Center for Quantum Devices - Most Downloaded Journal Articles

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15.	First observation of the quantum Hall effect in a Ga0.47In0.53As‐InP heterostructure with three electric subbands M. Razeghi; J. P. Duchemin; J. C. Portal; L. Dmowski; G. Remeni; R. J. Nicholas; A. Briggs M. Razeghi, J. P. Duchemin, J. C. Portal, L. Dmowski, G. Remeni, R. J. Nicholas, A. Briggs; First observation of the quantum Hall effect in a Ga0.47In0.53As‐InP heterostructure with three electric subbands. Appl. Phys. Lett. 17 March 1986; 48 (11)-- March 17, 1986 ...[Visit Journal] Shubnikov–de Haas and quantum Hall effects have been studied in GaInAs‐InP heterojunctions grown by modified low pressure metalorganic chemical vapor deposition. In contrast to the results reported up till now on GaInAs‐InP heterojunctions with nearly the same channel electron density, not one but three electric subbands, E0, E1, and E2, are occupied in zero magnetic field. Two electric subbands E0 and E1 contribute to the quantum Hall effect. Magnetic depopulation of the higher (E1 and E2) subbands is observed in both perpendicular and tilted magnetic field orientations. This enables a demonstration of the importance of intersubband scattering in resistivity and cyclotron resonance. [reprint (PDF)]
15.	TEG IN LP-MO CVD Ga 0 4 7 ln 0 S3 As-lnP SUPERLATTICE M. RAZEGHIM. A. POISSONJ. P. LARIVAINB. de CREMOUXJ. P. DUCHEMIN ELECTRONICS LETTERs, 1982 ,Vol. 18-- April 15, 1982 ...[Visit Journal] We report the first successful growth of Ga o .4. 7 In 0 . J3 As-InPsuperlattice by the low-pressure metalorganic chemicalvapour deposition technique, and evidence for TEG proper-ties in these structures. [reprint (PDF)]
15.	Solar-Blind Deep UV Avalanche Photodetectors Using Reduced Area Epitaxy Lakshay Gautam , Junhee Lee, Michael Richards, and Manijeh Razeghi , Lakshay Gautam, Manijeh Razeghi, IEEE JOURNAL OF QUANTUM ELECTRONICS, VOL. 59, NO. 6, 10.1109/JQE.2023.3325254 ...[Visit Journal] We report high gain avalanche photodetectors operating in the deep UV wavelength regime. The high gain was leveraged through reduced area epitaxy by patterning AlN on Sapphire substrate. This helps in a substantial reduction of crack formation due to overgrowth on individually isolated AlN mesas. Reproducible gain on the order of 105 was reported for multiple diodes in different areas of 320 × 256 focal plane array. [reprint (PDF)]
15.	Recent advances in InAs/InAs1- xSbx/AlAs1-xSbx gap-engineered Type-II superlattice-based photodetectors Manijeh Razeghi, Abbas Haddadi, Arash Dehzangi, Romain Chevallier, Thomas Yang Proc. SPIE 10177, Infrared Technology and Applications XLIII, 1017705 -- May 9, 2017 ...[Visit Journal] InAs/InAs1-xSbx/AlAs1-xSbx type-II superlattices (T2SLs) is a system of multi-interacting quantum wells. Since its introduction, this material system has drawn a lot of attention especially for infrared detection. In recent years, InAs/InAs1- xSbx/AlAs1-xSbx T2SL material system has experienced incredible improvements in material quality, device structure designs and device fabrication process which elevated the performances of T2SL-based photodetectors to a comparable level to the state-of-the-art material systems for infrared detection such as Mercury Cadmium Telluride (MCT). In this paper, we will present the current status of InAs/InAs1-xSbx/AlAs1-xSbx T2SL-based photodetectors for detection in different infrared regions, from short-wavelength (SWIR) to long-wavelength (LWIR) infrared, and the future outlook of this material system. [reprint (PDF)]
15.	Growth of Al_xGa_1-xN:Ge on sapphire and silicon substrates X. Zhang, P. Kung, A. Saxler, D. Walker, T.C. Wang, and M. Razeghi Applied Physics Letters 67 (12)-- September 18, 1995 ...[Visit Journal] Al_xGa_1–xN were grown on (00.1) sapphire and (111) silicon substrates in the whole composition range (0 <= x <= 1). The high optical quality of the epilayers was assessed by room-temperature optical absorption and photoluminescence measurements. Layers with higher Al composition are more resistive. Resistive Al_xGa_1–xN epilayers were successfully doped with Ge and free-electron concentration as high as 3 × 10¹⁹ cm^–3 was achieved. [reprint (PDF)]
15.	Comparison of chemical and laser lift-off for the transfer of InGaN-based p-i-n junctions from sapphire to glass substrates D. J. Rogers ; P. Bove ; F. Hosseini Teherani ; K. Pantzas ; T. Moudakir ; G. Orsal ; G. Patriarche ; S. Gautier ; A. Ougazzaden ; V. E. Sandana ; R. McClintock ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862611 (March 18, 2013)-- March 18, 2013 ...[Visit Journal] InGaN-based p-i-n structures were transferred from sapphire to soda-lime glass substrates using two approaches: (1) laser-lift-off (LLO) and thermo-metallic bonding and (2) chemical lift-off (LLO) by means sacrificial ZnO templates and direct wafer bonding. Both processes were found to function at RT and allow reclaim of the expensive single crystal substrate. Both approaches have also already been demonstrated to work for the wafer-scale transfer of III/V semiconductors. Compared with the industry-standard LLO, the CLO offers the added advantages of a lattice match to InGaN with higher indium contents, no need for an interfacial adhesive layer (which facilitates electrical, optical and thermal coupling), no damaged/contaminated GaN surface layer, simplified sapphire reclaim (GaN residue after LLO may complicate reclaim) and cost savings linked to elimination of the expensive LLO process. [reprint (PDF)]
15.	Optical Investigations of GaAs-GaInP Quantum Wells Grown on the GaAs, InP, and Si Substrates H. Xiaoguang, M. Razeghi Applied Physics Letters 61 (14)-- October 5, 1992 ...[Visit Journal] We report the first photoluminescence investigation of GaAs‐Ga_0.51In_0.49P lattice matched multiquantum wells grown by the low pressure metalorganic chemical vapor deposition simultaneously in the same run on GaAs, Si, and InP substrates. The sharp photoluminescence peaks indicate the high quality of the samples on three different substrates. The temperature dependence of the photoluminescence indicates that the intrinsic excitonic transitions dominate at low temperature and free‐carrier recombinations at room temperature. The photoluminescence peaks of the samples grown on Si and InP substrates shift about 15 meV from the corresponding peaks of the sample grown on the GaAs substrate. Two possible interpretations are provided for the observed energy shift. One is the diffusion of In along the dislocation threads from GaInP to GaAs and another is the localized strain induced by defects and In segregations. [reprint (PDF)]
15.	Fabrication of nanostructured heterojunction LEDs using self-forming Moth-Eye Arrays of n-ZnO Nanocones Grown on p-Si (111) by PLD D.J. Rogers; V.E. Sandana; F. Hosseini Teherani; M. Razeghi; H.-J. Drouhin Proc. SPIE 7217, Zinc Oxide Materials and Devices IV, 721708 (February 17, 2009)-- February 17, 2009 ...[Visit Journal] ZnO nanostructures were grown on Si (111) substrates using Pulsed Laser Deposition. The impact of growth temperature (T_s) and Ar pressure (P_Ar) on the morphology, crystal structure and photoluminescence was investigated. Various types of ZnO nanostructures were obtained. Self-forming arrays of vertically-aligned nanorods and nanocones with strong c-axis crystallographic orientation and good optical response were obtained at higher T_s. The nanocone, or "moth-eye" type structures were selected for LED development because of their graded effective refractive index, which could facilitate improved light extraction at the LED/air interface. Such moth-eye arrays were grown on p-type Si (111) substrates to form heteroj unction LEDs with the n-type ZnO nanocones acting as an active component of the device. These nanostructured LEDs gave rectifying I/V characteristics with a threshold voltage of about 6V and a blueish-white electroluminescence, which was clearly visible to the naked eye. [reprint (PDF)]
15.	Geiger-mode operation of ultraviolet avalanche photodiodes grown on sapphire and free-standing GaN substrates E. Cicek, Z. Vashaei, R. McClintock, C. Bayram, and M. Razeghi Applied Physics Letters, Vol. 96, No. 26, p. 261107 (2010);-- June 28, 2010 ...[Visit Journal] GaN avalanche photodiodes (APDs) were grown on both conventional sapphire and low dislocation density free-standing (FS) c-plane GaN substrates. Leakage current, gain, and single photon detection efficiency (SPDE) of these APDs were compared. At a reverse-bias of 70 V, APDs grown on sapphire substrates exhibited a dark current density of 2.7×10⁻⁴ A/cm² whereas APDs grown on FS-GaN substrates had a significantly lower dark current density of 2.1×10⁻⁶ A/cm². Under linear-mode operation, APDs grown on FS-GaN achieved avalanche gain as high as 14 000. Geiger-mode operation conditions were studied for enhanced SPDE. Under front-illumination the 625 μm² area APD yielded a SPDE of 13% when grown on sapphire substrates compared to more than 24% when grown on FS-GaN. The SPDE of the same APD on sapphire substrate increased to 30% under back-illumination—the FS-GaN APDs were only tested under front illumination due to the thick absorbing GaN substrate. [reprint (PDF)]
15.	Direct growth of thick AlN layers on nanopatterned Si substrates by cantilever epitaxy Ilkay Demir, Yoann Robin, Ryan McClintock, Sezai Elagoz, Konstantinos Zekentes, and Manijeh Razeghi Physica Status Solidi 214 (4), pp. 1770120-- April 4, 2017 ...[Visit Journal] The growth of thick, high quality, and low stress AlN films on Si substrates is highly desired for a number of applications like the development of micro and nano electromechanical system (MEMS and NEMS) technologies [1] and particularly for fabricating AlGaNbased UV LEDs [2–5]. UV LEDs are attractive as they are applied in many areas, such as biomedical instrumentations and dermatology, curing of industrial resins and inks, air purification, water sterilization, and many others [2, 3]. UV LEDs have been generally fabricated on AlN, GaN, Al₂O₃, or SiC substrates because of better lattice mismatching to AlGaN material systems. [reprint (PDF)]
15.	Thin-Film Antimonide-Based Photodetectors Integrated on Si Yiyun Zhang , Member, IEEE, Abbas Haddadi, Member, IEEE, Romain Chevallier, Arash Dehzangi, Member, IEEE, and Manijeh Razeghi , Life Fellow, IEEE IEEE JOURNAL OF QUANTUM ELECTRONICS, VOL. 54, NO. 2-- April 1, 2018 ...[Visit Journal] Monolithic integration of antimonide (Sb)-based compound semiconductors on Si is in high demand to enrich silicon photonics by extending the detection range to longer infrared wavelengths. In this paper, we have demonstrated the damage-free transfer of large-area (1×1 cm² ) narrow-bandgap Sb-based type-II superlattice (T2SL)-based thin-film materials onto a Si substrate using a combination of wafer-bonding and chemical epilayer release techniques. An array of Sb-based T2SL-based long-wavelength infrared (LWIR) photodetectors with diameters from 100 to 400 μm has been successfully fabricated using standard "top–down" processing technique. The transferred LWIR photodetectors exhibit a cut-off wavelength of λ 8.6 μm at 77 K. The dark current density of the transferred photodetectors under 200 mV applied bias at 77 K is as low as 5.7×10⁻⁴ A/cm² and the R×A reaches 66.3 Ω·cm², exhibiting no electrical degradation compared with reference samples on GaSb native substrate. The quantum efficiency and peak responsivity at 6.75 μm (@77 K, 200 mV) are 46.2% and 2.44 A/W, respectively. The specific detectivity (D^*) at 6.75 μm reaches as high as 1.6×10¹¹ cm·Hz^1/2/W under 200 mV bias at 77 K. Our method opens a reliable pathway to realize high performance and practical Sb-based optoelectronic devices on a Si platform. [reprint (PDF)]
15.	Fabrication of GaN Nanotubular Material using MOCVD with an Aluminium Oxide Membrane W.G. Jung, S.H. Jung, P. Kung, and M. Razeghi Nanotechnology 17-- January 1, 2006 ...[Visit Journal] GaN nanotubular material is fabricated with an aluminium oxide membrane in MOCVD. SEM, XRD, TEM and PL are employed to characterize the fabricated GaN nanotubular material. An aluminium oxide membrane with ordered nanoholes is used as a template. Gallium nitride is deposited at the inner wall of the nanoholes in the aluminium oxide template, and the nanotubular material with high aspect ratio is synthesized using the precursors of TMG and ammonia gas. Optimal synthesis conditions in MOCVD are obtained successfully for the gallium nitride nanotubular material in this research. The diameter of the GaN nanotube fabricated is approximately 200–250 nm and the wall thickness is about 40–50 nm. [reprint (PDF)]
15.	Review of high power frequency comb sources based on InP From MIR to THZ at CQD Manijeh Razeghi, Quanyong Lu, Donghai Wu, Steven Slivken Event: SPIE Optical Engineering + Applications, 2018, San Diego, California, United States-- September 14, 2018 ...[Visit Journal] We present the recent development of high performance compact frequency comb sources based on mid-infrared quantum cascade lasers. Significant performance improvements of our frequency combs with respect to the continuous wave power output, spectral bandwidth, and beatnote linewidth are achieved by systematic optimization of the device's active region, group velocity dispersion, and waveguide design. To date, we have demonstrated the most efficient, high power frequency comb operation from a free-running room temperature continuous wave (RT CW) dispersion engineered QCL at λ~5-9 μm. In terms of bandwidth, the comb covered a broad spectral range of 120 cm⁻¹ with a radio-frequency intermode beatnote spectral linewidth of 40 Hz and a total power output of 880 mW at 8 μm and 1 W at ~5.0 μm. The developing characteristics show the potential for fast detection of various gas molecules. Furthermore, THz comb sources based on difference frequency generation in a mid-IR QCL combs could be potentially developed. [reprint (PDF)]
15.	Very high quality p-type Al_xGa_1-xN/GaN superlattice A. Yasan and M. Razeghi special ISDRS issue of Solid State Electronics Journal, 47-- January 1, 2003 ...[Visit Journal] Very high quality p-type Al_xGa_1−xN/GaN superlattice has been achieved through optimization of Mg flow and period of superlattice. Theoretical model was used to optimize the structure of superlattice by choosing suitable Al compositions and superlattice periods. The experiments show that for x=0.26, the resistivity is as low as 0.19 Ω cm and hole concentration is as high as 4.2×10¹⁸ cm⁻³, the highest values ever reported for p-type AlGaN/GaN superlattices. Hall effect measurement and admittance spectroscopy on the samples confirm the high quality of the superlattices. The activation energy calculated for p-type GaN and p-type A_0.1Ga_0.9N/GaN superlattice is estimated to be not, vert, similar 125 and 3 meV respectively. [reprint (PDF)]
15.	Broad area photonic crystal distributed feedback quantum cascade lasers emitting 34 W at λ ~ 4.36 μm B. Gokden, Y. Bai, N. Bandyopadhyay, S. Slivken and M. Razeghi Applied Physics Letters, Vol. 97, No. 13, p. 131112-1-- September 27, 2010 ...[Visit Journal] We demonstrate room temperature, high power, single mode, and diffraction limited operation of a two dimensional photonic crystal distributed feedback quantum cascade laser emitting at 4.36 μm. Total peak power up to 34 W is observed from a 3 mm long laser with 400 μm cavity width at room temperature. Far-field profiles have M2 figure of merit as low as 2.5. This device represents a significant step toward realization of spatially and spectrally pure broad area high power quantum cascade lasers. [reprint (PDF)]
15.	InAs/InAs_1-xSb_x type-II superlattices for high performance long wavelength infrared detection A. Haddadi , G. Chen , R. Chevallier , A. M. Hoang , and M. Razeghi Appl. Phys. Lett. 105, 121104 (2014)-- September 22, 2014 ...[Visit Journal] High performance long-wavelength infrared nBn photodetectors based on InAs/InAs_1−xSb_x type-II superlattices on GaSb substrate have been demonstrated. The photodetector's 50% cut-off wavelength was ∼10 μm at 77 K. The photodetector with a 6 μm-thick absorption region exhibited a peak responsivity of 4.47 A/W at 7.9 μm, corresponding to a quantum efficiency of 54% at −90 mV bias voltage under front-side illumination and without any anti-reflection coating. With an R × A of 119 Ω·cm² and a dark current density of 4.4 × 10⁻⁴ A/cm² under −90 mV applied bias at 77 K, the photodetector exhibited a specific detectivity of 2.8 × 10¹¹ cm·Hz^1/2·W^-1. [reprint (PDF)]
15.	Current status of high performance quantum cascade lasers at the center for quantum devices M. Razeghi; A. Evans; Y. Bai; J. Nguyen; S. Slivken; S.R. Darvish; K. Mi Conference Proceedings - International Conference on Indium Phosphide and Related Materials. 588-593:[4266015] (2007)-- May 14, 2007 ...[Visit Journal] Mid-infrared laser sources are highly desired for laser-based trace chemical sensors, military countermeasures, free-space communications, as well as developing medical applications. While application development has been limited by the availability of adequate mid-infrared sources, InP-based quantum cascade lasers (QCLs) hold promise as inexpensive, miniature, portable solutions capable of producing high powers and operating at high temperatures with excellent beam quality and superior reliability. This paper discusses the most recent developments of application-ready high power (> 100 mW), continuous-wave (CW), mid-infrared QCLs operating above room temperature with lifetimes exceeding 13,000 hours. [reprint (PDF)]
15.	Development of Quantum Cascade Lasers for High Peak Output Power and Low Threshold Current Density S. Slivken and M. Razeghi Solid State Electronics 46-- January 1, 2002 ...[Visit Journal] Design and material optimization are used to both decrease the threshold current density and increase the output power for quantum cascade lasers. Waveguides are designed to try and minimize free-carrier and surface-plasmon absorption. Excellent material characterization is also presented, showing excellent control over layer thickness, interface quality, and doping level. Experiments are done to both optimize the injector doping level and to maximize the output power from a single aperture. At 300 K, a threshold current density as low as 1.8 kA/cm² is reported, along with peak powers of approximately 2.5 W. Strain-balanced lasers are also demonstrated at λnot, vert, similar5 μm, exhibiting threshold current densities<300 A/cm² at 80 K. These values represent the state-of-the-art for mid-infrared lasers with λ>4 μm [reprint (PDF)]
15.	Low pressure metalorganic chemical vapor deposition of high quality AlN and GaN thin films on sapphire and silicon substrates P. Kung, X. Zhang, E. Bigan, and M. Razeghi Optoelectronic Integrated Circuit Materials, Physics and Devices, SPIE Conference, San Jose, CA; Proceedings, Vol. 2397-- February 6, 1995 ...[Visit Journal] High quality AlN and GaN epilayers have been grown on basal plane sapphire by low pressure metalorganic chemical vapor deposition. The X-ray rocking curve linewidth of the AlN and GaN films were about 100 and 30 arcsecs respectively. Sharp absorption edges were determined at 6.1 and 3.4 eV respectively. Successful donor-bound excitonic luminescence emissions were detected for GaN films grown on sapphire and silicon. Two additional lines at 3.37 and 3.31 eV were observed on GaN on sapphire and assumed to be impurity-related. Doping of GaN layers was achieved with magnesium. Mg-related photoluminescence emissions were successfully detected on as-grown samples, without any post-growth treatment. [reprint (PDF)]
15.	Bias-selectable dual-band mid-/long-wavelength infrared photodetectors based on InAs/InAs_1−xSb_x type-II superlattices A. Haddadi, R. Chevallier, G. Chen, A. M. Hoang, and M. Razeghi Applied Physics Letters 106 , 011104-- January 8, 2015 ...[Visit Journal] A high performance bias-selectable mid-/long-wavelength infrared photodetector based on InAs/InAs_1−xSb_x type-II superlattices on GaSb substrate has been demonstrated. The mid- and long-wavelength channels' 50% cut-off wavelengths were ∼5.1 and ∼9.5 μm at 77 K. The mid-wavelength channel exhibited a quantum efficiency of 45% at 100 mV bias voltage under front-side illumination and without any anti-reflection coating. With a dark current density of 1 × 10⁻⁷ A/cm² under 100 mV applied bias, the mid-wavelength channel exhibited a specific detectivity of 8.2 × 10¹² cm·Hz^½·W^-1 at 77 K. The long-wavelength channel exhibited a quantum efficiency of 40%, a dark current density of 5.7 × 10⁻⁴ A/cm² under −150 mV applied bias at 77 K, providing a specific detectivity value of 1.64 × 10¹¹ cm·Hz^½·W^-1. [reprint (PDF)]
15.	Recent advances in mid infrared (3-5 μm) quantum cascade lasers Manijeh Razeghi; Neelanjan Bandyopadhyay; Yanbo Bai; Quanyong Lu; Steven Slivken Optical Materials Express, Vol. 3, Issue 11, pp. 1872-1884 (2013)-- November 2, 2013 ...[Visit Journal] Quantum cascade laser (QCL) is an important source of electromagnetic radiation in mid infrared region. Recent research in mid-IR QCLs has resulted in record high wallplug efficiency (WPE), high continuous wave (CW) output power, single mode operation and wide tunability. CW output power of 5.1 W with 21% WPE has been achieved at room temperature (RT). A record high WPE of 53% at 40K has been demonstrated. Operation wavelength of QCL in CW at RT has been extended to as short as 3μm. Very high peak power of 190 W has been obtained from a broad area QCL of ridge width 400μm. 2.4W RT, CW power output has been achieved from a distributed feedback (DFB) QCL. Wide tuning based on dual section sample grating DFB QCLs has resulted in individual tuning of 50cm-1 and 24 dB side mode suppression ratio with continuous wave power greater than 100 mW. [reprint (PDF)]
15.	Compressively-strained multiple quantum well InAsSb lasers emitting at 3.6 μm grown by metal-organic chemical vapor deposition B. Lane, D. Wu, A. Rybaltowski, H. Yi, J. Diaz, and M. Razeghi Applied Physics Letters 70 (4)-- January 27, 1997 ...[Visit Journal] A compressively strained InAsSb/InAs multiple quantum-well (MQW) structure was grown by low-pressure metal-organic chemical vapor deposition. Maximum output power (from two facets) up to 1 W with differential efficiency about 70% was obtained from a MQW laser with stripe width of 100 μm and cavity length of 700 μm for emitting wavelength of 3.65 μm at 90 K in pulse mode operation. About 2 times lower threshold current density was obtained from the MQW lasers for a temperature range of 90 to 140 K compared to the double heterostructure lasers grown on the same growth conditions. [reprint (PDF)]
15.	Growth of AlGaN on silicon substrates: a novel way to make back-illuminated ultraviolet photodetectors Ryan McClintock ; Manijeh Razeghi Proc. SPIE 9555, Optical Sensing, Imaging, and Photon Counting: Nanostructured Devices and Applications, 95550U-- August 28, 2015 ...[Visit Journal] AlGaN, with its tunable wide-bandgap is a good choice for the realization of ultraviolet photodetectors. AlGaN films tend to be grown on foreign substrates such as sapphire, which is the most common choice for back-illuminated devices. However, even ultraviolet opaque substrates like silicon holds promise because, silicon can be removed by chemical treatment to allow back-illumination,1 and it is a very low-cost substrate which is available in large diameters up to 300 mm. However, Implementation of silicon as the solar-blind PD substrates requires overcoming the lattice-mismatch (17%) with the AlxGa1-xN that leads to high density of dislocation and crack-initiating stress. In this talk, we report the growth of thick crack-free AlGaN films on (111) silicon substrates through the use of a substrate patterning and mask-less selective area regrowth. This technique is critical as it decouples the epilayers and the substrate and allows for crack-free growth; however, the masking also helps to reduce the dislocation density by inclining the growth direction and encouraging dislocations to annihilate. A back-illuminated p-i-n PD structure is subsequently grown on this high quality template layer. After processing and hybridizing the device we use a chemical process to selectively remove the silicon substrate. This removal has minimal effect on the device, but it removes the UV-opaque silicon and allows back-illumination of the photodetector. We report our latest results of back-illuminated solar-blind photodetectors growth on silicon. [reprint (PDF)]
15.	Defects in Organometallic Vapor-Phase Epitaxy-Grown GaInP Layers Feng S.L., Bourgoin J.C., Omnes F., and Razeghi M. Applied Physics Letters 59 (8), p. 941-- May 28, 1991 ...[Visit Journal] Non-intentionally doped metalorganic vapor‐phase epitaxy Ga_1−x InxP layers, having an alloy composition (x = 0.49) corresponding to a lattice matched to GaAs, grown by metalorganic chemical vapor deposition, have been studied by capacitance‐voltage and deep-level transient spectroscopy techniques. They are found to exhibit a free‐carrier concentration at room temperature of the order of 10¹⁵ cm⁻³. Two electron traps have been detected. The first one, at 75 meV below the conduction band, is in small concentration (∼10¹³ cm⁻³) while the other, at about 0.9 eV and emitting electrons above room temperature, has a concentration in the range 10¹⁴–10¹⁵ cm⁻³. [reprint (PDF)]
15.	High Quality Aluminum Nitride Epitaxial Layers Grown on Sapphire Substrates A. Saxler, P. Kung, C.J. Sun, E. Bigan and M. Razeghi Applied Physics Letters 64 (3)-- January 17, 1994 ...[Visit Journal] In this letter we report the growth of high quality AlN epitaxial layers on sapphire substrates. The AlN grown on (00·1) sapphire exhibited a better crystalline quality than that grown on (01·2) sapphire. An x-ray rocking curve of AlN on (00·1) Al₂O₃ yielded a full width at half-maximum of 97.2 arcsec, which is the narrowest value reported to our knowledge. The AlN peak on (01·2) Al₂O₃ was about 30 times wider. The absorption edge measured by ultraviolet transmission spectroscopy for AlN grown on (00·1) Al₂O₃ was about 197 nm. [reprint (PDF)]

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