Center for Quantum Devices, Northwestern University

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1.	Noise analysis in Type-II InAs/GaSb Focal Plane Arrays P.Y. Delaunay and M. Razeghi Virtual Journal of Nanoscale Science and Technology, Vol. 20, No. 14-- October 5, 2009 ...[Visit Journal]
2.	Noise analysis in type-II InAs/GaSb focal plane arrays P.Y. Delaunay and M. Razeghi Journal of Applied Physics, Vol. 106, Issue 6, p. 063110-- September 15, 2009 A long wavelength infrared focal plane array based on type-II InAs/GaSb superlattices was fabricated and characterized at 80 K. The noise equivalent temperature difference in the array was measured as low as 23 mK for an integration time of 0.129 ms. The noise behavior of the detectors was properly described by a model based on thermal, shot, read out integrated circuit, and photon noises. The noise of the imager was dominated by photon noise for photon fluxes higher than 1.8 X 10(15) ph s(−1)cm(−2). At lower irradiance, the imager was limited by the shot noise generated by the dark current or the noise of the testing system. The superlattice detector did not create 1/ f noise for frequencies above 4 mHz. As a result, the focal plane array did not require frequent calibrations. © 2009 American Institute of Physics.
3.	Demonstration of mid-infrared type-II InAs/GaSb superlattice photodiodes grown on GaAs substrate B.M. Nguyen, D. Hoffman, E.K. Huang, S. Bogdanov, P.Y. Delaunay, M. Razeghi and M.Z. Tidrow Applied Physics Letters, Vol. 94, No. 22-- June 8, 2009 We report the growth and characterization of type-II InAs/GaSb superlattice photodiodes grown on a GaAs substrate. Through a low nucleation temperature and a reduced growth rate, a smooth GaSb surface was obtained on the GaAs substrate with clear atomic steps and low roughness morphology. On the top of the GaSb buffer, a p⁺-i-n⁺ type-II InAs/GaSb superlattice photodiode was grown with a designed cutoff wavelength of 4 μm. The detector exhibited a differential resistance at zero bias (R₀A)in excess of 1600 Ω·cm² and a quantum efficiency of 36.4% at 77 K, providing a specific detectivity of 6 X 10¹¹ cm·Hz^½/W and a background limited operating temperature of 100 K with a 300 K background. Uncooled detectors showed similar performance to those grown on GaSb substrates with a carrier lifetime of 110 ns and a detectivity of 6 X 10⁸ cm·Hz^½/W. ...[Visit Journal]
4.	Recent Advances in LWIR Type-II InAs/GaSb Superlattice Photodetectors and Focal Plane Arrays at the Center for Quantum Devices M. Razeghi, D. Hoffman, B.M. Nguyen, P.Y. Delaunay, E.K. Huang, M.Z. Tidrow, and V. Nathan Proceedings of the IEEE, Vol. 97, No. 6, p. 1056-1066-- June 1, 2009 In recent years, Type-II InAs/GaSb superlattice photo-detectors have experienced significant improvements in material quality, structural designs, and imaging applications. They now appear to be a possible alternative to the state-of-the-art HgCdTe (MCT) technology in the long and very long wavelength infrared regimes. At the Center for Quantum Devices, we have successfully realized very high quantum efficiency, very high dynamic differential resistance R₀A - product LWIR Type – II InAs/GaSb superlattice photodiodes with efficient surface passivation techniques. The demonstration of high quality LWIR Focal Plane Arrays that were 100 % fabricated in - house reaffirms the pioneer position of this university-based laboratory. ...[Visit Journal]
5.	High performance antimony based type-II superlattice photodiodes on GaAs substrates B.M. Nguyen, D. Hoffman, E.K. Huang, P.Y. Delaunay, and M. Razeghi SPIE Porceedings, Vol. 7298, Orlando, FL 2009, p. 72981T-- April 13, 2009 In recent years, Type II InAs/GaSb superlattices grown on GaSb substrate have achieved significant advances in both structural design and material growth, making Type II superlattice infrared detector a rival competitor to the state-of-the-art MCT technology. However, the limited size and strong infrared absorption of GaSb substrates prevent large format type-II superlattice infrared imagers from being realized. In this work, we demonstrate type-II superlattices grown on GaAs substrates, which is a significant step toward third generation infrared imaging at low cost. The device performances of Type II superalttice photodetectors grown on these two substrates are compared. ...[Visit Journal]
6.	Background limited performance of long wavelength infrared focal plane arrays fabricated from type-II InAs/GaSb M-structure superlattice P.Y. Delaunay, B.M. Nguyen and M. Razeghi SPIE Porceedings, Vol. 7298, Orlando, FL 2009, p. 72981Q-- April 13, 2009 Recent advances in growth techniques, structure design and processing have lifted the performance of Type-II InAs/GaSb superlattice photodetectors. The introduction of a M-structure design improved both the dark current and R0A of Type-II photodiodes. This new structure combined with a thick absorbing region demonstrated background limited performance at 77K for a 300K background and a 2-π field of view. A focal plane array with a 9.6 μm 50% cutoff wavelength was fabricated with this design and characterized at 80K. The dark current of individual pixels was measured around 1.3 nA, 7 times lower than previous superlattice FPAs. This led to a higher dynamic range and longer integration times. The quantum efficiency of detectors without anti-reflective coating was 72%. The noise equivalent temperature difference reached 23 mK. The deposition of an anti-reflective coating improved the NEDT to 20 mK and the quantum efficiency to 89%. ...[Visit Journal]
7.	Surface leakage reduction in narrow band gap type-II antimonide-based superlattice photodiodes E.K. Huang, D. Hoffman, B.M. Nguyen, P.Y. Delaunay and M. Razeghi Applied Physics Letters, Vol. 94, No. 5, p. 053506-1-- February 2, 2009 Inductively coupled plasma (ICP) dry etching rendered structural and electrical enhancements on type-II antimonide-based superlattices compared to those delineated by electron cyclotron resonance (ECR) with a regenerative chemical wet etch. The surface resistivity of 4×10⁵ Omega cm is evidence of the surface quality achieved with ICP etching and polyimide passivation. By only modifying the etching technique in the fabrication steps, the ICP-etched devices with a 9.3 µm cutoff wavelength revealed a diffusion-limited dark current density of 4.1×10⁻⁶ A/cm² and a maximum differential resistance at zero bias in excess of 5300 Ω·cm² at 77 K, which are an order of magnitude better in comparison to the ECR-etched devices. ...[Visit Journal]
8.	Background limited performance of long wavelength infrared focal plane arrays fabricated from M-structure InAs-GaSb superlattices P.Y. Delaunay, B.M. Nguyen, D. Hoffman, E.K. Huang, and M. Razeghi IEEE Journal of Quantum Electronics, Vol. 45, No. 2, p. 157-162.-- February 1, 2009 The recent introduction of a M-structure design improved both the dark current and R₀A performances of Type-II InAs-GaSb photodiodes. A focal plane array fabricated with this design was characterized at 81 K. The dark current of individual pixels was measured between 1.1 and 1.6 nA, 7 times lower than previous superlattice FPAs. This led to a higher dynamic range and longer integration times. The quantum efficiency of detectors without antireflective coating was 74%. The noise equivalent temperature difference reached 23 mK, limited only by the performance of the testing system and the read out integrated circuit. Background limited performances were demonstrated at 81 K for a 300 K background. ...[Visit Journal]
9.	The importance of band alignment in VLWIR type-II InAs/GaSb heterodiodes containing the M-structure barrier D. Hoffman, B.M. Nguyen, E.K. Huang, P.Y. Delaunay, S. Bogdanov, P. Manukar, M. Razeghi, and V. Nathan SPIE Proceedings, San Jose, CA Volume 7222-15-- January 26, 2009 The Type-II InAs/GaSb superlattice photon detector is an attractive alternative to HgCdTe photodiodes and QWIPS. The use of p+ - pi - M - N+ heterodiode allows for greater flexibility in enhancing the device performance. The utilization of the Empirical Tight Binding method gives the band structure of the InAs/GaSb superlattice and the new M- structure (InAs/GaSb/AlSb/GaSb) superlattice allowing for the band alignment between the binary superlattice and the M- superlattice to be determined and see how it affects the optical performance. Then by modifying the doping level of the M- superlattice an optimal level can be determined to achieve high detectivity, by simultaneously improving both photo-response and reducing dark current for devices with cutoffs greater than 14.5 µm. ...[Visit Journal]
10.	Background limited performance of long wavelength infrared focal plane arrays fabricated from M-structure InAs/GaSb superlattices P.Y. Delaunay, B.M. Nguyen, D. Hoffman, E.K. Huang, P. Manurkar, S. Bogdanov and M. Razeghi SPIE Proceedings, San Jose, CA Volume 7222-0W-- January 26, 2009 Recent advances in the design and fabrication of Type-II InAs/GaSb superlattices allowed the realization of high performance long wavelength infrared focal plane arrays. The introduction of an Mstructure barrier between the n-type contact and the pi active region reduced the tunneling component of the dark current. The M-structure design improved the noise performance and the dynamic range of FPAs at low temperatures. At 81K, the NEDT of the focal plane array was 23 mK. The noise of the camera was dominated by the noise component due to the read out integrated circuit. At 8 µm, the median quantum efficiency of the detectors was 71%, mainly limited by the reflections on the backside of the array. ...[Visit Journal]
11.	Inductively coupled plasma etching and processing techniques for type-II InAs/GaSb superlattices infrared detectors toward high fill factor focal plane arrays E.K. Huang, B.M. Nguyen, D. Hoffman, P.Y. Delaunay and M. Razeghi SPIE Proceedings, San Jose, CA Volume 7222-0Z-- January 26, 2009 A challenge for Type-II InAs/GaSb superlattice (T2SL) photodetectors is to achieve high fill factor, high aspect ratio etching for third generation focal plane arrays (FPAs). Initially, we compare the morphological and electrical results of single element T2SL photodiodes after BCl₃/Ar inductively coupled plasma (ICP) and electron cyclotron resonance (ECR) dry etching. Using a Si₃N₄ hard mask, ICP-etched structures exemplify greater sidewall verticality and smoothness, which are essential toward the realization of high fill factor FPAs. ICP-etched single element devices with SiO2 passivation that are 9.3 µm in cutoff wavelength achieved vertical sidewalls of 7.7 µm in depth with a resistance area product at zero bias of greater than 1,000 Ω·cm² and maximum differential resistance in excess of 10,000 Ω·cm² at 77 K. By only modifying the etching technique in the fabrication steps, the ICP-etched photodiodes showed an order of magnitude decrease in their dark current densities in comparison to the ECR-etched devices. Finally, high aspect ratio etching is demonstrated on mutli-element arrays with 3 µm-wide trenches that are 11 µm deep. ...[Visit Journal]
12.	Band edge tunability of M-structure for heterojunction design in Sb based type II superlattice photodiodes B.M. Nguyen, D. Hoffman, P.Y. Delaunay, E.K. Huang, M. Razeghi, and J. Pellegrino Applied Physics Letters, Vol. 93, No. 16, p. 163502-1-- October 20, 2008 We present theoretically and experimentally the effect of the band discontinuity in type II misaligned InAs/GaSb superlattice heterodiodes. Calculations using the empirical tight binding method have shown the great flexibility in tuning the energy levels of the band edge in M-structure superlattice as compared to the standard InAs/GaSb superlattice. Through the experimental realization of several p-pi-M-n photodiodes, the band discontinuity alignment between the standard binary-binary superlattice and the M-structured superlattice was investigated via optical characterization. The agreement between the theoretical predictions and the experimental measurement confirms the capability of controlling the M-structure band edges and suggests a way to exploit this advantage for the realization of heterostructures containing an M-structured superlattice without bias dependent operation. ...[Visit Journal]
13.	Background limited long wavelength infrared type-II InAs/GaSb superlattice photodiodes operating at 110 K B.M. Nguyen, D. Hoffman, E.K. Huang, P.Y. Delaunay, and M. Razeghi Applied Physics Letters, Vol. 93, No. 12, p. 123502-1-- September 22, 2008 The utilization of the P+-pi-M-N+ photodiode architecture in conjunction with a thick active region can significantly improve long wavelength infrared Type-II InAs/GaSb superlattice photodiodes. By studying the effect of the depletion region placement on the quantum efficiency in a thick structure, we achieved a topside illuminated quantum efficiency of 50% for an N-on-P diode at 8.0 µm at 77 K. Both the double heterostructure design and the application of polyimide passivation greatly reduce the surface leakage, giving an R₀A of 416 Ω·cm² for a 1% cutoff wavelength of 10.52 µm, a Shot–Johnson detectivity of 8.1×10¹¹ cm·Hz^½/W at 77 K, and a background limited operating temperature of 110 K with 300 K background. ...[Visit Journal]
14.	Development of material quality and structural design for high performance type-II InAs/GaSb superlattice photodiodes and focal plane arrays M. Razeghi, B.M. Nguyen, D. Hoffman, P.Y. Delaunay, E.K. Huang, M.Z. Tidrow and V. Nathan SPIE Porceedings, Vol. 7082, San Diego, CA 2008, p. 708204-- August 11, 2008 Recent progress made in the structure design, growth and processing of Type-II InAs/GaSb superlattice photo-detectors lifted both the quantum efficiency and the R0A product of the detectors. Type-II superlattice demonstrated its ability to perform imaging in the Mid-Wave Infrared (MWIR)and Long-Wave Infrared (LWIR) ranges, becoming a potential competitor for technologies such as Quantum Well Infrared Photo-detectors (QWIP) and Mercury Cadmium Telluride (MCT). Using an empirical tight-binding model, we developed superlattices designs that were nearly lattice-matched to the GaSb substrates and presented cutoff wavelengths of 5 and 11 μm. We demonstrated high quality material growth with X-ray FWHM below 30 arcsec and an AFM rms roughness of 1.5 Å over an area of 20x20 μm2. The detectors with a 5 μm cutoff, capable of operating at room temperature, showed a R0A of 1.25 106 Ω.cm2 at 77K, and a quantum efficiency of 32%. In the long wavelength infrared, we demonstrated high quantum efficiencies above 50% with high R0A products of 12 Ω.cm2 by increasing the thickness of the active region. Using the novel M-structure superlattice design, more than one order of magnitude improvement has been observed for electrical performance of the devices. Focal plane arrays in the middle and long infrared range, hybridized to an Indigo read out integrated circuit, exhibited high quality imaging. ...[Visit Journal]
15.	Very high performance LWIR and VLWIR type-II InAs/GaSb superlattice photodiodes with M-structure barrier B.M. Nguyen, D. Hoffman, P.Y. Delaunay, E.K. Huang and M. Razeghi SPIE Porceedings, Vol. 7082, San Diego, CA 2008, p. 708205-- August 11, 2008 LWIR and VLWIR type II InAs/GaSb superlattice photodetectors have for long time suffered from a high dark current level and a low dynamic resistance which hampers the its emergence to the infrared detection and imaging industry. However, with the use of M-structure superlattice, a new type II binary InAs/GaSb/AlSb superlattice design, as an effective blocking barrier, the dark current in type II superlattice diode has been significantly reduced. We have obtained comparable differential resistance product to the MCT technology at the cut-off wavelength of 10 and 14μm. Also, this new design is compatible with the optical optimization scheme, leading to high quantum efficiency, high special detectivity devices for photon detectors and focal plane arrays. ...[Visit Journal]
16.	The effect of doping the M-barrier in very long-wave type-II InAs/GaSb heterodiodes D. Hoffman, B.M. Nguyen, E.K. Huang, P.Y. Delaunay, M. Razeghi, M.Z. Tidrow and J. Pellegrino Applied Physics Letters, Vol. 93, No. 3, p. 031107-1-- July 21, 2008 A variation on the standard homo-diode Type-II superlattice with an M-barrier between the pi-region and the n-region is shown to suppress the dark currents. By determining the optimal doping level of the M-superlattice, dark current densities of 4.95 mA·cm^-2 and quantum efficiencies in excess of 20% have been demonstrated at the moderate reverse bias of 50 mV; allowing for near background-limited performance with a Johnson-noise detectivity of 3.11×10¹⁰ Jones at 77 K for a 14.58 µm cutoff wavelength for large area diodes without passivation. This is comparable to values for the state-of-the-art HgCdTe photodiodes. ...[Visit Journal]
17.	High-Performance Focal Plane Arrays Based on InAs-GaSb Superlattices with a 10-micron Cutoff Wavelegth P.Y. Delaunay, B.M. Nguyen, D. Hoffman and M. Razeghi IEEE Journal of Quantum Electronics, Vol. 44, No. 5, p. 462-467-- May 1, 2008 We report on the demonstration of a focal plane array based on Type-II InAs/GaSb superlattices grown on N-type GaSb substrate with a 50%-cutoff wavelength at 10 μm. The surface leakage occurring after flip-chip bonding and underfill in the Type-II devices was suppressed using a double heterostructure design. The R₀A of diodes passivated with SiO₂ was 23 Ω·cm² after underfill. A focal plane array hybridized to an Indigo readout integrated circuit demonstrated a noise equivalent temperature difference of 33 mK at 81 K, with an integration time of 0.23 ms. ...[Visit Journal]
18.	High quantum efficiency two color type-II InAs/GaSb n-i-p-p-i-n photodiodes P.Y. Delaunay, B.M. Nguyen, D. Hoffman, A. Hood, E.K. Huang, M. Razeghi, and M.Z. Tidrow Applied Physics Letters, Vol. 92, No. 11, p. 111112-1-- March 17, 2008 A n-i-p-p-i-n photodiode based on type-II InAs/GaSb superlattice was grown on a GaSb substrate. The two channels, with respective 50% of responsivity cutoff wavelengths at 7.7 and 10 µm, presented quantum efficiencies (QEs) of 47% and 39% at 77 K. The devices can be operated as two diodes for simultaneous detection or as a single n-i-p-p-i-n detector for sequential detection. In the latter configuration, the QEs at 5.3 and 8.5 µm were measured as high as 40% and 39% at 77 K. The optical cross-talk between the two channels could be reduced from 0.36 to 0.08 by applying a 50 mV bias. ...[Visit Journal]
19.	Recent advances in LWIR type-II InAs/GaSb superlattice photodetectors and focal plane arrays at the Center for Quantum Devices M. Razeghi, D. Hoffman, B.M. Nguyen, P.Y. Delaunay, E.K. Huang, and M.Z. Tidrow SPIE Porceedings, Vol. 6940, Orlando, FL 2008, p. 694009-- March 17, 2008 In recent years, Type-II InAs/GaSb superlattice photo-detectors have experienced significant improvements in material quality, structural designs, and imaging applications. They now appear to be a possible alternative to the state-of-the-art HgCdTe (MCT) technology in the long and very long wavelength infrared regimes. At the Center for Quantum Devices,we have successfully realized very high quantum efficiency, very high dynamic differential resistance R0A - product LWIR Type – II InAs/GaSb superlattice photodiodes with efficient surface passivation techniques. The demonstration of high quality LWIR Focal Plane Arrays that were 100 % fabricated in - house reaffirms the pioneer position of this university-based laboratory. ...[Visit Journal]
20.	High performance focal plane array based on type-II InAs/GaSb superlattice heterostructures P.Y. Delaunay and M. Razeghi SPIE Conference, January 20-25, 2008, San Jose, CA Proceedings – Quantum Sensing and Nanophotonic Devices V, Vol. 6900, p. 69000M-1-10.-- February 1, 2008 Recent progress in growth techniques, structure design and processing has lifted the performances of Type-II InAs/GaSb superlattice photodetectors. A double heterostructure design, based on a low band gap (11 µm) active region and high band gap (5 µm) superlattice contacts, reduced the sensitivity of the superlattice to surface effects. The heterodiodes with an 11 µm cutoff, passivated with SiO₂, presented similar performances to unpassivated devices and a one order of magnitude increase of the resistivity of the sidewalls, even after flip-chip bonding and underfill. Thanks to this new design and to the inversion of the polarity of the devices, a high performance focal plane array with an 11 µm cutoff was demonstrated. The noise equivalent temperature difference was measured as 26 mK and 19 mK for operating temperatures of 81 K and 67 K. At an integration time of 0.08 ms, the FPA presented a quantum efficiency superior to 50%. ...[Visit Journal]
21.	Substrate removal for high quantum efficiency back side illuminated type-II InAs/GaSb photodetectors P.Y. Delaunay, B.M. Nguyen, D. Hoffman and M. Razeghi Applied Physics Letters, Vol. 91, No. 23, p. 231106-- December 3, 2007 A substrate removal technique using an InAsSb etch stop layer improves by a factor of 2 the quantum efficiency of back side illuminated type-II InAs/GaSb superlattice photodetectors. After etching of the GaSb substrate with a CrO₃ based solution, the quantum efficiency of the diodes presents Fabry-Pérot oscillations averaging at 56%. Due to the confinement of the infrared light inside the devices, the quantum efficiency for certain devices reaches 75% at 8.5 µm. The implementation of this new technique to a focal plane array resulted in a decrease of the integration time from 0.23 to 0.08 ms. ...[Visit Journal]
22.	Dark current suppression in type II InAs/GaSb superlattice long wavelength infrared photodiodes with M-structure barrier B.M. Nguyen, D. Hoffman, P.Y. Delaunay, and M. Razeghi Applied Physics Letters, Vol. 91, No. 16, p. 163511-1-- October 15, 2007 We presented an alternative design of type II superlattice photodiodes with the insertion of a mid-wavelength infrared M-structure AlSb/GaSb/InAs/GaSb/AlSb superlattice for the reduction of dark current. The M-structure superlattice has a larger carrier effective mass and a greater band discontinuity as compared to the standard type II superlattices at the valence band. It acts as an effective medium that weakens the diffusion and tunneling transport at the depletion region. As a result, a 10.5 µm cutoff type II superlattice with 500 nm M-superlattice barrier exhibited a R₀A of 200 cm² at 77 K, approximately one order of magnitude higher than the design without the barrier. The quantum efficiency of such structures does not show dependence on either barrier thickness or applied bias. ...[Visit Journal]
23.	Beryllium compensation doping of InAs/GaSb infrared superlattice photodiodes D. Hoffman, B.M. Nguyen, P.Y. Delaunay, A. Hood, M. Razeghi and J. Pellegrino Applied Physics Letters, Vol. 91, No. 14, p. 143507-1-- October 1, 2007 Capacitance-voltage measurements in conjunction with dark current measurements on InAs/GaSb long wavelength infrared superlattice photodiodes grown by molecular-beam epitaxy on GaSb substrates are reported. By varying the beryllium concentration in the InAs layer of the active region, the residually n-type superlattice is compensated to become slightly p-type. By adjusting the doping, the dominant dark current mechanism can be varied from diffusion to Zener tunneling. Minimization of the dark current leads to an increase of the zero-bias differential resistance from less than 4 to 32 cm² for a 100% cutoff of 12.05 µm ...[Visit Journal]
24.	Polarity inversion of type II InAs/GaSb superlattice photodiodes B.M. Nguyen, D. Hoffman, P.Y. Delaunay, M. Razeghi and V. Nathan Applied Physics Letters, Vol. 91, No. 10, p. 103503-1-- September 3, 2007 The authors demonstrated the realization of p-on-n type II InAs/GaSb superlattice photodiodes. Growth condition for high quality InAsSb layer lattice matched to GaSb was established for the use of an effective n-contact layer. By studying the effect of various GaSb capping layer thicknesses on the optical and electrical performances, an optimized thickness of 160 nm was determined. In comparison to as grown n-on-p superlattice photodiodes, this inverted design of p on n has shown similar quality. Finally, by analyzing Fabry-Perot interference fringes in the front side illuminated spectral measurement, the refractive index of the superlattice was determined to be approximately 3.8. ...[Visit Journal]
25.	Passivation of type-II InAs/GaSb double heterostructure P.Y. Delaunay, A. Hood, B.M. Nguyen, D. Hoffman, Y. Wei, and M. Razeghi Applied Physics Letters, Vol. 91, No. 9, p. 091112-1-- August 27, 2007 Focal plane array fabrication requires a well passivated material that is resistant to aggressive processes. The authors report on the ability of type-II InAs/GaSb superlattice heterodiodes to be more resilient than homojunctions diodes in improving sidewall resistivity through the use of various passivation techniques. The heterostructure consisting of two wide band gap (5 µm) superlattice contacts and a low band gap active region (11 µm) exhibits an R₀A averaging of 13·Ω cm². The devices passivated with SiO₂, Na₂S and SiO₂ or polyimide did not degrade compared to the unpassivated sample and the resistivity of the sidewalls increased to 47 kΩ·cm. ...[Visit Journal]

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