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26.  
Substrate removal for high quantum efficiency back side illuminated type-II InAs/GaSb photodetectors
Substrate removal for high quantum efficiency back side illuminated type-II InAs/GaSb photodetectors
P.Y. Delaunay, B.M. Nguyen, D. Hoffman and M. Razeghi
Applied Physics Letters, Vol. 91, No. 23, p. 231106-- December 3, 2007
A substrate removal technique using an InAsSb etch stop layer improves by a factor of 2 the quantum efficiency of back side illuminated type-II InAs/GaSb superlattice photodetectors. After etching of the GaSb substrate with a CrO3 based solution, the quantum efficiency of the diodes presents Fabry-Pérot oscillations averaging at 56%. Due to the confinement of the infrared light inside the devices, the quantum efficiency for certain devices reaches 75% at 8.5 µm. The implementation of this new technique to a focal plane array resulted in a decrease of the integration time from 0.23 to 0.08 ms. reprint
 
27.  
Dark current suppression in Type-II InAs/GaSb superlattice long wavelength infrared photodiodes with M-structure barrier
Dark current suppression in Type-II InAs/GaSb superlattice long wavelength infrared photodiodes with M-structure barrier
B.M. Nguyen, D. Hoffman, P.Y. Delaunay, and M. Razeghi
Applied Physics Letters, Vol. 91, No. 16, p. 163511-1-- October 15, 2007
We presented an alternative design of Type-II superlattice photodiodes with the insertion of a mid-wavelength infrared M-structure AlSb/GaSb/InAs/GaSb/AlSb superlattice for the reduction of dark current. The M-structure superlattice has a larger carrier effective mass and a greater band discontinuity as compared to the standard Type-II superlattices at the valence band. It acts as an effective medium that weakens the diffusion and tunneling transport at the depletion region. As a result, a 10.5 µm cutoff Type-II superlattice with 500 nm M-superlattice barrier exhibited a R0A of 200 cm2 at 77 K, approximately one order of magnitude higher than the design without the barrier. The quantum efficiency of such structures does not show dependence on either barrier thickness or applied bias. reprint
 
28.  
Beryllium compensation doping of InAs/GaSb infrared superlattice photodiodes
Beryllium compensation doping of InAs/GaSb infrared superlattice photodiodes
D. Hoffman, B.M. Nguyen, P.Y. Delaunay, A. Hood, M. Razeghi and J. Pellegrino
Applied Physics Letters, Vol. 91, No. 14, p. 143507-1-- October 1, 2007
Capacitance-voltage measurements in conjunction with dark current measurements on InAs/GaSb long wavelength infrared superlattice photodiodes grown by molecular-beam epitaxy on GaSb substrates are reported. By varying the beryllium concentration in the InAs layer of the active region, the residually n-type superlattice is compensated to become slightly p-type. By adjusting the doping, the dominant dark current mechanism can be varied from diffusion to Zener tunneling. Minimization of the dark current leads to an increase of the zero-bias differential resistance from less than 4 to 32 cm2 for a 100% cutoff of 12.05 µm reprint
 
29.  
Polarity inversion of Type-II InAs/GaSb superlattice photodiodes
Polarity inversion of Type-II InAs/GaSb superlattice photodiodes
B.M. Nguyen, D. Hoffman, P.Y. Delaunay, M. Razeghi and V. Nathan
Applied Physics Letters, Vol. 91, No. 10, p. 103503-1-- September 3, 2007
The authors demonstrated the realization of p-on-n Type-II InAs/GaSb superlattice photodiodes. Growth condition for high quality InAsSb layer lattice matched to GaSb was established for the use of an effective n-contact layer. By studying the effect of various GaSb capping layer thicknesses on the optical and electrical performances, an optimized thickness of 160 nm was determined. In comparison to as grown n-on-p superlattice photodiodes, this inverted design of p on n has shown similar quality. Finally, by analyzing Fabry-Perot interference fringes in the front side illuminated spectral measurement, the refractive index of the superlattice was determined to be approximately 3.8. reprint
 
30.  
Passivation of type-II InAs/GaSb double heterostructure
Passivation of type-II InAs/GaSb double heterostructure
P.Y. Delaunay, A. Hood, B.M. Nguyen, D. Hoffman, Y. Wei, and M. Razeghi
Applied Physics Letters, Vol. 91, No. 9, p. 091112-1-- August 27, 2007
Focal plane array fabrication requires a well passivated material that is resistant to aggressive processes. The authors report on the ability of type-II InAs/GaSb superlattice heterodiodes to be more resilient than homojunctions diodes in improving sidewall resistivity through the use of various passivation techniques. The heterostructure consisting of two wide band gap (5 µm) superlattice contacts and a low band gap active region (11 µm) exhibits an R0A averaging of 13·Ω cm2. The devices passivated with SiO2, Na2S and SiO2 or polyimide did not degrade compared to the unpassivated sample and the resistivity of the sidewalls increased to 47 kΩ·cm. reprint
 
31.  
Very high quantum efficiency in type-II InAs/GaSb superlattice photodiode with cutoff of 12 µm
Very high quantum efficiency in type-II InAs/GaSb superlattice photodiode with cutoff of 12 µm
B.M. Nguyen, D. Hoffman, Y. Wei, P.Y. Delaunay, A. Hood and M. Razeghi
Applied Physics Letters, Vol. 90, No. 23, p. 231108-1-- June 4, 2007
The authors report the dependence of the quantum efficiency on device thickness of Type-II InAs/GaSb superlattice photodetectors with a cutoff wavelength around 12 µm. The quantum efficiency and responsivity show a clear delineation in comparison to the device thickness. An external single-pass quantum efficiency of 54% is obtained for a 12 µm cutoff wavelength photodiodes with a -region thickness of 6.0 µm. The R0A value is kept stable for the range of structure thicknesses allowing for a specific detectivity (2.2×1011 cm·Hz½/W). reprint
 
32.  
Near bulk-limited R0A of long-wavelength infrared type-II InAs/GaSb superlattice photodiodes with polyimide surface passivation
Near bulk-limited R0A of long-wavelength infrared type-II InAs/GaSb superlattice photodiodes with polyimide surface passivation
Andrew Hood, Pierre-Yves Delaunay, Darin Hoffman, Binh-Minh Nguyen, Yajun Wei, Manijeh Razeghi, and Vaidya Nathan
Applied Physics Letters 90, 233513-- June 4, 2007
Effective surface passivation of Type-II InAs/GaSb superlattice photodiodes with cutoff wavelengths in the long-wavelength infrared is presented. A stable passivation layer, the electrical properties of which do not change as a function of the ambient environment nor time, has been prepared by a solvent-based surface preparation, vacuum desorption, and the application of an insulating polyimide layer. Passivated photodiodes, with dimensions ranging from 400×400 to 25×25 µm2, with a cutoff wavelength of ~11 µm, exhibited near bulk-limited R0A values of ~12 Ω·cm2, surface resistivities in excess of 104 Ω·cm, and very uniform current-voltage behavior at 77 K. reprint
 
33.  
320x256 infrared focal plane array based on type-II InAs/GaSb superlattice with a 12 μm cutoff wavelength
320x256 infrared focal plane array based on type-II InAs/GaSb superlattice with a 12 μm cutoff wavelength
P.Y. Delaunay, B.M. Nguyen, D. Hoffman, and M. Razeghi
SPIE Porceedings, Vol. 6542, Orlando, FL 2007, p. 654204-- April 9, 2007
In the past few years, significant progress has been made in the structure design, growth and processing of Type-II InAs/GaSb superlattice photodetectors. Type-II superlattice demonstrated its ability to perform imaging in the middle and long infra-red range, becoming a potential competitor for technologies such as QWIP and HgCdTe. Using an empirical tight-binding model, we developed a superlattice design that matches the lattice parameter of GaSb substrates and presents a cutoff wavelength of 12 μm. Electrical and optical measurements performed on single element detectors at 77 K showed an R0A averaging 13 Ω·cm² and a quantum efficiency as high as 54%. We demonstrated high quality material growth with x-ray FWHM below 30 arcsec and an AFM rms roughness of 1.5 Å over an area of 20x20 μm². A 320x256 array of 25x25μm² pixels, hybridized to an Indigo Read Out Integrated Circuit, performed thermal imaging up to 185 K with an operability close to 97%. The noise equivalent temperature difference at 81 K presented a peak at 270 mK, corresponding to a mean value of 340 mK. reprint
 
34.  
Influence of Residual Impurity Background on the Non-radiative Recombination Processes in High Purity InAs/GaSb superlattice Photodiodes
Influence of Residual Impurity Background on the Non-radiative Recombination Processes in High Purity InAs/GaSb superlattice Photodiodes
E.C.F. da Silva, D. Hoffman, A. Hood, B. Nguyen, P.Y. Delaunay and M. Razeghi
Applied Physics Letters, 89 (24)-- December 11, 2006
The influence of the impurity background on the recombination processes in type-II InAs/GaSb superlattice photodiodes with a cutoff wavelength of approximately 4.8 μm was investigated by electroluminescence measurements. Using an iterative fitting procedure based on the dependence of the quantum efficiency of the electroluminescence on the injection current, the Auger and Shockley-Read-Hall lifetimes were determined reprint
 
35.  
First Demonstration of ~ 10 microns FPAs in InAs/GaSb SLS
First Demonstration of ~ 10 microns FPAs in InAs/GaSb SLS
M. Razeghi, P.Y. Delaunay, B.M. Nguyen, A. Hood, D. Hoffman, R. McClintock, Y. Wei, E. Michel, V. Nathan and M. Tidrow
IEEE LEOS Newsletter 20 (5)-- October 1, 2006
The concept of Type-II InAs/GaSb superlattice was first brought by Nobel Laureate L. Esaki, et al. in the 1970s. There had been few studies on this material system until two decades later when reasonable quality material growth was made possible using molecular beam epitaxy. With the addition of cracker cells for the group V sources and optimizations of material growth conditions, the superlattice quality become significantly improved and the detectors made of these superlattice materials can meet the demand in some practical field applications. Especially in the LWIR regime, it provides a very promising alternative to HgCdTe for better material stability and uniformity, etc. We have developed the empirical tight binding model (ETBM) for precise determination of the superlattice bandgap. reprint
 
36.  
High differential resistance type-II InAs/GaSb superlattice photodiodes for the long-wavelength infrared
High differential resistance type-II InAs/GaSb superlattice photodiodes for the long-wavelength infrared
A. Hood, D. Hoffman, B.M. Nguyen, P.Y. Delaunay, E. Michel and M. Razeghi
Applied Physics Letters, 89 (9)-- August 28, 2006
Type-II InAs/GaSb superlattice photodiodes with a 50% cutoff wavelength ranging from 11 to 13 μm are presented. Optimization of diffusion limited photodiodes provided superlattice structures for improved injection efficiency in direct injection hybrid focal plane array applications. reprint
 
37.  
Type-II superlattice photodetectors for MWIR to VLWIR focal plane arrays
Type-II superlattice photodetectors for MWIR to VLWIR focal plane arrays
M. Razeghi, Y. Wei, A. Hood, D. Hoffman, B.M. Nguyen, P.Y. Delaunay, E. Michel and R. McClintock
SPIE Infrared Technology and Applications Conference, April 17-21, 2006, Orlando, FL Proceedings – Infrared Technology and Applications XXXII, Vol. 6206, p. 62060N-1-- April 21, 2006
Results obtained on GaSb/InAs Type-II superlattices have shown performance comparable to HgCdTe detectors, with the promise of higher performance due to reduced Auger recombination and dark current through improvements in device design and material quality. In this paper, we discuss advancements in Type-II IR sensors that cover the 3 to > 30 µm wavelength range. Specific topics covered will be device design and modeling using the Empirical Tight Binding Method (ETBM), material growth and characterization, device fabrication and testing, as well as focal plane array processing and imaging. Imaging has been demonstrated at room temperature for the first time with a 5 µm cutoff wavelength 256×256 focal plane array. reprint
 

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