Center for Quantum Devices - Most Downloaded Journal Articles

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15.	InAs/InAs_1-xSb_x type-II superlattices for high performance long wavelength infrared detection M. Razeghi, A. Haddadi, A. M. Hoang, R. Chevallier, S. Adhikary, A. Dehzangi Proc. SPIE 9819, Infrared Technology and Applications XLII, 981909-- May 20, 2016 ...[Visit Journal] We report InAs/InAs1-xSbx type-II superlattice base photodetector as high performance long-wavelength infrared nBn device grown on GaSb substrate. The device has 6 μm-thick absorption region, and shows optical performance with a peak responsivity of 4.47 A/W at 7.9 μm, which is corresponding to the quantum efficiency of 54% at a bias voltage of negative 90 mV, where no anti-reflection coating was used for front-side illumination. At 77K, the photodetector’s 50% cut-off wavelength was ~10 μm. The device shows the detectivity of 2.8x10¹¹ cm•Hz^½/W at 77 K, where RxA and dark current density were 119 Ω•cm² and 4.4x10^-4 A/cm² , respectively, under -90 mV applied bias voltage [reprint (PDF)]
15.	Growth and Optimization of GaInAsP/InP Material System for Quantum Well Infrared Photodetector Applications M. Erdtmann, J. Jiang, A. Matlis, A. Tahraoui, C. Jelen, M. Razeghi, and G. Brown SPIE Conference, San Jose, CA, -- January 26, 2000 ...[Visit Journal] Multi-quantum well structures of Ga_xIn_1-xAs_yP_1-y were grown by metalorganic chemical vapor deposition for the fabrication of quantum well IR photodetectors. The thickness and composition of the wells was determined by high-resolution x-ray diffraction and photoluminescence experiments. The intersubband absorption spectrum of the Ga_0.47In_0.53As/InP, Ga_0.38In_0.62As_0.80P_0.20 (1.55 μm)/InP, and Ga_0.27In_0.73As_0.57P_0.43 (1.3 μm))/InP quantum wells are found to have cutoff wavelengths of 9.3 μm, 10.7 micrometers , and 14.2 μm respectively. These wavelengths are consistent with a conduction band offset to bandgap ratio of approximately 0.32. Facet coupled illumination responsivity and detectivity are reported for each composition. [reprint (PDF)]
15.	AlGaN ultraviolet photoconductors grown on sapphire D. Walker, X. Zhang, P. Kung, A. Saxler, S. Javadpour, J. Xu, and M. Razeghi Applied Physics Letters 68 (15)-- April 8, 1996 ...[Visit Journal] Al_xGa_1−xN (0≤x≤0.50) ultraviolet photoconductors with a minimum cutoff wavelength shorter than 260 nm have been fabricated and characterized. The AlGaN active layers were grown on (00⋅1) sapphire substrates by metalorganic chemical vapor deposition (MOCVD). The spectral responsivity of the GaN detector at 360 nm is about 1 A/W biased at 8 V at room temperature. The carrier lifetime derived from the voltage‐dependent responsivity is 0.13–0.36 ms. [reprint (PDF)]
15.	Optical Investigations of GaAs-GaInP Quantum Wells Grown on the GaAs, InP, and Si Substrates H. Xiaoguang, M. Razeghi Applied Physics Letters 61 (14)-- October 5, 1992 ...[Visit Journal] We report the first photoluminescence investigation of GaAs‐Ga_0.51In_0.49P lattice matched multiquantum wells grown by the low pressure metalorganic chemical vapor deposition simultaneously in the same run on GaAs, Si, and InP substrates. The sharp photoluminescence peaks indicate the high quality of the samples on three different substrates. The temperature dependence of the photoluminescence indicates that the intrinsic excitonic transitions dominate at low temperature and free‐carrier recombinations at room temperature. The photoluminescence peaks of the samples grown on Si and InP substrates shift about 15 meV from the corresponding peaks of the sample grown on the GaAs substrate. Two possible interpretations are provided for the observed energy shift. One is the diffusion of In along the dislocation threads from GaInP to GaAs and another is the localized strain induced by defects and In segregations. [reprint (PDF)]
15.	Quantum Sensing Using Type-II InAs/GaSb Superlattice for Infrared Detection M. Razeghi, A. Gin, Y. Wei, J. Bae, and J. Nah Microelectronics Journal, 34 (5-8)-- May 1, 2003 ...[Visit Journal] Large, regular arrays of bulk GaSb and InAs/GaSb Type-II superlattice pillars have been fabricated by electron beam lithography and dry etching. A 2.5 keV electron beam lithography system and metal evaporation are used to form the Au mask on superlattice and bulk substrates. Dry etching of these materials has been developed with BCl3:Ar, CH4:H2:Ar and cyclic CH₄:H₂:Ar/O₂ plasmas. Etch temperatures were varied from 20 to 150 °C. The diameter of the superlattice pillars was below 50 nm with regular 200 nm spacing. Bulk GaSb pillars were etched with diameters below 20 nm. Areas of dense nanopillars as large as 500 μm×500 μm were fabricated. The best height/diameter aspect ratio was approximately 10:1. To date, these are the smallest diameter III–V superlattice pillar structures reported, and the first nanopillars in the InAs/GaSb material system. The basic theory of these devices and surface passivation with SiO₂ and Si₃N₄ thin films has also been discussed. [reprint (PDF)]
15.	Comparison of ZnO nanostructures grown using pulsed laser deposition, metal organic chemical vapor deposition, and physical vapor transport V.E. Sandana, D.J. Rogers, F. Hosseini Teherani, R. McClintock, C. Bayram, M. Razeghi, H-J Drouhin, M.C. Clochard, V. Sallett, G. Garry, and F. Falyouni Journal of Vacuum Science and Technology B, Vol. 27, No. 3, May/June, p. 1678-1683-- May 29, 2009 ...[Visit Journal] This article compares the forms and properties of ZnO nanostructures grown on Si (111) and c-plane sapphire (c-Al₂O₃) substrates using three different growth processes: metal organic chemical vapor deposition (MOCVD), pulsed laser deposition (PLD), and physical vapor transport (PVT). A very wide range of ZnO nanostructures was observed, including nanorods, nanoneedles, nanocombs, and some novel structures resembelling “bevelled” nanowires. PVT gave the widest family of nanostructures. PLD gave dense regular arrays of nanorods with a preferred orientation perpendicular to the substrate plane on both Si and c-Al₂O₃ substrates, without the use of a catalyst. X-ray diffraction (XRD) studies confirmed that nanostructures grown by PLD were better crystallized and more highly oriented than those grown by PVT and MOCVD. Samples grown on Si showed relatively poor XRD response but lower wavelength emission and narrower linewidths in PL studies. [reprint (PDF)]
15.	Investigations on the substrate dependence of the properties in nominally-undoped β-Ga2O3 thin films grown by PLD F. H. Teherani ; D. J. Rogers ; V. E. Sandana ; P. Bove ; C. Ton-That ; L. L. C. Lem ; E. Chikoidze ; M. Neumann-Spallart ; Y. Dumont ; T. Huynh ; M. R. Phillips ; P. Chapon ; R. McClintock ; M. Razeghi Proc. SPIE 10105, Oxide-based Materials and Devices VIII, 101051R-OLD-- March 23, 2017 ...[Visit Journal] Nominally-undoped Ga₂O₃ layers were deposited on a-, c- and r-plane sapphire substrates using pulsed laser deposition. Conventional x-ray diffraction analysis for films grown on a- and c-plane sapphire showed the layers to be in the β-Ga₂O₃ phase with preferential orientation of the (-201) axis along the growth direction. Pole figures revealed the film grown on r-plane sapphire to also be in the β-Ga₂O₃ phase but with epitaxial offsets of 29.5°, 38.5° and 64° from the growth direction for the (-201) axis. Optical transmission spectroscopy indicated that the bandgap was ~5.2eV, for all the layers and that the transparency was > 80% in the visible wavelength range. Four point collinear resistivity and Van der Pauw based Hall measurements revealed the β-Ga₂O₃ layer on r-plane sapphire to be 4 orders of magnitude more conducting than layers grown on a- and c-plane sapphire under similar conditions. The absolute values of conductivity, carrier mobility and carrier concentration for the β-Ga₂O₃ layer on r-sapphire (at 20Ω-1.cm^-1, 6 cm²/Vs and 1.7 x 10¹⁹ cm^-3, respectively) all exceeded values found in the literature for nominally-undoped β-Ga₂O₃ thin films by at least an order of magnitude. Gas discharge optical emission spectroscopy compositional depth profiling for common shallow donor impurities (Cl, F, Si and Sn) did not indicate any discernable increase in their concentrations compared to background levels in the sapphire substrate. It is proposed that the fundamentally anisotropic conductivity in β-Ga₂O₃ combined with the epitaxial offset of the (-201) axis observed for the layer grown on r-plane sapphire may explain the much larger carrier concentration, electrical conductivity and mobility compared with layers having the (-201) axis aligned along the growth direction. [reprint (PDF)]
15.	Angled cavity broad area quantum cascade lasers Y. Bai, S. Slivken, Q.Y. Lu, N. Bandyopadhyay, and M. Razeghi Applied Physics Letters, Vol. 100, Np. 8, p. 081106-1-- August 20, 2012 ...[Visit Journal] Angled cavity broad area quantum cascade lasers (QCLs) are investigated with surface gratingbased distributed feedback (DFB) mechanisms. It is found that an angled cavity incorporating a one dimensional DFB with grating lines parallel to the laser facet offers the simplest solution for single mode and diffraction limited emission in the facet normal direction. A room temperature single mode QCL with the highest output power for wavelengths longer than 10 micron is demonstrated. This structure could be applied to a wide range of laser structures for power scaling along with spectral and spatial beam control. [reprint (PDF)]
15.	Monolithic integrated photoreceiver for 1.3–1.55‐μm wavelengths: Association of a Schottky photodiode and a field‐effect transistor on GaInP‐GaInAs heteroepitaxy A. Hosseini Therani; D. Decoster; J. P. Vilcot; M. Razeghi J. Appl. Phys. 64, 2215–2218 (1988) -- March 24, 1988 ...[Visit Journal] We present a monolithic integrated circuit associating a Schottky photodiode and a field-effect transistor which has been fabricated, for the first time, on G8.0.49 InO.51 P /GaO,47 Ino.53 As strained heteroepitaxiaI material. Static, dynamic, and noise properties of the Schottky photodiode, the field-effect transistor, and the integrated circuit have been investigated and are reported. As an example, dynamic responsivity up to 50 A/W can be achieved at 1.3-pm wavelength for the integrated photoreceiver. The performance of the device is discussed, taking into account the integrated circuit design and the main characteristics of the material. [reprint (PDF)]
15.	1-5 jim ROOM-TEMPERATURE PULSED OPERATION OF GalnAsP/lnP DOUBLE HETEROSTRUCTURE GROWN BY LP MOCVD Manijeh Razeghi, P. Hirtz, J.P. Larivain, R. Blondeau, B. de Crémoux, J.P. Duchemin, ELECTRONICS LETTERS, vol. 17, no.18-- September 3, 1981 ...[Visit Journal] The letter reports the first successful room-temperature pulsed operation of a broad-area contact laser of GaInAsP/InP double heterostructure, grown by LP MOCVD, emitting at 1.5 μm. Pulsed thresholds as low as 2.5 kA/cm2 have been obtained for 1.5 μm, for an active layer thickness of 0.48 μm. This is equal to a current density per micrometre of 5.2 kA cm−2 μm−1. InxGa1−xAsyP1−y, III, III, V, V alloys are of great interest for use in infra-red devices. They can be grown lattice matched on InP over a wide range of compositions. The resulting bandgap (1.35–0.75 eV) covers a spectral range which contains the region of lowest losses and lowest dispersion in modern optical fibres. This property makes In1−xGaxASyP1−y, very attractive as a semiconductor laser and detector material for future fibre communication systems. [reprint (PDF)]
15.	Fabrication of GaN Nanotubular Material using MOCVD with an Aluminium Oxide Membrane W.G. Jung, S.H. Jung, P. Kung, and M. Razeghi Nanotechnology 17-- January 1, 2006 ...[Visit Journal] GaN nanotubular material is fabricated with an aluminium oxide membrane in MOCVD. SEM, XRD, TEM and PL are employed to characterize the fabricated GaN nanotubular material. An aluminium oxide membrane with ordered nanoholes is used as a template. Gallium nitride is deposited at the inner wall of the nanoholes in the aluminium oxide template, and the nanotubular material with high aspect ratio is synthesized using the precursors of TMG and ammonia gas. Optimal synthesis conditions in MOCVD are obtained successfully for the gallium nitride nanotubular material in this research. The diameter of the GaN nanotube fabricated is approximately 200–250 nm and the wall thickness is about 40–50 nm. [reprint (PDF)]
15.	Optical Investigations of GaAs-GaInP Quantum Wells and Superlattices Grown by Metalorganic Chemical Vapor Deposition Omnes F., and Razeghi M. Applied Physics Letters 59 (9), p. 1034-- May 28, 1991 ...[Visit Journal] Recent experimental results on the photoluminescence and photoluminescence excitation of GaAs‐Ga_0.51In_0.49P lattice‐matched quantum wells and superlattices are discussed. The full width at half maximum of a 10‐period GaAs‐GaInP superlattice with Lz=90 Å and LB=100 Å is 4 meV at 4 K. The photoluminescence excitation exhibits very sharp peaks attributed to the electron to light‐hole and electron to heavy‐hole transitions. The GaInP‐GaAs interface suffers from memory effect of In, rather than P or As elements. [reprint (PDF)]
15.	Crystallography of epitaxial growth of wurtzite-type thin films on sapphire substrates P. Kung, C.J. Sun, A. Saxler, H. Ohsato, and M. Razeghi Journal of Applied Physics 75 (9)-- May 1, 1994 ...[Visit Journal] In this article, we present a crystallographic model to describe the epitaxial growth of wurtzite‐type thin films such as gallium nitride (GaN) on different orientations of sapphire (Al2O3) substrates. Through this model, we demonstrate the thin films grown on (00⋅1)Al₂O₃ have a better epilayer‐substrate interface quality than those grown on (01⋅2)Al₂O₃. We also show the epilayer grown on (00⋅1)Al₂O₃ are gallium‐terminated, and both (00⋅1) and (01⋅2) surfaces of sapphire crystals are oxygen‐terminated. [reprint (PDF)]
15.	Radiative recombination of confined electrons at the MgZnO/ ZnO heterojunction interface Sumin Choi, David J. Rogers, Eric V. Sandana, Philippe Bove, Ferechteh H. Teherani, Christian Nenstiel, Axel Hoffmann, Ryan McClintock, Manijeh Razeghi, David Look, Angus Gentle, Matthew R. Phillips & Cuong Ton-That Nature Scientific Reports 7, pp. 7457-- August 7, 2017 ...[Visit Journal] We investigate the optical signature of the interface in a single MgZnO/ZnO heterojunction, which exhibits two orders of magnitude lower resistivity and 10 times higher electron mobility compared with the MgZnO/Al₂O₃ film grown under the same conditions. These impressive transport properties are attributed to increased mobility of electrons at the MgZnO/ZnO heterojunction interface. Depthresolved cathodoluminescence and photoluminescence studies reveal a 3.2 eV H-band optical emission from the heterointerface, which exhibits excitonic properties and a localization energy of 19.6 meV. The emission is attributed to band-bending due to the polarization discontinuity at the interface, which leads to formation of a triangular quantum well and localized excitons by electrostatic coupling. [reprint (PDF)]
15.	First Demonstration of ~ 10 microns FPAs in InAs/GaSb SLS M. Razeghi, P.Y. Delaunay, B.M. Nguyen, A. Hood, D. Hoffman, R. McClintock, Y. Wei, E. Michel, V. Nathan and M. Tidrow IEEE LEOS Newsletter 20 (5)-- October 1, 2006 ...[Visit Journal] The concept of Type-II InAs/GaSb superlattice was first brought by Nobel Laureate L. Esaki, et al. in the 1970s. There had been few studies on this material system until two decades later when reasonable quality material growth was made possible using molecular beam epitaxy. With the addition of cracker cells for the group V sources and optimizations of material growth conditions, the superlattice quality become significantly improved and the detectors made of these superlattice materials can meet the demand in some practical field applications. Especially in the LWIR regime, it provides a very promising alternative to HgCdTe for better material stability and uniformity, etc. We have developed the empirical tight binding model (ETBM) for precise determination of the superlattice bandgap. [reprint (PDF)]
15.	Etching of ZnO Towards the Development of ZnO Homostructure LEDs K. Minder, F.H. Teherani, D. Rogers, C. Bayram, R. McClintock, P. Kung, and M. Razeghi SPIE Conference, January 25-29, 2007, San Jose, CA Proceedings – Zinc Oxide Materials and Devices II, Vol. 6474, p. 64740Q-1-6-- January 29, 2007 ...[Visit Journal] Although ZnO has recently gained much interest as an alternative to the III-Nitride material system, the development of ZnO based optoelectonic devices is still in its infancy. Significant material breakthroughs in p-type doping of ZnO thin films and improvements in crystal growth techniques have recently been achieved, making the development of optoelectonic devices possible. First, a survey of current ZnO processing methods is presented, followed by the results of our processing research. [reprint (PDF)]
15.	Transport properties in n-type InSb films grown by metalorganic chemical vapor deposition S.N. Song, J.B. Ketterson, Y.H. Choi, R. Sudharsanan, and M. Razeghi Applied Physics Letters 63 (7)-- August 16, 1993 ...[Visit Journal] We have measured the temperature and magnetic field dependence of the Hall mobility and transverse magnetoresistance in n-type InSb films epitaxially grown on GaAs substrates by metalorganic chemical vapor deposition. The films show a giant magnetoresistance: e.g., at 240 K the resistivity increases over 20 times at a magnetic field of 5 T; the low field coefficient of resistivity at 77 K is as high as 47.5 μ·Ω· cm/G. The Hall mobility decreases with magnetic field and saturates at higher fields. By taking the interface carrier transport into account, the observed field dependence of the Hall mobility and magnetoresistance may be understood based on a two-layer model. [reprint (PDF)]
15.	Recent advances in antimonide-based gap-engineered Type-II superlattices material system for 2 and 3 colors infrared imagers Manijeh. Razeghi, Abbas Haddadi, Arash Dehzangi, Romain Chevallier, and Thomas Yang Proceedings of SPIE 10177, Infrared Technology and Applications XLIII, 1017705-- May 9, 2017 ...[Visit Journal] InAs/InAs_1-xSb_x/AlAs_1-xSb_x type-II superlattices (T2SLs) is a system of multi-interacting quantum wells. Since its introduction, this material system has drawn a lot of attention especially for infrared detection. In recent years, InAs/InAs_1- xSb_x/AlAs_1-xSb_x T2SL material system has experienced incredible improvements in material quality, device structure designs and device fabrication process which elevated the performances of T2SL-based photodetectors to a comparable level to the state-of-the-art material systems for infrared detection such as Mercury Cadmium Telluride (MCT). In this paper, we will present the current status of InAs/InAs_1-xSb_x/AlAs_1-xSb_x T2SL-based photodetectors for detection in different infrared regions, from short-wavelength (SWIR) to long-wavelength (LWIR) infrared, and the future outlook of this material system. [reprint (PDF)]
15.	Efficiency of photoluminescence and excess carrier confinement in InGaAsP/GaAs structures prepared by metal-organic chemical vapor deposition J. Diaz, H.J. Yi, M. Erdtmann, X. He, E. Kolev, D. Garbuzov, E. Bigan, and M. Razeghi Journal of Applied Physics 76 (2)-- July 15, 1994 ...[Visit Journal] Special double‐ and separate‐confinement InGaAsP/GaAs heterostructures intended for photoluminescence measurements have been grown by low‐pressure metal‐organic chemical‐vapor deposition. The band gap of the active region quaternary material was close to 1.5 eV, and the waveguide of the separate‐confinement structures was near 1.8 eV. Measurement of the integrated luminescence efficiency at 300 K has shown that over a wide range of excitation level (10–10³ W/cm²) radiative transitions are the dominant mechanism for excess carrier recombination in the active region of the structures studied. As determined by spectral measurements, the excess carrier concentration in the waveguide of the separate‐confinement heterostructures and the intensity of the waveguide emission band correspond to a condition of thermal equilibrium of the excess carrier populations in the active region and the waveguide. The ratio of the intensity of the waveguide emission to the active region emission fits a model which assumes that the barrier height for minority carriers (holes) is equal to the difference in band gaps between the active region and the waveguide region. [reprint (PDF)]
15.	Improved performance of IR photodetectors with 3D gap engineering J. Piotrowski and M. Razeghi Optoelectronic Integrated Circuit Materials, Physics and Devices, SPIE Conference, San Jose, CA; Proceedings, Vol. 2397-- February 6, 1995 ...[Visit Journal] The ultimate signal-to-noise performance of the semiconductor photodetector is limited by the statistical fluctuations of the thermal generation and recombination rates in photodetector material. Cooling is an effective but impractical way of suppression of the thermal processes. The performance of uncooled detectors can be improved by minimizing the thermal generation and recombination rates and reducing the actual volume of photodetector. This can be realized in 3D heterostructure devices. In these devices, the incident radiation is absorbed in small regions of narrow gap semiconductor, buried in wide gap volume and supplied with wide gap electric contacts and radiation concentrators. The practical near room-temperature 1 - 12 μm IR heterostructure photodetectors are reported. The devices are based on variable gap Hg_1-xCd_xTe. The 3D heterostructures have been obtained by Isothermal Vapor Growth Epitaxy in a reusable growth system which enables in situ doping during growth with foreign impurities. Ion milling was extensively used in preparation of the devices. Monolithic optical immersion has been applied for further improvement of performance. The 3D heterostructure devices exhibit performance exceeding that of conventional photodetectors. [reprint (PDF)]
15.	High quantum efficiency two color type-II InAs/GaSb n-i-p-p-i-n photodiodes P.Y. Delaunay, B.M. Nguyen, D. Hoffman, A. Hood, E.K. Huang, M. Razeghi, and M.Z. Tidrow Applied Physics Letters, Vol. 92, No. 11, p. 111112-1-- March 17, 2008 ...[Visit Journal] A n-i-p-p-i-n photodiode based on type-II InAs/GaSb superlattice was grown on a GaSb substrate. The two channels, with respective 50% of responsivity cutoff wavelengths at 7.7 and 10 µm, presented quantum efficiencies (QEs) of 47% and 39% at 77 K. The devices can be operated as two diodes for simultaneous detection or as a single n-i-p-p-i-n detector for sequential detection. In the latter configuration, the QEs at 5.3 and 8.5 µm were measured as high as 40% and 39% at 77 K. The optical cross-talk between the two channels could be reduced from 0.36 to 0.08 by applying a 50 mV bias. [reprint (PDF)]
15.	High-Power Continuous-Wave Operation of a 6 µm Quantum-Cascade Laser at Room Temperature J.S. Yu, S. Slivken, A. Evans, L. Doris, and M. Razeghi Applied Physics Letters, 83 (13)-- September 29, 2003 ...[Visit Journal] We report continuous-wave (cw) operation of quantum-cascade lasers (λ= 6 µm) using a thick electroplated Au top contact layer and epilayer-up bonding on a copper heat sink up to a temperature of 308 K (35 °C). The high cw optical output powers of 132 mW at 293 K and 21 mW at 308 K are achieved with threshold current densities of 2.29 and 2.91 kA/cm², respectively, for a high-reflectivity-coated 15 µm wide and 2 mm long laser. [reprint (PDF)]
15.	InAs/InAs_1-xSb_x type-II superlattices for high performance long wavelength infrared detection A. Haddadi , G. Chen , R. Chevallier , A. M. Hoang , and M. Razeghi Appl. Phys. Lett. 105, 121104 (2014)-- September 22, 2014 ...[Visit Journal] High performance long-wavelength infrared nBn photodetectors based on InAs/InAs_1−xSb_x type-II superlattices on GaSb substrate have been demonstrated. The photodetector's 50% cut-off wavelength was ∼10 μm at 77 K. The photodetector with a 6 μm-thick absorption region exhibited a peak responsivity of 4.47 A/W at 7.9 μm, corresponding to a quantum efficiency of 54% at −90 mV bias voltage under front-side illumination and without any anti-reflection coating. With an R × A of 119 Ω·cm² and a dark current density of 4.4 × 10⁻⁴ A/cm² under −90 mV applied bias at 77 K, the photodetector exhibited a specific detectivity of 2.8 × 10¹¹ cm·Hz^1/2·W^-1. [reprint (PDF)]
15.	Future of Al_xGa_1-xN Materials and Device Technology for Ultraviolet Photodetectors P. Kung, A. Yasan, R. McClintock, S. Darvish, K. Mi, and M. Razeghi SPIE Conference, San Jose, CA, Vol. 4650, pp. 199-- May 1, 2002 ...[Visit Journal] Design of the photodetector structure is one of the key issues in obtaining high performance devices; especially the thickness of the intrinsic region for p-i-n photodiodes is a crucial value and needs to be optimized. We compare the performance of the p-i-n photodiodes with different widths for the depletion region, which shows a trade-off between speed and responsivity of the devices. [reprint (PDF)]
15.	Thin-Film Antimonide-Based Photodetectors Integrated on Si Yiyun Zhang , Member, IEEE, Abbas Haddadi, Member, IEEE, Romain Chevallier, Arash Dehzangi, Member, IEEE, and Manijeh Razeghi , Life Fellow, IEEE IEEE JOURNAL OF QUANTUM ELECTRONICS, VOL. 54, NO. 2-- April 1, 2018 ...[Visit Journal] Monolithic integration of antimonide (Sb)-based compound semiconductors on Si is in high demand to enrich silicon photonics by extending the detection range to longer infrared wavelengths. In this paper, we have demonstrated the damage-free transfer of large-area (1×1 cm² ) narrow-bandgap Sb-based type-II superlattice (T2SL)-based thin-film materials onto a Si substrate using a combination of wafer-bonding and chemical epilayer release techniques. An array of Sb-based T2SL-based long-wavelength infrared (LWIR) photodetectors with diameters from 100 to 400 μm has been successfully fabricated using standard "top–down" processing technique. The transferred LWIR photodetectors exhibit a cut-off wavelength of λ 8.6 μm at 77 K. The dark current density of the transferred photodetectors under 200 mV applied bias at 77 K is as low as 5.7×10⁻⁴ A/cm² and the R×A reaches 66.3 Ω·cm², exhibiting no electrical degradation compared with reference samples on GaSb native substrate. The quantum efficiency and peak responsivity at 6.75 μm (@77 K, 200 mV) are 46.2% and 2.44 A/W, respectively. The specific detectivity (D^*) at 6.75 μm reaches as high as 1.6×10¹¹ cm·Hz^1/2/W under 200 mV bias at 77 K. Our method opens a reliable pathway to realize high performance and practical Sb-based optoelectronic devices on a Si platform. [reprint (PDF)]

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