Electron Beam Lithography
 Lica Lion-LV1 electron beam lithography system capable or producing features smaller than 30 nm. |
Laser Measurement Setup
 Bruker FRIR, laser drivers, thermostatic stage, and data acquisition equipment |
Photodetector Measurment Setup
 Burker FTIR and Helium cryostat used to characterize Infrared materials and devices. |
Lapping & Polishing
 One of two Logitech lapping and polsihing systems used to mechanically thin laser diodes in preperatiion for cleaving, or to assist in back-thinning of hybridized focal plane arrays for higher performance. |
Laser Bonder
.jpg) SET FC-150 high-precision die-bonder used to bond lasers with excellent placement accuracy and planarity. |
Atomic Force Microscope
 Digital Instruments, Nanoscope D3100 scanning probe microscope in a vibration isolation enclosure, configured for tapping more AFM. |
IR Photoluminescence
 Setup used to characterize IR material using an argon-ion laser, monochromator, lock-in amplifier, and various commercial IR detectors. |
Scanning Electron Microscope
 Hitachi 4500 cold field emission SEM used in the characterization of epitaxial films and the processing of semiconductor devices. |
High-Resolution X-Ray Diffraction System
 Philips HR-XRD with a 2 KW copper Kα source, 4-bounce germanium monochromator, precision goniometer, and scintillation detector. |
Chemistry Room
 Class 1000 chemistry room with four hoods, mask aligner, and yellow lighting to support lithography and semiconductor device processing. |