Center for Quantum Devices - Most Downloaded Journal Articles

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17.	Pulsed metal-organic chemical vapor deposition of high quality AlN/GaN superlattices for near-infrared intersubband transitions C. Bayram, N. Pere-Laperne, R. McClintock, B. Fain and M. Razeghi Applied Physics Letters, Vol. 94, No. 12, p. 121902-1-- March 23, 2009 ...[Visit Journal] A pulsed metal-organic chemical vapor deposition technique is developed for the growth of high-quality AlN/GaN superlattices (SLs) with intersubband (ISB) transitions at optical communications wavelengths. Tunability of the AlN and GaN layers is demonstrated. Indium is shown to improve SL surface and structural quality. Capping thickness is shown to be crucial for ISB transition characteristics. Effects of barrier- and well-doping on the ISB absorption are reported. [reprint (PDF)]
17.	Characteristics of high quality p-type Al_xGa_1-xN/GaN superlattices A. Yasan, R. McClintock, S.R. Darvish, Z. Lin, K. Mi, P. Kung, and M. Razeghi Applied Physics Letters 80 (12)-- March 18, 2002 ...[Visit Journal] Very-high-quality p-type Al_xGa_1–xN/GaN superlattices have been grown by low-pressure metalorganic vapor-phase epitaxy through optimization of Mg flow and the period of the superlattice. For the superlattice with x = 26%, the hole concentration reaches a high value of 4.2×10¹⁸ cm^–3 with a resistivity as low as 0.19 Ω · cm by Hall measurement. Measurements confirm that superlattices with a larger period and higher Al composition have higher hole concentration and lower resistivity, as predicted by theory. [reprint (PDF)]
17.	High performance LWIR Type-II InAs/GaSb superlattice photodetectors and infrared focal plane array Y. Wei, A. Hood, A. Gin, V. Yazdanpanah, M. Razeghi and M. Tidrow SPIE Conference, Jose, CA, Vol. 5732, pp. 309-- January 22, 2005 ...[Visit Journal] We report on the demonstration of a focal plane array based on Type-II InAs-GaSb superlattices grown on n-type GaSb substrate with a 50% cutoff wavelength at 10 μm. The surface leakage occurring after flip-chip bonding and underfill in the Type-II devices was suppressed using a double heterostructure design. The R₀A of diodes passivated with SiO₂ was 23 Ω·cm² after underfill. A focal plane array hybridized to an Indigo readout integrated circuit demonstrated a noise equivalent temperature difference of 33 mK at 81 K, with an integration time of 0.23 ms. [reprint (PDF)]
17.	Monolithic integrated photoreceiver for 1.3–1.55‐μm wavelengths: Association of a Schottky photodiode and a field‐effect transistor on GaInP‐GaInAs heteroepitaxy A. Hosseini Therani; D. Decoster; J. P. Vilcot; M. Razeghi J. Appl. Phys. 64, 2215–2218 (1988) -- March 24, 1988 ...[Visit Journal] We present a monolithic integrated circuit associating a Schottky photodiode and a field-effect transistor which has been fabricated, for the first time, on G8.0.49 InO.51 P /GaO,47 Ino.53 As strained heteroepitaxiaI material. Static, dynamic, and noise properties of the Schottky photodiode, the field-effect transistor, and the integrated circuit have been investigated and are reported. As an example, dynamic responsivity up to 50 A/W can be achieved at 1.3-pm wavelength for the integrated photoreceiver. The performance of the device is discussed, taking into account the integrated circuit design and the main characteristics of the material. [reprint (PDF)]
17.	Ga/sub 0.51/In/sub 0.49/P/GaAs HEMT's exhibiting good electrical performance at cryogenic temperatures Y.-J. Chan; D. Pavlidis; M. Razeghi; F. Omnes IEEE TRANS. ELEC.DEVICES. 77. IO. 1990-- October 1, 1990 ...[Visit Journal] The DC and microwave characteristics of Ga/sub 0.51/In/sub 0.49/P/GaAs HEMTs grown by metalorganic chemical vapor deposition (MOCVD) are presented. Devices with 1- mu m-long gates show transconductances of 163 and 213 mS/mm at 300 and 77 K, respectively. Their maximum cutoff frequency is 17.8 GHz. Deep traps in the doped layer are evaluated at low temperature by the threshold voltage shift and current collapse phenomena. GaInP/GaAs HEMTs show no current collapse and have almost zero threshold voltage shift compared to AlGaAs/GaAs and InAlAs/InGaAs where the corresponding values are 0.5 and 0.25 V, respectively. [reprint (PDF)]
17.	Direct growth of thick AlN layers on nanopatterned Si substrates by cantilever epitaxy Ilkay Demir, Yoann Robin, Ryan McClintock, Sezai Elagoz, Konstantinos Zekentes, and Manijeh Razeghi Phys. Status Solidi A, pp. 1–6-- September 30, 2016 ...[Visit Journal] AlN layers have been grown on 200 nm period of nanopatterned Si (111) substrates by cantilever epitaxy and compared with AlN layers grown by maskless lateral epitaxial overgrowth (LEO) on micropatterned Si (111) substrates. The material quality of 5–10 µm thick AlN grown by LEO is comparable to that of much thinner layers (2 µm) grown by cantilever epitaxy on the nanopatterned substrates. Indeed, the latter exhibited root mean square (RMS) roughness of 0.65 nm and X-ray diffraction full width at half-maximum (FWHM) of 710 arcsec along the (0002) reflection and 930 arcsec along the (10̅15) reflection. The corresponding room temperature photoluminescence spectra was dominated by a sharp band edge peak. Back emission ultra violet light emitting diodes (UV LEDs) were fabricated by flip chip bonding to patterned AlN heat sinks followed by complete Si (111) substrate removal demonstrating a peak pulsed power of ∼0.7 mW at 344 nm peak emission wavelength. The demonstrated UV LEDs were fabricated on a cost effective epitaxial structure grown on the nanopatterned Si substrate with a total thickness of 3.3 µm [reprint (PDF)]
17.	280 nm UV LEDs Grown on HVPE GaN Substrates A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, M. Razeghi, and R.J. Molnar Opto-Electronics Review, 10 (4)-- January 1, 2002 ...[Visit Journal] We report on the enhancement of optical and electrical properties of 280 nm UV LEDs using low dislocation density HVPE-grown GaN substrate. Compared with the same structure grown on sapphire, these LEDs show ~30% reduction in current-voltage differential resistance, ~15% reduction in turn-on voltage, more than 200% increase in output power slope efficiency and saturation at higher currents. Lower density of defects due to higher material quality and better heat dissipation are believed to be the reason behind these improvements. [reprint (PDF)]
17.	Passivation of type-II InAs/GaSb double heterostructure P.Y. Delaunay, A. Hood, B.M. Nguyen, D. Hoffman, Y. Wei, and M. Razeghi Applied Physics Letters, Vol. 91, No. 9, p. 091112-1-- August 27, 2007 ...[Visit Journal] Focal plane array fabrication requires a well passivated material that is resistant to aggressive processes. The authors report on the ability of type-II InAs/GaSb superlattice heterodiodes to be more resilient than homojunctions diodes in improving sidewall resistivity through the use of various passivation techniques. The heterostructure consisting of two wide band gap (5 µm) superlattice contacts and a low band gap active region (11 µm) exhibits an R₀A averaging of 13·Ω cm². The devices passivated with SiO₂, Na₂S and SiO₂ or polyimide did not degrade compared to the unpassivated sample and the resistivity of the sidewalls increased to 47 kΩ·cm. [reprint (PDF)]
17.	High power quantum cascade lasers M. Razeghi, S. Slivken, Y. Bai, B. Gokden, and S.R. Darvish New Journal of Physics (NJP), Volume 11, p. 125017-- December 1, 2009 ...[Visit Journal] We report the most recent state-of-art quantum cascade laser results at wavelengths around 4.8 and 10 μm. At 4.8 μm, a room temperature wall plug efficiency (WPE) of 22 and 15.5% are obtained in pulsed mode and continuous wave (cw) mode, respectively. Room temperature cw output power reaches 3.4 W. The same laser design is able to reach a WPE of 36% at 120 K in pulsed mode. At 10 μm, room temperature average power of 2.2 W and cw power of 0.62 W are obtained. We also explore lasers utilizing the photonic crystal distributed feedback mechanism, and we demonstrate up to 12 W peak power operation at three different wavelengths around 4.7 μm with a waveguide width of 100 μm and diffraction limited beam quality. [reprint (PDF)]
17.	Reliable GaN-based resonant tunneling diodes with reproducible room-temperature negative differential resistance C. Bayram, D.K. Sadana, Z. Vashaei and M. Razeghi SPIE Proceedings, Vol. 8268, p. 826827-- January 22, 2012 ...[Visit Journal] negative differential resistance (NDR). Compared to other negative resistance devices such as (Esaki) tunnel and transferred-electron devices, RTDs operate much faster and at higher temperatures. III-nitride materials, composed of AlGaInN alloys, have wide bandgap, high carrier mobility and thermal stability; making them ideal for high power high frequency RTDs. Moreover, larger conduction band discontinuity promise higher NDR than other materials (such as GaAs) and room-temperature operation. However, earlier efforts on GaN-based RTD structures have failed to achieve a reliable and reproducible NDR. Recently, we have demonstrated for the first time that minimizing dislocation density and eliminating the piezoelectric fields enable reliable and reproducible NDR in GaN-based RTDs even at room temperature. Observation of NDR under both forward and reverse bias as well as at room and low temperatures attribute the NDR behaviour to quantum tunneling. This demonstration marks an important milestone in exploring III-nitride quantum devices, and will pave the way towards fundamental quantum transport studies as well as for high frequency optoelectronic devices such as terahertz emitters based on oscillators and cascading structures. [reprint (PDF)]
17.	Observation of Room Temperature Surface-Emitting Stimulated Emission from GaN:Ge by Optical pumping X. Zhang, P. Kung, A. Saxler, D. Walker, and M. Razeghi Journal of Applied Physics 80 (11)-- December 1, 1996 ...[Visit Journal] Optically pumped surface-emitting stimulated emission at room temperature was observed from GaN:Ge grown by metalorganic chemical vapor deposition. The sample was optically pumped perpendicularly on the top surface while the stimulated emission was collected from the back colinearly with the pump beam. The cavity was formed by the GaN/air and GaN/sapphire interfaces without any other structure. The stimulated emission was gain guided by the pump beam. The threshold optical pump density for stimulated emission was approximately 2.8 MW/cm² and the linewidth was 2.5 nm. The emission from GaN:Ge showed a redshift as the pump density increased. The comparison between theoretical calculations and experimental results suggested that many-body interactions can account well for the redshift. [reprint (PDF)]
17.	Photonic crystal distributed feedback quantum cascade lasers with 12 W output power Y. Bai, B. Gokden, S.R. Darvish, S. Slivken, and M. Razeghi Applied Physics Letters, Vol. 95, No. 3-- July 20, 2009 ...[Visit Journal] We demonstrate room temperature, high power, and diffraction limited operation of photonic crystal distributed feedback (PCDFB) quantum cascade lasers emitting around 4.7 µm. PCDFB gratings with three distinctive periods are fabricated on the same wafer. Peak output power up to 12 W is demonstrated. Lasers with different periods show expected wavelength shifts according to the design. Dual mode spectra are attributed to a purer index coupling by putting the grating layer 100 nm away from the laser core. Single lobed diffraction limited far field profiles are observed. [reprint (PDF)]
17.	New design strategies for multifunctional and inexpensive quantum cascade lasers Steven Slivken; Manijeh Razeghi Proc. SPIE 10926, Quantum Sensing and Nano Electronics and Photonics XVI, 1092611-- February 1, 2019 ...[Visit Journal] This manuscript describes some of the new advances in active mid-infrared photonic integrated circuits enabled by new quantum cascade laser technologies. This includes monolithic beam steering which was achieved via the integration of a widely tunable QCL and a tapered grating outcoupler. A record 17.9 degrees of steering with a low divergence beam (0.5 degrees) was achieved. In addition, the use of surface emitting architectures is proposed as a means to reduce the manufacturing cost of next-generation QCLs. A reflective outcoupler is demonstrated which can allow for stable surface emission from a quantum cascade laser and has potential for cost-effective wafer-scale manufacturing. This outcoupler is integrated with an amplified, electrically tunable laser architecture to demonstrate high power surface emission at a wavelength near 4.9 μm. Single mode peak power up to 6.7 W is demonstrated with >6 W available over a 90 cm⁻¹ (215 nm) spectral range. All of this is achieved while maintaining a high quality output beam, similar to a standard edge emitter. [reprint (PDF)]
17.	Inductively coupled plasma etching and processing techniques for type-II InAs/GaSb superlattices infrared detectors toward high fill factor focal plane arrays E.K. Huang, B.M. Nguyen, D. Hoffman, P.Y. Delaunay and M. Razeghi SPIE Proceedings, San Jose, CA Volume 7222-0Z-- January 26, 2009 ...[Visit Journal] A challenge for Type-II InAs/GaSb superlattice (T2SL) photodetectors is to achieve high fill factor, high aspect ratio etching for third generation focal plane arrays (FPAs). Initially, we compare the morphological and electrical results of single element T2SL photodiodes after BCl₃/Ar inductively coupled plasma (ICP) and electron cyclotron resonance (ECR) dry etching. Using a Si₃N₄ hard mask, ICP-etched structures exemplify greater sidewall verticality and smoothness, which are essential toward the realization of high fill factor FPAs. ICP-etched single element devices with SiO₂ passivation that are 9.3 µm in cutoff wavelength achieved vertical sidewalls of 7.7 µm in depth with a resistance area product at zero bias of greater than 1,000 Ω·cm² and maximum differential resistance in excess of 10,000 Ω·cm² at 77 K. By only modifying the etching technique in the fabrication steps, the ICP-etched photodiodes showed an order of magnitude decrease in their dark current densities in comparison to the ECR-etched devices. Finally, high aspect ratio etching is demonstrated on mutli-element arrays with 3 µm-wide trenches that are 11 µm deep. [reprint (PDF)]
17.	Room-temperature continuous wave operation of distributed feedback quantum cascade lasers with watt-level power output Q.Y. Lu, Y. Bai, N. Bandyopadhyay, Sl Slivken, and M. Razeghi Applied Physics Letters, Vol. 97, No. 23, p. 231119-1-- December 6, 2010 ...[Visit Journal] We demonstrate surface-grating distributed feedback quantum cascade lasers (QCLs) with a watt-level power output at 4.75 μm. A device with a 5 mm cavity length exhibits an output power of 1.1 W in room-temperature cw operation. Single-mode operation with a side mode suppression ratio of 30 dB is obtained in the working temperature of 15–105 °C. A double-lobed far field with negligible beam steering is observed. The significance of this demonstration lies in its simplicity and readiness to be applied to standard QCL wafers with the promise of high-power performances. [reprint (PDF)]
17.	Combined resonant tunneling and rate equation modeling of terahertz quantum cascade lasers Zhichao Chen , Andong Liu, Dong Chang , Sukhdeep Dhillon , Manijeh Razeghi , Feihu Wang Journal of Applied Physics, 135, 115703 ...[Visit Journal] Terahertz (THz) quantum cascade lasers (QCLs) are technologically important laser sources for the THz range but are complex to model. An efficient extended rate equation model is developed here by incorporating the resonant tunneling mechanism from the density matrix formalism, which permits to simulate THz QCLs with thick carrier injection barriers within the semi-classical formalism. A self-consistent solution is obtained by iteratively solving the Schrödinger-Poisson equation with this transport model. Carrier-light coupling is also included to simulate the current behavior arising from stimulated emission. As a quasi-ab initio model, intermediate parameters such as pure dephasing time and optical linewidth are dynamically calculated in the convergence process, and the only fitting parameters are the interface roughness correlation length and height. Good agreement has been achieved by comparing the simulation results of various designs with experiments, and other models such as density matrix Monte Carlo and non-equilibrium Green’s function method that, unlike here, require important computational resources. The accuracy, compatibility, and computational efficiency of our model enables many application scenarios, such as design optimization and quantitative insights into THz QCLs. Finally, the source code of the model is also provided in the supplementary material of this article for readers to repeat the results presented here, investigate and optimize new designs. [reprint (PDF)]
17.	Structural and compositional characterization of MOVPE GaN thin films transferred from sapphire to glass substrates using chemical lift-off and room temperature direct wafer bonding and GaN wafer scale MOVPE growth on ZnO-buffered sapphire S. Gautier, T. Moudakir, G. Patriarche, D.J. Rogers, V.E. Sandana, F. Hosseini Teherani, P. Bove, Y. El Gmili, K. Pantzas, Suresh Sundaram, D. Troadec, P.L. Voss, M. Razeghi, A. Ougazzaden Journal of Crystal Growth, Volume 370, Pages 63-67 (2013)-- May 1, 2013 ...[Visit Journal] GaN thin films were grown on ZnO/c-Al₂O₃ with excellent uniformity over 2 in. diameter wafers using a low temperature/pressure MOVPE process with N₂ as a carrier and dimethylhydrazine as an N source. 5 mm×5 mm sections of similar GaN layers were direct-fusion-bonded onto soda lime glass substrates after chemical lift-off from the sapphire substrates. X-Ray Diffraction, Scanning Electron Microscopy and Transmission Electron Microscopy confirmed the bonding of crack-free wurtzite GaN films onto a glass substrate with a very good quality of interface, i.e. continuous/uniform adherence and absence of voids or particle inclusions. Using this approach, (In) GaN based devices can be lifted-off expensive single crystal substrates and bonded onto supports with a better cost-performance profile. Moreover, the approach offers the possibility of reclaiming the expensive sapphire substrate so it can be utilized again for growth. [reprint (PDF)]
17.	Pressure-induced depopulation of the first excited subband in GaInAs/InP heterojunctions D Gauthier, J C Portal and M Razeghi D Gauthier et al 1989 Semicond. Sci. Technol. 4 218-- December 8, 1988 ...[Visit Journal] Following our previous work on (GalnAs)/(lnP) heterojunctions under hydrostatic pressure we present recent experimental results where the evidence for the total depopulation of the first excited electric subband with pressure is demonstrated. The total electron concentration decreases at a rate of 2.7% kbar”, much higher than in previous experiments. The experimental situation can be fitted with the triangular-well approximation if we both assume the change with pressure of the conduction band discontinuity AE, and the deepening of a deep impurity level with activation energy of the order 160 meV at zero pressure. [reprint (PDF)]
17.	Angled cavity broad area quantum cascade lasers Y. Bai, S. Slivken, Q.Y. Lu, N. Bandyopadhyay, and M. Razeghi Applied Physics Letters, Vol. 100, Np. 8, p. 081106-1-- August 20, 2012 ...[Visit Journal] Angled cavity broad area quantum cascade lasers (QCLs) are investigated with surface gratingbased distributed feedback (DFB) mechanisms. It is found that an angled cavity incorporating a one dimensional DFB with grating lines parallel to the laser facet offers the simplest solution for single mode and diffraction limited emission in the facet normal direction. A room temperature single mode QCL with the highest output power for wavelengths longer than 10 micron is demonstrated. This structure could be applied to a wide range of laser structures for power scaling along with spectral and spatial beam control. [reprint (PDF)]
17.	On the interface properties of ZnO/Si electroluminescent diodes J.L. Pau, J. Piqueras, D.J. Rogers, F. Hosseini Teherani, K. Minder, R. McClintock, and M. Razeghi Journal of Applied Physics, Vol. 107, No. 3, p. 033719-1-- February 1, 2010 ...[Visit Journal] ZnO layers grown on n⁻–Si(100), n⁺–Si(100), and n^––Si(111) substrates by pulsed-laser deposition were found to give electroluminescence. Light emission was observed in the form of discrete spots for currents over 1 mA with a white appearance to the naked eye. The intensity of these spots showed an erratic behavior over time, appearing and disappearing at random, while showing an associated random telegraph noise in the current signal. Regardless the substrate used, the electroluminescence spectra had a main broadband emission centered at about 600 nm and a relatively small peak at around 380 nm which corresponds to the energy of ZnO near band edge emission. Furthermore, the devices exhibited rectifying characteristics, whose current blocking direction depended on the substrate orientation. Optimization of ZnO conductivity and performing sample growth in N₂ ambient were found to be critical to enhance the emission intensity. Rutherford backscattering characterization revealed the existence of an intermixed region at the interface between ZnO and Si. To study the electronic properties at the interface, frequency dependent capacitance measurements were carried out. The junction capacitance became frequency dependent at the bias voltages at which light emission occurs due to the relatively slow trapping and generation processes at deep centers. These centers are believed to play an important role in the mechanism of light emission. [reprint (PDF)]
17.	Elimination of surface leakage in gate controlled Type-II InAs/GaSb mid-infrared photodetectors G. Chen, B.-M. Nguyen, A.M. Hoang, E.K. Huang, S.R. Darvish, and M. Razeghi Applied Physics Letters, Vol. 99, No. 18, p. 183503-1-- October 31, 2011 ...[Visit Journal] The electrical performance of mid-infrared type-II superlattice M-barrier photodetectors is shown to be limited by surface leakage. By applying gate bias on the mesa sidewall surface, leakage current is significantly reduced. Qualitatively IV modeling shows diffusion-dominated behavior of dark current at temperatures greater than 120 K. At 110 K, the dark current of gated device is reduced by more than 2 orders of magnitude, reaching the measurement system noise floor. With a quantum efficiency of 48% in front side illumination configuration, a 4.7μm cut-off gated device attains a specific detectivity of 2.5 × 10¹⁴ cm·Hz^½·W^-1 at 110 K, which is 3.6 times higher than in ungated devices. [reprint (PDF)]
17.	Crystallography of epitaxial growth of wurtzite-type thin films on sapphire substrates P. Kung, C.J. Sun, A. Saxler, H. Ohsato, and M. Razeghi Journal of Applied Physics 75 (9)-- May 1, 1994 ...[Visit Journal] In this article, we present a crystallographic model to describe the epitaxial growth of wurtzite‐type thin films such as gallium nitride (GaN) on different orientations of sapphire (Al2O3) substrates. Through this model, we demonstrate the thin films grown on (00⋅1)Al₂O₃ have a better epilayer‐substrate interface quality than those grown on (01⋅2)Al₂O₃. We also show the epilayer grown on (00⋅1)Al₂O₃ are gallium‐terminated, and both (00⋅1) and (01⋅2) surfaces of sapphire crystals are oxygen‐terminated. [reprint (PDF)]
17.	Ga₂O₃ Metal-oxide-semiconductor Field Effect Transistors on Sapphire Substrate by MOCVD Ji-Hyeon Park, Ryan McClintock and Manijeh Razeghi Semiconductor Science and Technology, Volume 34, Number 8-- June 26, 2019 ...[Visit Journal] Si-doped gallium oxide (Ga₂O₃) thin films were grown on a c-plane sapphire substrate by metalorganic chemical vapor deposition (MOCVD) and fabricated into metal oxide semiconductor field effect transistors (MOSFETs). The Ga₂O₃ MOSFETs exhibited effective gate modulation of the drain current with a complete channel pinch-off for VG < −25 V, and the three-terminal off-state breakdown voltage was 390 V. The device shows a very low gate leakage current (~50 pA/mm), which led to a high on/off ratio of ~10⁸. These transistor characteristics were stable from room temperature to 250 °C [reprint (PDF)]
17.	Demonstration of type-II superlattice MWIR minority carrier unipolar imager for high operation temperature application Guanxi Chen, Abbas Haddadi, Anh-Minh Hoang, Romain Chevallier, and Manijeh Razeghi Optics Letters Vol. 40, Iss. 1, pp. 29–32-- December 18, 2014 ...[Visit Journal] An InAs/GaSb type-II superlattice-based mid-wavelength infrared (MWIR) 320×256 unipolar focal plane array (FPA) using pMp architecture exhibited excellent infrared image from 81 to 150 K and ∼98% operability, which illustrated the possibility for high operation temperature application. At 150 K and −50 mV operation bias, the 27 μm pixels exhibited dark current density to be 1.2×10⁻⁵ A/cm², with 50% cutoff wavelength of 4.9 μm, quantum efficiency of 67% at peak responsivity (4.6 μm), and specific detectivity of 1.2×10¹² Jones. At 90 K and below, the 27 μm pixels exhibited system limited dark current density, which is below 1×10⁻⁹ A/cm², and specific detectivity of 1.5×10¹⁴ Jones. From 81 to 100 K, the FPA showed ∼11 mK NEDT by using F/2.3 optics and a 9.69 ms integration time. [reprint (PDF)]
17.	Hole-initiated multiplication in back-illuminated GaN avalanche photodiodes R. McClintock, J.L. Pau, K. Minder, C. Bayram, P. Kung and M. Razeghi Applied Physics Letters, Vol. 90 No. 14, p. 141112-1-- April 2, 2007 ...[Visit Journal] Avalanche p-i-n photodiodes were fabricated on AlN templates for back illumination. Structures with different intrinsic layer thicknesses were tested. A critical electric field of 2.73 MV/cm was estimated from the variation of the breakdown voltage with thickness. From the device response under back and front illumination and the consequent selective injection of holes and electrons in the junction, ionization coefficients were obtained for GaN. The hole ionization coefficient was found to be higher than the electron ionization coefficient as predicted by theory. Excess multiplication noise factors were also calculated for back and front illumination, and indicated a higher noise contribution for electron injection. [reprint (PDF)]

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