Center for Quantum Devices - Journal Articles and Conference Proceedings

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1.	ZnO 3D flower-like nanostructure synthesized on GaN epitaxial layer by simple route hydrothermal process J.M. Jung, C.R. Kim, H. Ryu, M. Razeghi and W.G. Jung Journal of Alloys and Compounds-- September 15, 2007 The 3D type, flower-like ZnO nanostructures from particle to flower-like or chestnut bur are fabricated on the GaN epitaxial layer substrate through the simple-route hydrothermal process. Structural characterization was made for the ZnO 3D nanostructures synthesized in different pH ranging from 9.5 to 11.0. The growth model was proposed and discussed regarding the fabrication mechanism and morphology of ZnO 3D flower-like nanostructure. The flower-like ZnO is composed of many thin single crystals ZnO nanorods. Bigger and thicker ZnO structure is fabricated with the increase of pH in solution. The enhanced UV emission in the PL measurement and the spectra in the Raman spectroscopy for ZnO–GaN heterojunction material were discussed. reprint
2.	Fabrication of GaN nanotubular material using MOCVD with aluminum oxide membrane W.G. Jung, S.H. Jung, P. Kung, and M. Razeghi SPIE Conference, San Jose, CA, Vol. 6127, pp. 61270K-- January 23, 2006 GaN nanotubular material is fabricated with aluminum oxide membrane in MOCVD. SEM, XRD, TEM and PL are employed to characterize the fabricated GaN nanotubular material. An aluminum oxide membrane with ordered nano holes is used as template. Gallium nitride is deposited at the inner wall of the nano holes in aluminum oxide template, and the nanotubular material with high aspect ratio is synthesized using the precursors of TMG and ammonia gas. Optimal synthesis condition in MOCVD is obtained successfully for the gallium nitride nanotubular material in this research. The diameter of GaN nanotube fabricated is approximately 200 ~ 250 nm and the wall thickness is about 40 ~ 50 nm. GaN nanotubular material consists of numerous fine GaN particulates with sizes ranging 15 to 30 nm. reprint
3.	Fabrication of GaN Nanotubular Material using MOCVD with an Aluminium Oxide Membrane W.G. Jung, S.H. Jung, P. Kung, and M. Razeghi Nanotechnology 17-- January 1, 2006 GaN nanotubular material is fabricated with an aluminium oxide membrane in MOCVD. SEM, XRD, TEM and PL are employed to characterize the fabricated GaN nanotubular material. An aluminium oxide membrane with ordered nanoholes is used as a template. Gallium nitride is deposited at the inner wall of the nanoholes in the aluminium oxide template, and the nanotubular material with high aspect ratio is synthesized using the precursors of TMG and ammonia gas. Optimal synthesis conditions in MOCVD are obtained successfully for the gallium nitride nanotubular material in this research. The diameter of the GaN nanotube fabricated is approximately 200–250 nm and the wall thickness is about 40–50 nm. reprint

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