Center for Quantum Devices - Journal Articles and Conference Proceedings

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26.	Investigations on the substrate dependence of the properties in nominally-undoped β-Ga2O3 thin films grown by PLD F. H. Teherani ; D. J. Rogers ; V. E. Sandana ; P. Bove ; C. Ton-That ; L. L. C. Lem ; E. Chikoidze ; M. Neumann-Spallart ; Y. Dumont ; T. Huynh ; M. R. Phillips ; P. Chapon ; R. McClintock ; M. Razeghi Proc. SPIE 10105, Oxide-based Materials and Devices VIII, 101051R-OLD-- March 23, 2017 Nominally-undoped Ga₂O₃ layers were deposited on a-, c- and r-plane sapphire substrates using pulsed laser deposition. Conventional x-ray diffraction analysis for films grown on a- and c-plane sapphire showed the layers to be in the β-Ga₂O₃ phase with preferential orientation of the (-201) axis along the growth direction. Pole figures revealed the film grown on r-plane sapphire to also be in the β-Ga₂O₃ phase but with epitaxial offsets of 29.5°, 38.5° and 64° from the growth direction for the (-201) axis. Optical transmission spectroscopy indicated that the bandgap was ~5.2eV, for all the layers and that the transparency was > 80% in the visible wavelength range. Four point collinear resistivity and Van der Pauw based Hall measurements revealed the β-Ga₂O₃ layer on r-plane sapphire to be 4 orders of magnitude more conducting than layers grown on a- and c-plane sapphire under similar conditions. The absolute values of conductivity, carrier mobility and carrier concentration for the β-Ga₂O₃ layer on r-sapphire (at 20Ω-1.cm^-1, 6 cm²/Vs and 1.7 x 10¹⁹ cm^-3, respectively) all exceeded values found in the literature for nominally-undoped β-Ga₂O₃ thin films by at least an order of magnitude. Gas discharge optical emission spectroscopy compositional depth profiling for common shallow donor impurities (Cl, F, Si and Sn) did not indicate any discernable increase in their concentrations compared to background levels in the sapphire substrate. It is proposed that the fundamentally anisotropic conductivity in β-Ga₂O₃ combined with the epitaxial offset of the (-201) axis observed for the layer grown on r-plane sapphire may explain the much larger carrier concentration, electrical conductivity and mobility compared with layers having the (-201) axis aligned along the growth direction. reprint
27.	A study into the impact of sapphire substrate orientation on the properties of nominally-undoped β-Ga2O3 thin films grown by pulsed laser deposition F. H. Teherani; D. J. Rogers; V. E. Sandana; P. Bove; C. Ton-That; L. L. C. Lem; E. Chikoidze; M. Neumann-Spallart; Y. Dumont; T. Huynh; M. R. Phillips; P. Chapon; R. McClintock; M. Razeghi Proceedings Volume 10105, Oxide-based Materials and Devices VIII; 101051R-- March 23, 2017 Nominally-undoped Ga2O3 layers were deposited on a-, c- and r-plane sapphire substrates using pulsed laser deposition. Conventional x-ray diffraction analysis for films grown on a- and c-plane sapphire showed the layers to be in the β-Ga2O3 phase with preferential orientation of the (-201) axis along the growth direction. Pole figures revealed the film grown on r-plane sapphire to also be in theβ-Ga2O3 phase but with epitaxial offsets of 29.5°, 38.5° and 64° from the growth direction for the (-201) axis. Optical transmission spectroscopy indicated that the bandgap was ~5.2eV, for all the layers and that the transparency was > 80% in the visible wavelength range. Four point collinear resistivity and Van der Pauw based Hall measurements revealed the β-Ga2O3 layer on r-plane sapphire to be 4 orders of magnitude more conducting than layers grown on a- and c-plane sapphire under similar conditions. The absolute values of conductivity, carrier mobility and carrier concentration for the β-Ga2O3 layer on r-sapphire (at 20Ω-1.cm-1, 6 cm2/Vs and 1.7 x 1019 cm-3, respectively) all exceeded values found in the literature for nominally-undoped β-Ga2O3 thin films by at least an order of magnitude. Gas discharge optical emission spectroscopy compositional depth profiling for common shallow donor impurities (Cl, F, Si and Sn) did not indicate any discernable increase in their concentrations compared to background levels in the sapphire substrate. It is proposed that the fundamentally anisotropic conductivity in β-Ga2O3 combined with the epitaxial offset of the (-201) axis observed for the layer grown on r-plane sapphire may explain the much larger carrier concentration, electrical conductivity and mobility compared with layers having the (-201) axis aligned along the growth direction. reprint
28.	Study of Au coated ZnO nanoarrays for surface enhanced Raman scattering chemical sensing Gre´gory Barbillon, Vinod E. Sandana,Christophe Humbert, Benoit Be´lier, David J. Rogers, Ferechteh H. Teherani, Philippe Bove Ryan McClintock and Manijeh Razeghid J. Mater. Chem. C, 2017, 5, 3528-- March 20, 2017 At present, the simultaneous attainment of good reproducibility and high enhancement factors (EF) are key challenges in the development of surface enhanced Raman scattering (SERS)substrates for improved chemical and biological sensing. SERS substrates are generally based on distributions of metallic nanoparticles/structures with different shapes and architectures which are prepared by either thermal dewetting, precipitation from colloidal suspensions1–4 or advanced (e.g. deep UV or electron beam (EBL)) lithographic techniques.5–9 Although such substrates can exhibit large Raman enhancements, the former two techniques (colloidal and thermal dewetting) give poor SERS reproducibility while deep UV and EBL are too expensive and/or complex for mass production.
29.	Quntum Cascade Laser Breakthrough for Advanced Remote Detection Manijeh Razeghi, Wenjia Zhou, Donghai Wu, Ryan McClintock, and Steven Slivken Photonics Spectra, November issue-- November 1, 2016 The atoms in a molecule can bend, stretch and rotate with respect to one another, and these excitations are largely optically active. Most molecules, from simple to moderately complex, have a characteristic absorption spectrum in the 3- to 14-µrn wavelength range that can be uniquely identified and quantified in real time. Infrared spectroscopy has been used to study these absorption features and develop different molecular "fingerprints."
30.	Direct growth of thick AlN layers on nanopatterned Si substrates by cantilever epitaxy Ilkay Demir, Yoann Robin, Ryan McClintock, Sezai Elagoz, Konstantinos Zekentes, and Manijeh Razeghi Phys. Status Solidi A, pp. 1–6-- September 30, 2016 AlN layers have been grown on 200 nm period of nanopatterned Si (111) substrates by cantilever epitaxy and compared with AlN layers grown by maskless lateral epitaxial overgrowth (LEO) on micropatterned Si (111) substrates. The material quality of 5–10 µm thick AlN grown by LEO is comparable to that of much thinner layers (2 µm) grown by cantilever epitaxy on the nanopatterned substrates. Indeed, the latter exhibited root mean square (RMS) roughness of 0.65 nm and X-ray diffraction full width at half-maximum (FWHM) of 710 arcsec along the (0002) reflection and 930 arcsec along the (10̅15) reflection. The corresponding room temperature photoluminescence spectra was dominated by a sharp band edge peak. Back emission ultra violet light emitting diodes (UV LEDs) were fabricated by flip chip bonding to patterned AlN heat sinks followed by complete Si (111) substrate removal demonstrating a peak pulsed power of ∼0.7 mW at 344 nm peak emission wavelength. The demonstrated UV LEDs were fabricated on a cost effective epitaxial structure grown on the nanopatterned Si substrate with a total thickness of 3.3 µm reprint
31.	Wafer-scale epitaxial lift-off of optoelectronic grade GaN from a GaN substrate using a sacrificial ZnO interlayer Akhil Rajan, David J Rogers, Cuong Ton-That, Liangchen Zhu, Matthew R Phillips, Suresh Sundaram, Simon Gautier, Tarik Moudakir, Youssef El-Gmili, Abdallah Ougazzaden, Vinod E Sandana, Ferechteh H Teherani, Philippe Bove, Kevin A Prior, Zakaria Djebbour, Ryan McClintock and Manijeh Razeghi Journal of Physics D: Applied Physics, Volume 49, Number 31 -- July 15, 2016 Full 2 inch GaN epilayers were lifted off GaN and c-sapphire substrates by preferential chemical dissolution of sacrificial ZnO underlayers. Modification of the standard epitaxial lift-off (ELO) process by supporting the wax host with a glass substrate proved key in enabling full wafer scale-up. Scanning electron microscopy and x-ray diffraction confirmed that intact epitaxial GaN had been transferred to the glass host. Depth-resolved cathodoluminescence (CL) analysis of the bottom surface of the lifted-off GaN layer revealed strong near-band-edge (3.33 eV) emission indicating a superior optical quality for the GaN which was lifted off the GaN substrate. This modified ELO approach demonstrates that previous theories proposing that wax host curling was necessary to keep the ELO etch channel open do not apply to the GaN/ZnO system. The unprecedented full wafer transfer of epitaxial GaN to an alternative support by ELO offers the perspective of accelerating industrial adoption of the expensive GaN substrate through cost-reducing recycling. reprint
32.	Monolithically, widely tunable quantum cascade lasers based on a heterogeneous active region design Wenjia Zhou, Neelanjan Bandyopadhyay, Donghai Wu, Ryan McClintock & Manijeh Razeghi Nature Scientific Reports 6, Article number: 25213 -- June 8, 2016 Quantum cascade lasers (QCLs) have become important laser sources for accessing the mid-infrared (mid-IR) spectral range, achieving watt-level continuous wave operation in a compact package at room temperature. However, up to now, wavelength tuning, which is desirable for most applications, has relied on external cavity feedback or exhibited a limited monolithic tuning range. Here we demonstrate a widely tunable QCL source over the 6.2 to 9.1 μm wavelength range with a single emitting aperture by integrating an eight-laser sampled grating distributed feedback laser array with an on-chip beam combiner. The laser gain medium is based on a five-core heterogeneous QCL wafer. A compact tunable laser system was built to drive the individual lasers within the array and produce any desired wavelength within the available spectral range. A rapid, broadband spectral measurement (520 cm⁻¹) of methane using the tunable laser source shows excellent agreement to a measurement made using a standard low-speed infrared spectrometer. This monolithic, widely tunable laser technology is compact, with no moving parts, and will open new opportunities for MIR spectroscopy and chemical sensing. reprint
33.	Growth of AlGaN on silicon substrates: a novel way to make back-illuminated ultraviolet photodetectors Ryan McClintock ; Manijeh Razeghi Proc. SPIE 9555, Optical Sensing, Imaging, and Photon Counting: Nanostructured Devices and Applications, 95550U-- August 28, 2015 AlGaN, with its tunable wide-bandgap is a good choice for the realization of ultraviolet photodetectors. AlGaN films tend to be grown on foreign substrates such as sapphire, which is the most common choice for back-illuminated devices. However, even ultraviolet opaque substrates like silicon holds promise because, silicon can be removed by chemical treatment to allow back-illumination,1 and it is a very low-cost substrate which is available in large diameters up to 300 mm. However, Implementation of silicon as the solar-blind PD substrates requires overcoming the lattice-mismatch (17%) with the AlxGa1-xN that leads to high density of dislocation and crack-initiating stress. In this talk, we report the growth of thick crack-free AlGaN films on (111) silicon substrates through the use of a substrate patterning and mask-less selective area regrowth. This technique is critical as it decouples the epilayers and the substrate and allows for crack-free growth; however, the masking also helps to reduce the dislocation density by inclining the growth direction and encouraging dislocations to annihilate. A back-illuminated p-i-n PD structure is subsequently grown on this high quality template layer. After processing and hybridizing the device we use a chemical process to selectively remove the silicon substrate. This removal has minimal effect on the device, but it removes the UV-opaque silicon and allows back-illumination of the photodetector. We report our latest results of back-illuminated solar-blind photodetectors growth on silicon. reprint
34.	Ultraviolet avalanche photodiodes Ryan McClintock ; Manijeh Razeghi Proc. SPIE 9555, Optical Sensing, Imaging, and Photon Counting: Nanostructured Devices and Applications, 95550B -- August 28, 2015 The III-Nitride material system is rapidly maturing; having proved itself as a material for LEDs and laser, and now finding use in the area of UV photodetectors. However, many UV applications are still dominated by the use of photomultiplier tubes (PMT). PMTs are capable of obtaining very high sensitivity using internal electron multiplication gain (typically ~106). It is highly desirable to develop a compact semiconductor-based photodetector capable of realizing this level of sensitivity. In principle, this can be obtained in III-Nitrides by taking advantage of avalanche multiplication under high electric fields – typically 2.7 MV/cm, which with proper design can correspond to an external reverse bias of less than 100 volts. In this talk, we review the current state-of-the-art in III-Nitride solar- and visible-blind APDs, and present our latest results on GaN APDs grown on both conventional sapphire and low dislocation density free-standing c- and m-plane GaN substrates. Leakage current, gain, and single photon detection efficiency (SPDE) of these APDs were compared. The spectral response and Geiger-mode photon counting performance of UV APDs are studied under low photon fluxes, with single photon detection capabilities as much as 30% being demonstrated in smaller devices. Geiger-mode operation conditions are optimized for enhanced SPDE. reprint
35.	Solar-blind photodetectors and focal plane arrays based on AlGaN R. McClintock, M. Razeghi Proc. SPIE 9555, Optical Sensing, Imaging, and Photon Counting: Nanostructured Devices and Applications, 955502-- August 25, 2015 III-Nitride material system (AlGaInN) possesses unique optical, electrical and structural properties such as a wide tunable direct bandgap, inherent fast carrier dynamics; good carrier transport properties, high breakdown fields; and high robustness and chemical stability. Recent technological advances in the wide bandgap AlGaN portion of this material system have led to a renewed interest in ultraviolet (UV) photodetectors. These detectors find use in numerous applications in the defense, commercial and scientific arenas such as covert space-to-space communications, early missile threat detection, chemical and biological threat detection and spectroscopy, flame detection and monitoring, UV environmental monitoring, and UV astronomy.1,2,3 Back illuminated detectors operating in the solar blind region are of special interest. Back illumination allows the detector to be hybridized to a silicon read-out integrated circuit, epi-side down, and still collect light through the back of the transparent sapphire substrate. This allows the realization of solar blind focal plane arrays (FPAs) for imaging applications. Solar-blind FPAs are especially important because of the near total absence of any background radiation in this region. In this talk, we will present our recent back-illuminated solar-blind photodetector, mini-array, and FPA results. By systematically optimizing the design of the structure we have realized external quantum efficiencies (EQE) of in excess of 89% for pixel-sized detectors. Based on the absence of any anti-reflection coating, this corresponds to nearly 100% internal quantum efficiency. At the same time, the dark current remains below ~2 × 10^-9 A/cm² even at 10 volts of reverse bias. The detector has a very sharp falloff starting at 275 with the UV-solar rejection of better than three orders of magnitude, and a visible rejection ratio is more than 6 orders of magnitude. This high performance photodetector design was then used as the basis of the realization of solar-blind FPA. We demonstrated a 320×256 FPA with a peak detection wavelength of 278nm. The operability of the FPA was better than 92%, and excellent corrected imaging was obtained. reprint
36.	Core-shell GaN-ZnO Moth-eye Nanostructure Arrays Grown on a-SiO₂/Si (111) as a basis for Improved InGaN-based Photovoltaics and LEDs D.J. Rogers, V.E. Sandana, S. Gautier, T. Moudakir, M. Abid, A. Ougazzaden, F. Hosseini Teherani, P. Bove, M. Molinari, M. Troyon, M. Peres, Manuel J. Soares, A.J. Neves, T. Monteiro, D. McGrouther, J.N. Chapman, H.-J. Drouhin, R. McClintock, M. Razeghi Photonics and Nanostructures - Fundamentals and Applications, Volume 15, Pages 53-58-- March 30, 2015 Self-forming, vertically-aligned, ZnO moth-eye-like nanoarrays were grown by catalyst-free pulsed laser deposition on a-SiO₂/Si (111) substrates. X-Ray Diffraction (XRD) and Cathodoluminescence (CL) studies indicated that nanostructures were highly c-axis oriented wurtzite ZnO with strong near band edge emission. The nanostructures were used as templates for the growth of non-polar GaN by metal organic vapor phase epitaxy. XRD, scanning electron microscopy, energy dispersive X-ray microanalysis and CL revealed ZnO encapsulated with GaN, without evidence of ZnO back-etching. XRD showed compressive epitaxial strain in the GaN, which is conducive to stabilization of the higher indium contents required for more efficient green light emitting diode (LED) and photovoltaic (PV) operation. Angular-dependent specular reflection measurements showed a relative reflectance of less than 1% over the wavelength range of 400–720 nm at all angles up to 60°. The superior black-body performance of this moth-eye-like structure would boost LED light extraction and PV anti-reflection performance compared with existing planar or nanowire LED and PV morphologies. The enhancement in core conductivity, provided by the ZnO, would also improve current distribution and increase the effective junction area compared with nanowire devices based solely on GaN. reprint
37.	Scale-up of the Chemical Lift-off of (In)GaN-based p-i-n Junctions from Sapphire Substrates Using Sacrificial ZnO Template Layers D. J. Rogers, S. Sundaram, Y. El Gmili, F. Hosseini Teherani, P. Bove, V. Sandana, P. L. Voss, A. Ougazzaden, A. Rajan, K.A. Prior, R. McClintock, & M. Razeghi Proc. SPIE 9364, Oxide-based Materials and Devices VI, 936424 -- March 24, 2015 (In)GaN p-i-n structures were grown by MOVPE on both GaN- and ZnO-coated c-sapphire substrates. XRD studies of the as-grown layers revealed that a strongly c-axis oriented wurtzite crystal structure was obtained on both templates and that there was a slight compressive strain in the ZnO underlayer which increased after GaN overgrowth. The InGaN peak position gave an estimate of 13.6at% for the indium content in the active layer. SEM and AFM revealed that the top surface morphologies were similar for both substrates, with an RMS roughness (5 μm x 5 μm) of about 10 nm. Granularity appeared slightly coarser (40nm for the device grown on ZnO vs 30nm for the device grown on the GaN template) however. CL revealed a weaker GaN near band edge UV emission peak and a stronger broad defect-related visible emission band for the structure grown on the GaN template. Only a strong ZnO NBE UV emission was observed for the sample grown on the ZnO template. Quarter-wafer chemical lift-off (CLO) of the InGaN-based p-i-n structures from the sapphire substrate was achieved by temporary-bonding the GaN surface to rigid glass support with wax and then selectively dissolving the ZnO in 0.1M HCl. XRD studies revealed that the epitaxial nature and strong preferential c-axis orientation of the layers had been maintained after lift-off. This demonstration of CLO scale-up, without compromising the crystallographic integrity of the (In)GaN p-i-n structure opens up the perspective of transferring GaN based devices off of sapphire substrates industrially. reprint
38.	Structural, Optical, Electrical and Morphological Study of Transparent p-NiO/n-ZnO Heterojunctions Grown by PLD V. E. Sandana, D. J. Rogers, F. Hosseini Teherani, P. Bove, N. Ben Sedrine, M. R. Correia, T. Monteiro, R. McClintock, and M. Razeghi Proc. SPIE 9364, Oxide-based Materials and Devices VI, 93641O-- March 24, 2015 NiO/ZnO heterostructures were fabricated on FTO/glass and bulk hydrothermal ZnO substrates by pulsed laser deposition. X-Ray diffraction and Room Temperature (RT) Raman studies were consistent with the formation of (0002) oriented wurtzite ZnO and (111) oriented fcc NiO. RT optical transmission studies revealed bandgap energy values of ~3.70 eV and ~3.30 eV for NiO and ZnO, respectively and more than 80% transmission for the whole ZnO/NiO/FTO/glass stack over the majority of the visible spectrum. Lateral p-n heterojunction mesas (~6mm x 6mm) were fabricated using a shadow mask during PLD growth. n-n and p-p measurements showed that Ti/Au contacting gave an Ohmic reponse for the NiO, ZnO and FTO. Both heterojunctions had rectifying I/V characteristics. The junction on FTO/glass gave forward bias currents (243mA at +10V) that were over 5 orders of magnitude higher than those for the junction formed on bulk ZnO. At ~ 10^-7 A (for 10V of reverse bias) the heterojunction leakage current was approximately two orders of magnitude lower on the bulk ZnO substrate than on FTO. Overall, the lateral p-NiO/n-ZnO/FTO/glass device proved far superior to that formed by growing p-NiO directly on the bulk n-ZnO substrate and gave a combination of electrical performance and visible wavelength transparency that could predispose it for use in various third generation transparent electronics applications. reprint
39.	High power frequency comb based on mid-infrared quantum cascade laser at λ ~9μm Q. Y. Lu, M. Razeghi, S. Slivken, N. Bandyopadhyay, Y. Bai, W. J. Zhou, M. Chen, D. Heydari, A. Haddadi, R. McClintock, M. Amanti, and C. Sirtori Appl. Phys. Lett. 106, 051105-- February 2, 2015 We investigate a frequency comb source based on a mid-infrared quantum cascade laser at λ ∼9 μm with high power output. A broad flat-top gain with near-zero group velocity dispersion has been engineered using a dual-core active region structure. This favors the locking of the dispersed Fabry-Pérot modes into equally spaced frequency lines via four wave mixing. A current range with a narrow intermode beating linewidth of 3 kHz is identified with a fast detector and spectrum analyzer. This range corresponds to a broad spectral coverage of 65 cm⁻¹ and a high power output of 180 mW for ∼176 comb modes. reprint
40.	High Performance Solar-Blind Ultraviolet Focal Plane Arrays Based on AlGaN Erdem Cicek, Ryan McClintock, Abbas Haddadi, William A. Gaviria Rojas, and Manijeh Razeghi IEEE Journal of Quantum Electronics, Vol. 50, Issue 8, p 591-595-- August 1, 2014 We report on solar-blind ultraviolet, AlxGa1-x N- based,p-i-n,focal plane array (FPA) with 92% operability. At the peak detection wavelength of 278 nm, 320×256-FP A-pixel showed unbiased peak external quantum efficiency (EQE) and responsivity of 49% and 109 mA/W, respectively, increasing to 66% under 5 volts of reverse bias. Electrical measurements yielded a low-dark current density: <7×10^-9A/cm², at FPA operating voltage of 2 volts of reverse bias. reprint
41.	Antimonide-Based Type II Superlattices: A Superior Candidate for the Third Generation of Infrared Imaging Systems M. Razeghi, A. Haddadi, A.M. Hoang, G. Chen, S. Bogdanov, S.R. Darvish, F. Callewaert, P.R. Bijjam, and R. McClintock Journal of ELECTRONIC MATERIALS, Vol. 43, No. 8, 2014-- August 1, 2014 Type II superlattices (T2SLs), a system of interacting multiquantum wells,were introduced by Nobel Laureate L. Esaki in the 1970s. Since then, this material system has drawn a lot of attention, especially for infrared detection and imaging. In recent years, the T2SL material system has experienced incredible improvements in material growth quality, device structure design, and device fabrication techniques that have elevated the performance of T2SL-based photodetectors and focal-plane arrays (FPAs) to a level comparable to state-of-the-art material systems for infrared detection and imaging, such as mercury cadmium telluride compounds. We present the current status of T2SL-based photodetectors and FPAs for imaging in different infrared regimes, from short wavelength to very long wavelength, and dual-band infrared detection and imaging, as well as the future outlook for this material system. reprint
42.	Novel Method for Reclaim/Reuse of Bulk GaN Substrates using Sacrifical ZnO Release Layers A. Rajan, S. Sundaram, Y. El Gmili, P. L. Voss, K. Pantzas, T. Moudakir, A. Ougazzaden, D. J. Rogers, F. Hosseini Teherani, V. E. Sandana, P. Bove, K. Prior, R. McClintock & M. Razeghi Proc. SPIE 8987, Oxide-based Materials and Devices V, 898719-- April 2, 2014 Free-standing (0002)-oriented GaN substrates (f = 2”) were coated with 200 nm of ZnO and used as templates for the growth of GaN thin films. SEM and AFM revealed that such GaN layers had a relatively homogenous surface morphology with an RMS roughness (5 μm x 5 μm) of less than 4nm. XRD studies revealed strained ZnO growth on the GaN substrate and the reproduction of the substrate rocking curve for the GaN overlayers after only a hundred nm of growth, thus indicating that the GaN films had superior crystallographic quality compared to those grown on sapphire or ZnO/sapphire substrates. Quarter-wafer areas of GaN were removed from the GaN substrate (by selective chemical etching away of the ZnO interlayer). The expensive GaN substrates were then reclaimed/reused (without the need for polishing) for a second cycle of ZnO and GaN growth, which gave similar XRD, SEM, CL and AFM results to the first cycle. reprint
43.	Nickel oxide growth on Si (111), c-Al₂O₃ and FTO/glass by pulsed laser deposition V. E. Sandana ; D. J. Rogers ; F. Hosseini Teherani ; P. Bove ; R. McClintock ; M. Razeghi 03/07/2014-- March 7, 2014 NiO was grown on Si (111), c-Al₂O₃ and FTO/glass substrates by pulsed laser deposition (PLD). X-Ray Diffraction (XRD) and scanning electron microscope (SEM) studies revealed that layers grown on c-Al₂O₃ were fcc NiO with a dense morphology of cubic grains that were strongly (111) oriented along the growth direction. The relatively low ω rocking curve linewidth, of 0.12°suggests that there may have been epitaxial growth on the c-Al₂O₃ substrate. XRD and SEM indicated that films grown on Si (111) were also fcc NiO, with cubic grains, but that the grain orientation was random. This is consistent with the presence of an amorphous SiO₂ layer at the surface of the Si substrate, which precluded epitaxial growth. NiO grown at lower temperature (200°C) on temperature-sensitive FTO/glass substrates showed no evidence of crystallinity in XRD and SEM studies. After flash annealing in air, however, peaks characteristic of randomly oriented fcc NiO appeared in the XRD scans and the surface morphology became more granular in appearance. Such layers appear promising for the development of future dye-sensitised solar cell devices based on NiO grown by PLD. reprint
44.	Al_xGa_1-xN-based back-illuminated solar-blind photodetectors with external quantum efficiency of 89% E. Cicek, R. McClintock, C. Y. Cho, B. Rahnema, and M. Razeghi Appl. Phys. Lett. 103, 191108 (2013)-- November 5, 2013 We report on high performance Al_xGa_1−xN-based solar-blind ultraviolet photodetector (PD) array grown on sapphire substrate. First, high quality, crack-free AlN template layer is grown via metalorganic chemical vapor deposition. Then, we systematically optimized the device design and material doping through the growth and processing of multiple devices. After optimization, uniform and solar-blind operation is observed throughout the array; at the peak detection wavelength of 275 nm, 729 μm² area PD showed unbiased peak external quantum efficiency and responsivity of ∼80% and ∼176 mA/W, respectively, increasing to 89% under 5 V of reverse bias. Taking the reflection loses into consideration, the internal quantum efficiency of these optimized PD can be estimated to be as high as ∼98%. The visible rejection ratio measured to be more than six orders of magnitude. Electrical measurements yielded a low-dark current density: <2 × 10⁻⁹ A/cm², at 10 V of reverse bias. reprint
45.	Al_xGa_1−xN-based solar-blind ultraviolet photodetector based on lateral epitaxial overgrowth of AlN on Si substrate E. Cicek, R. McClintock, C. Y. Cho, B. Rahnema, and M. Razeghi Appl. Phys. Lett. 103, 181113 (2013)-- October 30, 2013 We report on Al_xGa_1−xN-based solar-blind ultraviolet (UV) photodetector (PD) grown on Si(111) substrate. First, Si(111) substrate is patterned, and then metalorganic chemical vapor deposition is implemented for a fully-coalesced ∼8.5 μm AlN template layer via a pulsed atomic layer epitaxial growth technique. A back-illuminated p-i-n PD structure is subsequently grown on the high quality AlN template layer. After processing and implementation of Si(111) substrate removal, the optical and electrical characteristic of PDs are studied. Solar-blind operation is observed throughout the array; at the peak detection wavelength of 290 nm, 625 μm² area PD showed unbiased peak external quantum efficiency and responsivity of ∼7% and 18.3 mA/W, respectively, with a UV and visible rejection ratio of more than three orders of magnitude. Electrical measurements yielded a low-dark current density below 1.6 × 10⁻⁸ A/cm² at 10 V reverse bias. reprint
46.	SOLID-STATE DEEP UV EMITTERS/DETECTORS: Zinc oxide moves further into the ultraviolet David J. Rogers; Philippe Bove; Eric V. Sandana; Ferechteh Hosseini Teherani; Ryan McClintock; Manijeh Razeghi Laser Focus World. 2013;49(10):33-36.-- October 10, 2013 Latest advancements in the alloying of zinc oxide (ZnO) with magnesium (Mg) can offer an alternative to (Al) GaN-based emitters/detectors in the deep UV with reduced lattice and efficiency issues. The emerging potential of ZnO for UV emitter and detector applications is the result of a long, concerted, and fruitful R&D effort that has led to more than 7000 publications in 2012. ZnO is considered to be a potentially superior material for use in LEDs and laser diodes due to its larger exciton binding energy, as compared with 21 meV for GaN. Wet etching is also possible for ZnO with nearly all dilute acids and alkalis, while GaN requires hydrofluoric (HF) acid or plasma etching. High-quality ZnO films can be grown more readily on mismatched substrates and bulk ZnO substrates have better availability than their GaN equivalents.
47.	Advances in antimonide-based Type-II superlattices for infrared detection and imaging at center for quantum devices M. Razeghi, A. Haddadi, A.M. Hoang, E.K. Huang, G. Chen, S. Bogdanov, S.R. Darvish, F. Callewaert, R. McClintock Infrared Physics & Technology, Volume 59, Pages 41-52 (2013)-- July 1, 2013 Type-II InAs/GaSb superlattices (T2SLs), a system of multi-interacting quantum wells, was introduced by Nobel Laureate L. Esaki in the 1970s. Since then, this material system has drawn a lot of attention especially for infrared detection. In recent years, T2SL material system has experienced incredible improvements in material quality, device structure designs and device fabrication process which elevated the performances of T2SL-based photo-detectors to a comparable level to the state-of-the-art material systems for infrared detection such as Mercury Cadmium Telluride (MCT). In this paper, we will present the current status of T2SL-based photo-detectors and focal plane arrays for imaging in different infrared regions, from SWIR to VLWIR, and the future outlook of this material system. reprint
48.	Surface plasmon enhanced light emission from AlGaN-based ultraviolet light-emitting diodes grown on Si (111) Chu-Young Cho, Yinjun Zhang, Erdem Cicek, Benjamin Rahnema, Yanbo Bai, Ryan McClintock, and Manijeh Razeghi Appl. Phys. Lett. 102, 211110 (2013)-- May 31, 2013 We report on the development of surface plasmon (SP) enhanced AlGaN-based multiple quantum wells (MQWs) ultraviolet (UV) light-emitting diodes (LEDs) grown on silicon (111) substrates. In order to generate SP-coupling with the radiating dipoles in MQWs, an aluminum layer is selectively deposited in holes etched in the top p-AlGaN to p-GaN layers. After flip-chip bonding and substrate removal, an optical output power of ∼1.2 mW is achieved at an emission wavelength of 346 nm; the output power of these UV LEDs with Al layer is increased by 45% compared to that of conventional UV LEDs without Al layer. This enhancement can be attributed to an increase in the spontaneous emission rate and improved internal quantum efficiency via resonance coupling between excitons in MQWs and SPs in the aluminum layer. reprint
49.	Engineering future light emitting diodes and photovoltaics with inexpensive materials: Integrating ZnO and Si into GaN-based devices C. Bayram ; K. T. Shiu ; Y. Zhu ; C. W. Cheng ; D. K. Sadana ; F. H. Teherani ; D. J. Rogers ; V. E. Sandana ; P. Bove ; Y. Zhang ; S. Gautier ; C.-Y. Cho ; E. Cicek ; Z. Vashaei ; R. McClintock ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 86260L (March 18, 2013)-- March 18, 2013 Indium Gallium Nitride (InGaN) based PV have the best fit to the solar spectrum of any alloy system and emerging LED lighting based on InGaN technology and has the potential to reduce energy consumption by nearly one half while enabling significant carbon emission reduction. However, getting the maximum benefit from GaN diode -based PV and LEDs will require wide-scale adoption. A key bottleneck for this is the device cost, which is currently dominated by the substrate (i.e. sapphire) and the epitaxy (i.e. GaN). This work investigates two schemes for reducing such costs. First, we investigated the integration of Zinc Oxide (ZnO) in InGaN-based diodes. (Successful growth of GaN on ZnO template layers (on sapphire) was illustrated. These templates can then be used as sacrificial release layers for chemical lift-off. Such an approach provides an alternative to laser lift-off for the transfer of GaN to substrates with a superior cost-performance profile, plus an added advantage of reclaiming the expensive single-crystal sapphire. It was also illustrated that substitution of low temperature n-type ZnO for n-GaN layers can combat indium leakage from InGaN quantum well active layers in inverted p-n junction structures. The ZnO overlayers can also double as transparent contacts with a nanostructured surface which enhances light in/out coupling. Thus ZnO was confirmed to be an effective GaN substitute which offers added flexibility in device design and can be used in order to simultaneously reduce the epitaxial cost and boost the device performance. Second, we investigated the use of GaN templates on patterned Silicon (100) substrates for reduced substrate cost LED applications. Controlled local metal organic chemical vapor deposition epitaxy of cubic phase GaN with on-axis Si(100) substrates was illustrated. Scanning electron microscopy and transmission electron microscopy techniques were used to investigate uniformity and examine the defect structure in the GaN. Our results suggest that groove structures are very promising for controlled local epitaxy of cubic phase GaN. Overall, it is concluded that there are significant opportunities for cost reduction in novel hybrid diodes based on ZnO-InGaN-Si hybridization. reprint
50.	Comparison of chemical and laser lift-off for the transfer of InGaN-based p-i-n junctions from sapphire to glass substrates D. J. Rogers ; P. Bove ; F. Hosseini Teherani ; K. Pantzas ; T. Moudakir ; G. Orsal ; G. Patriarche ; S. Gautier ; A. Ougazzaden ; V. E. Sandana ; R. McClintock ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862611 (March 18, 2013)-- March 18, 2013 InGaN-based p-i-n structures were transferred from sapphire to soda-lime glass substrates using two approaches: (1) laser-lift-off (LLO) and thermo-metallic bonding and (2) chemical lift-off (LLO) by means sacrificial ZnO templates and direct wafer bonding. Both processes were found to function at RT and allow reclaim of the expensive single crystal substrate. Both approaches have also already been demonstrated to work for the wafer-scale transfer of III/V semiconductors. Compared with the industry-standard LLO, the CLO offers the added advantages of a lattice match to InGaN with higher indium contents, no need for an interfacial adhesive layer (which facilitates electrical, optical and thermal coupling), no damaged/contaminated GaN surface layer, simplified sapphire reclaim (GaN residue after LLO may complicate reclaim) and cost savings linked to elimination of the expensive LLO process. reprint

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