Publications by    
Page 1  (4 Items)

1.  
Effects of well width and growth temperature on optical and structural characteristics of AlN/GaN superlattices grown by metal-organic chemical vapor deposition
Effects of well width and growth temperature on optical and structural characteristics of AlN/GaN superlattices grown by metal-organic chemical vapor deposition
C. Bayram, N. Pere-Laperne, and M. Razeghi
Applied Physics Letters, Vol. 95, No. 20, p. 201906-1-- November 16, 2009
AlN/GaN superlattices (SLs) employing various well widths (from 1.5 to 7.0 nm) are grown by metal-organic chemical vapor deposition technique at various growth temperatures (Ts) (from 900 to 1035 °C). The photoluminescence (PL), x-ray diffraction, and intersubband (ISB) absorption characteristics of these SLs and their dependency on well width and growth temperature are investigated. Superlattices with thinner wells (grown at the same Ts) or grown at lower Ts (employing the same well width) are shown to demonstrate higher strain effects leading to a higher PL energy and ISB absorption energy. Simulations are employed to explain the experimental observations. ISB absorptions from 1.04 to 2.15 µm are demonstrated via controlling well width and growth temperature. reprint
 
2.  
Tunability of intersubband absorption from 4.5 to 5.3  µm in a GaN/Al<sub>0.2</sub>Ga<sub>0.8</sub>N superlattices grown by metalorganic chemical vapor deposition
Tunability of intersubband absorption from 4.5 to 5.3 µm in a GaN/Al0.2Ga0.8N superlattices grown by metalorganic chemical vapor deposition
N. Péré-Laperne, C. Bayram, L. Nguyen-Thê, R. McClintock, and M. Razeghi
Applied Physics Letters, Vol. 95, No. 13, p. 131109-- September 28, 2009
Intersubband (ISB) absorption at wavelengths as long as 5.3 µm is realized in GaN/Al0.2Ga0.8N superlattices grown by metalorganic chemical vapor deposition. By employing low aluminum content Al0.2Ga0.8N barriers and varying the well width from 2.6 to 5.1 nm, ISB absorption has been tuned from 4.5 to 5.3 µm. Theoretical ISB absorption and interband emission models are developed and compared to the experimental results. The effects of band offsets and the piezoelectric fields on these superlattices are investigated. reprint
 
3.  
Pulsed metal-organic chemical vapor deposition of high quality AlN/GaN superlattices for near-infrared intersubband transitions
Pulsed metal-organic chemical vapor deposition of high quality AlN/GaN superlattices for near-infrared intersubband transitions
C. Bayram, N. Pere-Laperne, R. McClintock, B. Fain and M. Razeghi
Applied Physics Letters, Vol. 94, No. 12, p. 121902-1-- March 23, 2009
A pulsed metal-organic chemical vapor deposition technique is developed for the growth of high-quality AlN/GaN superlattices (SLs) with intersubband (ISB) transitions at optical communications wavelengths. Tunability of the AlN and GaN layers is demonstrated. Indium is shown to improve SL surface and structural quality. Capping thickness is shown to be crucial for ISB transition characteristics. Effects of barrier- and well-doping on the ISB absorption are reported. reprint
 
4.  
Pulsed metalorganic chemical vapor deposition of high quality AlN/GaN superlattices for intersubband transitions
Pulsed metalorganic chemical vapor deposition of high quality AlN/GaN superlattices for intersubband transitions
C. Bayram, B. Fain, N. Pere-Laperne, R. McClintock and M. Razeghi
SPIE Proceedings, San Jose, CA Volume 7222-12-- January 26, 2009
A pulsed metalorganic chemical vapor deposition (MOCVD) technique, specifically designed for high quality AlN/GaN superlattices (SLs) is introduced. Optical quality and precise controllability over layer thicknesses are investigated. Indium is shown to improve interface and surface quality. An AlN/GaN SL designed for intersubband transition at a telecommunication wavelength of ~1.5 µm, is grown, and processed for intersubband (ISB) absorption measurements. Room temperature measurements show intersubband absorption centered at 1.49 µm. Minimal (n-type) silicon doping of the well is shown to be crucial for good ISB absorption characteristics. The potential to extend this technology into the far infrared and even the terahertz (THz) region is also discussed. reprint
 

Page 1  (4 Items)