Entrance to the CQD Cleanroom  This is the main airlock granting entrance to the CQD's cleanroom facilities. Notice the hazardous gas detection annunciators above the door. |
Emcore MOCVD Reactor  Commercial Emcore shower head reactor used primarily for the growth of quantum dots. |
Emcore MOCVD Reactor  Close up of Emcore reactor growth chamber. |
Gas Source MBE reactor  Gas Source Molecular Beam Epitaxy system used in the growth of Quantum Cascade Lasers. |
Solid-Source MBE Reactor  This is the Solid Source MBE reactor used in the growth of Type-II superlattice photodetectors. |
Aixtron MOCVD Reactor  Commercial Horizontal flow Aixtron MOCVD reactor. One of the first ever developed to facilitate the growth of III-Nitirdes |
Infrared Detector Characterization Setup  Cryostat, blackbody, and lock-in amplifier used in the testing of IR detectors. |
Infrared Laser Characterization Setup  One of the setup used in the Characterization of Quantum Cascade Lasers |
UV Device Characterization Setup  This is the measurement setup used to characterize UV lasers, LEDs, photodetectors, and APDs. |
Electron Beam Lithography  Lica Lion-LV1 electron beam lithography system capable or producing features smaller than 30 nm. |
Laser Measurement Setup  Bruker FRIR, laser drivers, thermostatic stage, and data acquisition equipment |
Photodetector Measurment Setup  Burker FTIR and Helium cryostat used to characterize Infrared materials and devices. |
Atomic Force Microscope  Digital Instruments, Nanoscope D3100 scanning probe microscope in a vibration isolation enclosure, configured for tapping more AFM. |
IR Photoluminescence  Setup used to characterize IR material using an argon-ion laser, monochromator, lock-in amplifier, and various commercial IR detectors. |
Scanning Electron Microscope  Hitachi 4500 cold field emission SEM used in the characterization of epitaxial films and the processing of semiconductor devices. |
High-Resolution X-Ray Diffraction System  Philips HR-XRD with a 2 KW copper Kα source, 4-bounce germanium monochromator, precision goniometer, and scintillation detector. |
Chemistry Room  Class 1000 chemistry room with four hoods, mask aligner, and yellow lighting to support lithography and semiconductor device processing. |
Wire Bonder  Gold wire bonder used in the packaging of semiconductor devices for test. |
Metal E-beam Evaporator  Electron-beam metal deposition system outfitted for deposition of Gold, Platinum, Titanium, and Nickel, with a secondary thermal boat for evaporation of Gold-Germanium. |
ECR Etching System  PlasmaLabs Electron Cyclotron Resonance dry etching system used in the processing of semiconductor devices |
PECVD System  Oxford Instrument Plasma Enhanced Chemical Vapor Deposition system used to deposit dielectrics such as silicon dioxide and silicon nitride used in the passivation of devices. |
Thermal Evaporator  This is an extensively modified Veeco thermal evaporator that is used to deposit metals. |
Dicing System  This K&S 7100 semi-automatic dicing system is used in the partition of wafers into smaller die. |
Life testing System  Life testing system allows for extended logging and testing of lasers and LEDs at controlled currents, voltages, or output powers, at a constant temperature. |
MOCVD Reactor  This is the MOCVD reactor developed by Professor Razerghi at Thompson and brought with her to northwestern. |
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