 mW per facet was achieved at room temperature for a broad area laser with 130 μm width and 300 μm cavity length. This is an unusually high value of output power for this wavelength laser in this material system. The differential quantum efficiency exceeded 75% with excellent homogeneity and uniformity. The characteristic temperature, T0 was in the range of 120–130 K. [reprint (PDF)]
 
1.  AlxGa1−xN-based solar-blind ultraviolet photodetector based on lateral epitaxial overgrowth of AlN on Si substrate
E. Cicek, R. McClintock, C. Y. Cho, B. Rahnema, and M. Razeghi
Appl. Phys. Lett. 103, 181113 (2013)-- October 30, 2013 ...[Visit Journal]
We report on AlxGa1−xN-based solar-blind ultraviolet (UV) photodetector (PD) grown on Si(111) substrate. First, Si(111) substrate is patterned, and then metalorganic chemical vapor deposition is implemented for a fully-coalesced ∼8.5 μm AlN template layer via a pulsed atomic layer epitaxial growth technique. A back-illuminated p-i-n PD structure is subsequently grown on the high quality AlN template layer. After processing and implementation of Si(111) substrate removal, the optical and electrical characteristic of PDs are studied. Solar-blind operation is observed throughout the array; at the peak detection wavelength of 290 nm, 625 μm² area PD showed unbiased peak external quantum efficiency and responsivity of ∼7% and 18.3 mA/W, respectively, with a UV and visible rejection ratio of more than three orders of magnitude. Electrical measurements yielded a low-dark current density below 1.6 × 10−8 A/cm² at 10 V reverse bias. [reprint (PDF)]
 
1.  Investigation of MgZnO/ZnO heterostructures grown on c-sapphire substrates by pulsed laser deposition
D. J. Rogers ; F. Hosseini Teherani ; P. Bove ; A. Lusson ; M. Razeghi
Proc. SPIE 8626, Oxide-based Materials and Devices IV, 86261X (March 18, 2013)-- March 18, 2013 ...[Visit Journal]
MgZnO thin films were grown on c-sapphire and ZnO-coated c-sapphire substrates by pulsed laser deposition from a ZnMgO target with 4 at% Mg. The MgZnO grown on the ZnO underlayer showed significantly better crystal quality than that grown directly on sapphire. AFM studies revealed a significant deterioration in surface morphology for the MgZnO layers compared with the ZnO underlayer. Optical transmission studies indicated a MgZnO bandgap of 3.61eV (compared with 3.34eV for the ZnO), which corresponds to a Mg content of about 16.1 at%. The MgZnO/ZnO heterojunction showed an anomalously low resistivity, which was more than two orders of magnitude less than the MgZnO layer and an order of magnitude lower than that for the ZnO layer. It was suggested that this may be attributable to the presence of a 2D electron gas at the ZnMgO/ZnO heterointerface. [reprint (PDF)]
 
1.  Sampled grating, distributed feedback quantum cascade lasers with broad tunability and continuous operation at room temperature
S. Slivken, N. Bandyopadhyay, S. Tsao, S. Nida, Y. Bai, Q.Y. Lu and M. Razeghi
Applied Physics Letters, Vol. 100, No. 26, p. 261112-1-- June 25, 2012 ...[Visit Journal]
A dual-section, single-mode quantum cascade laser is demonstrated in continuous wave at room temperature with up to 114 nm (50 cm−1) of tuning near a wavelength of 4.8 μm. Power above 100 mW is demonstrated, with a mean side mode suppression ratio of 24 dB. By changing the grating period, 270 nm (120 cm−1) of gap-free electrical tuning for a single gain medium has been realized. [reprint (PDF)]
 
1.  Stable single mode terahertz semiconductor sources at room temperature
M. Razeghi
2011 International Semiconductor Device Research Symposium, ISDRS [6135180] (2011).-- December 7, 2011 ...[Visit Journal]
Terahertz (THz) range is an area of the electromagnetic spectra which has lots of applications but it suffers from the lack of simple working devices which can emit THz radiation, such as the high performance mid-infrared (mid-IR) quantum cascade lasers (QCLs) based on InP technology. The applications for the THz can be found in astronomy and space research, biology imaging, security, industrial inspection, etc. Unlike THz QCLs based on the fundamental oscillators, which are limited to cryogenic operations, semiconductor THz sources based on nonlinear effects of mid-IR QCLs do not suffer from operating temperature limitations, because mid-IR QCLs can operate well above room temperature. THz sources based on difference frequency generation (DFG) utilize nonlinear properties of asymmetric quantum structures, such as QCL structures. [reprint (PDF)]
 
1.  Performance enhancement of GaN ultraviolet avalanche photodiodes with p-type delta-doping
C. Bayram, J.L. Pau, R. McClintock and M. Razeghi
Applied Physics Letters, Vol. 92, No. 24, p. 241103-1-- June 16, 2008 ...[Visit Journal]
High quality delta-doped p-GaN is used as a means of improving the performance of back-illuminated GaN avalanche photodiodes (APDs). Devices with delta-doped p-GaN show consistently lower leakage current and lower breakdown voltage than those with bulk p-GaN. APDs with delta-doped p-GaN also achieve a maximum multiplication gain of 5.1×104, more than 50 times higher than that obtained in devices with bulk p-GaN. The better device performance of APDs with delta-doped p-GaN is attributed to the higher structural quality of the p-GaN layer achieved via delta-doping. [reprint (PDF)]
 
1.  Passivation of type-II InAs/GaSb double heterostructure
P.Y. Delaunay, A. Hood, B.M. Nguyen, D. Hoffman, Y. Wei, and M. Razeghi
Applied Physics Letters, Vol. 91, No. 9, p. 091112-1-- August 27, 2007 ...[Visit Journal]
Focal plane array fabrication requires a well passivated material that is resistant to aggressive processes. The authors report on the ability of type-II InAs/GaSb superlattice heterodiodes to be more resilient than homojunctions diodes in improving sidewall resistivity through the use of various passivation techniques. The heterostructure consisting of two wide band gap (5 µm) superlattice contacts and a low band gap active region (11 µm) exhibits an R0A averaging of 13·Ω cm2. The devices passivated with SiO2, Na2S and SiO2 or polyimide did not degrade compared to the unpassivated sample and the resistivity of the sidewalls increased to 47 kΩ·cm. [reprint (PDF)]
 
1.  Fabrication of GaN Nanotubular Material using MOCVD with an Aluminium Oxide Membrane
W.G. Jung, S.H. Jung, P. Kung, and M. Razeghi
Nanotechnology 17-- January 1, 2006 ...[Visit Journal]
GaN nanotubular material is fabricated with an aluminium oxide membrane in MOCVD. SEM, XRD, TEM and PL are employed to characterize the fabricated GaN nanotubular material. An aluminium oxide membrane with ordered nanoholes is used as a template. Gallium nitride is deposited at the inner wall of the nanoholes in the aluminium oxide template, and the nanotubular material with high aspect ratio is synthesized using the precursors of TMG and ammonia gas. Optimal synthesis conditions in MOCVD are obtained successfully for the gallium nitride nanotubular material in this research. The diameter of the GaN nanotube fabricated is approximately 200–250 nm and the wall thickness is about 40–50 nm. [reprint (PDF)]
 
1.  AlGaN-based deep UV light emitting diodes with peak emission below 255 nm
A. Yasan, R. McClintock, K. Mayes, P. Kung, and M. Razeghi
SPIE Conference, Jose, CA, Vol. 5732, pp. 197-- January 22, 2005 ...[Visit Journal]
We report on the growth and fabrication of AlGaN-based deep ultraviolet light-emitting diodes (LEDs) with peak emission of below 255 nm. In order to achieve such short wavelength UV LEDs, the Al mole fractions in the device layers should be greater than ~60%. This introdues serious challenges on the growth and doping of AlxGa1-xN epilayers. However, with the aid of a high-quality AlN template layer and refinement of the growth conditions we have been able to demonstrate UV LEDs emitting below 255 nm. [reprint (PDF)]
 
1.  High-Average-Power, High-Duty-Cycle (~6 μm) Quantum Cascade Lasers
S. Slivken, A. Evans, J. David, and M. Razeghi
Virtual Journal of Nanoscience & Technology 9-- December 9, 2002 ...[Visit Journal][reprint (PDF)]
 
1.  High Power 3-12 μm Infrared Lasers: Recent Improvements and Future Trends
M. Razeghi, S. Slivken, A. Tahraoui, A. Matlis, and Y.S. Park
Physica E: Low-Dimensional Systems and Nanostructures 11 (2-3)-- October 1, 2001 ...[Visit Journal]
In this paper, we discuss the progress of quantum cascade lasers (QCLs) grown by gas-source molecular beam epitaxy. Room temperature QCL operation has been reported for lasers emitting between 5-11 μm, with 9-11 μm lasers operating up to 425 K. Laser technology for the 3-5 μm range takes advantage of a strain-balanced active layer design. We also demonstrate record room temperature peak output powers at 9 and 11 μm (2.5 and 1 W, respectively) as well as record low 80K threshold current densities (250 A/cm²) for some laser designs. Preliminary distributed feedback (DFB) results are also presented and exhibit single mode operation for 9 μm lasers at room temperature. [reprint (PDF)]
 
1.  Solar-Blind AlxGa1-xN p-i-n Photodetectors grown on LEO and non-LEO GaN
P. Sandvik, D. Walker, P. Kung, K. Mi, F. Shahedipour, V. Kumar, X. Zhang, J. Diaz, C. Jelen, and M. Razeghi
SPIE Conference, San Jose, CA, Vol. 3948, pp. 265 -- January 26, 2000 ...[Visit Journal]
The III-Nitride material system is an excellent candidate for UV photodetector applications due to its wide, direct bandgaps and robust material nature. However, despite many inherent material advantages, the III-Nitride material system typically suffers from a large number of extended defects which degrade material quality and device performance. One technique aimed at reducing defect densities in these materials is lateral epitaxial overgrowth (LEO). In this work, we present a preliminary comparison between AlGaN UV, solar-blind p-i-n photodiodes fabricated form LEO GaN and non-LEO GaN. Improvements in both responsivity and rejection ratio are observed, however, further device improvements are necessary. For these, we focus on the optimization of the p- i-n structure and a reduction in contact resistivity to p- GaN and p-AlGaN layers. By improving the structure of the device, GaN p-i-n photodiodes were fabricated and demonstrate 86 percent internal quantum efficiency at 362 nm and a peak to visible rejection ratio of 105. Contact treatments have reduced the contact resistivity to p-GaN and p-AlGaN by over one order of magnitude form our previous results. [reprint (PDF)]
 
1.  GaN p-i-n photodiodes with high visible-to-ultraviolet rejection ratio
P. Kung, X. Zhang, D. Walker, A. Saxler, and M. Razeghi
SPIE Conference, San Jose, CA, -- January 28, 1998 ...[Visit Journal]
UV photodetectors are critical components in many applications, including UV astronomy, flame sensors, early missile threat warning and space-to-space communications. Because of the presence of strong IR radiation in these situations, the photodetectors have to be solar blind, i.e. able to detect UV radiation while not being sensitive to IR. AlxGa1-xN is a promising material system for such devices. AlxGa1-xN materials are wide bandgap semiconductors, with a direct bandgap whose corresponding wavelength can be continuously tuned from 200 to 365 nm. AlxGa1-xN materials are thus insensitive to visible and IR radiation whose wavelengths are higher than 365 nm. We have already reported the fabrication and characterization of AlxGa1-xN-based photoconductors with a cut-off wavelength tunable from 200 to 365 nm by adjusting the ternary alloy composition. Here, we present the growth and characterization of GaN p-i- n photodiodes which exhibit a visible-to-UV rejection ratio of 6 orders or magnitude. The thin films were grown by low pressure metalorganic chemical vapor deposition. Square mesa structures were fabricated using dry etching, followed by contact metallization. The spectral response, rejection ratio and transient response of these photodiodes is reported. [reprint (PDF)]
 
1.  Growth of InAsSb Alloys on GaAs and Si Substrates for Uncooled Infrared Photodetector Applications
J.D. Kim, H. Mohseni, J.S. Wojkowski, J.J. Lee and M. Razeghi
SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal]
In this paper, we report on the growth and characterization of InAsSb alloys on GaAs and Si substrates for uncooled infrared photodetector applications. The fabrication and characterization of photodetectors from the grown layers are also reported. The photovoltaic and photoconductive devices were grown on (100) GaAs and Si substrates, respectively, using molecular beam epitaxy (MBE). The composition of InAs>sub>1-xSbx layers was 0.95 in both cases and cut-off wavelength of 7-8 μm has been obtained. At 300 K, the photovoltaic detectors on GaAs substrates resulted in a sharp cut-off wavelength of 7.5 μm with a peak responsivity as high as 0.32 V/W at 6.5 micrometer. For the photoconductive detectors on Si substrates, cut-off wavelength of 8 μm has been observed with a responsivity of 6.3x10-2 V/W at 7 μm under an electric field of 420 V/m. [reprint (PDF)]
 
1.  Schottky barrier heights and conduction-band offsets of In1-xGaxAs1-yPy lattice matched to GaAs
J.K. Lee, Y.H. Cho, B.D. Choe, K.S. Kim, H.I. Jeon, H. Lim and M. Razeghi
Applied Physics Letters 71 (7)-- August 18, 1997 ...[Visit Journal]
The Schottky barrier heights of Au/In1−xGaxAs1−yPy contacts have been determined as a function of y by the capacitance–voltage and temperature dependent current–voltage characteristics measurements. The barrier height is observed to increase as y is increased for both n- and p-type materials, with a more rapid increase for the p-type material. The compositional variation of the barrier heights for Au/n-In1−xGaxAs1−yPy is found to be identical to that of the conduction-band offsets in In1−xGaxAs1−yPy/GaAs heterojunctions. A possible cause of this phenomenon is also discussed. [reprint (PDF)]
 
1.  Observation of Room Temperature Surface-Emitting Stimulated Emission from GaN:Ge by Optical pumping
X. Zhang, P. Kung, A. Saxler, D. Walker, and M. Razeghi
Journal of Applied Physics 80 (11)-- December 1, 1996 ...[Visit Journal]
Optically pumped surface-emitting stimulated emission at room temperature was observed from GaN:Ge grown by metalorganic chemical vapor deposition. The sample was optically pumped perpendicularly on the top surface while the stimulated emission was collected from the back colinearly with the pump beam. The cavity was formed by the GaN/air and GaN/sapphire interfaces without any other structure. The stimulated emission was gain guided by the pump beam. The threshold optical pump density for stimulated emission was approximately 2.8 MW/cm² and the linewidth was 2.5 nm. The emission from GaN:Ge showed a redshift as the pump density increased. The comparison between theoretical calculations and experimental results suggested that many-body interactions can account well for the redshift. [reprint (PDF)]
 

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