Center for Quantum Devices - Most Downloaded Journal Articles

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15.	Recent advances in InAs/InAs1- xSbx/AlAs1-xSbx gap-engineered Type-II superlattice-based photodetectors Manijeh Razeghi, Abbas Haddadi, Arash Dehzangi, Romain Chevallier, Thomas Yang Proc. SPIE 10177, Infrared Technology and Applications XLIII, 1017705 -- May 9, 2017 ...[Visit Journal] InAs/InAs1-xSbx/AlAs1-xSbx type-II superlattices (T2SLs) is a system of multi-interacting quantum wells. Since its introduction, this material system has drawn a lot of attention especially for infrared detection. In recent years, InAs/InAs1- xSbx/AlAs1-xSbx T2SL material system has experienced incredible improvements in material quality, device structure designs and device fabrication process which elevated the performances of T2SL-based photodetectors to a comparable level to the state-of-the-art material systems for infrared detection such as Mercury Cadmium Telluride (MCT). In this paper, we will present the current status of InAs/InAs1-xSbx/AlAs1-xSbx T2SL-based photodetectors for detection in different infrared regions, from short-wavelength (SWIR) to long-wavelength (LWIR) infrared, and the future outlook of this material system. [reprint (PDF)]
15.	Reliability in room-temperature negative differential resistance characteristics of low-aluminum contact AlGaN/GaN double-barrier resonant tunneling diodes C. Bayram, Z. Vashaei, and M. Razeghi Applied Physics Letters, Vol. 97, No. 18, p. 181109-1-- November 1, 2010 ...[Visit Journal] AlGaN/GaN resonant tunneling diodes (RTDs), consisting of 20% (10%) aluminum-content in double-barrier (DB) active layer, were grown by metal-organic chemical vapor deposition on freestanding polar (c-plane) and nonpolar (m-plane) GaN substrates. RTDs were fabricated into 35-μm-diameter devices for electrical characterization. Lower aluminum content in the DB active layer and minimization of dislocations and polarization fields increased the reliability and reproducibility of room-temperature negative differential resistance (NDR). Polar RTDs showed decaying NDR behavior, whereas nonpolar ones did not significantly. Averaging over 50 measurements, nonpolar RTDs demonstrated a NDR of 67 Ω, a current-peak-to-valley ratio of 1.08, and an average oscillator output power of 0.52 mW. [reprint (PDF)]
15.	Bias–selectable nBn dual–band long–/very long–wavelength infrared photodetectors based on InAs/InAsSb/AlAsSb type–II superlattices Abbas Haddadi, Arash Dehzangi, Romain Chevallier, Sourav Adhikary, & Manijeh Razeghi Nature Scientific Reports 7, Article number: 3379-- June 13, 2017 ...[Visit Journal] Type–II superlattices (T2SLs) are a class of artificial semiconductors that have demonstrated themselves as a viable candidate to compete with the state–of–the–art mercury–cadmium–telluride material system in the field of infrared detection and imaging. Within type–II superlattices, InAs/InAs_1−xSb_x T2SLs have been shown to have a significantly longer minority carrier lifetime. However, demonstration of high–performance dual–band photodetectors based on InAs/InAs_1−xSb_x T2SLs in the long and very long wavelength infrared (LWIR & VLWIR) regimes remains challenging. We report the demonstration of high–performance bias–selectable dual–band long–wavelength infrared photodetectors based on new InAs/InAsSb/AlAsSb type–II superlattice design. Our design uses two different bandgap absorption regions separated by an electron barrier that blocks the transport of majority carriers to reduce the dark current density of the device. As the applied bias is varied, the device exhibits well–defined cut–off wavelengths of either ∼8.7 or ∼12.5 μm at 77 K. This bias–selectable dual–band photodetector is compact, with no moving parts, and will open new opportunities for multi–spectral LWIR and VLWIR imaging and detection. [reprint (PDF)]
15.	AlGaN ultraviolet detectors M. Razeghi and A. Rogalski, SPIE Conference, San Jose, CA, -- February 12, 1997 ...[Visit Journal] Hitherto, the semiconductor ultraviolet (UV) detectors have been mainly fabricated using Si. Industries such as the aerospace, automotive, petroleum, and others have continuously provided the impetus pushing the development of fringe technologies which are tolerant of increasingly high temperatures and hostile environments. As a result, the main efforts are currently directed to anew generation of UV detectors fabricated from wide-band-gap semiconductors between them the most promising are diamond and AlGaN. The latest progress in development of AlGaN UV detectors is described in detail. [reprint (PDF)]
15.	Comparison of chemical and laser lift-off for the transfer of InGaN-based p-i-n junctions from sapphire to glass substrates D. J. Rogers ; P. Bove ; F. Hosseini Teherani ; K. Pantzas ; T. Moudakir ; G. Orsal ; G. Patriarche ; S. Gautier ; A. Ougazzaden ; V. E. Sandana ; R. McClintock ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862611 (March 18, 2013)-- March 18, 2013 ...[Visit Journal] InGaN-based p-i-n structures were transferred from sapphire to soda-lime glass substrates using two approaches: (1) laser-lift-off (LLO) and thermo-metallic bonding and (2) chemical lift-off (LLO) by means sacrificial ZnO templates and direct wafer bonding. Both processes were found to function at RT and allow reclaim of the expensive single crystal substrate. Both approaches have also already been demonstrated to work for the wafer-scale transfer of III/V semiconductors. Compared with the industry-standard LLO, the CLO offers the added advantages of a lattice match to InGaN with higher indium contents, no need for an interfacial adhesive layer (which facilitates electrical, optical and thermal coupling), no damaged/contaminated GaN surface layer, simplified sapphire reclaim (GaN residue after LLO may complicate reclaim) and cost savings linked to elimination of the expensive LLO process. [reprint (PDF)]
15.	Transport properties in n-type InSb films grown by metalorganic chemical vapor deposition S.N. Song, J.B. Ketterson, Y.H. Choi, R. Sudharsanan, and M. Razeghi Applied Physics Letters 63 (7)-- August 16, 1993 ...[Visit Journal] We have measured the temperature and magnetic field dependence of the Hall mobility and transverse magnetoresistance in n-type InSb films epitaxially grown on GaAs substrates by metalorganic chemical vapor deposition. The films show a giant magnetoresistance: e.g., at 240 K the resistivity increases over 20 times at a magnetic field of 5 T; the low field coefficient of resistivity at 77 K is as high as 47.5 μ·Ω· cm/G. The Hall mobility decreases with magnetic field and saturates at higher fields. By taking the interface carrier transport into account, the observed field dependence of the Hall mobility and magnetoresistance may be understood based on a two-layer model. [reprint (PDF)]
15.	TEG IN LP-MO CVD Ga 0 4 7 ln 0 S3 As-lnP SUPERLATTICE M. RAZEGHIM. A. POISSONJ. P. LARIVAINB. de CREMOUXJ. P. DUCHEMIN ELECTRONICS LETTERs, 1982 ,Vol. 18-- April 15, 1982 ...[Visit Journal] We report the first successful growth of Ga o .4. 7 In 0 . J3 As-InPsuperlattice by the low-pressure metalorganic chemicalvapour deposition technique, and evidence for TEG proper-ties in these structures. [reprint (PDF)]
15.	Use of Sacrificial Zinc Oxide Template Layers for Epitaxial Lift-Off of Yttria-Stabilised Zirconia Thin Films D. J. Rogers, T. Maroutian, V. E. Sandana, P. Lecoeur, F. H. Teherani, P. Bove and M. Razeghi Proc. of SPIE 11687, 116872C (2021) ...[Visit Journal] 275 nm-thick Yttria-stabilised zirconia (YSZ) layers were grown on 240 nm-thick epitaxial (0002)-oriented ZnO buffer layers on c-sapphire substrates by pulsed laser deposition (PLD). X-ray diffraction (XRD) studies revealed high quality epitaxial growth with the YSZ having a preferential (111) orientation and a root mean square surface roughness of 1.4 nm over an area of 10 um x 10 um. The YSZ top surface was then temporary bonded to an Apiezon W wax carrier and the sample was immersed in 0.1M HCl so as to preferentially etch/dissolve away the ZnO underlayer and release of the YSZ from the sapphire substrate. XRD revealed only the characteristic (111) peak of YSZ after lift-off and thus confirmed both the dissolution of the ZnO and the preservation of the crystallographic integrity of the YSZ on the wax carrier. Optical and Atomic Force Microscopy revealed some buckling, roughening and cracking of the lifted YSZ, however, which was probably due to tensile epitaxial strain release. [reprint (PDF)]
15.	Very Long Wavelength GaAs/GaInP Quantum Well Infrared Photodetectors C. Jelen, S. Slivken, G.J. Brown, and M. Razeghi SPIE Conference, San Jose, CA, -- February 12, 1997 ...[Visit Journal] We demonstrate long wavelength quantum well infrared photodetectors with GaAs quantum wells and GaInP barriers grown using gas-source molecular beam epitaxy. Wafers were grown with varying well widths. The optimum well width was 75 angstrom, which resulted in a detection peak at 13 μm and a cutoff wavelength of 15 μm. Dark current measurements of the samples with 15 μm cutoff wavelength show low dark current densities. The dark current characteristics have been investigated as a function of temperature and electron density in the well and compared to a model which takes into account thermionic emission and thermally assisted tunneling. The model is used to extract a saturation velocity of 1.5 x 10⁵ cm/s for electrons. The photoelectron lifetime before recapture has been deduced from this carrier velocity and photoconductive gain measurements. The lifetime is found to be approximately 5 ps. Preliminary focal plane array imaging is demonstrated. [reprint (PDF)]
15.	Compressively-strained multiple quantum well InAsSb lasers emitting at 3.6 μm grown by metal-organic chemical vapor deposition B. Lane, D. Wu, A. Rybaltowski, H. Yi, J. Diaz, and M. Razeghi Applied Physics Letters 70 (4)-- January 27, 1997 ...[Visit Journal] A compressively strained InAsSb/InAs multiple quantum-well (MQW) structure was grown by low-pressure metal-organic chemical vapor deposition. Maximum output power (from two facets) up to 1 W with differential efficiency about 70% was obtained from a MQW laser with stripe width of 100 μm and cavity length of 700 μm for emitting wavelength of 3.65 μm at 90 K in pulse mode operation. About 2 times lower threshold current density was obtained from the MQW lasers for a temperature range of 90 to 140 K compared to the double heterostructure lasers grown on the same growth conditions. [reprint (PDF)]
15.	Quantum Dot Infrared Photodetectors: Comparison Experiment and Theory H. Lim, W. Zhang, S. Tsao, T. Sills, J. Szafraniec, K. Mi, B. Movaghar, and M. Razeghi Virtual Journal of Nanoscale Science and Technology 12 (9)-- August 29, 2005 ...[Visit Journal][reprint (PDF)]
15.	AlGaN ultraviolet photoconductors grown on sapphire D. Walker, X. Zhang, P. Kung, A. Saxler, S. Javadpour, J. Xu, and M. Razeghi Applied Physics Letters 68 (15)-- April 8, 1996 ...[Visit Journal] Al_xGa_1−xN (0≤x≤0.50) ultraviolet photoconductors with a minimum cutoff wavelength shorter than 260 nm have been fabricated and characterized. The AlGaN active layers were grown on (00⋅1) sapphire substrates by metalorganic chemical vapor deposition (MOCVD). The spectral responsivity of the GaN detector at 360 nm is about 1 A/W biased at 8 V at room temperature. The carrier lifetime derived from the voltage‐dependent responsivity is 0.13–0.36 ms. [reprint (PDF)]
15.	Growth and Characterization of Very Long Wavelength Type-II Infrared Detectors H. Mohseni, A. Tahraoui, J. Wojkowski, M. Razeghi, W. Mitchel, and A. Saxler SPIE Conference, San Jose, CA, -- January 26, 2000 ...[Visit Journal] We report on the growth and characterization of type-II IR detectors with a InAs/GaSb superlattice active layer in the 15-19 μm wavelength range. The material was grown by molecular beam epitaxy on semi-insulating GaAs substrates. The material was processed into photoconductive detectors using standard photolithography, dry etching, and metalization. The 50 percent cut-off wavelength of the detectors is about 15.5 μm with a responsivity of 90 mA/W at 80 K. The 90 percent-10 percent cut-off energy width of the responsivity is only 17 meV which is an indication of the uniformity of the superlattices. These are the best reported values for type-II superlattices grown on GaAs substrates. [reprint (PDF)]
15.	Fabrication of nanostructured heterojunction LEDs using self-forming Moth-Eye Arrays of n-ZnO Nanocones Grown on p-Si (111) by PLD D.J. Rogers; V.E. Sandana; F. Hosseini Teherani; M. Razeghi; H.-J. Drouhin Proc. SPIE 7217, Zinc Oxide Materials and Devices IV, 721708 (February 17, 2009)-- February 17, 2009 ...[Visit Journal] ZnO nanostructures were grown on Si (111) substrates using Pulsed Laser Deposition. The impact of growth temperature (T_s) and Ar pressure (P_Ar) on the morphology, crystal structure and photoluminescence was investigated. Various types of ZnO nanostructures were obtained. Self-forming arrays of vertically-aligned nanorods and nanocones with strong c-axis crystallographic orientation and good optical response were obtained at higher T_s. The nanocone, or "moth-eye" type structures were selected for LED development because of their graded effective refractive index, which could facilitate improved light extraction at the LED/air interface. Such moth-eye arrays were grown on p-type Si (111) substrates to form heteroj unction LEDs with the n-type ZnO nanocones acting as an active component of the device. These nanostructured LEDs gave rectifying I/V characteristics with a threshold voltage of about 6V and a blueish-white electroluminescence, which was clearly visible to the naked eye. [reprint (PDF)]
15.	High-Power CW Mid-IR Quantum Cascade Lasers J.R. Meyer, W.W. Bewley, J.R. Lindle, I. Vurgaftman, A.J. Evans, J.S. Yu, S. Slivken, and M. Razeghi SPIE Conference, Jose, CA, -- January 22, 2005 ...[Visit Journal] We report the cw operation of quantum cascade lasers that do not require cryogenic cooling and emit at λ = 4.7-6.2 µm. At 200 K, more than 1 W of output power is obtained from 12-µm-wide stripes, with a wall-plug efficiency (η_wall) near 10%. Room-temperature cw operation has also been demonstrated, with a maximum output power of 640 mW (η_wall = 4.5%) at 6 µm and 260 mW (η_wall = 2.3%) at 4.8 µm. Far-field characterization indicates that whereas the beam quality remains close to the diffraction limit in all of the tested lasers, in the devices emitting at 6.2 µm the beam tends to steer by as much as 5-10° degrees in either direction with varying temperature and pump current. [reprint (PDF)]
15.	Low-Threshold 7.3 μm Quantum Cascade Lasers Grown by Gas-Source Molecular Beam Epitaxy S. Slivken, A. Matlis, A. Rybaltowski, Z. Wu and M. Razeghi Applied Physics Letters 74 (19)-- May 19, 1999 ...[Visit Journal] We report low-threshold 7.3 μm superlattice-based quantum cascade lasers. The threshold current density is 3.4 kA/cm² at 300 K and 1.25 kA/cm² at 79 K in pulsed mode for narrow (∼20 μm), 2 mm-long laser diodes. The characteristic temperature (T₀) is 210 K. The slope efficiencies are 153 and 650 mW/A at 300 and 100 K, respectively. Power output is in excess of 100 mW at 300 K. Laser far-field intensity measurements give divergence angles of 64° and 29° in the growth direction and in the plane of the quantum wells, respectively. Far-field simulations show excellent agreement with the measured results. [reprint (PDF)]
15.	The Molecular Beam Epitaxial Growth of InSb on (111) GaAs E. Michel, J. Kim, J. Xu, S. Javadpour, I. Ferguson, and M. Razeghi Applied Physics Letters 69 (2)-- July 8, 1996 ...[Visit Journal] The molecular beam epitaxial growth of InSb on (111)B GaAs has been investigated. It was found that for a given Sb/In ratio, a higher growth temperature was required for the growth of InSb on (111)B GaAs compared to that on (001) GaAs. This difference has been attributed to the bonding characteristics of the (111)B and (001) surface. Once growth had been optimized, it was found that the material characteristics of (111)B InSb were almost identical to that of (001) InSb, i.e., independent of orientation. For example, the x-ray full width at half-maximum and 300 K mobility had the same absolute values for (111) InSb and (001)InSb and followed the same dependence with the sample thickness. Te was found to be a well-behaved n-type dopant for (111)B InSb. [reprint (PDF)]
15.	Future of Al_xGa_1-xN Materials and Device Technology for Ultraviolet Photodetectors P. Kung, A. Yasan, R. McClintock, S. Darvish, K. Mi, and M. Razeghi SPIE Conference, San Jose, CA, Vol. 4650, pp. 199-- May 1, 2002 ...[Visit Journal] Design of the photodetector structure is one of the key issues in obtaining high performance devices; especially the thickness of the intrinsic region for p-i-n photodiodes is a crucial value and needs to be optimized. We compare the performance of the p-i-n photodiodes with different widths for the depletion region, which shows a trade-off between speed and responsivity of the devices. [reprint (PDF)]
14.	Growth and Optimization of GaInAsP/InP Material System for Quantum Well Infrared Photodetector Applications M. Erdtmann, J. Jiang, A. Matlis, A. Tahraoui, C. Jelen, M. Razeghi, and G. Brown SPIE Conference, San Jose, CA, -- January 26, 2000 ...[Visit Journal] Multi-quantum well structures of Ga_xIn_1-xAs_yP_1-y were grown by metalorganic chemical vapor deposition for the fabrication of quantum well IR photodetectors. The thickness and composition of the wells was determined by high-resolution x-ray diffraction and photoluminescence experiments. The intersubband absorption spectrum of the Ga_0.47In_0.53As/InP, Ga_0.38In_0.62As_0.80P_0.20 (1.55 μm)/InP, and Ga_0.27In_0.73As_0.57P_0.43 (1.3 μm))/InP quantum wells are found to have cutoff wavelengths of 9.3 μm, 10.7 micrometers , and 14.2 μm respectively. These wavelengths are consistent with a conduction band offset to bandgap ratio of approximately 0.32. Facet coupled illumination responsivity and detectivity are reported for each composition. [reprint (PDF)]
14.	Recent progress of widely tunable, CW THz sources based QCLs at room temperature Manijeh Razeghi Terahertz Science and Technology, Vol.10, No.4, pp. 87-151-- December 7, 2017 ...[Visit Journal] The THz spectral region is of significant interest to the scientific community, but is one of the hardest regions to access with conventional technology. A wide range of compelling new applications are initiating a new revolution in THz technology, especially with regard to the development of compact and versatile devices for THz emission and detection. In this article, recent advances with regard to III-V semiconductor optoelectronics are explored with emphasis on how these advances will lead to the next generation of THz component technology [reprint (PDF)]
14.	Infrared Imaging Arrays Using Advanced III-V Materials and technology M. Razeghi, J.D. Kim, C. Jelen, S. Slivken, E. Michel, H. Mohseni, J.J. Lee, J. Wojkowski, K.S. Kim, H.I. Jeon, and J. X IEEE Proceedings, Advanced Workshop on Frontiers in Electronics (WOFE), Tenerife, Spain;-- January 6, 1997 ...[Visit Journal] Photodetectors operating in the 3-5 and 8-12 μm atmospheric windows are of great importance for applications in infrared (IR) thermal imaging. HgCdTe has been the dominant material system for these applications. However, it suffers from instability and non-uniformity problems over large areas due to high Hg vapor pressure during the material, growth. There has been a lot of interest in the use of heteroepitaxially grown Sb-based alloys, its strained layer superlattices, and GaAs based quantum wells as alternatives to MCT. This interest has been driven by the advanced material growth and processing technology available for the III-V material system [reprint (PDF)]
14.	Solar-Blind Al_xGa_1-xN p-i-n Photodetectors grown on LEO and non-LEO GaN P. Sandvik, D. Walker, P. Kung, K. Mi, F. Shahedipour, V. Kumar, X. Zhang, J. Diaz, C. Jelen, and M. Razeghi SPIE Conference, San Jose, CA, Vol. 3948, pp. 265 -- January 26, 2000 ...[Visit Journal] The III-Nitride material system is an excellent candidate for UV photodetector applications due to its wide, direct bandgaps and robust material nature. However, despite many inherent material advantages, the III-Nitride material system typically suffers from a large number of extended defects which degrade material quality and device performance. One technique aimed at reducing defect densities in these materials is lateral epitaxial overgrowth (LEO). In this work, we present a preliminary comparison between AlGaN UV, solar-blind p-i-n photodiodes fabricated form LEO GaN and non-LEO GaN. Improvements in both responsivity and rejection ratio are observed, however, further device improvements are necessary. For these, we focus on the optimization of the p- i-n structure and a reduction in contact resistivity to p- GaN and p-AlGaN layers. By improving the structure of the device, GaN p-i-n photodiodes were fabricated and demonstrate 86 percent internal quantum efficiency at 362 nm and a peak to visible rejection ratio of 105. Contact treatments have reduced the contact resistivity to p-GaN and p-AlGaN by over one order of magnitude form our previous results. [reprint (PDF)]
14.	High performance mid-wavelength quantum dot infrared photodetectors for focal plane arrays M. Razeghi, H. Lim, S. Tsao, M. Taguchi, W. Zhang and A.A. Quivy SPIE Conference, San Diego, CA, Vol. 6297, pp. 62970C-- August 13, 2006 ...[Visit Journal] Quantum dot infrared photodetectors (QDIPs) have recently emerged as promising candidates for detection in the middle wavelength infrared (MWIR) and long wavelength infrared (LWIR) ranges. Here, we report our recent results for mid-wavelength QDIPs grown by low-pressure metalorganic chemical vapor deposition. Three monolayer of In_0.68Ga_0.32As self-assembled via the Stranski-Krastanov growth mode and formed lens-shaped InGaAs quantum dots with a density around 3×10₁₀ cm^-2. The peak responsivity at 77 K was measured to be 3.4 A/W at a bias of -1.9 V with 4.7 µm peak detection wavelength. Focal plane arrays (FPAs) based on these devices have been developed. The preliminary result of FPA imaging is presented. [reprint (PDF)]
14.	Demonstration of high performance bias-selectable dual-band short-/mid-wavelength infrared photodetectors based on type-II InAs/GaSb/AlSb superlattices A.M. Hoang, G. Chen, A. Haddadi and M. Razeghi Applied Physics Letters, Vol. 102, No. 1, p. 011108-1-- January 7, 2013 ...[Visit Journal] High performance bias-selectable dual-band short-/mid-wavelength infrared photodetector based on InAs/GaSb/AlSb type-II superlattice with designed cut-off wavelengths of 2 μm and 4 μm was demonstrated. At 150 K, the short-wave channel exhibited a quantum efficiency of 55%, a dark current density of 1.0 × 10⁻⁹ A/cm² at −50 mV bias voltage, providing an associated shot noise detectivity of 3.0 × 10¹³ Jones. The mid-wavelength channel exhibited a quantum efficiency of 33% and a dark current density of 2.6 × 10⁻⁵ A/cm² at 300 mV bias voltage, resulting in a detectivity of 4.0 × 10¹¹ Jones. The spectral cross-talk between the two channels was also discussed for further optimization. [reprint (PDF)]
14.	Type-II InAs/GaSb/AlSb superlatticebased heterojunction phototransistors: back to the future Abbas Haddadi, Arash Dehzangi, Romain Chevallier, Thomas Yang, Manijeh Razeghi Proc. SPIE 10540, Quantum Sensing and Nano Electronics and Photonics XV- Page-1054004-1-- January 26, 2018 ...[Visit Journal] Most of reported HPTs in literatures are based on InGaAs compounds that cover NIR spectral region. However, InGaAs compounds provide limited cut-off wavelength tunability. In contrast, type-II superlattices (T2SLs) are a developing new material system with intrinsic advantages such as great flexibility in bandgap engineering, low growth and manufacturing cost, high-uniformity, auger recombination suppression, and high carrier effective mass that are becoming an attractive candidate for infrared detection and imaging from short-wavelength infrared to very long wavelength infrared regime. We present the recent advancements in T2SL-based heterojunction phototransistors in e– SWIR, MWIR and LWIR spectral ranges. A mid-wavelength infrared heterojunction phototransistor based on type-II InAs/AlSb/GaSb superlattices on GaSb substrate has been demonstrated. Then, we present the effect of vertical scaling on the optical and electrical performance of heterojunction phototransistors, where the performance of devices with different base width was compared as the base was scaled from 60 down to 40 nm. [reprint (PDF)]

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