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1.  
III-Nitride/Ga2O3 heterostructure for future power electronics: opportunity and challenges
III-Nitride/Ga2O3 heterostructure for future power electronics: opportunity and challenges
Nirajman Shrestha, Jun Hee Lee, F. H. Teherani, Manijeh Razeghi
Proc. of SPIE Vol. 12895, Quantum Sensing and Nano Electronics and Photonics XX, 128950B (28 January - 1 February 2024, San Francisco)http://dx.doi.org/10.1117/12.3011688
Ga2O3 has become the new focal point of high-power semiconductor device research due to its superior capability to handle high voltages in smaller dimensions and with higher efficiencies compared to other commercialized semiconductors. However, the low thermal conductivity of the material is expected to limit device performance. To compensate for the low thermal conductivity of Ga2O3 and to achieve a very high density 2-dimensional electron gas (2DEG), an innovative idea is to combine Ga2O3 with III-Nitrides (which have higher thermal conductivity), such as AlN. However, metal-polar AlN/β-Ga2O3 heterojunction provides type-II heterojunction which are beneficial for optoelectronic application, because of the negative value of specific charge density. On the other hand, N-polar AlN/β- Ga2O3 heterostructures provide higher 2DEG concentration and larger breakdown voltage compared to conventional AlGaN/GaN devices. This advancement would allow the demonstration of RF power transistors with a 10x increase in power density compared to today’s State of the Art (SoA) and provide a solution to size, weight, and power-constrained applications
 
2.  
Solar-Blind Deep UV Avalanche Photodetectors Using Reduced Area Epitaxy
Solar-Blind Deep UV Avalanche Photodetectors Using Reduced Area Epitaxy
Lakshay Gautam , Junhee Lee, Michael Richards, and Manijeh Razeghi ,
Lakshay Gautam, Manijeh Razeghi, IEEE JOURNAL OF QUANTUM ELECTRONICS, VOL. 59, NO. 6, 10.1109/JQE.2023.3325254
We report high gain avalanche photodetectors operating in the deep UV wavelength regime. The high gain was leveraged through reduced area epitaxy by patterning AlN on Sapphire substrate. This helps in a substantial reduction of crack formation due to overgrowth on individually isolated AlN mesas. Reproducible gain on the order of 105 was reported for multiple diodes in different areas of 320 × 256 focal plane array.
 
3.  
High-quality MOCVD-grown heteroepitaxial gallium oxide growth on III-nitrides enabled by AlOx interlayer
High-quality MOCVD-grown heteroepitaxial gallium oxide growth on III-nitrides enabled by AlOx interlayer
Junhee Lee, Lakshay Gautam, and Manijeh Razeghi
Junhee Lee, Manijeh RazeghiAppl. Phys. Lett. 123, 151902 (2023) https://doi.org/10.1063/5.0170383
We report high-quality Ga2O3 grown on an AlGaN/AlN/Sapphire in a single growth run in the same Metal Organic Chemical Vapor Deposition reactor with an AlOx interlayer at the Ga2O3/AlGaN interface. AlOx interlayer was found to enable the growth of single crystalline Ga2O3 on AlGaN in spite of the high lattice mismatch between the two material systems. The resulting nitride/oxide heterogenous heterostructures showed superior material qualities, which were characterized by structural, electrical, and optical characterization techniques. In particular, a significant enhancement of the electron mobility of the nitride/oxide heterogenous heterostructure is reported when compared to the individual electron mobilities of the Ga2O3 epilayer on the sapphire substrate and the AlGaN/AlN heterostructure on the sapphire substrate. This enhanced mobility marks a significant step in realizing the next generation of power electronic devices and transistors.
 
4.  
Investigation of Enhanced Heteroepitaxy and Electrical Properties in k-Ga2O3 due to Interfacing with β-Ga2O3 Template Layers
Investigation of Enhanced Heteroepitaxy and Electrical Properties in k-Ga2O3 due to Interfacing with β-Ga2O3 Template Layers
Junhee Lee, Lakshay Gautam, Ferechteh H. Teherani, Eric V. Sandana, P. Bove, David J. Rogers and Manijeh Razeghi
J. Lee, M. Razeghi, Physica Status Solidi A 2023,220, 2200559, https://doi.org/10.1002/pssa.202200559
Heteroepitaxial k-Ga2O3 films grown by metal-organic chemical vapor deposition (MOCVD) were found to have superior materials and electrical properties thanks to the interfacing with a b-Ga2O3 template layer. k-Ga2O3grown on sapphire has not been able to demonstrate its full potential due to materials imperfections created by strain induced by the lattice mismatch at the interface between the epilayer and the substrate. By adopting a b-Ga2O3 template on a c-sapphire substrate, higher quality k-Ga2O3thin films were obtained, as evidenced by a smoother surface morphology, narrower XRD peaks, and superior electrical performance. The implications of this phenomenon, caused by b-Ga2O3 buffer layer, are already very encouraging for both boosting current device performance and opening up the perspective of novel applications for Ga2O3. reprint
 
5.  
Low Dark Current Deep UV AlGaN Photodetectors on AlN Substrate
Low Dark Current Deep UV AlGaN Photodetectors on AlN Substrate
Lakshay Gautam, Junhee Lee, Gail Brown, Manijeh Razeghi
IEEE Journal of Quantum Electronics, vol. 58, no. 3, pp. 1-5, June 2022, Art no. 4000205
We report high quality, low dark current, deep Ultraviolet AlGaN/AlN Photodetectors on AlN substrate. AlGaN based Photodetectors are grown and fabricated both on AlN and Sapphire substrates with the same epilayer structure. Subsequently, electrical characteristics of both photodetectors on AlN substrate and Sapphire are compared. A reduction of 4 orders of magnitude of dark current density is reported in UV detectors grown on AlN substrate with respect to Sapphire substrate. reprint
 
6.  
Microstrip Array Ring FETs with 2D p-Ga2O3 Channels Grown by MOCVD
Microstrip Array Ring FETs with 2D p-Ga2O3 Channels Grown by MOCVD
Manijeh Razeghi, Junhee Lee, Lakshay Gautam, Jean-Pierre Leburton, Ferechteh H. Teherani, Pedram Khalili Amiri, Vinayak P. Dravid and Dimitris Pavlidis
Photonics 2021, 8(12), 578;
Gallium oxide (Ga2O3) thin films of various thicknesses were grown on sapphire (0001) substrates by metal organic chemical vapor deposition (MOCVD) using trimethylgallium (TMGa), high purity deionized water, and silane (SiH4) as gallium, oxygen, and silicon precursors, respectively. N2 was used as carrier gas. Hall measurements revealed that films grown with a lower VI/III ratio had a dominant p-type conduction with room temperature mobilities up to 7 cm2/Vs and carrier concentrations up to ~1020 cm−3 for thinner layers. High resolution transmission electron microscopy suggested that the layers were mainly κ phase. Microstrip field-effect transistors (FETs) were fabricated using 2D p-type Ga2O3:Si, channels. They achieved a maximum drain current of 2.19 mA and an on/off ratio as high as ~108. A phenomenological model for the p-type conduction was also presented. As the first demonstration of a p-type Ga2O3, this work represents a significant advance which is state of the art, which would allow the fabrication of p-n junction based devices which could be smaller/thinner and bring both cost (more devices/wafer and less growth time) and operating speed (due to miniaturization) advantages. Moreover, the first scaling down to 2D device channels opens the prospect of faster devices and improved heat evacuation reprint
 
7.  
High Thermal Stability of κ-Ga2O3 Grown by MOCVD
High Thermal Stability of κ-Ga2O3 Grown by MOCVD
Junhee Lee, Honghyuk Kim, Lakshay Gautam and Manijeh Razeghi
Lee, J.; Kim, H.; Gautam, L.; Razeghi, M. High Thermal Stability of κ-Ga2O3 Grown by MOCVD. Crystals 2021, 11, 446. https://doi.org/ 10.3390/cryst11040446
We report a high thermal stability of kappa gallium oxide grown on c-plane sapphire substrate by metal organic chemical vapor deposition. Kappa gallium oxide is widely known as a metastable polymorph transitioning its phase when subjected to a high temperature. Here, we show the kappa gallium oxide whose phase is stable in a high temperature annealing process at 1000 °C. These oxide films were grown at 690 °C under nitrogen carrier gas. The materials showed high electrical resistivity when doped with silicon, whereas the film conductivity was significantly improved when doped with both indium and silicon. This work provides a pathway to overcoming limitations for the advance in utilizing kappa gallium oxide possessing superior electrical characteristics. reprint
 
8.  
Highly Conductive Co-Doped Ga2O3Si-In Grown by MOCVD
Highly Conductive Co-Doped Ga2O3Si-In Grown by MOCVD
Junhee Lee, Honghyuk Kim, Lakshay Gautam and Manijeh Razeghi
Coatings 2021, 11(3), 287; https://doi.org/10.3390/coatings11030287
We report a highly conductive gallium oxide doped with both silicon and indium grown on c-plane sapphire substrate by MOCVD. From a superlattice structure of indium oxide and gallium oxide doped with silicon, we obtained a highly conductive material with an electron hall mobility up to 150 cm2/V·s with the carrier concentration near 2 × 1017 cm−3. However, if not doped with silicon, both Ga2O3:In and Ga2O3 are highly resistive. Optical and structural characterization techniques such as X-ray, transmission electron microscope, and photoluminescence, reveal no significant incorporation of indium into the superlattice materials, which suggests the indium plays a role of a surfactant passivating electron trapping defect levels. reprint
 
9.  
Study of Phase Transition in MOCVD Grown Ga2O3 from κ to β Phase by Ex Situ and In Situ Annealing
Study of Phase Transition in MOCVD Grown Ga2O3 from κ to β Phase by Ex Situ and In Situ Annealing
Junhee Lee, Honghyuk Kim, Lakshay Gautam, Kun He, Xiaobing Hu, Vinayak P. Dravid and Manijeh Razeghi
Photonics 2021, 8, 17. https://doi.org/10.3390/ photonics8010017
We report the post-growth thermal annealing and the subsequent phase transition of Ga2O3 grown on c-plane sapphire substrates by metal organic chemical vapor deposition (MOCVD). We demonstrated the post-growth thermal annealing at temperatures higher than 900 °C under N2 ambience, by either in situ or ex situ thermal annealing, can induce phase transition from nominally metastable κ- to thermodynamically stable β-phase. This was analyzed by structural characterizations such as high-resolution scanning transmission electron microscopy and x-ray diffraction. The highly resistive as-grown Ga2O3 epitaxial layer becomes conductive after annealing at 1000 °C. Furthermore, we demonstrate that in situ annealing can lead to a crack-free β-Ga2O3. reprint
 
10.  
Geiger-Mode Operation of AlGaN Avalanche Photodiodes at 255 nm
Geiger-Mode Operation of AlGaN Avalanche Photodiodes at 255 nm
Lakshay Gautam, Alexandre Guillaume Jaud, Junhee Lee, Gail J. Brown, Manijeh Razeghi
Published in: IEEE Journal of Quantum Electronics ( Volume: 57, Issue: 2, April 2021)
We report the Geiger mode operation of back-illuminated AlGaN avalanche photodiodes. The devices were fabricated on transparent AlN templates specifically for back-illumination to leverage hole-initiated multiplication. The spectral response was analyzed with a peak detection wavelength of 255 nm with an external quantum efficiency of ~14% at zero bias. Low-photon detection capabilities were demonstrated in devices with areas 25 μm×25 μm. Single photon detection efficiencies of ~5% were achieved. reprint
 
11.  
Thermal characteristics and analysis of quantum cascade lasers for biochemical sensing applications
Thermal characteristics and analysis of quantum cascade lasers for biochemical sensing applications
J.S. Yu, H.K. Lee, S. Slivken, and M. Razeghi
SPIE Proceedings, Biosensing II, San Diego, CA (August 2-6, 2009), Vol. 7397, p. 739705-1-- August 2, 2009
We studied the thermal characteristics and analysis of InGaAs/InAlAs quantum cascade lasers (QCLs) in terms of internal temperature distribution, heat flux, and thermal conductance from the heat transfer simulation. The heat source densities were obtained from threshold power densities measured experimentally for QCLs under room-temperature continuous-wave operation. The use of a thick electroplated Au around the laser ridges helps increase the heat removal from devices. The two-dimensional anisotropic heat dissipation model was used to analyze the thermal behaviors inside the device. The simulation results were also compared with those estimated from experimental data. reprint
 
12.  
Thermal analysis of buried heterostructure quantum cascade lasers for long-wavelength infrared emission using 2D anisotropic heat-dissipation model
Thermal analysis of buried heterostructure quantum cascade lasers for long-wavelength infrared emission using 2D anisotropic heat-dissipation model
H.K. Lee, K.S. Chung, J.S. Yu and M. Razeghi
Physica Status Solidi (a), Vol. 206, p. 356-362-- February 1, 2009
We have theoretically investigated and compared the thermal characteristics of 10.6 μm InGaAs/InAlAs/InP buried heterostructure (BH) quantum cascade lasers (QCLs) with different heat-sinking configurations by a steady-state heat-transfer analysis. The heat-source densities were obtained from laser threshold power densities measured experimentally under room-temperature continuous-wave mode. The two-dimensional anisotropic heat-dissipation model was used to calculate the temperature distribution, heat flux, and thermal conductance (Gth) inside the device. For good thermal characteristics, the QCLs in the long-wavelength infrared region require the relatively narrow BH structure in combination with epilayer-down bonding due to thick active core/cladding layers and high insulator losses. The single-ridge BH structure results in slightly higher thermal conductance by 2-4% than the double-channel (DC) ridge BH structure. For W = 12 m with 5 μm thick electroplated Au, the single-ridge BH laser with epilayer-down bonding exhibited the highest Gth value of 201.9 W/K cm2, i.e. increased by nearly 36% with respect to the epilayer-up bonded DC ridge waveguide laser. This value is improved by 50% and 62% with respect to the single-ridge BH laser and DC ridge waveguide laser with W = 20 μm in the epilayer-up bonding scheme, respectively. reprint
 
13.  
Comparison of type-II superlattice and HgCdTe infrared detector technologies
Comparison of type-II superlattice and HgCdTe infrared detector technologies
Jagmohan Bajaj; Gerry Sullivan; Don Lee; Ed Aifer; Manijeh Razeghi
Proc. SPIE 6542, Infrared Technology and Applications XXXIII, 65420B (May 14, 2007)-- May 14, 2007
Performance of HgCdTe detector technology surpasses all others in the mid-wave and long-wave infrared spectrum. This technology is relatively mature with current effort focused on improving uniformity, and demonstrating increased focal plane array (FPA) functionality. Type-II superlattice (InAs-GaSb and related alloys) detector technology has seen rapid progress over the past few years. The merits of the superlattice material system rest on predictions of even higher performance than HgCdTe and of engineering advantages. While no one has demonstrated Type-II superlattice detectors with performance superior to HgCdTe detectors, the difference in performance between these two technologies is decreasing. In this paper, we review the status and highlight relative merits of both HgCdTe and Type-II superlattice based detector technologies. reprint
 
14.  Comparison of ultraviolet light-emitting diodes with peak emission at 340 nm grown on GaN substrate and sapphire
A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, H. Zhang, P. Kung, M. Razeghi, S.K. Lee and J.Y. Han
Applied Physics Letters, 81 (12)-- September 16, 2002
Based on AlInGaN/AlInGaN multiquantum wells, we compare properties of ultraviolet light-emitting diodes (LED) with peak emission at 340 nm grown on free-standing hydride vapor phase epitaxially grown GaN substrate and on sapphire. For the LED grown on GaN substrate, a differential resistance as low as 13 Ω and an output power of more than one order of magnitude higher than that of the same structure grown on sapphire are achieved. Due to higher thermal conductivity of GaN, output power of the LEDs saturates at higher injection currents compared to the devices grown on sapphire. reprint
 
15.  Novel Sb-based Materials for Uncooled Infrared Photodetector Applications
J.J. Lee and M. Razeghi
-- December 1, 2000
 
16.  Tl incorporation in InSb and lattice contraction of In1-xTlxSb
J.J. Lee and M. Razeghi
Applied Physics Letters 76 (3)-- January 17, 2000
Ternary In1−xTlxSb thin films are grown by low pressure metalorganic chemical vapor deposition in the high In composition region. Infrared photoresponse spectra of the In1−xTlxSb epilayers show a clear shift toward a longer wavelength compared to that of InSb. Tl incorporation is confirmed by Auger electron spectroscopy. In contrast to the theoretical expectation, high resolution x-ray diffraction study reveals that the lattice of the In1−xTlxSb epilayers is contracted by the incorporation of Tl. As more Tl is incorporated, the lattice contraction is observed to increase gradually in the experimental range. A possible origin of this phenomenon is discussed. Our experimental results suggest that the Tl incorporation behavior in In1−xTlxSb differs from that of other group III impurities in III antimonides. reprint
 
17.  Exploration of Novel InSbBi Alloy for Uncooled Infrared Photodetector Applications
J.J. Lee, J.D. Kim, and M. Razeghi
-- July 1, 1999
 
18.  Novel InTlSb Alloy for Uncooled Long-Wavelength Infrared Photodetectors
J.J. Lee, J.D. Kim, and M. Razeghi
-- March 1, 1999
 
19.  AlxGa1-xN p-i-n Photodiodes on Sapphire Substrates
D. Walker, P. Kung, P. Sandvik, J. Wu, M. Hamilton, I.H. Lee, J. Diaz, and M. Razeghi
SPIE Conference, San Jose, CA, -- January 27, 1999
We report the fabrication and characterization of AlxGa1-xN p-i-n photodiodes (0.05 ≤ to X ≤ 0.30) grown on sapphire by low-pressure metalorganic chemical vapor deposition. The devices present a visible-rejection of about four orders of magnitude with a cutoff wavelength that shifts from 350 nm to 291 nm. They also exhibit a constant responsivity for five decades (30 mW/m² to 1 kW/m²) of optical power density. Using capacitance measurements, the values for the acceptor concentration in the p-AlxGa1-xN region and the unintentional donor concentration in the intrinsic region are found. Photocurrent decays are exponential for high load resistances, with a time constant that corresponds to the RC product of the system. For low load resistances the transient response becomes non-exponential, with a decay time longer than the RC constant. reprint
 
20.  Schottky MSM Photodetectors on GaN Films Grown on Sapphire by Lateral Epitaxial Overgrowth
P. Kung, D. Walker, P. Sandvik, M. Hamilton, J. Diaz, I.H. Lee and M. Razeghi
SPIE Conference, San Jose, CA, -- January 27, 1999
We report the growth and characterization of Schottky based metal-semiconductor-metal ultraviolet photodetectors fabricated on lateral epitaxially overgrown GaN films. The lateral epitaxial overgrowth of GaN was carried out on basal plane sapphire substrates by low pressure metalorganic chemical vapor deposition and exhibited lateral growth rates more than 5 times as high as vertical growth rates. The spectral responsivity, the dependence on bias voltage, on incident optical power, and the time response of these photodetectors have been characterized. Two detector orientations were investigated: one with the interdigitated finger pattern parallel and the other perpendicular to the underlying SiOx mask stripes. reprint
 
21.  Growth of InAsSb Alloys on GaAs and Si Substrates for Uncooled Infrared Photodetector Applications
J.D. Kim, H. Mohseni, J.S. Wojkowski, J.J. Lee and M. Razeghi
SPIE Conference, San Jose, CA, -- January 27, 1999
In this paper, we report on the growth and characterization of InAsSb alloys on GaAs and Si substrates for uncooled infrared photodetector applications. The fabrication and characterization of photodetectors from the grown layers are also reported. The photovoltaic and photoconductive devices were grown on (100) GaAs and Si substrates, respectively, using molecular beam epitaxy (MBE). The composition of InAs>sub>1-xSbx layers was 0.95 in both cases and cut-off wavelength of 7-8 μm has been obtained. At 300 K, the photovoltaic detectors on GaAs substrates resulted in a sharp cut-off wavelength of 7.5 μm with a peak responsivity as high as 0.32 V/W at 6.5 micrometer. For the photoconductive detectors on Si substrates, cut-off wavelength of 8 μm has been observed with a responsivity of 6.3x10-2 V/W at 7 μm under an electric field of 420 V/m. reprint
 
22.  Band-gap narrowing and potential fluctuation in Si-doped GaN
I.H. Lee, J.J. Lee, P. Kung, F.J. Sanchez, and M. Razeghi
Applied Physics Letters 74 (1)-- January 4, 1999
We investigate the optical properties of two sets of Si-doped GaN epitaxial layers with different degree of compensation. The electron concentration dependence of the band-gap energy measured by photoluminescence is interpreted as band-gap narrowing effect and evaluated by a simple relation. The photoluminescence peak positions of heavily compensated samples are shifted downward with respect to those of moderately compensated samples, and the down shift becomes larger at higher electron density. Based on analysis of photoluminescence spectra, these prominent behaviors are accounted for by band-edge potential fluctuation associated with inhomogeneous residual impurities. reprint
 
23.  Uncooled long-wavelength infrared photodetectors using narrow bandgap semiconductors
M. Razeghi, J. Wojkowski, J.D. Kim, H. Mohseni and J.J. Lee
-- October 12, 1998
 
24.  Room temperature operation of 8-12 μm InSbBi infrared photodetectors on GaAs substrates
J.J. Lee, J.D. Kim, and M. Razeghi
Applied Physics Letters 73 (5)-- August 3, 1998
We report the room temperature operation of 8–12 μm InSbBi long-wavelength infrared photodetectors. The InSbBi/InSb heterostructures were grown on semi-insulating GaAs (001) substrates by low pressure metalorganic chemical vapor deposition. The voltage responsivity at 10.6 μm was about 1.9 mV/W at room temperature and the corresponding Johnson noise limited detectivity was estimated to be about 1.2×106 cm·Hz½/W. The carrier lifetime derived from the voltage dependent responsivity measurements was about 0.7 ns. reprint
 
25.  Electrical Transport Properties of Highly Doped N-type GaN Epilayers
H.J. Lee, M.G. Cheong, E.K. Suh, and M. Razeghi
SPIE Conference, San Jose, CA, -- January 28, 1998
Temperature-dependent Hall-effects in MOCVD-grown Si-doped GaN epilayers were measured as a function of temperature in the range 10-800 K. The results were satisfactorily analyzed in terms of a two-band model including the (Gamma) and impurity bands at lower temperatures than room. The (Gamma) band electrons are dominant only high temperatures. The ionized impurity scattering is the most important in the (Gamma) band except at very high temperatures. reprint
 

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