Publications by    
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1.  
Improved performance of quantum cascade lasers through a scalable, manufacturable epitaxial-side-down mounting process
Improved performance of quantum cascade lasers through a scalable, manufacturable epitaxial-side-down mounting process
A. Tsekoun, R. Go, M. Pushkarsky, M. Razeghi, and C. Kumar N. Patel
Proceedings of the National Academy of Sciences 103 (13)-- March 26, 2006
We report substantially improved performance of high-power quantum cascade lasers (QCLs) by using epitaxial-side-down mounting that provides superior heat dissipation properties. We used aluminum nitride as the heatsink material and gold–tin eutectic solder. We have obtained continuous wave power output of 450 mW at 20°C from mid-IR QCLs. The improved thermal management achieved with epitaxial-side-down mounting combined with a highly manufacturable and scalable assembly process should permit incorporation of mid-IR QCLs in reliable instrumentation.
 
2.  Lateral Epitaxial Overgrowth of GaN on Sapphire and Silicon Substrates for Ultraviolet Photodetector Applications
M. Razeghi, P. Sandvik, P. Kung, D. Walker, K. Mi, X. Zhang, V. Kumar, J. Diaz, and F. Shahedipour
-- May 1, 2000
 
3.  Solar-Blind AlxGa1-xN p-i-n Photodetectors grown on LEO and non-LEO GaN
P. Sandvik, D. Walker, P. Kung, K. Mi, F. Shahedipour, V. Kumar, X. Zhang, J. Diaz, C. Jelen, and M. Razeghi
SPIE Conference, San Jose, CA, Vol. 3948, pp. 265 -- January 26, 2000
The III-Nitride material system is an excellent candidate for UV photodetector applications due to its wide, direct bandgaps and robust material nature. However, despite many inherent material advantages, the III-Nitride material system typically suffers from a large number of extended defects which degrade material quality and device performance. One technique aimed at reducing defect densities in these materials is lateral epitaxial overgrowth (LEO). In this work, we present a preliminary comparison between AlGaN UV, solar-blind p-i-n photodiodes fabricated form LEO GaN and non-LEO GaN. Improvements in both responsivity and rejection ratio are observed, however, further device improvements are necessary. For these, we focus on the optimization of the p- i-n structure and a reduction in contact resistivity to p- GaN and p-AlGaN layers. By improving the structure of the device, GaN p-i-n photodiodes were fabricated and demonstrate 86 percent internal quantum efficiency at 362 nm and a peak to visible rejection ratio of 105. Contact treatments have reduced the contact resistivity to p-GaN and p-AlGaN by over one order of magnitude form our previous results. reprint
 
4.  Solar-blind AlGaN photodiodes with very low cutoff wavelength
D. Walker, V. Kumar, K. Mi, P. Sandvik, P. Kung, X.H. Zhang, and M. Razeghi
Applied Physics Letters 76 (4)-- January 24, 2000
We report the fabrication and characterization of AlxGa1–xN photodiodes (x~0.70) grown on sapphire by low-pressure metalorganic chemical vapor deposition. The peak responsivity for –5 V bias is 0.11 A/W at 232 nm, corresponding to an internal quantum efficiency greater than 90%. The device response drops four orders of magnitude by 275 nm and remains at low response for the entire near-ultraviolet and visible spectrum. Improvements were made to the device design including a semitransparent Ni/Au contact layer and a GaN:Mg cap layer, which dramatically increased device response by enhancing the carrier collection efficiency. reprint
 
5.  Future Trends of III-Nitrides Using Lateral Epitaxial Overgrowth
M. Razeghi, P. Kung, P. Sandvik, X. Zhang, K. Mi, D. Walker, V. Kumar, and J. Diaz
-- December 14, 1999
 

Page 1  (5 Items)